公开(公告)号：US20180046089A1

公开(公告)日：2018-02-15

申请号：US15790287

申请日：2017-10-23

Applicant: ASML NETHERLANDS B.V.

Inventor： Bob STREEFKERK ,  Johannes Jacobus Matheus BASELMANS ,  Henrikus Herman Marie COX ,  Antonius Theodorus Anna Maria DERKSEN ,  Sjoerd Nicolaas Lambertus DONDERS ,  Christiaan Alexander HOOGENDAM ,  Joeri LOF ,  Erik Roelof LOOPSTRA ,  Jeroen Johannes Sophia Maria MERTENS ,  Frits VAN DER MEDLEN ,  Johannes Catharinus Hubertus MULKENS ,  Gerardus Petrus Matthijs VAN NUNEN ,  Klaus SIMON ,  Bernardus Antonius SLAGHEKKE ,  Alexander STRAAIJER ,  Jan-Gerard Cornelis VAN DER TOORN ,  Martijn HOUKES

IPC: G03F7/20

CPC classification number: G03F7/70341 ,  G03F7/70425 ,  G03F7/70525 ,  G03F7/709

Abstract: In a lithographic apparatus, a localized area of the substrate surface under a projection system is immersed in liquid. The height of a liquid supply system above the surface of the substrate can be varied using actuators. A control system uses feedforward or feedback control with input of the surface height of the substrate to maintain the liquid supply system at a predetermined height above the surface of the substrate.

公开(公告)号：US20170045830A1

公开(公告)日：2017-02-16

申请号：US15338116

申请日：2016-10-28

Applicant: ASML NETHERLANDS B.V.

Inventor： Christiaan Alexander HOOGENDAM ,  Bob STREEFKERK ,  Johannes Catharinus Hubertus MULKENS ,  Erik Theodorus Maria BIJLAART ,  Aleksey Yurievich KOLESNYCHENKO ,  Erik Roelof LOOPSTRA ,  Jeroen Johannes Sophia Maria MERTENS ,  Bernardus Antonius SLAGHEKKE ,  Patricius Aloysius Jacobus TINNEMANS ,  Helmar VAN SANTEN

IPC: G03F7/20

CPC classification number: G03F7/70866 ,  G03F7/70341 ,  G03F7/70808

Abstract: Liquid is supplied to a space between the projection system and the substrate by an inlet. In an embodiment, an overflow region removes liquid above a given level. The overflow region may be arranged above the inlet and thus the liquid may be constantly refreshed and the pressure in the liquid may remain substantially constant.

Abstract translation: 通过入口将液体供给到投影系统和基板之间的空间。 在一个实施例中，溢流区域去除高于给定水平的液体。 溢流区域可以布置在入口的上方，因此液体可以不断刷新，并且液体中的压力可能保持基本恒定。

公开(公告)号：US20190227444A1

公开(公告)日：2019-07-25

申请号：US16369721

申请日：2019-03-29

Applicant: ASML NETHERLANDS B.V.

Inventor： Christiaan Alexander HOOGENDAM ,  Bob STREEFKERK ,  Johannes Catharinus Hubertus MULKENS ,  Erik Theodorus Maria BIJLAART ,  Aleksey Yurievich KOLESNYCHENKO ,  Erik Roelof LOOPSTRA ,  Jeroen Johannes Sophia Maria MERTENS ,  Bernardus Antonius SLAGHEKKE ,  Patricius Aloysius Jacobus TINNEMANS ,  Helmar VAN SANTEN

IPC: G03F7/20

CPC classification number: G03F7/70866 ,  G03F7/70341 ,  G03F7/70808

Abstract: Liquid is supplied to a space between the projection system and the substrate by an inlet. In an embodiment, an overflow region removes liquid above a given level. The overflow region may be arranged above the inlet and thus the liquid may be constantly refreshed and the pressure in the liquid may remain substantially constant.

公开(公告)号：US20160299440A1

公开(公告)日：2016-10-13

申请号：US15184770

申请日：2016-06-16

Applicant: ASML NETHERLANDS B.V.

Inventor： Bob STREEFKERK ,  Johannes Jacobus Matheus BASELMANS ,  Henrikus Herman Marie COX ,  Antonius Theodorus Anna Maria DERKSEN ,  Sjoerd Nicolaas Lambertus DONDERS ,  Christiaan Alexander HOOGENDAM ,  Joeri LOF ,  Erik Roelof LOOPSTRA ,  Jeroen Johannes Sophia Maria MERTENS ,  Frits VAN DER MEULEN ,  Johannes Catharinus Hubertus MULKENS ,  Gerardus Petrus Matthijs VAN NUNEN ,  Klaus SIMON ,  Bernardus Antonius SLAGHEKKE ,  Alexander STRAAIJER ,  Jan-Gerard Cornelis VAN DER TOORN ,  Martijn HOUKES

IPC: G03F7/20

CPC classification number: G03F7/70341 ,  G03F7/70425 ,  G03F7/70525 ,  G03F7/709

Abstract: In a lithographic apparatus, a localized area of the substrate surface under a projection system is immersed in liquid. The height of a liquid supply system above the surface of the substrate can be varied using actuators. A control system uses feedforward or feedback control with input of the surface height of the substrate to maintain the liquid supply system at a predetermined height above the surface of the substrate.