公开(公告)号：JP2012212898A

公开(公告)日：2012-11-01

申请号：JP2012128952

申请日：2012-06-06

Applicant: Asml Netherlands Bv ,  エーエスエムエル ネザーランズ ビー.ブイ.

Inventor： GEORGE RICHARD ALEXANDER ,  CHENG KUN GUI ,  PIETA BILEN HELMAN DEJAGAH ,  ROBERT EDGAR VAN LEEUWEN ,  JACOBS BURGOYNE

IPC: H01L21/027 ,  G03F7/20 ,  G03F9/00

CPC classification number: G03B27/53 ,  G03F7/70291 ,  G03F7/70791 ,  G03F9/7003 ,  G03F9/7026

Abstract: PROBLEM TO BE SOLVED: To provide a method and an apparatus for enhancing the overlay accuracy without impairing the processing capacity of a lithography apparatus significantly.SOLUTION: Alignment marks on a substrate are inspected during exposure thereof in order to optimize the exposure conditions. When the substrate 10 is scanned directly under an exposure and alignment unit 15, each part of the substrate passes under a detector unit 16 at first, and then passes under an exposure unit 17. Consequently, the information about the linear position, orientation, and expansion measured by the detector unit 16 for each part of the substrate 10 can be transmitted to the exposure unit 17, and the exposure conditions for each part of the substrate can be optimized when the substrate is exposed while passing under the exposure unit 17.

Abstract translation: 要解决的问题：提供一种用于提高叠加精度的方法和装置，而不会显着地损害光刻设备的处理能力。

解决方案：在曝光期间检查衬底上的对准标记，以优化曝光条件。 当基板10直接在曝光和对准单元15下方扫描时，基板的每个部分首先通过检测器单元16，然后通过曝光单元17。因此，关于线性位置，取向和 通过检测器单元16对基板10的每个部分测量的扩展可以被传输到曝光单元17，并且当基板在曝光单元17下方曝光时，可以优化基板的每个部分的曝光条件。 P>版权所有（C）2013，JPO＆INPIT

公开(公告)号：JP2012209555A

公开(公告)日：2012-10-25

申请号：JP2012069038

申请日：2012-03-26

Applicant: Asml Holding Nv ,  Asml Netherlands Bv ,  エーエスエムエル ネザーランズ ビー.ブイ. ,  エーエスエムエル ホールディング エヌ.ブイ.

Inventor： HERMAN VOGEL ,  GOSEN JEROEN GERARD ,  PAARHUIS BART DINAND ,  VAN BOXTEL FRANK JOHANNES JACOBUS ,  LI JINGGAO

IPC: H01L21/027 ,  G03F7/20

CPC classification number: G03F7/70908 ,  G03F7/70866

Abstract: PROBLEM TO BE SOLVED: To provide, for example, an arrangement which addresses some problems associated with movement of a support.SOLUTION: An apparatus, in an embodiment, has a patterning device support including a first planar element having a first flow-restricting surface; a second planar element including a second flow-restricting surface facing the first flow-restricting surface; a support driver to linearly move the support along a certain direction relative to the second planar element. The first and/or second flow-restricting surface has one or more projections and/or recesses between the first and second flow-restricting surfaces. The projection and/or recess on the first and/or second flow-restricting surface is arranged to provide a flow resistance, per unit width of the first and/or second flow-restricting surface perpendicular to a flow, that is lower against a flow that is parallel to the certain direction than against a flow that is perpendicular to the certain direction. The flow-restricting surfaces may direct a gas flow onto a driver part that generates heat.

Abstract translation: 要解决的问题：提供例如解决与支撑件的移动有关的一些问题的装置。 解决方案：在一个实施例中，一种装置具有包括具有第一流动限制表面的第一平面元件的图案形成装置支撑件; 第二平面元件，包括面向第一流动限制表面的第二流动限制表面; 支撑驱动器，用于沿着相对于第二平面元件的一定方向线性地移动支撑件。 第一和/或第二流动限制表面在第一和第二流动限制表面之间具有一个或多个突起和/或凹部。 第一和/或第二流动限制表面上的突起和/或凹槽被布置成提供垂直于流动的第一和/或第二流动限制表面的每单位宽度的流动阻力，其相对于流动较低 其平行于一定方向，而不是垂直于该方向的流动。 流动限制表面可以将气流引导到产生热量的驱动器部件上。 版权所有（C）2013，JPO＆INPIT

公开(公告)号：JP2012204835A

公开(公告)日：2012-10-22

申请号：JP2012060219

申请日：2012-03-16

Applicant: Asml Netherlands Bv ,  エーエスエムエル ネザーランズ ビー.ブイ.

Inventor： VAN BEURDEN MARTIJN CONSTANT

IPC: H01L21/027 ,  G01B11/24

CPC classification number: G06F17/11 ,  G01N21/4788 ,  G01N21/95607 ,  G03F1/84 ,  G03F7/705 ,  G03F7/70625 ,  G06F17/50

Abstract: PROBLEM TO BE SOLVED: To provide a CSI algorithm for reconstructing grating profiles.SOLUTION: Solving a volume integral equation for current density J employs the implicit construction of a vector field Frelated to an electric field, Eand current density J by selection of continuous components of E and J, F being continuous at one or more material boundaries, so as to determine an approximate solution of J. F is represented by at least one finite Fourier series with respect to at least one direction, x, y, and the step of numerically solving the volume integral equation comprises determining a component of J by convolution of F, with a convolution operator M comprising material and geometric structure properties in both directions. J may be represented by at least one finite Fourier series with respect to both directions. The continuous components can be extracted using convolution operators, Pand PN, acting on E and J.

Abstract translation: 要解决的问题：提供用于重建光栅轮廓的CSI算法。 解决方案：求解电流密度J的体积积分方程采用与电场相关的矢量场F S 的隐式构造，E S 和电流密度J，通过选择E和J的连续分量，F在一个或多个材料边界处是连续的，以便确定J.F的近似解由至少一个有限傅里叶级数 相对于至少一个方向x，y，并且数字求解体积积分方程的步骤包括通过卷积F来确定J的分量，其中卷积算子M包括两个方向上的材料和几何结构特性。 J可以由相对于两个方向的至少一个有限傅里叶级数表示。 可以使用卷积算子P T 和PN作为E和J来提取连续分量。（C）2013，JPO＆INPIT

公开(公告)号：JP2012191206A

公开(公告)日：2012-10-04

申请号：JP2012048439

申请日：2012-03-05

Applicant: Asml Netherlands Bv ,  エーエスエムエル ネザーランズ ビー.ブイ.

Inventor： HAN-KWANG NIENHUYS ,  MARTINUS AGNES WILLEM CUIJPERS ,  LEVACIA LEON MARTIN ,  VAN SCHOOT JAN BERNARD PLECHELMUS ,  VAN DE VIJVER YURI JOHANNES GABRIEL ,  VOZNYI OLEG VIACHESLAVOVICH ,  JANSSEN FRANCISCUS JOHANNES JOSEPH ,  DANNY MARIA HUBERTUS PHILIPS ,  MARCIO ALEXANDRE CANO MIRANDA ,  OLEKSIY GALAKTIONOV ,  VAN BOKHOVEN LAURENTIUS JOHANNES ADRIANUS ,  KATE NICOLAAS TEN ,  MANISH RANJAN ,  RIJPMA ALBERT PIETER ,  KURSAT BAL ,  ROGER WILHELMUS ANTONIUS HENRICUS SCHMITZ ,  ALAIN LOUIS CLAUDE LEROUX

IPC: H01L21/027

CPC classification number: G03F7/70933 ,  G03F7/70875 ,  G03F7/70891

Abstract: PROBLEM TO BE SOLVED: To provide a lithographic apparatus capable of controlling a substrate temperature.SOLUTION: The lithographic apparatus comprises: a substrate table configured to hold a substrate; a projection system configured to project a patterned radiation beam through an opening and onto a target portion of the substrate; and a conduit having an outlet in the opening. The conduit is configured to supply gas to the opening. The lithographic apparatus further includes a cooling apparatus controlled by a control system. The cooling apparatus is configured to cool the gas such that gas which travels from the opening to the substrate has a predetermined temperature when the gas is incident upon the substrate.

Abstract translation: 要解决的问题：提供能够控制基板温度的光刻设备。 光刻设备包括：被配置为保持基板的基板台; 投影系统，被配置为将图案化的辐射束通过开口投影到所述基板的目标部分上; 以及在开口中具有出口的导管。 导管构造成向开口供应气体。 光刻设备还包括由控制系统控制的冷却装置。 冷却装置构造成冷却气体，使得当气体入射到基板上时，从开口行进到基板的气体具有预定温度。 版权所有（C）2013，JPO＆INPIT

公开(公告)号：JP2012191177A

公开(公告)日：2012-10-04

申请号：JP2012027626

申请日：2012-02-10

Applicant: Asml Netherlands Bv ,  エーエスエムエル ネザーランズ ビー.ブイ.

Inventor： DEN BOEF ARIE JEFFREY ,  BEEMS MARCEL HENDRIKUS MARIA ,  CADEE THEODORUS PETRUS MARIA ,  LAFARRE RAYMOND WILHELMUS LOUIS

IPC: H01L21/027 ,  G03F9/00

CPC classification number: G01B11/14 ,  G01B11/00 ,  G02B21/0048 ,  G02B26/105 ,  G03F7/70625 ,  G03F9/7088

Abstract: PROBLEM TO BE SOLVED: To enable accurate measurement without degrading throughput of an alignment sensor.SOLUTION: A measurement optical system comprises an illumination subsystem for illuminating a mark 202 with a radiation spot and a detecting subsystem 580 for detecting radiation diffracted by the mark. A substrate and the measurement optical system move relatively to each other at a first velocity (v) so as to scan the mark while synchronously moving the radiation spot relatively to the reference frame of the measurement optical system at a second velocity (v). The spot scans the mark at a third velocity (v) which is lower than the first velocity to allow more time for accurate position measurements to be acquired. An objective lens 524 remains fixed in relation to the reference frame while a moving optical element 562 imparts the movement of the radiation spot relative to the reference frame.

Abstract translation: 要解决的问题：使得能够精确测量而不降低对准传感器的生产量。 解决方案：测量光学系统包括用于用辐射点照射标记202的照明子系统和用于检测由标记衍射的辐射的检测子系统580。 基板和测量光学系统以第一速度（v W ）彼此相对移动，以便在相对于参考系的参考系同步移动辐射点的同时扫描标记 测量光学系统处于第二速度（v SPOT ）。 该点以比第一速度低的第三速度（v EFF ）扫描标记，以允许更多时间获取准确的位置测量。 物镜524相对于参考框架保持固定，而移动的光学元件562相对于参考框架传递辐射点的移动。 版权所有（C）2013，JPO＆INPIT

公开(公告)号：JP2012178563A

公开(公告)日：2012-09-13

申请号：JP2012032987

申请日：2012-02-17

Applicant: Asml Netherlands Bv ,  エーエスエムエル ネザーランズ ビー.ブイ.

Inventor： PIETER MULDER ,  JAN WILLEM CROMWIJK ,  VAN DE WINKEL JIMMY MATHEUS WILHELMUS ,  HOFMANN MARIAN LEONARDOUS KATHARINA ,  HENDRIK FERDINAND BERNALDOS JOHANNES WILHELMUS MAR

IPC: H01L21/027 ,  G03F7/20

CPC classification number: G03F7/70341

Abstract: PROBLEM TO BE SOLVED: To reduce or eliminate risks of a defocusing error.SOLUTION: An immersion lithographic apparatus is disclosed having a projection system configured to direct a patterned beam of radiation onto a substrate and a liquid handling system configured to supply and confine immersion liquid to a space defined between the projection system and a substrate, or a substrate table, or both. A controller is provided to adjust an angle of a lower surface of the liquid handling system relative to the top surface of the substrate during moving of the substrate and/or substrate table relative to the liquid handling system dependent upon a position of the substrate and/or substrate table relative to the liquid handling system and/or a direction of relative movement between the substrate and/or substrate table and the liquid handling system.

Abstract translation: 要解决的问题：减少或消除散焦错误的风险。 解决方案：公开了一种浸没式光刻设备，其具有被配置为将图案化的辐射束引导到衬底上的投影系统和配置成将浸没液体限定在投影系统和衬底之间限定的空间的液体处理系统， 或底物台，或两者。 提供控制器，用于在衬底和/或衬底台相对于液体处理系统移动期间相对于衬底的顶表面调整液体处理系统的下表面的角度，这取决于衬底的位置和/ 或衬底台相对于液体处理系统和/或衬底和/或衬底台和液体处理系统之间的相对运动的方向。 版权所有（C）2012，JPO＆INPIT

公开(公告)号：JP2012178561A

公开(公告)日：2012-09-13

申请号：JP2012032609

申请日：2012-02-17

Applicant: Asml Netherlands Bv ,  エーエスエムエル ネザーランズ ビー.ブイ.

Inventor： VAN DER TOORN JAN-GERARD CORNELIS ,  BAGGEN MARCEL KOENRAAD MARIE ,  STEFAN GEERTE KRUIJSWIJK ,  STARREVELD JEROEN PIETER ,  MARC CONSTANT JOHANNES BAGGEN ,  MICHAEL JOHANNES PHELVOLDELDONK

IPC: H01L21/027 ,  G05D3/12 ,  H01L21/68

CPC classification number: G03F7/70716 ,  G03F7/709

Abstract: PROBLEM TO BE SOLVED: To provide accurate short stroke positioning.SOLUTION: A stage system comprises an object table which holds an object, a short stroke actuator element which moves the object table over a first moving range, a long stroke actuator element which moves the short stroke actuator element over a second moving range wider than the first moving range. The stage system further comprises a pneumatic compensation device including a sensor which measures an amount representing an air disturbance force on the short stroke actuator element, an actuator which provides a compensation force at least partially compensating for air disturbance, and a controller. The sensor is connected to a controller input of the controller, and the actuator is connected to a controller output of the controller. The controller drives the actuator in response to a signal received from the sensor.

Abstract translation: 要解决的问题：提供准确的短行程定位。 解决方案：舞台系统包括保持物体的物体台，在第一移动范围上移动物体台的短行程致动器元件，在第二移动范围内移动短行程致动器元件的长行程致动器元件 比第一移动范围宽。 舞台系统还包括气动补偿装置，其包括测量表示短行程致动器元件上的空气扰动力的量的传感器，提供至少部分地补偿空气干扰的补偿力的致动器和控制器。 传感器连接到控制器的控制器输入，执行器连接到控制器的控制器输出。 控制器响应于从传感器接收到的信号驱动致动器。 版权所有（C）2012，JPO＆INPIT

公开(公告)号：JP2012175103A

公开(公告)日：2012-09-10

申请号：JP2012027606

申请日：2012-02-10

Applicant: Asml Netherlands Bv ,  エーエスエムエル ネザーランズ ビー.ブイ.

Inventor： DEN BOEF ARIE JEFFREY

IPC: H01L21/027 ,  G01B11/00

CPC classification number: G01B11/14 ,  G01B11/00 ,  G02B21/0048 ,  G02B26/105 ,  G03F7/70625 ,  G03F9/7088

Abstract: PROBLEM TO BE SOLVED: To provide an optical scanning mechanism which avoids or reduces additional cost and bulk to a sensor and/or inaccuracies in measurement.SOLUTION: The optical apparatus measures a position of a mark 202 on a lithographic substrate W. A measurement optical system comprises an illumination subsystem for illuminating the mark with a spot of radiation and a detecting subsystem 580 for detecting radiation diffracted by the mark. A tilting mirror 562 moves the spot of radiation relative to the reference frame of the measurement optical system synchronously with a scanning motion of the mark itself, to allow more time for accurate position measurements to be acquired. The mirror tilt axis 568 is arranged along the intersection of the mirror plane with a pupil plane P of an objective lens 524 to minimize artifacts of the scanning. The same geometrical arrangement can be used for scanning in other types of apparatus, for example a confocal microscope.

Abstract translation: 要解决的问题：提供一种光学扫描机构，其避免或减少传感器的额外成本和体积，和/或测量中的不准确性。 解决方案：光学装置测量光刻基板W上的标记202的位置。测量光学系统包括用于用辐射点照射标记的照明子系统和用于检测由标记衍射的辐射的检测子系统580 。 倾斜镜562与标记本身的扫描运动同步地相对于测量光学系统的参考系移动辐射点，以允许更多的时间获得精确的位置测量。 镜面倾斜轴568沿着镜面与物镜524的光瞳平面P的相交被布置，以最小化扫描的伪影。 可以使用相同的几何布置来在其他类型的装置中进行扫描，例如共聚焦显微镜。 版权所有（C）2012，JPO＆INPIT

公开(公告)号：JP2012165021A

公开(公告)日：2012-08-30

申请号：JP2012115353

申请日：2012-05-21

Applicant: Asml Netherlands Bv ,  エーエスエムエル ネザーランズ ビー.ブイ.

Inventor： NIHTIANOV STOYAN ,  VAN DER SIJS ARIE JOHAN ,  MOEST BEARRACH ,  KEMPER PETRUS WILHELMUS JOSEPH MARIA ,  HAAST MARC ANTONIUS MARIA ,  BAAS GERARDUS WILHELMUS PETRUS ,  NANVER LIS KAREN ,  SARUBBI FRANCESCO ,  SCHUWER ANTONIUS ANDREAS JOHANNES ,  GOMMEREN GREGORY MICHA ,  POT MARTIJN ,  SCHOLTES THOMAS LUDOVICUS MARIA

IPC: H01L21/027 ,  H01L31/10

CPC classification number: H01L31/103 ,  G03F7/7085 ,  G03F7/70958 ,  H01L31/02161 ,  H01L31/022408 ,  H01L31/022416 ,  H01L31/1185 ,  H01L31/1804 ,  Y02E10/547

Abstract: PROBLEM TO BE SOLVED: To provide a radiation detector, a method of manufacturing a radiation detector, and a lithographic apparatus comprising a radiation detector.SOLUTION: The radiation detector has a radiation sensitive surface. The radiation sensitive surface is sensitive to radiation wavelengths of 10 to 200 nm and/or charged particles. The radiation detector has a silicon substrate, a dopant layer, a first electrode, and a second electrode. The silicon substrate is provided in a surface area on a first surface side with a doping profile of a certain conduction type. The dopant layer is provided on the first surface side of the silicon substrate. The dopant layer has a first layer of a dopant material and a second layer. The second layer is a diffusion layer in contact with the surface area on the first surface side of the silicon substrate. The first electrode is connected to the dopant layer. The second electrode is connected to the silicon substrate.

Abstract translation: 要解决的问题：提供一种辐射检测器，一种制造辐射检测器的方法以及包括一个辐射检测器的光刻设备。 解决方案：辐射检测器具有辐射敏感表面。 辐射敏感表面对10至200nm的辐射波长和/或带电粒子敏感。 辐射检测器具有硅衬底，掺杂剂层，第一电极和第二电极。 硅衬底在第一表面侧的表面区域中设置有具有一定导电类型的掺杂分布。 掺杂剂层设置在硅衬底的第一表面侧上。 掺杂剂层具有掺杂剂材料的第一层和第二层。 第二层是与硅衬底的第一表面侧上的表面区域接触的扩散层。 第一电极连接到掺杂剂层。 第二电极连接到硅衬底。 版权所有（C）2012，JPO＆INPIT

公开(公告)号：JP2012147015A

公开(公告)日：2012-08-02

申请号：JP2012083578

申请日：2012-04-02

Applicant: Asml Netherlands Bv ,  エーエスエムエル ネザーランズ ビー.ブイ.

Inventor： MARCO COELHO STAUFEN ,  JACOBS JOHANNES HENRICUS WILHELMUS ,  JANSEN HANS ,  VERHAGEN MARTINUS CORNELIS MARIA

IPC: H01L21/027 ,  G02B21/26

CPC classification number: G03F7/70341 ,  G03F7/709

Abstract: PROBLEM TO BE SOLVED: To provide various types of pressure regulation means for reducing a pressure gradient in a liquid supply system of a lithographic apparatus.SOLUTION: The liquid supply system has a liquid confinement structure configured to at least partially confine a liquid between a projection system and a substrate table of the lithographic apparatus. A high pressure gradient may cause particulate contamination in the liquid supply system and/or liquid confinement structure. A pressure gradient can be reduced by, for example, the use of slow switching in one or more valves, a bleed flow around or through one or more valves, diversion of liquid to a drain rather than or in addition to switching a valve off, a pressure regulator or flow restrictor to prevent shock waves, and a buffer liquid/damper to compensate for pressure fluctuation.

Abstract translation: 要解决的问题：提供用于降低光刻设备的液体供应系统中的压力梯度的各种类型的压力调节装置。 解决方案：液体供应系统具有液体限制结构，其被配置为至少部分地将液体限制在光刻设备的投影系统和衬底台之间。 高压梯度可能导致液体供应系统和/或液体限制结构中的颗粒污染。 压力梯度可以通过例如在一个或多个阀门中使用缓慢的切换，绕过或通过一个或多个阀门的泄放流量来减少，而不是或者除了切换阀门之外将液体转移到排水管， 压力调节器或限流器，以防止冲击波，以及缓冲液/阻尼器来补偿压力波动。 版权所有（C）2012，JPO＆INPIT