Invention Grant
- Patent Title: Electronic device and method for manufacturing the same, and substrate structure and method for manufacturing the same
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Application No.: US14802248Application Date: 2015-07-17
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Publication No.: US09991187B2Publication Date: 2018-06-05
- Inventor: Motonobu Sato , Mizuhisa Nihei
- Applicant: FUJITSU LIMITED
- Applicant Address: JP Kawasaki
- Assignee: FUJITSU LIMITED
- Current Assignee: FUJITSU LIMITED
- Current Assignee Address: JP Kawasaki
- Agency: Kratz, Quintos & Hanson, LLP
- Priority: JP2013-007736 20130118
- Main IPC: H01L23/34
- IPC: H01L23/34 ; H01L23/373 ; H01L23/31 ; H01L25/065 ; H01L23/00 ; H01L23/367 ; H01L27/06 ; H01L21/48

Abstract:
A semiconductor device includes: a silicon substrate that includes a heat release mechanism formed on a rear surface thereof; and an element layer that includes a transistor element and is formed on a front surface of the silicon substrate, the heat release mechanism including: a carbon material being a high heat-conducting material such as a CNT that is higher in heat conductivity than the silicon substrate and is formed in a plurality of first holes formed in the rear surface of the silicon substrate; and a carbon material being a heat-conductive film such as a multilayer graphene film that is thermally connected to the CNT in a manner to cover a rear surface side of the silicon substrate. This configuration provides a carbon material-embedded silicon substrate realizing very efficient heat release with a relatively simple configuration to obtain a highly-reliable electronic device.
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