Invention Application
WO2008045504A2 HYDRAULIC-FACILITATED CONTACT LITHOGRAPHY APPARATUS, SYSTEM AND METHOD
审中-公开
液压辅助接触平面设备，系统和方法
- Patent Title: HYDRAULIC-FACILITATED CONTACT LITHOGRAPHY APPARATUS, SYSTEM AND METHOD
- Patent Title (中): 液压辅助接触平面设备，系统和方法
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Application No.: PCT/US2007/021722Application Date: 2007-10-10
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Publication No.: WO2008045504A2Publication Date: 2008-04-17
- Inventor: GAO, Jun , WU, Wei , PICCIOTTO, Carl
- Applicant: HEWLETT-PACKARD DEVELOPMENT COMPANY, L.P. , GAO, Jun , WU, Wei , PICCIOTTO, Carl
- Applicant Address: 20555 S. H. 249 Houston, TX 77070 US
- Assignee: HEWLETT-PACKARD DEVELOPMENT COMPANY, L.P.,GAO, Jun,WU, Wei,PICCIOTTO, Carl
- Current Assignee: HEWLETT-PACKARD DEVELOPMENT COMPANY, L.P.,GAO, Jun,WU, Wei,PICCIOTTO, Carl
- Current Assignee Address: 20555 S. H. 249 Houston, TX 77070 US
- Agency: COLLINS, David, W,
- Priority: US11/548,216 20061010
Abstract:
A contact lithography apparatus 100, 220, a system 200 and a method 300 use a hydraulic deformation to facilitate pattern transfer. The apparatus, the system and the method include a spacer 120, 226 that provides a spaced apart proximal orientation of lithographic elements 110, 228a, 130, 228b, and a hydraulic force member 140, 240 that provides the hydraulic deformation. One or more of the lithographic elements and the spacer is deformable, such that hydraulic deformation thereof facilitates the pattern transfer.
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