公开(公告)号：US20200271830A1

公开(公告)日：2020-08-27

申请号：US16872233

申请日：2020-05-11

Applicant: DENSO CORPORATION

Inventor： Yoshihiro ABE ,  Toshiaki WATANABE ,  Shinichiro MATSUZAWA

IPC: G02B1/118 ,  G02B1/115 ,  B60R1/00 ,  G01S13/931

Abstract: An antireflection structure includes an antireflection film provided on a front surface of a substrate. The antireflection film has a plurality of holes that are spatially and periodically arranged and pass through front and back surfaces of the antireflection film. A thickness and a relative dielectric constant of the antireflection film are set according to a relative dielectric constant and a thickness of the substrate and an incident angle θ of an electromagnetic wave. The thickness and the relative dielectric constant of the antireflection film are set for an electromagnetic wave incident at the angle θ so that, for example, an electromagnetic wave reflected by the antireflection film provided on the front surface of the substrate and an electromagnetic wave reflected by a back surface of the substrate deviate from each other by a half wavelength and cancel each other.