公开(公告)号：CA1187040A

公开(公告)日：1985-05-14

申请号：CA419768

申请日：1983-01-19

Applicant: IBM

Inventor： BURKHART ROBERT W ,  COX ALLEN R ,  HARTLEY JOHN D

IPC: C23C14/34 ,  C23C14/50 ,  G11B5/133 ,  G11B5/187

Abstract: The sputter deposition of a thin film of material on both sides of a thin substrate is performed by positioning the substrate sides orthogonal to the target and preferably radial to the deposition center of the sputter system. The vapor deposition of alumina on a this ferrite core for a magnetic head is accomplished by positioning the ferrite substrate in the vacuum chamber orthogonally to the target and radial to the particle deposition center. The alumina is deposited on both sides of the ferrite core simultaneous1y to substantially the same thickness. The deposition on both sides of the ferrite core protects the core against width erosion, and minimizes bending stress. In addition, signal output of the ferrite core when used in a magnetic head is increased.