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公开(公告)号：US20230248921A1
公开(公告)日：2023-08-10
申请号：US18304854
申请日：2023-04-21
Applicant: Stamford Devices Limited
Inventor： Joseph GREHAN , Niall SMITH
IPC: A61M11/00 , G01N29/22 , G01N29/42 , B05B17/00 , B05B17/06 , B06B1/02 , B05B15/14 , G16H20/10 , G16H20/13
CPC classification number: A61M11/005 , A61M11/001 , G01N29/22 , G01N29/42 , B05B17/0646 , B05B17/0669 , B06B1/0253 , B05B15/14 , G16H20/10 , G16H20/13 , B05B12/004
Abstract: A nebulizer has an aperture plate, a mounting, an actuator, and an aperture plate drive circuit (2-4). A controller measures an electrical drive parameter at each of a plurality of measuring points, each measuring point having a drive frequency; and based on the values of the parameter at the measuring points makes a determination of optimum drive frequency and also an end-of-dose prediction. The controller performs a short scan at regular sub-second intervals at which drive current is measured at two measuring points with different drive frequencies. According to drive parameter measurements at these points the controller determines if a full scan sweeping across a larger number of measuring points should be performed. The full scan provides the optimum drive frequency for the device and also an end of dose indication.
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公开(公告)号：US11679209B2
公开(公告)日：2023-06-20
申请号：US16686286
申请日：2019-11-18
Applicant: Stamford Devices Limited
Inventor： Brendan Hogan
CPC classification number: A61M11/003 , A61M11/005 , C25D1/08 , C25D7/00 , B05B17/0646 , C25D3/567
Abstract: A photo-resist (21) is applied in a pattern or vertical columns having the dimensions of holes or pores of the aperture plate to be produced. This mask pattern provides the apertures which define the aerosol particle size, having up to 2500 holes per square mm. There is electro-deposition of metal (22) into the spaces around the columns (21). There is further application of a second photo-resist mask (25) of much larger (wider and taller) columns, encompassing the area of a number of first columns (21). The hole diameter in the second plating layer is chosen according to a desired flow rate.
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公开(公告)号：US11648580B2
公开(公告)日：2023-05-16
申请号：US17888334
申请日：2022-08-15
Applicant: Stamford Devices Limited
Inventor： Brendan Hogan , Kieran Hyland , Anthony Redmond
CPC classification number: B05B17/0646 , A61M11/001 , A61M11/005 , A61M15/0085 , B05B17/0653
Abstract: An aerosol generator with electrical power conducting pins has a vibratable plate with apertures therein and an annular piezo. An annular support member supports the piezo and the vibratable plate. A first electrical power conducting pin engages directly with a first, top, surface of the piezo. A second electrical power conducting pin indirectly conducts electrical power to a second surface of the piezo, by contacting an extension tab. There is a film of cured epoxy adhesive on the tab. The aerosol generator avoids need for soldered joints for electrical contact, and the pins are conveniently mounted parallel to each on the same lateral and top side of the piezo and support member. The pins may have multi-point tips for particularly effective electrical contact.
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公开(公告)号：US20230080331A1
公开(公告)日：2023-03-16
申请号：US17808432
申请日：2022-06-23
Applicant: Stamford Devices Limited
Inventor： Hong XU
IPC: C25D7/00 , B41J2/16 , C25D5/02 , C25D5/10 , C25D1/00 , C25D5/00 , A61M11/00 , C25D5/54 , B05B17/00 , C25D3/38 , C25D3/46 , C25D3/48 , C25D3/54 , C25D5/34 , C25D5/48
Abstract: In one embodiment, a method for manufacturing an aperture plate includes depositing a releasable seed layer above a substrate, applying a first patterned photolithography mask above the releasable seed layer, the first patterned photolithography mask having a negative pattern to a desired aperture pattern, electroplating a first material above the exposed portions of the releasable seed layer and defined by the first mask, applying a second photolithography mask above the first material, the second photolithography mask having a negative pattern to a first cavity, electroplating a second material above the exposed portions of the first material and defined by the second mask, removing both masks, and etching the releasable seed layer to release the first material and the second material. The first and second material form an aperture plate for use in aerosolizing a liquid. Other aperture plates and methods of producing aperture plates are described according to other embodiments.
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公开(公告)号：US20230032517A1
公开(公告)日：2023-02-02
申请号：US17818484
申请日：2022-08-09
Applicant: Stamford Devices Limited
Inventor： Brendan HOGAN , Hong XU
Abstract: An aperture plate is manufactured by plating metal around a mask of resist columns having a desired size, pitch, and profile, which yields a wafer about 60 μm thickness. This is approximately the full desired target aperture plate thickness. The plating is continued so that the metal overlies the top surfaces of the columns until the desired apertures are achieved. This needs only one masking/plating cycle to achieve the desired plate thickness. Also, the plate has passageways formed beneath the apertures, formed as an integral part of the method, by mask material removal. These are suitable for entrainment of aerosolized droplets exiting the apertures.
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Patent Agency Ranking
公开(公告)号：US20210370336A1
公开(公告)日：2021-12-02
申请号：US17179950
申请日：2021-02-19
Applicant: Stamford Devices Limited
Inventor： Ronan MACLOUGHLIN , Conor Paul Duffy , Brendan HOGAN , Patrick Martin Kelly
Abstract: A method for aerosolising a liquid comprises the steps of: providing an aperture plate having at least 100 outlet holes per mm2; delivering liquid to the aperture plate; and vibrating the aperture plate to produce an aerosol. The viscosity of the liquid is in the range of from 1 to15 cP and the surface tension of the liquid is in the range of from 72 to 0.5 mN/m. The output rate of the generated aerosol is greater than 0.01 mL/min.
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公开(公告)号：US10967138B2
公开(公告)日：2021-04-06
申请号：US15762387
申请日：2016-09-22
Applicant: Stamford Devices Limited
Inventor： Joseph Grehan , Michael Casey , Shaun Porter , Niall Smith
Abstract: A digital processor of a nebulizer controller controls and monitors drive current (I) applied to an aperture plate. The drive current is detected as a series of discrete values at each of multiple measuring points, each having a particular drive frequency The processor in real time calculates a slope or rate of change of drive current with frequency and additionally determines a minimum value for drive current leading up to the peak value. The processor uses both the value of the minimum drive current during the scan and also the maximum slope value to achieve reliable prediction of end of dose, when the aperture plate becomes dry.
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公开(公告)号：US20200347507A1
公开(公告)日：2020-11-05
申请号：US16852692
申请日：2020-04-20
Applicant: Stamford Devices Limited
Inventor： Hong XU
IPC: C25D7/00 , B41J2/16 , C25D5/02 , C25D5/10 , C25D1/00 , B05B17/00 , C25D3/38 , C25D3/46 , C25D3/48 , C25D3/54 , C25D5/34 , C25D5/48 , C25D5/54
Abstract: In one embodiment, a method for manufacturing an aperture plate includes depositing a releasable seed layer above a substrate, applying a first patterned photolithography mask above the releasable seed layer, the first patterned photolithography mask having a negative pattern to a desired aperture pattern, electroplating a first material above the exposed portions of the releasable seed layer and defined by the first mask, applying a second photolithography mask above the first material, the second photolithography mask having a negative pattern to a first cavity, electroplating a second material above the exposed portions of the first material and defined by the second mask, removing both masks, and etching the releasable seed layer to release the first material and the second material. The first and second material form an aperture plate for use in aerosolizing a liquid. Other aperture plates and methods of producing aperture plates are described according to other embodiments.
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公开(公告)号：US10662543B2
公开(公告)日：2020-05-26
申请号：US15001551
申请日：2016-01-20
Applicant: Stamford Devices Limited
Inventor： Hong Xu
IPC: C25D7/00 , B41J2/16 , C25D5/02 , C25D5/10 , C25D1/00 , B05B17/00 , C25D3/38 , C25D3/46 , C25D3/48 , C25D3/54 , C25D5/34 , C25D5/48 , C25D5/54
Abstract: A method for manufacturing an aperture plate includes depositing a releasable seed layer above a substrate, applying a first patterned photolithography mask above the releasable seed layer, the first patterned photolithography mask having a negative pattern to a desired aperture pattern, electroplating a first material above the exposed portions of the releasable seed layer and defined by the first mask, applying a second photolithography mask above the first material, the second photolithography mask having a negative pattern to a first cavity, electroplating a second material above the exposed portions of the first material and defined by the second mask, removing both masks, and etching the releasable seed layer to release the first material and the second material. The first and second material form an aperture plate for use in aerosolizing a liquid. Other aperture plates and methods of producing aperture plates are described.
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公开(公告)号：US20200155788A1
公开(公告)日：2020-05-21
申请号：US16750507
申请日：2020-01-23
Applicant: Stamford Devices Limited
Inventor： Ronan MACLOUGHLIN , Niall Smith
Abstract: A high flow nasal therapy system (1) has a gas supply (2), a nebulizer (12), and a nasal interface (7). There are two branches (11, 10) and a valve (6) linked with the controller, the branches including a first branch (11) for delivery of aerosol and a second branch (10) for delivery of non-aerosolized gas. The controller controls delivery into the branches (11, 10), in which flow is unidirectional in the first and second branches, from the gas supply towards the nasal interface. The first branch (11) includes the nebulizer (12) and a line configured to store a bolus of aerosol during flow through the second branch (10). The valve (6) comprises a Y-junction between the gas inlet on one side and the branches on the other side.
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