公开(公告)号：US11377454B2

公开(公告)日：2022-07-05

申请号：US17046208

申请日：2019-04-10

Applicant: BASF SE ,  Wayne State University

Inventor： Charles Hartger Winter ,  Kyle Blakeney ,  Lukas Mayr ,  David Dominique Schweinfurth ,  Sabine Weiguny ,  Daniel Waldmann

IPC: C07F5/06 ,  C23C16/30 ,  C23C16/455

Abstract: The present disclosure is in the field of processes for the generation of thin inorganic films on substrates, in particular atomic layer deposition processes. Described herein is a process for preparing metal-containing films including: (a) depositing a metal-containing compound from the gaseous state onto a solid substrate, and (b) bringing the solid substrate with the deposited metal-containing compound in contact with a compound of general formula (I) wherein Z is a C2-C4 alkylene group, and R is hydrogen, an alkyl group, an alkenyl group, an aryl group, or a silyl group.

公开(公告)号：US11150031B2

公开(公告)日：2021-10-19

申请号：US16096319

申请日：2017-04-20

Applicant: BASF SE

Inventor： Juergen Wortmann ,  Sabine Weiguny ,  Katharina Federsel ,  Matthias Hinrichs ,  Stephan Maurer

IPC: F28D20/00 ,  C09K5/12 ,  F28D20/02 ,  F24S80/20 ,  F24S60/10

Abstract: A heat transfer or storage medium containing a nitrate salt composition including at least one alkali metal nitrate and optionally alkaline earth metal nitrate; and, at least one alkali metal nitrite and optionally alkaline earth metal nitrite in an amount of 1.1 to 15.0 mol %. The molar amount of the alkali metal nitrite and optionally alkaline earth metal nitrite for a desired temperature is calculated by x nitrite = K 6 ⁡ ( T ) K 6 ⁡ ( T ) + P O ⁢ ⁢ 2 Xnitrite is the mole fraction of nitrite, K6(T) is the temperature-dependent equilibrium constant of the reaction nitrate ⇄nitrite+½ oxygen (NO3−⇄ NO2−+½ O2), pO2 is the oxygen partial pressure and T is the temperature of the nitrate salt composition.

公开(公告)号：US10850982B2

公开(公告)日：2020-12-01

申请号：US15569792

申请日：2016-04-19

Applicant: BASF SE

Inventor： Eberhard Beckmann ,  Sabine Weiguny ,  Martin Gärtner ,  Katharina Federsel

IPC: C01B17/66 ,  D21C9/10 ,  D06P1/00 ,  D06L4/30 ,  D06P1/673 ,  D06P1/647 ,  D06L4/13

Abstract: The present invention relates to a method for reducing or preventing the decomposition of a composition Z comprising Z1 a salt of dithionous acid in an amount ranging from 50 to 100 wt % and optionally Z2 an additive selected from the group consisting of alkali metal carbonate, alkaline earth metal carbonate, alkali metal or alkaline earth metal tripolyphosphate (Na5P3O10), alkali metal or alkaline earth metal sulfite, disulfite or sulfate, dextrose and complexing agents in a combined amount ranging from 0.0001 to 40 wt %, which comprises contacting the components Z1 and optionally Z2 in the solid and/or dry or solvent-dissolved or -suspended state with at least one of the following compounds V in the solid and/or dry or solvent-dissolved or -suspended state, wherein the compounds V are selected from the group consisting of: (a) oxides of the alkali metals lithium, sodium, potassium, rubidium, cesium, or of magnesium, (b) sodium tetrahydroborate (NaBH4), (c) anhydrous copper(II) sulfate (Cu(SO4)), phosphorus pentoxide and (d) basic amino acids arginine, lysine, histidine, wherein the solvent for Z1, optionally Z2 and V is practically water-free.

公开(公告)号：US11655262B2

公开(公告)日：2023-05-23

申请号：US17710178

申请日：2022-03-31

Applicant: BASF SE ,  Wayne State University

Inventor： David Dominique Schweinfurth ,  Lukas Mayr ,  Sinja Verena Klenk ,  Sabine Weiguny ,  Charles Hartger Winter ,  Kyle Blakeney ,  Nilanka Weerathunga Sirikkathuge ,  Tharindu Malawara Arachchige Nimanthaka Karunaratne

IPC: C07F5/06 ,  C23C16/08 ,  C23C16/20 ,  C23C16/455 ,  C23C16/12

CPC classification number: C07F5/069 ,  C07F5/067 ,  C23C16/08 ,  C23C16/12 ,  C23C16/20 ,  C23C16/45534 ,  C23C16/45553

Abstract: A process including bringing a solid substrate in contact with a compound of general formula (I), (II), (III), or (IV) in the gaseous state




where A is NR2 or OR with R being an alkyl group, an alkenyl group, an aryl group, or a silyl group,

E is NR or O,

n is 0, 1 or 2, m is 0, 1 or 2, and

R′ is hydrogen, an alkyl group, an alkenyl group, an aryl group, or a silyl group.

公开(公告)号：US11505562B2

公开(公告)日：2022-11-22

申请号：US16954371

申请日：2018-11-09

Applicant: BASF SE ,  Wayne State University

Inventor： Lukas Mayr ,  David Dominique Schweinfurth ,  Daniel Waldmann ,  Charles Hartger Winter ,  Kyle Blakeney ,  Sinja Verena Klenk ,  Sabine Weiguny ,  Nilanka Weerathunga Sirikkathuge ,  Tharindu Malawara Arachchige Nimanthaka Karunaratne

IPC: C23C16/20 ,  C07F5/06 ,  C23C16/08 ,  C23C16/455 ,  C23C16/12

Abstract: Described herein is a process for preparing inorganic metal-containing films including bringing a solid substrate in contact with a compound of general formula (I) or (II) in the gaseous state where A is NR2 or OR with R being an alkyl group, an alkenyl group, an aryl group, or a silyl group, E is NR or O, n is 1, 2 or 3, and R′ is hydrogen, an alkyl group, an alkenyl group, an aryl group, or a silyl group, wherein if n is 2 and E is NR or A is OR, at least one R in NR or OR bears no hydrogen atom in the 1-position.

公开(公告)号：US20220220131A1

公开(公告)日：2022-07-14

申请号：US17710178

申请日：2022-03-31

Applicant: BASF SE ,  Wayne State University

Inventor： David Dominique Schweinfurth ,  Lukas Mayr ,  Sinja Verena Klenk ,  Sabine Weiguny ,  Charles Hartger Winter ,  Kyle Blakeney ,  Nilanka Weerathunga Sirikkathuge ,  Tharindu Malawara Arachchige Nimanthaka Karunaratne

IPC: C07F5/06 ,  C23C16/08 ,  C23C16/20 ,  C23C16/455 ,  C23C16/12

Abstract: A process including bringing a solid substrate in contact with a compound of general formula (I), (II), (III), or (IV) in the gaseous state where A is NR2 or OR with R being an alkyl group, an alkenyl group, an aryl group, or a silyl group, E is NR or O, n is 0, 1 or 2, m is 0, 1 or 2, and R′ is hydrogen, an alkyl group, an alkenyl group, an aryl group, or a silyl group.

公开(公告)号：US20210079520A1

公开(公告)日：2021-03-18

申请号：US16954341

申请日：2018-09-17

Applicant: BASF SE ,  WAYNE STATE UNIVERSITY

Inventor： David Dominique Schweinfurth ,  Lukas Mayr ,  Sinja Verena Klenk ,  Sabine Weiguny ,  Charles Hartger Winter ,  Kyle Blakeney ,  Nilanka Weerathunga Sirikkathuge ,  Tharindu Malawara Arachchige Nimanthaka Karunaratne

IPC: C23C16/20 ,  C23C16/12 ,  C23C16/455 ,  C07F5/06

Abstract: Described herein is a process including bringing a solid substrate in contact with a compound of general formula (I), (II), (III), or (IV) in the gaseous state where A is NR2 or OR with R being an alkyl group, an alkenyl group, an aryl group, or a silyl group, E is NR or O, n is 0, 1 or 2, m is 0, 1 or 2, and R′ is hydrogen, an alkyl group, an alkenyl group, an aryl group, or a silyl group.

公开(公告)号：US20210079025A1

公开(公告)日：2021-03-18

申请号：US16954371

申请日：2018-11-09

Applicant: BASF SE ,  Wayne State University

Inventor： Lukas Mayr ,  David Dominique Schweinfurth ,  Daniel Waldmann ,  Charles Hartger Winter ,  Kyle Blakeney ,  Sinja Verena Klenk ,  Sabine Weiguny ,  Nilanka Weerathunga Sirikkathuge ,  Tharindu Malawara Arachchige Nimanthaka Karunaratne

IPC: C07F5/06 ,  C23C16/455 ,  C23C16/08 ,  C23C16/20

Abstract: Described herein is a process for preparing inorganic metal-containing films including bringing a solid substrate in contact with a compound of general formula (I) or (II) in the gaseous state where A is NR2 or OR with R being an alkyl group, an alkenyl group, an aryl group, or a silyl group, E is NR or O, n is 1, 2 or 3, and R′ is hydrogen, an alkyl group, an alkenyl group, an aryl group, or a silyl group, wherein if n is 2 and E is NR or A is OR, at least one R in NR or OR bears no hydrogen atom in the 1-position.

公开(公告)号：US10214485B2

公开(公告)日：2019-02-26

申请号：US15774722

申请日：2016-11-08

Applicant: BASF SE

Inventor： Jan Spielmann ,  Michael Koch ,  Juergen Wortmann ,  Sabine Weiguny ,  Feelly Ruether ,  Robert Sengpiel

IPC: C07C303/44

Abstract: The invention relates to a method of reprocessing alkanesulfonic acid employed in a chemical process as an agent, catalyst or solvent and comprising the steps of: (a) removing an alkanesulfonic acid-comprising stream from a reaction mixture generated in the chemical process, (b) feeding the alkanesulfonic acid-comprising stream into a melt crystallization as the starting melt to form crystals of the alkanesulfonic acid, of hydrates of the alkanesulfonic acid or of a mixture of both suspended in mother liquor, (c) performing a solid-liquid separation to remove the crystals from the mother liquor, (d) optionally washing the crystals to remove mother liquor adhering to the crystals, (e) recycling the washed or unwashed crystals removed from the mother liquor into the chemical process.

公开(公告)号：US12297534B2

公开(公告)日：2025-05-13

申请号：US17778429

申请日：2020-11-16

Applicant: BASF SE ,  Wayne State University

Inventor： Sinja Verena Klenk ,  Alexander Georg Hufnagel ,  Hagen Wilmer ,  Daniel Löffler ,  Sabine Weiguny ,  Kerstin Schierle-Arndt ,  Charles Hartger Winter ,  Nilanka Weerathunga Sirikkathuge

IPC: C23C16/455 ,  C23C16/18

Abstract: The present invention is in the field of processes for preparing inorganic metal- or semimetal-containing films. The process for preparing inorganic metal- or semimetal-containing films comprising (a) depositing a metal- or semimetal-containing compound from the gaseous state onto a solid substrate and (b) bringing the solid substrate with the deposited metal- or semimetal-containing compound in contact with a compound of general formula (I) or (II) wherein Z is NR2, PR2, OR, SR, CR2, SiR2, X is H, R′ or NR′2, wherein at least one X is H, n is 1 or 2, and R and R′ is an alkyl group, an alkenyl group, an aryl group, or a silyl group.