公开(公告)号：US20240264539A1

公开(公告)日：2024-08-08

申请号：US18565951

申请日：2022-05-20

Applicant: ASML NETHERLANDS B.V.

Inventor： Lingling LU ,  Yuzhang LIN ,  Teng WANG ,  Bo WANG ,  Raphael Eric LA GRECA ,  Stefan HUNSCHE

IPC: G03F7/00 ,  G06T7/00 ,  G06T7/12

CPC classification number: G03F7/706837 ,  G03F7/70625 ,  G03F7/70655 ,  G06T7/0006 ,  G06T7/12 ,  G06T2207/10061 ,  G06T2207/30148

Abstract: To monitor semiconductor manufacturing process variation, contours of identical pattern features are determined based on SEM images, and the contours are aggregated and statistically analyzed to determine the variation of the feature. Some of the contours are outliers, and the aggregation and averaging of the contours “hides” these outliers. The present disclosure describes filtering certain outlier contours before they are aggregated and statistically analyzed. The filtering can be performed at multiple levels, such as based on individual points on the contours in the set of inspection contours, or based on overall geometrical shapes of the contours in the set of inspection contours.