Invention Grant
- Patent Title: Nanoshell, method of fabricating same and uses thereof
-
Application No.: US14402348Application Date: 2013-05-21
-
Publication No.: US09991458B2Publication Date: 2018-06-05
- Inventor: Gil Rosenman , Simon Litsyn , Yakov Roizin
- Applicant: Ramot at Tel-Aviv University Ltd. , Tower Semiconductor Ltd.
- Applicant Address: IL Tel-Aviv IL Migdal HaEmek
- Assignee: Ramot at Tel-Aviv University Ltd.,Tower Semiconductor Ltd.
- Current Assignee: Ramot at Tel-Aviv University Ltd.,Tower Semiconductor Ltd.
- Current Assignee Address: IL Tel-Aviv IL Migdal HaEmek
- International Application: PCT/IL2013/050436 WO 20130521
- International Announcement: WO2013/175470 WO 20131128
- Main IPC: H01L51/42
- IPC: H01L51/42 ; H01L21/02 ; B82Y20/00 ; B82Y25/00 ; B82Y30/00 ; B82Y40/00 ; H01G11/36 ; B32B3/20 ; C23C16/455 ; H01L27/146 ; G11C16/04 ; H01L21/28 ; H01L27/10 ; H01L29/788 ; H01L27/11521 ; H01L49/02 ; H01L29/06 ; G11C11/56 ; H01G11/24 ; H01G11/30 ; C23C16/44 ; H01M4/02 ; B01J13/04 ; B01J13/20 ; B01J13/22 ; B32B15/02 ; H01L27/11568 ; H01L27/22 ; H01L27/28 ; H01L27/30 ; H01L27/32 ; H01L43/02 ; H01L43/10 ; H01L43/12 ; H01L51/00 ; H01L51/05 ; H01L51/56 ; B82Y10/00 ; H01L29/82 ; H01L33/00 ; G11C13/00 ; H01M4/36

Abstract:
A method of fabricating a nanoshell is disclosed. The method comprises coating a nanometric core made of a first material by a second material, to form a core-shell nanostructure and applying non-chemical treatment to the core-shell nanostructure so as to at least partially remove the nanometric core, thereby fabricating a nanoshell. The disclosed nanoshell can be used in the fabrication of transistors, optical devices (such as CCD and CMOS sensors), memory devices and energy storage devices.
Public/Granted literature
- US20150108425A1 NANOSHELL, METHOD OF FABRICATING SAME AND USES THEREOF Public/Granted day:2015-04-23
Information query
IPC分类: