Invention Application
WO01036319A1 METHOD FOR REDUCING VARIATIONS IN ARRAYS OF MICRO-MACHINED CANTILEVER STRUCTURES USING ION IMPLANTATION 审中-公开
使用离子植入法减少微机械结构的阵列变化的方法

  • Patent Title: METHOD FOR REDUCING VARIATIONS IN ARRAYS OF MICRO-MACHINED CANTILEVER STRUCTURES USING ION IMPLANTATION
  • Patent Title (中): 使用离子植入法减少微机械结构的阵列变化的方法
  • Application No.: PCT/US2000/031358
    Application Date: 2000-11-15
  • Publication No.: WO01036319A1
    Publication Date: 2001-05-25
  • Main IPC: B81B3/00
  • IPC: B81B3/00 B81C1/00 G01J5/40
METHOD FOR REDUCING VARIATIONS IN ARRAYS OF MICRO-MACHINED CANTILEVER STRUCTURES USING ION IMPLANTATION
Abstract:
A method of adjusting the position of a micro-mechanical bi-material cantilever is provided. The bi-material includes a first and a second material and each material has a corresponding thermal expansion coefficient. The method includes implanting ions predominantly into one material of the bi-material to modify internal stress in one of the first and second materials relative to the other material. The deformation of the bi-material is then detected to modulate the implantation of ions thereto.
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