中科微点-全球专利检索

  1. Login
  2. Sign Up

Search Results

9 records (took 0.021 seconds)

    ANGLE-RESOLVED ANTISYMMETRIC SCATTEROMETRY
    3.
    发明申请
    ANGLE-RESOLVED ANTISYMMETRIC SCATTEROMETRY 审中-公开
    角解决的反对称散射测量

    公开(公告)号：WO2011011511A1

    公开(公告)日：2011-01-27

    申请号：PCT/US2010/042738

    申请日：2010-07-21

    Applicant: KLA-TENCOR CORPORATION ,  KANDEL, Daniel ,  LEVINSKI, Vladimir ,  SAPIENS, Noam

    Inventor： KANDEL, Daniel ,  LEVINSKI, Vladimir ,  SAPIENS, Noam

    IPC: G01J4/00

    CPC classification number: G01N21/95607 ,  G01B11/14 ,  G01B11/24 ,  G01B2210/56 ,  G03F7/70633

    Abstract: A method for determining an overlay offset may include, but is not limited to: obtaining a first anti-symmetric differential signal (ΔS 1 ) associated with a first scatterometry cell; obtaining a second anti-symmetric differential signal (ΔS 2 ) associated with a second scatterometry cell and computing an overlay offset from the first anti-symmetric differential (ΔS 1 ) signal associated with the first scatterometry cell and the second anti-symmetric differential signal (ΔS 2 ) associated with the second scatterometry cell.

    Abstract translation: 用于确定覆盖偏移的方法可以包括但不限于：获得与第一散射测量单元相关联的第一反对称差分信号（ΔS1）; 获得与第二散射测量单元相关联的第二反对称差分信号（θS2），并计算与第一散射测量单元和第二反对称差分信号相关联的第一反对称差分（ΔS1）信号的叠加偏移（ βS2）与第二散射测量单元相关联。

    STRUCTURED ILLUMINATION FOR CONTRAST ENHANCEMENT IN OVERLAY METROLOGY
    4.
    发明申请
    STRUCTURED ILLUMINATION FOR CONTRAST ENHANCEMENT IN OVERLAY METROLOGY 审中-公开
    结构化照明在超大规模的对比度增强

    公开(公告)号：WO2012109348A1

    公开(公告)日：2012-08-16

    申请号：PCT/US2012/024320

    申请日：2012-02-08

    Applicant: KLA-TENCOR CORPORATION ,  SELIGSON, Joel, L. ,  SAPIENS, Noam ,  KANDEL, Daniel

    Inventor： SELIGSON, Joel, L. ,  SAPIENS, Noam ,  KANDEL, Daniel

    IPC: G03F9/00

    CPC classification number: G01N21/47 ,  G01B11/02 ,  G01N21/00 ,  G03F7/70633

    Abstract: Contrast enhancement in a metrology tool may include generating a beam of illumination, directing a portion of the generated beam onto a surface of a spatial light modulator (SLM), directing at least a portion of the generated beam incident on the surface of the SLM through an aperture of an aperture stop and onto one or more target structures of one or more samples, and generating a selected illumination pupil function of the illumination transmitted through the aperture utilizing the SLM in order to establish a contrast level of one or more field images of the one or more target structures above a selected contrast threshold, and performing one or more metrology measurements on the one or more target structures utilizing the selected illumination pupil function.

    Abstract translation: 计量工具中的对比度增强可以包括产生照射光束，将所产生的光束的一部分引导到空间光调制器（SLM）的表面上，引导入射到SLM的表面上的所产生的光束的至少一部分通过 孔径的孔径停止并且连接到一个或多个样本的一个或多个目标结构上，并且通过使用SLM生成通过孔径透射的照明的选择的照明光瞳函数，以便建立一个或多个场图像的对比度 所述一个或多个目标结构在所选择的对比度阈值之上，以及利用所选择的照明光瞳功能对所述一个或多个目标结构执行一个或多个度量测量。

    MEASUREMENT SYSTEMS HAVING LINKED FIELD AND PUPIL SIGNAL DETECTION
    5.
    发明申请
    MEASUREMENT SYSTEMS HAVING LINKED FIELD AND PUPIL SIGNAL DETECTION 审中-公开
    具有链接字段和PUPIL信号检测的测量系统

    公开(公告)号：WO2016070155A1

    公开(公告)日：2016-05-06

    申请号：PCT/US2015/058519

    申请日：2015-10-31

    Applicant: KLA-TENCOR CORPORATION ,  FU, Jiyou ,  SAPIENS, Noam

    Inventor： FU, Jiyou ,  SAPIENS, Noam

    IPC: G01J1/02 ,  H01L21/66

    CPC classification number: G01N21/8851 ,  G01B11/0616 ,  G01N21/8806 ,  G01N21/9501 ,  G01N2021/8848

    Abstract: Methods and systems for simultaneous detection and linked processing of field signals and pupil signals are presented herein. In one aspect, estimates of one or more structural or process parameter values are based on field measurement signals, pupil measurement signals, or both. In addition, the quality of the measurements of the one or more structural or process parameter values is characterized based on the field measurement signals, pupil measurement signals, or both. In some embodiments, field measurement signals are processed to estimate one or more structural or process parameter values, and pupil measurement signals are processed to characterize the field measurement conditions. In some other embodiments, pupil measurement signals are processed to estimate one or more structural or process parameter values, and field measurement signals are processed to characterize the pupil measurement conditions.

    Abstract translation: 本文介绍了场信号和瞳孔信号的同时检测和链接处理的方法和系统。 在一个方面，一个或多个结构或过程参数值的估计基于场测量信号，光瞳测量信号或两者。 此外，一个或多个结构或过程参数值的测量的质量基于场测量信号，光瞳测量信号或二者来表征。 在一些实施例中，处理场测量信号以估计一个或多个结构或过程参数值，并且处理瞳孔测量信号以表征场测量条件。 在一些其他实施例中，处理瞳孔测量信号以估计一个或多个结构或过程参数值，并且处理场测量信号以表征瞳孔测量条件。

    ILLUMINATION CONTROL
    6.
    发明申请
    ILLUMINATION CONTROL 审中-公开
    照明控制

    公开(公告)号：WO2013002988A3

    公开(公告)日：2013-07-11

    申请号：PCT/US2012041273

    申请日：2012-06-07

    Applicant: KLA TENCOR CORP ,  MANASSEN AMNON ,  SELIGSON JOEL ,  SAPIENS NOAM

    Inventor： MANASSEN AMNON ,  SELIGSON JOEL ,  SAPIENS NOAM

    IPC: H01L21/027

    CPC classification number: G01J1/4257 ,  G02B21/0016 ,  G02B21/082 ,  G02B21/365 ,  G02B26/0833 ,  G03F7/70633

    Abstract: An optical system may include an objective, a source of illumination, an illumination system having illumination optics configured to direct the illumination onto the objective, and at least two dynamic optical array devices located at a pupil conjugate plane and a field conjugate plane, respectively in the illumination optics. The dynamic optical array devices are configured to control one or more properties of illumination coupled from the illumination system to the objective.

    Abstract translation: 光学系统可以包括物镜，照明源，具有被配置为将照明引导到物镜上的照明光学器件的照明系统以及分别位于光瞳共轭平面和场共轭平面处的至少两个动态光学阵列装置 照明光学器件。 动态光学阵列装置被配置为控制从照明系统耦合到物镜的照明的一个或多个特性。

    OVERLAY METROLOGY BY PUPIL PHASE ANALYSIS
    7.
    发明申请
    OVERLAY METROLOGY BY PUPIL PHASE ANALYSIS 审中-公开
    通过相位分析的覆盖度量

    公开(公告)号：WO2013025333A1

    公开(公告)日：2013-02-21

    申请号：PCT/US2012/048807

    申请日：2012-07-30

    Applicant: KLA-TENCOR CORPORATION ,  MANASSEN, Amnon ,  KANDEL, Daniel ,  BARUCH, Moshe ,  LEVINSKI, Vladimir ,  SAPIENS, Noam ,  SELIGSON, Joel L. ,  HILL, Andy ,  BACHAR, Ohad ,  NEGRI, Daria ,  ZAHARAN, Ofer

    Inventor： MANASSEN, Amnon ,  KANDEL, Daniel ,  BARUCH, Moshe ,  LEVINSKI, Vladimir ,  SAPIENS, Noam ,  SELIGSON, Joel L. ,  HILL, Andy ,  BACHAR, Ohad ,  NEGRI, Daria ,  ZAHARAN, Ofer

    IPC: H01L21/66

    CPC classification number: G03F7/70633

    Abstract: The present invention may include measuring a first phase distribution across a pupil plane of a portion of illumination reflected from a first overlay target of a semiconductor wafer, wherein the first overlay target is fabricated to have a first intentional overlay, measuring a second phase distribution across the pupil plane of a portion of illumination reflected from a second overlay target, wherein the second overlay target is fabricated to have a second intentional overlay in a direction opposite to and having the same magnitude as the first intentional overlay, determining a first phase tilt associated with a sum of the first and second phase distributions, determining a second phase tilt associated with a difference between the first and second phase distributions, calibrating a set of phase tilt data, and determining a test overlay value associated with the first and second overlay target.

    Abstract translation: 本发明可以包括测量跨越从半导体晶片的第一覆盖目标反射的照明部分的光瞳平面的第一相分布，其中第一覆盖目标被制造为具有第一有意覆盖，测量第二相位分布 从第二覆盖目标反射的照明部分的光瞳平面，其中第二覆盖目标被制造为具有与第一有意重叠相反并具有相同幅度的方向的第二有意覆盖，确定相关联的第一相位倾斜 具有第一和第二相位分布的总和，确定与第一和第二相位分布之间的差相关联的第二相位倾斜，校准一组相位倾斜数据，以及确定与第一和第二覆盖目标相关联的测试覆盖值 。

    METHOD AND SYSTEM FOR PROVIDING A QUALITY METRIC FOR IMPROVED PROCESS CONTROL
    8.
    发明申请
    METHOD AND SYSTEM FOR PROVIDING A QUALITY METRIC FOR IMPROVED PROCESS CONTROL 审中-公开
    提供改进过程控制质量标准的方法和系统

    公开(公告)号：WO2012138758A1

    公开(公告)日：2012-10-11

    申请号：PCT/US2012/032169

    申请日：2012-04-04

    Applicant: KLA-TENCOR CORPORATION ,  KANDEL, Daniel ,  COHEN, Guy ,  KLEIN, Dana ,  LEVINSKI, Vladimir ,  SAPIENS, Noam ,  SHULMAN, Alex ,  KAMENETSKY, Vladimir ,  AMIT, Eran ,  VAKSHTEIN, Irina

    Inventor： KANDEL, Daniel ,  COHEN, Guy ,  KLEIN, Dana ,  LEVINSKI, Vladimir ,  SAPIENS, Noam ,  SHULMAN, Alex ,  KAMENETSKY, Vladimir ,  AMIT, Eran ,  VAKSHTEIN, Irina

    IPC: G01N37/00

    CPC classification number: G03F7/70633 ,  G01N2223/6116

    Abstract: The present invention may include acquiring a plurality of overlay metrology measurement signals from a plurality of metrology targets distributed across one or more fields of a wafer of a lot of wafers, determining a plurality of overlay estimates for each of the plurality of overlay metrology measurement signals using a plurality of overlay algorithms, generating a plurality of overlay estimate distributions, and generating a first plurality of quality metrics utilizing the generated plurality of overlay estimate distributions, wherein each quality metric corresponds with one overlay estimate distribution of the generated plurality of overlay estimate distributions, each quality metric a function of a width of a corresponding generated overlay estimate distribution, each quality metric further being a function of asymmetry present in an overlay metrology measurement signal from an associated metrology target.

    Abstract translation: 本发明可以包括从分布在许多晶片的晶片的一个或多个场上的多个测量目标获取多个覆盖度量测量信号，为多个覆盖度量测量信号中的每一个确定多个重叠估计 使用多个覆盖算法，生成多个覆盖估计分布，以及利用所生成的多个覆盖估计分布生成第一多个质量度量，其中每个质量度量对应于所生成的多个覆盖估计分布的一个覆盖估计分布 每个质量度量是对应的生成的重叠估计分布的宽度的函数，每个质量度量还是来自相关度量目标的覆盖度量测量信号中存在的不对称的函数。

    ILLUMINATION CONTROL
    9.
    发明申请
    ILLUMINATION CONTROL 审中-公开
    照明控制

    公开(公告)号：WO2013002988A2

    公开(公告)日：2013-01-03

    申请号：PCT/US2012/041273

    申请日：2012-06-07

    Applicant: KLA-TENCOR CORPORATION ,  MANASSEN, Amnon ,  SELIGSON, Joel ,  SAPIENS, Noam

    Inventor： MANASSEN, Amnon ,  SELIGSON, Joel ,  SAPIENS, Noam

    CPC classification number: G01J1/4257 ,  G02B21/0016 ,  G02B21/082 ,  G02B21/365 ,  G02B26/0833 ,  G03F7/70633

    Abstract: An optical system may include an objective, a source of illumination, an illumination system having illumination optics configured to direct the illumination onto the objective, and at least two dynamic optical array devices located at a pupil conjugate plane and a field conjugate plane, respectively in the illumination optics. The dynamic optical array devices are configured to control one or more properties of illumination coupled from the illumination system to the objective.

    Abstract translation: 光学系统可以包括目标，照明源，具有被配置为将照明引导到物镜上的照明光学器件的照明系统，以及分别位于瞳孔共轭平面和场共轭平面处的至少两个动态光学阵列器件 照明光学。 动态光学阵列装置被配置为控制从照明系统耦合到目标的照明的一个或多个特性。

Patent Agency Ranking