METHOD FOR CLEANING A NOZZLE ARRANGEMENT IN A SPRAY DRYING APPARATUS, AND SPRAY DRYING APPARATUS FOR CARRYING OUT THE METHOD
    92.
    发明申请
    METHOD FOR CLEANING A NOZZLE ARRANGEMENT IN A SPRAY DRYING APPARATUS, AND SPRAY DRYING APPARATUS FOR CARRYING OUT THE METHOD 审中-公开
    用于清洁喷雾干燥装置中的喷嘴布置的方法和用于实施方法的喷雾干燥装置

    公开(公告)号:US20160252299A1

    公开(公告)日:2016-09-01

    申请号:US15030056

    申请日:2013-10-18

    CPC classification number: F26B3/12 B01D1/18 B05B15/52 B05B15/555 B08B9/027

    Abstract: In a spray drying apparatus, comprising in a usual manner a drying chamber, an air disperser, and at least one pressure nozzle arrangement (4), means are provided for emptying the feed in the nozzle arrangement(s) (4) after the supply of feed from a feed system (5) is halted and before the nozzle arrangement(s) (4) are removed from the drying chamber and positioned in a cleaning system (7). The emptying takes place while maintaining atomization in the nozzle arrangement (4). The feed emptying system (6) comprises a pump (60), a pressurized air/gas source (61) and a conduit (62), and the spray drying apparatus at least one valve (45, 53, 63, 64, 65, 66) allowing switching from the feed system (5) to the feed emptying system (6).

    Abstract translation: 在喷雾干燥装置中,以通常的方式包括干燥室,空气分散器和至少一个压力喷嘴装置(4),提供用于在供应之后排空喷嘴装置(4)中的进料的装置 来自进料系统(5)的进料停止,并且在喷嘴装置(4)从干燥室中取出并定位在清洁系统(7)中之前。 在喷嘴装置(4)中保持雾化的同时进行排空。 进料排空系统(6)包括泵(60),加压空气/气体源(61)和导管(62),喷雾干燥装置至少有一个阀(45,53,63,64,65, 66)允许从进料系统(5)切换到进料排空系统(6)。

    A DRYING SYSTEM AND A METHOD FOR AVOIDING THE FORMATION OF CONDENSATION IN A DRYING SYSTEM

    公开(公告)号:EP4521046A1

    公开(公告)日:2025-03-12

    申请号:EP23196295.2

    申请日:2023-09-08

    Abstract: A drying system (1) is provided comprising a drying device (2), a recuperator (7) and a first sink heater (3), the drying device (2) being configured to dry a solid material and comprising an inlet (18) and an outlet (19), the recuperator (7) comprising an inlet (7a) and an outlet (7b) and being configured to heat and/or cool down an operating medium, the operating medium flowing from the drying device (2) to the recuperator (7), wherein the first sink heater (3) is configured to heat a process medium. A method for avoiding the formation of condensation in a drying system (1) is also provided.

    A METHOD FOR USE IN CLEANING A PROCESSING SYSTEM AND A PROCESSING SYSTEM

    公开(公告)号:EP4212234A1

    公开(公告)日:2023-07-19

    申请号:EP22151421.9

    申请日:2022-01-13

    Inventor: MØRK, Nils

    Abstract: Disclosed is a method for use in cleaning a processing system, the processing system comprising a loop, the loop comprising at least one filtration membrane, and a pump for feeding to the loop a fluid during a cleaning-in-place, CIP, process of the processing apparatus, the method comprising: during a first time interval during the CIP process of the processing apparatus, applying by the pump a first fluid flow rate over the at least one filtration membrane, and during a second time interval during the CIP process of the processing apparatus, applying by the pump a second fluid flow rate over the at least one filtration membrane, wherein the second fluid flow rate is larger than the first fluid flow rate. Further disclosed is a control device for controlling a setting of a pump, a processing system comprising the control device, and a computer program product.

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