公开(公告)号：KR1020060030755A

公开(公告)日：2006-04-11

申请号：KR1020040079617

申请日：2004-10-06

Applicant: 삼성전자주식회사

Inventor： 안계택

IPC: H01L21/265

Abstract: 이온 주입 장치를 절연 또는 냉각 시키기 위한 가스 리사이클링 장치는 이온 주입 장치의 적어도 일부분을 냉각시키며 외부로부터 절연시키기 위한 가스가 그 내부에 충진되도록 상기 적어도 일부분을 감싸도록 배치된 충진부가 구비된다. 가스 저장부는 상기 충진부와 가스 라인을 통해 연결되며 상기 가스를 저장한다. 압축기는 상기 가스 공급 라인 상에 구비되며 상기 이온 주입 장치를 절연 또는 냉각시키는 경우에는 상기 저장부의 가스를 상기 충진부에 압축시키고, 상기 이온 주입 장치의 점검시에는 상기 충진부의 가스를 상기 저장부에 압축시킨다.

公开(公告)号：KR1020040023941A

公开(公告)日：2004-03-20

申请号：KR1020020055391

申请日：2002-09-12

Applicant: 삼성전자주식회사

Inventor： 안계택

IPC: H01L21/265

Abstract: PURPOSE: An ion implanter equipped with means for removing particles is provided to avoid damage to equipment and malfunction of the equipment by preventing particles from being transferred to a power supply or a controller installed in an acceleration unit. CONSTITUTION: An ion beam generating unit is prepared. An ion analyzing unit(320) selects a specific ion among the ions supplied by the ion beam generating unit. The acceleration unit(330) accelerates the ions selected and radiated from the ion analyzing unit. The ions accelerated in the acceleration unit are implanted into a semiconductor substrate in a process chamber unit. The means for removing particles(325) is included in the ion analyzing unit.

Abstract translation: 目的：提供一个装有去除颗粒的装置的离子注入机，通过防止颗粒转移到安装在加速单元中的电源或控制器上，避免设备损坏和设备故障。 构成：制备离子束发生单元。 离子分析单元选择由离子束发生单元提供的离子中的特定离子。 加速单元（330）加速从离子分析单元选择和辐射的离子。 在加速单元中加速的离子注入到处理室单元中的半导体衬底中。 用于除去颗粒（325）的装置包括在离子分析单元中。

公开(公告)号：KR100375984B1

公开(公告)日：2003-03-15

申请号：KR1020010011541

申请日：2001-03-06

Applicant: 삼성전자주식회사

Inventor： 안계택

IPC: H01L21/68

CPC classification number: H01L21/68742 ,  C23C16/4581 ,  H01L21/6875

Abstract: A plate assembly on which a wafer is supported in the processing chamber of a processing apparatus facilitates a precise transfer of the wafer therefrom even when a vacuum atmosphere is present in the chamber. The plate assembly includes an underlying support plate and a pad dedicated to support the rear surface of the wafer. A plurality of recesses, in the form of parallel grooves, extend in the upper surface of the pad so that the rear surface of the wafer can also be exposed to the vacuum atmosphere in the processing chamber. Accordingly, a pressure difference at both sides of the wafer is minimized. Thus, the wafer can be raised off of the plate assembly while the precise position thereof is maintained.

Abstract translation: 在处理设备的处理室中支撑晶片的板组件有助于即使在室中存在真空气氛时也能够精确地传送晶片。 板组件包括下面的支撑板和专用于支撑晶片的后表面的衬垫。 平行凹槽形式的多个凹槽在衬垫的上表面中延伸，使得晶片的后表面也可暴露于处理室中的真空气氛。 因此，晶片两侧的压力差最小。 因此，晶片可以在保持其精确位置的同时从板组件上升起。

公开(公告)号：KR1020020075959A

公开(公告)日：2002-10-09

申请号：KR1020010015658

申请日：2001-03-26

Applicant: 삼성전자주식회사

Inventor： 안계택

IPC: H02K5/00 ,  H02K5/14

Abstract: PURPOSE: A motor is provided to reduce the damage and the driving badness by constructing a housing of the motor with a transparent material. CONSTITUTION: Both ends of a cylindrical housing(110b) are tightly closed. A permanent magnet(108) is adhered within the housing(110b) and forms a magnetic field. A rotational shaft passes through one side of the housing(110b), is connected to the other side and installed on a coaxial place with the housing(110b). A rotor(106) is installed on the rotational shaft, opposite to the permanent magnet(108) and generates a rotational force by a supplied current and the magnetic field. A commutator(104) is installed on the rotational shaft in a predetermined direction and connected to the rotor(106). A brush(112) is installed within the housing(110b) so as to come in touch with the commutator(104) to supply power thereto.

Abstract translation: 目的：通过用透明材料构建电机的外壳，提供电机来减少损坏和驾驶不良。 构成：圆柱形壳体（110b）的两端紧密关闭。 永磁体（108）粘附在壳体（110b）内并形成磁场。 旋转轴穿过壳体（110b）的一侧，连接到另一侧并与壳体（110b）安装在同轴的位置。 转子（106）安装在与永磁体（108）相反的旋转轴上，并通过供给的电流和磁场产生旋转力。 换向器（104）以预定方向安装在旋转轴上并连接到转子（106）。 刷子（112）安装在壳体（110b）内以与换向器（104）接触以向其供电。

公开(公告)号：KR1020010093478A

公开(公告)日：2001-10-29

申请号：KR1020000016115

申请日：2000-03-29

Applicant: 삼성전자주식회사

Inventor： 안계택 ,  김도형

IPC: H01L21/00

Abstract: PURPOSE: An isolation value device of a semiconductor manufacturing apparatus is provided to prevent a damage of a wafer by installing an isolation value device between a load lock and a process chamber. CONSTITUTION: A partition(30) is installed between a load lock region(20) and a process chamber region(70) in order to form an opening(36) and separate the load lock region(20) and the process chamber region(70). The opening(36) is formed at the partition(30). A wafer(60) is transferred between the load lock region(20) and the process chamber region(70) by the opening(36). A door operation portion(52) is combined with a door(50) for opening and shutting the opening(36). The door operation portion(52) is formed on an upper portion of the opening(36). The door(50) is moved to an upper direction of the partition(30). An inclined plate(40) is extended and formed to a lower portion of the partition(30) to the load lock region(20).

Abstract translation: 目的：提供半导体制造装置的隔离值装置，以通过在负载锁和处理室之间安装隔离值装置来防止晶片的损坏。 构成：在负载锁定区域（20）和处理室区域（70）之间安装隔板（30），以便形成开口（36）并分离负载锁定区域（20）和处理室区域（70） ）。 开口（36）形成在隔板（30）处。 晶片（60）通过开口（36）在负载锁定区域（20）和处理室区域（70）之间传递。 门操作部分（52）与用于打开和关闭开口（36）的门（50）组合。 门操作部（52）形成在开口（36）的上部。 门（50）移动到隔板（30）的上方。 倾斜板（40）延伸并形成到分隔件（30）的下部到装载锁定区域（20）。

公开(公告)号：KR1020020042185A

公开(公告)日：2002-06-05

申请号：KR1020000071975

申请日：2000-11-30

Applicant: 삼성전자주식회사

Inventor： 안계택 ,  박광식

IPC: H01L21/68

Abstract: PURPOSE: A wafer lift apparatus is provided to previously prevent a wafer trembling phenomenon due to a wafer lift by minimizing a vacuum pressure. CONSTITUTION: A wafer lift apparatus(200) largely comprises a wafer unloader(210) and a displacement generating unit(250). The wafer unloader(210) further comprises a base plate(211) having a disc shape, wafer lift pins(213,214,215) respectively having defined heights with a cylindric bar shape inserted into loading/unloading through-holes(115) on the base plate(211), and a finger separation unit(217) removing a binding force of a finger(150) installed on the wafer lift pin(213) fronted with the lower portion of the finger(150) among the wafer lift pins(213,214,215). At this point, the two wafer lift pins(214,215) are formed higher than the wafer lift pin(213), thereby softening a vacuum pressure binding a wafer(170) and a wafer fixing pad(135).

Abstract translation: 目的：提供一种晶片提升装置，以预先通过最小化真空压力来防止由于晶片升高引起的晶片颤动现象。 构成：晶片提升装置（200）主要包括晶片卸载器（210）和位移产生单元（250）。 晶片卸载器（210）还包括具有圆盘形状的基板（211），分别具有限定高度的晶片提升销（213,214,215）插入基板上的装载/卸载通孔（115）中的圆柱形棒状 211），以及手指分离单元（217），其移除安装在晶片提升销（213,214,215）中的与手指（150）的下部相对的晶片提升销（213）上的手指（150）的绑定力。 在这一点上，两个晶片提升销（214,215）形成得高于晶片提升销（213），从而软化结合晶片（170）和晶片固定垫（135）的真空压力。

公开(公告)号：KR1020000065962A

公开(公告)日：2000-11-15

申请号：KR1019990012762

申请日：1999-04-12

Applicant: 삼성전자주식회사

Inventor： 안계택

IPC: G09F3/00

Abstract: PURPOSE: A bar code tag is provided to prevent a bar code from being separated from the tag by attaching a bar code sticker on an obscure plate so as for the top of the sticker to be contact with a transparent plate. CONSTITUTION: A bar code tag comprises an obscured plate, a transparent plate, a bar code sticker and an interconnection portion. The obscured plate and the transparent plate are interconnected, with a center portion bent. The bar code sticker is attached on the obscured plate, with an upper plane contacted with the transparent plate. The interconnection portion is formed so as to interconnect the obscured plate and the transparent plate.

Abstract translation: 目的：提供条形码标签，以防止条形码与标签分开，方法是在不透明的板上贴上条形码标签，以使贴纸的顶部与透明板接触。 构成：条形码标签包括遮盖板，透明板，条形码标签和互连部分。 遮蔽板和透明板互连，中心部分弯曲。 条形码贴纸贴在遮光板上，上面与透明板接触。 互连部形成为使遮蔽板和透明板相互连接。

公开(公告)号：KR1020080084339A

公开(公告)日：2008-09-19

申请号：KR1020070025957

申请日：2007-03-16

Applicant: 삼성전자주식회사

Inventor： 안계택

IPC: H01L21/265

Abstract: An apparatus for clamping a cathode of an ion source is provided to prevent the degradation of clamping force of a cathode fixing shaft and the mis-alignment of a cathode by using a cathode clamp with a clamp screw. An arc chamber(10) has an ionization space. A cathode(20) has a cylindrical shape of which one lateral side is opened at a side of the arc chamber. A cathode fixing shaft(40) is prepared on the other opened side from a cross-sectional center of the cathode. A cathode clamp(50) clamps the cathode fixing shaft at a side of the outside of the cathode by using a clamp screw. A filament(30) is prepared adjacent to a lateral cross-section of the cathode by integrally connecting a pair of leads being inserted into an inner of the cathode. A filament clamp(60) clamps ends of leads of the filament. A spiral line is formed on an outer circumference of the cathode fixing shaft having a part being clamped to the cathode clamp.

Abstract translation: 提供一种用于夹持离子源的阴极的装置，以通过使用具有夹紧螺钉的阴极夹来防止阴极固定轴的夹紧力的劣化和阴极的错位。 电弧室（10）具有电离空间。 阴极（20）具有圆弧形状，其一侧侧在电弧室侧开口。 阴极固定轴（40）从阴极的横截面中心在另一个开放侧准备。 阴极夹具（50）通过使用夹紧螺钉将阴极固定轴夹在阴极外侧。 通过将插入到阴极的内部的一对引线整体连接，来制造与阴极的横截面相邻的细丝（30）。 灯丝夹具（60）夹紧灯丝的引线端。 螺旋线形成在阴极固定轴的外周上，其一部分被夹紧到阴极夹。

公开(公告)号：KR1020030090363A

公开(公告)日：2003-11-28

申请号：KR1020020028642

申请日：2002-05-23

Applicant: 삼성전자주식회사

Inventor： 안계택

IPC: H01L21/265

Abstract: PURPOSE: A jig for assembling a faraday cup of ion injection equipment is provided to prevent the pollution of a faraday cup assembly by using a cover plate for covering a polluted part of the faraday cup assembly. CONSTITUTION: A jig for assembling a faraday cup of ion injection equipment includes a cover plate(52), a holder portion(63), and a support portion(55). The cover plate(52) includes a measuring groove(54) in order to cover an open portion of a faraday cup assembly. A size of the measuring groove(54) corresponds to the size of the open portion of the faraday cup assembly. The holder portion(63) presses edge portions of a measuring paper(70) in order to cover the measuring groove(54). The support portion(55) supports the faraday cup assembly in order to fix the cover plate(52) including the holder portion(63).

Abstract translation: 目的：提供组装法拉第杯离子注射设备的夹具，以通过使用盖板覆盖法拉第杯组件的污染部分来防止法拉第杯组件的污染。 构成：用于组装法拉第杯离子注入设备的夹具包括盖板（52），保持器部分（63）和支撑部分（55）。 盖板（52）包括测量凹槽（54），以覆盖法拉第杯组件的开口部分。 测量槽（54）的尺寸对应于法拉第杯组件的开口部分的尺寸。 为了覆盖测量凹槽（54），保持器部分（63）挤压测量纸（70）的边缘部分。 支撑部分（55）支撑法拉第杯组件以便固定包括保持器部分（63）的盖板（52）。

公开(公告)号：KR1020020071405A

公开(公告)日：2002-09-12

申请号：KR1020010011541

申请日：2001-03-06

Applicant: 삼성전자주식회사

Inventor： 안계택

IPC: H01L21/68

CPC classification number: H01L21/68742 ,  C23C16/4581 ,  H01L21/6875

Abstract: PURPOSE: A plate assembly and a processing apparatus having the same are provided to minimize an aligning error of a wafer by providing vacuum atmosphere of a process chamber to a back side of the wafer. CONSTITUTION: A plate assembly(32) includes a pad(32a) and a plate(32b). The pad(32a) has recesses. The recesses have a shape of groove. A vacuum atmosphere of a process chamber is provided by the recesses of the pad(32a). The vacuum atmosphere is provided to a back side of a wafer loaded on the plate assembly(32). The plate assembly(32) has a disc shape. A diameter of the plate assembly(32) is larger than the diameter of the wafer. The pad(32a) is formed by rubber material. A silicon material can be added into the pad(32a). A robot arm transfers the wafer from the outside of a process chamber to the plate assembly(32) or the plate assembly(32) to the outside of the process chamber.

Abstract translation: 目的：提供一种板组件和具有该组件的处理设备，以通过将处理室的真空气氛提供到晶片的背面来最小化晶片的对准误差。 构成：板组件（32）包括垫（32a）和板（32b）。 垫（32a）具有凹部。 凹槽具有凹槽的形状。 处理室的真空气氛由衬垫（32a）的凹部提供。 真空气氛被提供到装载在板组件（32）上的晶片的背面。 板组件（32）具有圆盘形状。 板组件（32）的直径大于晶片的直径。 垫（32a）由橡胶材料形成。 可以将硅材料添加到垫（32a）中。 机器人臂将晶片从处理室的外部传送到板组件（32）或板组件（32）到处理室的外部。