公开(公告)号：WO2021052712A1

公开(公告)日：2021-03-25

申请号：PCT/EP2020/073449

申请日：2020-08-21

Applicant: ASML NETHERLANDS B.V.

Inventor： CAO, Yu ,  SCRANTON, Greggory ,  SU, Jing ,  ZOU, Yi

IPC: G03F1/36 ,  G03F1/70 ,  G03F7/20 ,  G06N20/00

Abstract: Described herein are methods of generating a characteristic pattern for a patterning process and training a machine learning model. A method of training a machine learning model configured to generate a characteristic pattern for a mask pattern includes obtaining (i) a reference characteristic pattern (EFMs) that meets a satisfactory threshold related to manufacturing of the mask pattern, and (ii) a continuous transmission mask (CTM) for use in generating the mask pattern; and training, based on the reference characteristic pattern and the CTM, the machine learning model such that a first metric between the characteristic pattern (EFM1) and the CTM, and a second metric between the characteristic pattern (EFM1) and the reference characteristic pattern (EFMs) is reduced.