Invention Grant
- Patent Title: Magnetron assembly for physical vapor deposition chamber
-
Application No.: US14725527Application Date: 2015-05-29
-
Publication No.: US09991101B2Publication Date: 2018-06-05
- Inventor: William Johanson , Brij Datta , Fuhong Zhang , Adolph Miller Allen , Yu Y. Liu , Prashanth Kothnur
- Applicant: APPLIED MATERIALS, INC.
- Applicant Address: US CA Santa Clara
- Assignee: APPLIED MATERIALS, INC.
- Current Assignee: APPLIED MATERIALS, INC.
- Current Assignee Address: US CA Santa Clara
- Agency: Moser Taboada
- Agent Alan Taboada
- Main IPC: C23C14/34
- IPC: C23C14/34 ; H01J37/34 ; C23C14/35

Abstract:
Methods and apparatus for a magnetron assembly are provided herein. In some embodiments, a magnetron assembly includes a shunt plate having a central axis and rotatable about the central axis, a closed loop magnetic pole coupled to a first surface of the shunt plate and disposed 360 degrees along a peripheral edge of the shunt plate, and an open loop magnetic pole coupled at a the first surface of the shunt plate wherein the open loop magnetic pole comprises two rows of magnets disposed about the central axis.
Public/Granted literature
- US20160035547A1 MAGNETRON ASSEMBLY FOR PHYSICAL VAPOR DEPOSITION CHAMBER Public/Granted day:2016-02-04
Information query
IPC分类: