公开(公告)号：EP4212234A1

公开(公告)日：2023-07-19

申请号：EP22151421.9

申请日：2022-01-13

Applicant: GEA Process Engineering A/S

Inventor： MØRK, Nils

IPC: B01D65/02

Abstract: Disclosed is a method for use in cleaning a processing system, the processing system comprising a loop, the loop comprising at least one filtration membrane, and a pump for feeding to the loop a fluid during a cleaning-in-place, CIP, process of the processing apparatus, the method comprising: during a first time interval during the CIP process of the processing apparatus, applying by the pump a first fluid flow rate over the at least one filtration membrane, and during a second time interval during the CIP process of the processing apparatus, applying by the pump a second fluid flow rate over the at least one filtration membrane, wherein the second fluid flow rate is larger than the first fluid flow rate. Further disclosed is a control device for controlling a setting of a pump, a processing system comprising the control device, and a computer program product.