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公开(公告)号：EP4523886A1
公开(公告)日：2025-03-19
申请号：EP23386113.7
申请日：2023-11-09
Inventor： Farsari, Maria , Zyla, Gordon
IPC: B29C64/129 , B29C64/135 , B29C64/268 , B29C64/277 , B29C64/286 , B33Y30/00
Abstract: A 3D printing device that combines one-photon printing by digital light projection (DLP) and two-photon polymerization (2PP) by means of a motorized nosepiece (4) with various microscope objectives (MO) with different numerical apertures capable of switching between said MOs, which allows for high-speed and high-resolution printing for large-area processing without limiting the 3D printing capabilities of 2PP (1).
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公开(公告)号：EP4504036A1
公开(公告)日：2025-02-12
申请号：EP23727094.7
申请日：2023-05-09
Applicant: Politecnico di Milano , Università degli Studi di Milano - Bicocca , Consiglio Nazionale Delle Ricerche - CNR , Foundation for Research and Technology - Hellas
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93.发明公开
公开(公告)号：EP4098252A1
公开(公告)日：2022-12-07
申请号：EP21386032.3
申请日：2021-06-02
Applicant: Université de Liège , Fundacio Institut de Bioenginyeria de Catalunya , Barcelona Institute For Global Health , Foundation For Research And Technology Hellas
Inventor： Grandfils, Christian , Sevrin, Chantal , Fernàndez Busquets, Xavier , Siden-Kiamos, Inga , Vontas, John
IPC: A61K9/16 , A61K31/121 , A61K31/122 , A61K31/167 , A61P43/00
Abstract: The invention provides a complex comprising at least one hydrophobic active agent, an ionic polymer comprising a repetitive unit of formula (I):
wherein R 1 represents a hydrogen atom or a straight or branched chain alkyl group, preferably a straight or branched chain alkyl group comprising from 1 to 6 carbon atoms, for example a methyl group; R 2 represents a straight or branched chain alkyl group which is substituted by a group which may have a positive charge at a physiological pH; a complex for use in a method of medical treatment; a pharmaceutical composition; and a method of preparing a complex according to the invention which method comprises the steps of:
(a) dissolving the hydrophobic active agent and the ionic polymer in one or more non-aqueous solvents to form the complex wherein the one or more non-aqueous solvents are miscible with water; and
(b) progressively replacing the one or more non-aqueous solvents with water.-
94.发明公开
公开(公告)号：EP1848531A1
公开(公告)日：2007-10-31
申请号：EP05749603.6
申请日：2005-06-10
Inventor： SOTIRCHOS, Efstratios , MITRI, Stratigoula
CPC classification number: B01J23/881 , B01J37/03 , B82Y30/00 , B82Y40/00 , C01B32/162 , C01B2202/30 , D01F9/1271 , D01F9/1272
Abstract: In the present invention, advanced catalysts for the production of high purity and high quality carbon nanotubes with the technique of chemical vapor deposition are described. The use of these catalysts and the described methodology allows the production of carbon nanotubes at high rates and with yields per mass unit of catalytic material, which are much higher than those achieved with other methods of carbon nannotubes production and other catalysts. The high yields, the high production rates and the very low cost of the catalysts that are employed in the developed method lead to the production of materials that cost much less than commercially available materials of similar or lower quality. The catalyst or the catalytic substrate on which carbon is deposited and grows in the form of nanotubes consists of the carrier or the substrate, which is aluminum oxide (alumina) or one of the other metal oxides that are usually employed as catalytic media, the active phase which is iron oxide (preferably hematite but also any other form) and a promoter, such as molybdenum oxide. The ratio of these three components plays a very important role in the composition of the catalyst.
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95.发明公开Procedure for the wafer scale integration of gallium arsenide based optoelectronic devices with silicon based integrated circuits 审中-公开GaAs基的集成电路，一种用于盘大小上集成光电子器件的方法与基于硅
公开(公告)号：EP1130647A3
公开(公告)日：2007-08-22
申请号：EP01600004.4
申请日：2001-02-28
Applicant: Halkias, George , Tsoukalas, Dimitrios , Georgakilas, Alexandros , Foundation for Research and Technology-Hellas (FO.R.T.H.), Institute of Electronic Structure and Laser , National Center for Scientific Research "Demokritos"/Institute of Microelectronics (NCSR "Demokritos"/Inst. of Microelec.)
Inventor： Georgakilas, Alexandros , Halkias, George , Tsoukalas, Dimitris
IPC: H01L21/8258 , H01L21/20 , H01L33/00 , H01L25/16
CPC classification number: H01L31/0304 , H01L21/8258 , H01L31/0368 , H01L31/1852 , Y02E10/544
Abstract: An integrated fabrication procedure of optoelectronic (OE) system, comprising light-emitting diodes (Lasers or LEDs) as well as photodetectors fabricated with III-V compound semiconductor epitaxial layers deposited on a crystalline wafer bonded on a Silicon wafer on which the CMOS/BiCMOS integrated circuits have been fabricated, characterized in that the bonding of the wafer containing the III-V epitaxial layers with the Silicon wafer is achieved either with an adhesive epoxy or with a Wafer Bonding procedure through the employment of an intermediate layer of SOG, SiO 2 or Si 3 N 4 (or a combination of them); the intermediate layers are deposited at low temperature (below 450°C) and the bonding is accomplished at even lower temperature (below 250°C). The invention is characterized in that the integration of the microelectronic with the optoelectronic components is achieved in a three-dimensional arrangement using a wafer scale fabrication procedure.
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Patent Agency Ranking96.发明公开A method and device for cleaning surfaces using temporarily coincidental laser pulses of two different wavelengths 审中-公开由两种不同波长的暂时同时激光脉冲的方法和装置用于清洁表面
公开(公告)号：EP1340556A3
公开(公告)日：2003-12-17
申请号：EP03386004.0
申请日：2003-03-03
Applicant: Foundation for Research and Technology-Hellas (FO.R.T.H.), Institute of Electronic Structure and Laser , Zafiropulos, Vassilis
Inventor： Zafiropulos, Vassilis , Pouli, Paraskevi , Eglezis, Apostolis , Petrakis, Aristides
CPC classification number: G21F9/005 , A61B18/20 , B08B7/0042 , B23K26/0604 , B23K26/0613 , B23K26/0622 , B23K26/067 , C04B41/0036 , C04B41/009 , C04B41/80 , E04G23/002 , C04B41/53 , C04B33/00 , C04B14/28 , C04B14/285
Abstract: The present invention relates to a method and a device for removal of any kind of superficial encrustation from surfaces, by the synchronous use of the fundamental and one of the harmonic frequencies of a short-pulse laser system (in the order of 1- 40 ns). This is embodied by temporal and spatial overlapping of the two beams in various ratios of energy density values between them. The present invention relates to a problem of major concern, related to the cleaning of stone-sculpted surfaces of historic and/or artistic value without any alteration to the underlying authentic surfaces. The invention can be employed in other materials such as façades, metallic surfaces, glass, paper, wood etc. as well as in other applications of industrial or medical interest, such as the removal of radioactive residues from any type of surfaces or the removal of deposits from any kind of animal tissues. The success of this method is based on the combined action of two discrete mechanisms for the removal of surface deposits, embodied by the use of laser pulses of two different wavelengths simultaneously. The suggested device is based on the spatial and temporal overlapping of the fundamental frequency with one of its harmonics, as well as the possibility to adjust the energy of each one of the two radiations individually.
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97.发明公开A PROCESS FOR CATALYTIC, SELECTIVE OXIDATION OF CARBON MONOXIDE IN GASEOUS MIXTURES CONTAINING EXCESS HYDROGEN, A CATALYST AND A PROCESS FOR ITS PREPARATION 审中-公开过程总额超过氢一氧化碳的选择性催化氧化含瓦斯MIX催化剂及其制造方法
公开(公告)号：EP1255693A2
公开(公告)日：2002-11-13
申请号：EP01902957.8
申请日：2001-02-09
Applicant: Kemijski Institut , Foundation for Research and Technology-Hellas, Institute of Chemical Engineering and High Temperature Chemical Processes
Inventor： HOCEVAR, Stanko , BATISTA, Jurka , MATRALIS, Haralambos , IOANNIDES, Theophilos , AVGOUROPOULOS, George
IPC: C01B3/58
CPC classification number: C01G3/02 , B01J23/002 , B01J23/83 , B01J37/03 , C01B3/583 , C01B2203/044 , C01B2203/047 , C01P2002/76 , C01P2002/77
Abstract: The invention refers to a process for catalytic, selective oxidation of carbon monoxide in gaseous mixtures containing excess hydrogen with stoichiometric quantity of oxygen at the temperature between 298 K and 573 K, pressure between 1 and 10 bar and at the ratio of oxygen and carbon monoxide partial pressures (μ= 2p02/pco) between 1.0 and 2.5, in a one-step flow reactor at contact time (W/F) between 0.03 and 0.40 g.s.cm-3, or at the flow rate of the gaseous mixture (F) between 0.083 cm3/s and 1.67 cm3/s in the presence of 0.010 to 0.100 g of the catalyst, namely the complex oxide of the formula Cu¿x?Ce1-xxO2-y, where x is between 0.01 and 0.30 while y is equal or greater than x. This invention refers also to a process for the catalyst preparation and to the catalyst prepared by this process. This invention is useful in the field of fuel technology for low temperature fuel cells.
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公开(公告)号：EP0737902A2
公开(公告)日：1996-10-16
申请号：EP96600004.4
申请日：1996-03-11
Inventor： Vainos,Nikolaos A. , Boutsikaris,Leonidas S. , Mailis,Sakellaris N. , Pissadakis,Stavros I. , Fotakis,Konstantinos E.
CPC classification number: G03H1/08 , B23K26/066 , G03F7/001 , G03H1/0244 , G03H2001/026 , G03H2001/048 , G03H2222/15 , G03H2222/33 , G03H2224/06 , G03H2260/62
Abstract: The invention refers to a method and a system for the fabrication of surface relief optical microstructures of very small characteristic dimensions suitable for yielding diffraction according to hologram design requirements based on the direct selective solid materials microetching, by using short wavelength, for example ultraviolet laser light, on the surfaces of solid materials with a main aim the recording of optical information. The method is characterized by the application of strong demagnification and simultaneously high-resolution optical imaging such as to achieve high energy density of radiation, targeting to the selective photodissociation and not to thermal evaporation of materials which may have a generic physical nature and geometrical shape. The invention is applied for the production of holograms, the pattern of which has been designed in a computer, specific optical diffraction elements and generally digitized optical microstructures. The invention includes embodiments in sectors of high interest in which conventional lithographic techniques fail and specifically to mass industrial production sectors in photonic and information technology, security encoding and authenticity verification, building illumination and solar energy collection.
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99.发明公开
公开(公告)号：EP0558490A1
公开(公告)日：1993-09-08
申请号：EP91914041.0
申请日：1991-07-26
Applicant: FOUNDATION FOR RESEARCH AND TECHNOLOGY HELLAS (FO.R.T.H.) INSTITUTE OF MOLECULAR BIOLOGY & BIOTECHNOLOGY , TABLER, Martin
Inventor： TABLER, Martin
CPC classification number: C12N15/113 , A61K38/00 , C07K2319/00 , C12N2310/111 , C12N2310/121
Abstract: Les cassettes de ribozymes portables décrites peuvent être incorporées dans des sites de clivage d'enzymes de restriction de toute séquence d'ADN désirée. Ainsi, des ribozymes hautement sélectifs (antizymes) sont obtenus. De plus, des procédés de production de ces cassettes de ribozymes portables, des séquences d'ADN les contenant et codant des ribozymes biologiquement actifs sont décrits. Sont également décrites des compositions contenant de tels ribozymes ou de telles séquences d'ADN les codant.
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公开(公告)号：EP4119149A1
公开(公告)日：2023-01-18
申请号：EP21386046.3
申请日：2021-07-15
Inventor： Gkirtzimanaki, Katerina , Niotis, Georgios , Chatzidoukaki, Ourania , Garinis, Georgios , Goulielmaki, Evangelia , Stratigi, Kalliopi
Abstract: An extracellular vesicle loaded with a nuclease selected from S1 nuclease, Deoxyribonuclease I, Ribonuclease H, three prime repair exonuclease, or with messenger RNA encoding such nuclease and the use of the extracellular vesicle in the treatment of an inflammatory disease.
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