Invention Grant
- Patent Title: Bipolar junction transistor
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Application No.: US15782817Application Date: 2017-10-12
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Publication No.: US09991367B1Publication Date: 2018-06-05
- Inventor: Chen-Wei Pan
- Applicant: UNITED MICROELECTRONICS CORP.
- Applicant Address: TW Hsin-Chu
- Assignee: UNITED MICROELECTRONICS CORP.
- Current Assignee: UNITED MICROELECTRONICS CORP.
- Current Assignee Address: TW Hsin-Chu
- Agent Winston Hsu
- Priority: TW106131547A 20170914
- Main IPC: H01L27/02
- IPC: H01L27/02 ; H01L29/73 ; H01L29/08 ; H01L27/06 ; H01L29/06 ; H01L29/66 ; H01L29/10 ; H01L29/417 ; H01L21/8234

Abstract:
A bipolar junction transistor (BJT) includes an emitter region, a base region surrounding the emitter region, and a collector region surrounding the base region. The emitter region includes a fin structures extending along a first direction, a first metal gate extending across the fin structure along a second direction, and a second metal gate disposed in parallel with the first metal gate. A spacing between the first metal gate and the second metal gate ranges between 0.2 micrometers and 0.4 micrometers.
Public/Granted literature
- US1263470A Extracting apparatus. Public/Granted day:1918-04-23
Information query
IPC分类: