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公开(公告)号：JP4498726B2
公开(公告)日：2010-07-07
申请号：JP2003394271
申请日：2003-11-25
Applicant: Kisco株式会社 , フアインポリマーズ株式会社
IPC: B08B3/08 , C11D7/04 , C11D3/04 , C11D3/39 , C11D7/06 , C11D7/08 , C11D7/18 , C11D7/32 , C11D11/00 , C11D17/08 , H01L21/304
CPC classification number: C11D11/0047 , C11D7/06 , C11D7/08 , C11D7/3209
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公开(公告)号：JP4375946B2
公开(公告)日：2009-12-02
申请号：JP2002185376
申请日：2002-06-25
CPC classification number: Y02P60/877
Abstract: PROBLEM TO BE SOLVED: To obtain a new antiobestic composition comprising a substance as an active ingredient which has inhibiting activity against lipase, inhibiting activity against cyclic AMP phosphodiesterase, inhibiting activity against α-glucosidase or inhibiting activity against α-amylase by finding the substance from natural products having high safety. SOLUTION: The antiobestic composition comprises an extract of astringent coat of peanut as the active ingredient having one or more activities selected from the group consisting of the inhibiting activity against lipase, inhibiting activity against cyclic AMP phosphodiesterase and inhibiting activity against α-glucosidase and inhibiting activity against α-amylase. COPYRIGHT: (C)2004,JPO
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公开(公告)号：JP4104109B2
公开(公告)日：2008-06-18
申请号：JP2001339155
申请日：2001-11-05
Applicant: Kisco株式会社 , フアインポリマーズ株式会社
IPC: H01L21/302 , H01L21/3065 , H01L21/304 , H01L21/308 , H01L21/768
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Patent Agency Ranking
公开(公告)号：JP4078338B2
公开(公告)日：2008-04-23
申请号：JP2004220566
申请日：2004-07-28
IPC: H01M4/66 , H01M4/134 , H01M4/1395 , H01M4/36 , H01M4/38 , H01M4/62 , H01M10/05 , H01M10/052
CPC classification number: H01M4/0404 , H01M4/02 , H01M4/13 , H01M4/134 , H01M4/364 , H01M4/366 , H01M4/661 , H01M10/052 , H01M10/0525 , H01M2004/021
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97.发明专利Manufacturing method of substrate having coating film having amino group on its surface 有权具有AMINO组在其表面上的涂层膜的基材的制造方法
公开(公告)号：JP2007322219A
公开(公告)日：2007-12-13
申请号：JP2006151848
申请日：2006-05-31
Applicant: Daisan Kasei Kk , Kisco Ltd , Kisco株式会社 , Univ Of Tokyo , 国立大学法人 東京大学 , 第三化成株式会社
Inventor： SUZUKI YUJI , KASAGI NOBUHIDE , MIWA JUNICHI , YOSHIOKA KOSHIRO , SHIBAYAMA KENICHI , INOUE TAKASHI
Abstract: PROBLEM TO BE SOLVED: To provide a method which enables the formation of the fine pattern of a reagent or the like at a desired position with good reproducibility. SOLUTION: This manufacturing method of a substrate includes a vapor deposition process for forming a coating film having an amino group on the surface of the substrate by heating a compound represented by the formula (1), wherein (R 1 is -NH 2 or -CH 2 NH 2 and R 2 is -NH 2 , -CH 2 NH 2 or -H) to form a monomer and vapor-depositing the monomer on the substrate. The surface of the substrate has at least a region comprising a first material and a region comprising a second material and the amount of the amino group present on the surface of the coating film having the amino group per a unit area is different between the surface of the region comprising the first material and the surface of the region comprising the second material. The manufacturing method of the substrate is also disclosed. COPYRIGHT: (C)2008,JPO&INPIT
Abstract translation: 待解决的问题：提供一种能够以期望的位置形成具有良好重现性的试剂等的精细图案的方法。 解决方案：该基板的制造方法包括通过加热由式（1）表示的化合物在基板的表面上形成具有氨基的涂膜的气相沉积工艺，其中（R
1 是-NH 2 或-CH 2 2 ，而R SP 2是-NH SB > 2 ，-CH 2 2 或-H）以形成单体并将单体气相沉积在基材上。 衬底的表面至少包括第一材料和包含第二材料的区域的区域，并且每单位面积具有氨基的涂膜表面上存在的氨基的量在第 所述区域包括第一材料和包括第二材料的区域的表面。 还公开了基板的制造方法。 版权所有（C）2008，JPO＆INPIT -
公开(公告)号：JPD1683143S
公开(公告)日：2021-04-12
申请号：JPD202017226
申请日：2020-07-21
Applicant: KISCO株式会社
Designer： 高橋 昇一 田中 和人 内田 浩 平塚 正樹 大石 哲史
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公开(公告)号：JPD1683142S
公开(公告)日：2021-04-12
申请号：JPD202017225
申请日：2020-07-21
Applicant: KISCO株式会社
Designer： 高橋 昇一 田中 和人 内田 浩 平塚 正樹 大石 哲史
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公开(公告)号：JPD1683139S
公开(公告)日：2021-04-12
申请号：JPD202017222
申请日：2020-07-21
Applicant: KISCO株式会社
Designer： 高橋 昇一 田中 和人 内田 浩 平塚 正樹 大石 哲史
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