公开(公告)号：JP2007081395A

公开(公告)日：2007-03-29

申请号：JP2006238794

申请日：2006-09-04

Applicant: Asml Netherlands Bv ,  エーエスエムエル ネザーランズ ビー.ブイ.

Inventor： NEERHOF HENDRIK ANTONY JOHANNE ,  BOTMA HAKO ,  RAVENSBERGEN MARIUS

IPC: H01L21/027 ,  G03F7/20

CPC classification number: G03F7/70191 ,  G03F7/70083

Abstract: PROBLEM TO BE SOLVED: To provide a lithographic apparatus and a device manufacturing method. SOLUTION: A lithographic apparatus comprises: an illumination system configured to condition a radiation beam; a support formed to support a patterning device (formed to impart a cross-sectional pattern to the radiation beam to form a patterned radiation beam); a substrate table formed to hold a substrate; and a projection system configured to project the patterned radiation beam onto a target portion of the substrate. An intensity adjustment device is positioned in a radiation system, and comprises multiple members for casting penumbrae in the radiation beam illuminating the patterning device. In addition, an attenuation control device is provided to adjust the members so as to control attenuation of the patterned radiation beam projected onto the target portion of the substrate across the cross section of the patterned radiation beam. COPYRIGHT: (C)2007,JPO&INPIT

Abstract translation: 要解决的问题：提供光刻设备和设备制造方法。 解决方案：光刻设备包括：照明系统，被配置为调节辐射束; 形成以支撑图案形成装置（形成为赋予辐射束以形成图案化辐射束的横截面图案）的支撑件; 形成为保持基板的基板台; 以及投影系统，被配置为将所述图案化的辐射束投影到所述基板的目标部分上。 强度调节装置定位在辐射系统中，并且包括多个用于在照射图案形成装置的辐射束中铸造半暗带的构件。 此外，提供衰减控制装置以调整构件，以便控制投射到基板上的图案化辐射束的衰减，跨过图案化的辐射束的横截面。 版权所有（C）2007，JPO＆INPIT

公开(公告)号：JP2011129912A

公开(公告)日：2011-06-30

申请号：JP2010275179

申请日：2010-12-10

Applicant: Asml Netherlands Bv ,  エーエスエムエル ネザーランズ ビー.ブイ.

Inventor： BOTMA HAKO ,  VAN DEN HOMBERG JOHANNES ALDEGONDA THEODORUS MARIE

IPC: H01L21/027

CPC classification number: G03F7/7085 ,  G03F7/70191 ,  G03F7/70525 ,  G03F7/70575

Abstract: PROBLEM TO BE SOLVED: To provide an apparatus and method of lithography, capable of reducing a risk that the mirror in an EUV lithography apparatus is damaged by out-of-range radiation of an EUV spectrum.
SOLUTION: A lithography apparatus has a sensor. The sensor includes a frame that defines a boundary of a space that is crossed by wires two or more times. A detecting electronic device is connected to the wire and configured to detect a change in wire temperature due to incident infrared radiation into the wire. The detecting electronic device is further configured to supply an output signal when the change in wire temperature is detected.
COPYRIGHT: (C)2011,JPO&INPIT

Abstract translation: 要解决的问题：提供一种光刻装置和方法，能够降低EUV光刻设备中的反射镜被EUV光谱的超范围辐射损坏的风险。 光刻设备具有传感器。 该传感器包括一个框架，该框架限定由两条或更多条线穿过的空间的边界。 检测电子设备连接到电线并且被配置为检测由于入射到电线中的入射红外辐射引起的电线温度的变化。 检测电子设备还被配置为当检测到线温度的变化时，提供输出信号。 版权所有（C）2011，JPO＆INPIT

公开(公告)号：JP2004200696A

公开(公告)日：2004-07-15

申请号：JP2003419669

申请日：2003-12-17

Applicant: Asml Netherlands Bv ,  エイエスエムエル ネザランドズ ベスローテン フエンノートシャップ

Inventor： BOTMA HAKO ,  VREUGDENHIL EWOUD

IPC: G02B5/08 ,  G03F7/20 ,  H01L21/027

CPC classification number: G03F7/70066 ,  G03F7/70566

Abstract: PROBLEM TO BE SOLVED: To provide a photolithography equipment that can maximize a kinetic energy output, while keeping the cost and reconstruction down to the minimum.
SOLUTION: According to this invention, lithography equipment is provided which comprises a radiation system that provides radiation projection beams, a supporting structure to support a pattern formation means that forms patterns in projection beans in accordance with the desired pattern, a substrate table to hold a substrate, a projection system to project the beams on the target location of the substrate after the pattern formation, a lighting system to provide the radiation beams after the beams have been adjusted so that the pattern formation means may be illuminated, a beam delivery system equipped with direction change elements that enable the direction change and delivery of the projection beams from the radiation system to the lighting system. The radiation beams are structured so that they may have the stated polarizing status, while the direction change elements are structured so that the radiation beam loss may be minimized against the stated polarizing status of the radiation beams.
COPYRIGHT: (C)2004,JPO&NCIPI

公开(公告)号：JP2008010834A

公开(公告)日：2008-01-17

申请号：JP2007120668

申请日：2007-05-01

Applicant: Asml Netherlands Bv ,  エーエスエムエル ネザーランズ ビー.ブイ.

Inventor： BOTMA HAKO ,  VREUGDENHIL EWOUD ,  SAKAI MINORU

IPC: H01L21/027 ,  G02B5/04 ,  G02B5/08 ,  G03F7/20

CPC classification number: G03F7/70941 ,  G02B5/04 ,  G02B5/3066 ,  G03F7/70058 ,  G03F7/70566

Abstract: PROBLEM TO BE SOLVED: To provide a beam delivery system capable of attaining a high level of polarization of radiation beam with less intensity loss. SOLUTION: A beam guiding element which receives an input beam IB of a specified wavelength, being substantially parallel and propagated in a first direction, and outputs an output beam OB, being substantially parallel, in a second direction, comprises a prism 10 which is made from transparent material and comprises an input surface 11 and an output surface 13. An internal angle β formed between the input surface 11 and the output surface 13 is such angle as enters the output surface 13 from inside at Brewster's angle when it substantially enters the input surface 11 at the Brewster's angle. The beam guiding element is useful for a lithography, for example, a beam delivery system. COPYRIGHT: (C)2008,JPO&INPIT

Abstract translation: 要解决的问题：提供能够以较小的强度损失获得辐射束的高水平极化的射束输送系统。 解决方案：接收特定波长的输入光束IB的光束引导元件，其基本上平行并在第一方向上传播，并且沿第二方向输出基本上平行的输出光束OB包括棱镜10 其由透明材料制成，并且包括输入表面11和输出表面13.形成在输入表面11和输出表面13之间的内角β在从布鲁斯特角的内部进入输出表面13时的角度大致为 以布鲁斯特角度进入输入表面11。 光束引导元件可用于光刻，例如光束传送系统。 版权所有（C）2008，JPO＆INPIT

公开(公告)号：JP2006148115A

公开(公告)日：2006-06-08

申请号：JP2005332328

申请日：2005-11-17

Applicant: Asml Holdings Nv ,  Asml Netherlands Bv ,  エイエスエムエル ネザランドズ ベスローテン フエンノートシャップ ,  エイエスエムエル ホールディング ナムローゼ フエンノートシャップ

Inventor： BOTMA HAKO ,  BRUEBACH JOERG ,  TRENTELMAN MARK ,  JOOBEUR ADEL

IPC: H01L21/027 ,  G03F7/20

CPC classification number: B23K26/0613 ,  B23K26/0622 ,  B23K26/066 ,  B23K26/067 ,  G03F7/7055

Abstract: PROBLEM TO BE SOLVED: To provide a pulse modulator for reducing change to the property of an incident radiation ray beam. SOLUTION: There is provided a pulse modulator constituted such that the input pulse of radiation ray is received along a first optical axis and constituted such that one or more corresponding output pulses of the radiation ray are emitted along a second optical axis. The pulse modulator comprises a divider arranged along the first optical axis and constituted such that the input pulse is divided into a first pulse portion and a second pulse portion and the first pulse portion is conducted along the second optical axis, and first and second mirrors having a predetermined curvature radius, being arranged to face with each other with a predetermined separation space therebetween, and being constituted such that the second pulse portion is received and the second portion is turned along the second optical axis. COPYRIGHT: (C)2006,JPO&NCIPI

Abstract translation: 要解决的问题：提供用于减少对入射的辐射束的特性的变化的脉冲调制器。 解决方案：提供一种脉冲调制器，其构成为使得沿着第一光轴接收辐射线的输入脉冲，并且构成为使得沿着第二光轴发射辐射线的一个或多个相应的输出脉冲。 脉冲调制器包括沿着第一光轴布置的分频器，并且构成为使得输入脉冲被分成第一脉冲部分和第二脉冲部分，第一脉冲部分沿第二光轴传导，第一和第二反射镜具有 预定的曲率半径被布置为彼此面对并具有预定的分隔空间，并且被构造成使得第二脉冲部分被接收并且第二部分沿着第二光轴转动。 版权所有（C）2006，JPO＆NCIPI

公开(公告)号：JP2005347750A

公开(公告)日：2005-12-15

申请号：JP2005161454

申请日：2005-06-01

Applicant: Asml Netherlands Bv ,  エイエスエムエル ネザランドズ ベスローテン フエンノートシャップ

Inventor： BOTMA HAKO

IPC: G02B5/00 ,  G02B27/10 ,  G03B27/54 ,  G03F7/20 ,  H01L21/027

CPC classification number: G03F7/70158 ,  G03F7/70141

Abstract: PROBLEM TO BE SOLVED: To provide a lighting assembly comprising a beam expander constituted, such that the beam expander receives a radiation beam oriented in a first direction (z) from a radiation source and expands the beam at single-fold magnification in a second direction (x) and at two-fold magnification in a third direction (y).
SOLUTION: First, second, and third directions intersect substantially perpendicular to one another. Further, a lighting assembly is constituted, such that a radiation beam (LB) is allowed to be divided into two divided radiation beams divided in at least one of the second and third directions. The propagation of the divided radiation beam is directed substantially in the first direction. Further, a beam divider (20) is constituted, such that the divider sends out the divided radiation beam to a beam expander (BXP) which allows at least one multiplication to be adjustable.
COPYRIGHT: (C)2006,JPO&NCIPI

Abstract translation: 要解决的问题：提供一种包括扩束器的照明组件，其构成为使得扩束器接收从辐射源沿第一方向（z）定向的辐射束，并以单倍放大率将光束扩展 第二方向（x）和在第三方向（y）的两倍放大倍数。 解决方案：第一，第二和第三方向彼此基本垂直相交。 此外，构成照明组件，使得辐射束（LB）被允许分成在第二和第三方向中的至少一个方向上分开的两个分割的辐射束。 分割的辐射束的传播基本上指向第一方向。 此外，构成分束器（20），使得分频器将分割的辐射束发送到允许至少一个乘法可调节的扩束器（BXP）。 版权所有（C）2006，JPO＆NCIPI

公开(公告)号：JP2009081438A

公开(公告)日：2009-04-16

申请号：JP2008241674

申请日：2008-09-19

Applicant: Asml Netherlands Bv ,  エーエスエムエル ネザーランズ ビー.ブイ.

Inventor： BOTMA HAKO

IPC: H01L21/027 ,  G03F7/20

CPC classification number: G02B27/144 ,  G02B17/004

Abstract: PROBLEM TO BE SOLVED: To provide an apparatus and method that allow the pulse duration of a radiation beam to be extended without a corresponding loss in intensity. SOLUTION: This apparatus and method is used for controlling electromagnetic radiation pulse duration in a lithographic apparatus. A splitting element is arranged to split an electromagnetic radiation pulse into a first portion and a second portion. A prism receives, refracts, and subsequently emits the first portion of the electromagnetic radiation pulse. A directing element is arranged to direct the first and second portions of the electromagnetic radiation pulse parallel to a common optical axis. The first portion combines with the second portion to form a combined radiation beam pulse. The combined radiation beam pulse has a longer pulse duration than the split electromagnetic pulse, but does not cause corresponding loss in intensity. COPYRIGHT: (C)2009,JPO&INPIT

Abstract translation: 要解决的问题：提供允许辐射束的脉冲持续时间延长而没有相应的强度损失的装置和方法。

解决方案：该设备和方法用于控制光刻设备中的电磁辐射脉冲持续时间。 分离元件被布置成将电磁辐射脉冲分成第一部分和第二部分。 棱镜接收，折射并随后发射电磁辐射脉冲的第一部分。 引导元件布置成引导电磁辐射脉冲的第一和第二部分平行于共同的光轴。 第一部分与第二部分组合以形成组合的辐射束脉冲。 组合的辐射束脉冲具有比分离电磁脉冲更长的脉冲持续时间，但不会引起相应的强度损失。 版权所有（C）2009，JPO＆INPIT

公开(公告)号：JP2008235941A

公开(公告)日：2008-10-02

申请号：JP2008172173

申请日：2008-07-01

Applicant: Asml Netherlands Bv ,  エーエスエムエル ネザーランズ ビー.ブイ.

Inventor： LUIJKX CORNELIS PETRUS ANDREAS ,  BANINE VADIM YEVGENYEVICH ,  BOTMA HAKO ,  VAN DUIJNHOVEN MARTINUS ,  MARKUS FRANCISCUS ANTONIUS EUR ,  KRIKKE JAN JAAP ,  MULDER HEINE MELLE ,  MUIJDERMAN JOHANNES HENDRIK EV ,  VAN DUIJN CORNELIS JACOBUS

IPC: G02B26/02 ,  H01L21/027 ,  G03F7/20

CPC classification number: G03F7/70191 ,  G03F7/70066 ,  G03F7/70116 ,  G03F7/70558

Abstract: PROBLEM TO BE SOLVED: To provide an optical attenuator having one optical attenuator element or a plurality of optical attenuator elements arranged symmetrically to a center line of a beam and in a central part of the beam. SOLUTION: The optical attenuator device operates to remove a part of a beam of radiation having intensity higher than average intensity by using at least one optical attenuator element. The device has applications in a radiation system, and/or a lithographic apparatus, in particular a scanning lithographic apparatus, wherein the optical attenuator element(s) are provided in a central part of the beam, for example perpendicularly to a scanning direction. COPYRIGHT: (C)2009,JPO&INPIT

Abstract translation: 要解决的问题：提供一种具有一个光衰减器元件或多个光束衰减器元件的光衰减器，所述光衰减器元件或对称地布置在梁的中心线和梁的中心部分中。 解决方案：光衰减器件通过使用至少一个光衰减器元件来操作以去除强度高于平均强度的辐射束的一部分。 该装置在辐射系统和/或光刻设备，特别是扫描光刻设备中具有应用，其中光学衰减器元件设置在光束的中心部分，例如垂直于扫描方向。 版权所有（C）2009，JPO＆INPIT

公开(公告)号：JP2005340847A

公开(公告)日：2005-12-08

申请号：JP2005181178

申请日：2005-05-25

Applicant: Asml Netherlands Bv ,  エイエスエムエル ネザランドズ ベスローテン フエンノートシャップ

Inventor： BOTMA HAKO

IPC: G03F7/20 ,  G03B27/54 ,  H01L21/027

CPC classification number: G03F7/70158 ,  G03F7/70066

Abstract: PROBLEM TO BE SOLVED: To provide a reticle illuminating field capable of illuminating only a specific portion, in order to reduce the loss of illumination energy, in a lithographic apparatus using a reticle having a plurality of patterns.
SOLUTION: The illumination system comprises a field defining element arranged to define an illuminating field in the plane of the patterning device or in a plane conjugate to it, the field being off-axis with respect to the optical axis of the illuminating system. One selected from a set of the field defining elements can be arranged to the illumination system through a replacing mechanism. The two-dimensional array of small lens or a holographic element can be used for the field defining element. The illumination system, in addition, may include a diffraction optical element for receiving an illuminating radiation, zoom lens, condensing lens, and relay lens.
COPYRIGHT: (C)2006,JPO&NCIPI

Abstract translation: 要解决的问题：在使用具有多个图案的掩模版的光刻设备中，提供能够仅照射特定部分的掩模版照明场，以减少照明能量的损失。 解决方案：照明系统包括场限定元件，其设置成在图案形成装置的平面中或在与其共面的平面中限定照明场，该场相对于照明系统的光轴偏离轴 。 从一组场定义元件中选择的一个可以通过替换机构布置到照明系统。 小透镜或全息元件的二维阵列可用于场定义元件。 此外，照明系统可以包括用于接收照射辐射，变焦透镜，聚光透镜和中继透镜的衍射光学元件。 版权所有（C）2006，JPO＆NCIPI

公开(公告)号：JP2005136422A

公开(公告)日：2005-05-26

申请号：JP2004314917

申请日：2004-10-29

Applicant: Asml Netherlands Bv ,  エイエスエムエル ネザランドズ ベスローテン フエンノートシャップ

Inventor： MARKUS FRANCISCUS ANTONIUS EUR ,  BASELMANS JOHANNES JACOBUS MAT ,  BOTMA HAKO ,  JAN BRUIJNINK ,  MARCEL MATHIJS THEODORE MARIE ,  VAN DIJSSELDONK ANTONIUS JOHAN ,  YUDOKUSU MARIE DOMINIKS SHUTOE

IPC: G03B27/54 ,  G03F7/20 ,  H01L21/027

CPC classification number: G03F7/70075

Abstract: PROBLEM TO BE SOLVED: To provide a lithographic apparatus, provided with a lighting system which is improved so that a projection beam of radiation has uniformity in a part of the cross section of the projection beam.
SOLUTION: The lighting system is provided with at least one movable optical element 7 so that the projection beam of a radiation 4 can be shifted around a center position. This means that nonuniformity of the intensity distribution in the projection beam 4 is smeared out and next, improved uniformity of the exposure of a wafer, other substrates or the like illuminated by the system is provided. The optical element 7 can be provided with a mirror which can be moved by a motor, a prism, a filter, a lens, an axicon, a diffuser, a diffraction optical array, an optical integrator or the like. A device-manufacturing method, using such a lithographic apparatus, is further provided, and the optical element is moved, in order to provide optimal uniformity concerning the projected beam of the radiation.
COPYRIGHT: (C)2005,JPO&NCIPI

Abstract translation: 要解决的问题：提供一种光刻设备，其设置有改进的照明系统，使得投影射束在投影光束的横截面的一部分中具有均匀性。 解决方案：照明系统设置有至少一个可移动光学元件7，使得辐射4的投影光束可以围绕中心位置移动。 这意味着投影光束4中的强度分布的不均匀性被涂抹，接下来，提供由系统照亮的晶片，其它基板等的曝光的均匀性提高。 光学元件7可以设置有可以由电动机，棱镜，滤光器，透镜，旋转三棱镜，漫射器，衍射光学阵列，光学积分器等移动的反射镜。 还提供使用这种光刻设备的设备制造方法，并且移动光学元件，以便提供关于投射的辐射束的最佳均匀性。 版权所有（C）2005，JPO＆NCIPI