公开(公告)号：JP2008160155A

公开(公告)日：2008-07-10

申请号：JP2008073704

申请日：2008-03-21

Applicant: Asml Netherlands Bv ,  エーエスエムエル ネザーランズ ビー.ブイ.

Inventor： STREEFKERK BOB ,  JOHANNES JACOBUS MATHEUS BASEL ,  COX HENRIKUS HERMAN MARIE ,  ANTONIUS THEODORUS ANNA MARIA ,  SJOERD NICOLAAS LAMBERTUS DOND ,  CHRISTIAAN ALEXANDER HOOGENDAM ,  JOERI LOF ,  LOOPSTRA ERIK ROELOF ,  JEROEN JOHANNES SOPHIA MARIA M ,  VAN DER MEULEN FRITS ,  MULKENS JOHANNES CATHARINUS HU ,  GERARDUS PETRUS MATTHIJS VAN N ,  SIMON KLAUS ,  SLAGHEKKE BERNARDUS ANTONIUS ,  STRAAIJER ALEXANDER ,  VAN DER TOORN JAN-GERARD CORNE ,  HOUKES MARTIJN

IPC: H01L21/027 ,  G03F7/20

CPC classification number: G03F7/70341 ,  G03F7/70425 ,  G03F7/70525 ,  G03F7/709

Abstract: PROBLEM TO BE SOLVED: To provide a lithographic apparatus for reducing residual liquid left on the surface of a substrate, after exposure by a projection system. SOLUTION: The lithographic apparatus whose localized area of the substrate surface under a projection system PL is immersed in a liquid. By having the height of a liquid supply system 310 above the surface of a substrate W, the height can be varied by using actuators 314. A control system uses feedforward control or feedback control with input of the surface height of the substrate W, to maintain the liquid supply system 310 at a predetermined height above the surface of the substrate W. COPYRIGHT: (C)2008,JPO&INPIT

Abstract translation: 要解决的问题：提供一种用于减少残留在基板表面上的残留液体的光刻设备，在通过投影系统曝光之后。 解决方案：将投影系统PL下的基板表面的局部区域浸入液体中的光刻设备。 通过在基板W的表面上方具有液体供应系统310的高度，可以通过使用致动器314来改变高度。控制系统使用前馈控制或反馈控制与基板W的表面高度的输入来维持 液体供应系统310在衬底W的表面上方的预定高度处。版权所有（C）2008，JPO＆INPIT

公开(公告)号：JP2008022038A

公开(公告)日：2008-01-31

申请号：JP2007260925

申请日：2007-10-04

Applicant: Asml Netherlands Bv ,  エーエスエムエル ネザーランズ ビー.ブイ.

Inventor： LOF JOERI ,  DE SMIT JOANNES THEODOOR ,  RITSEMA ROELOF AEILKO SIEBRAND ,  SIMON KLAUS ,  MODDERMAN THEODORUS MARINUS ,  MULKENS JOHANNES CATHARINUS HU ,  MEIJER HENDRICUS JOHANNES MARI ,  LOOPSTRA ERIK ROELOF

IPC: H01L21/027 ,  G03F7/20 ,  G03F9/00

CPC classification number: G03F7/70341 ,  G03F7/707 ,  G03F7/7085 ,  G03F9/7003 ,  G03F9/7034 ,  G03F9/7088

Abstract: PROBLEM TO BE SOLVED: To provide a method and apparatus for accurately aligning and/or leveling a substrate in an immersion lithography apparatus.
SOLUTION: A map of the surface of a substrate is formed at a measurement station. Then the substrate is moved to the place of which space between a projection lens and the substrate is filled with liquid. Subsequently, the substrate is aligned with, for example, a transmission image sensor to expose exactly according to the map formed previously. In this way, the mapping is never carried out under an environment of liquid.
COPYRIGHT: (C)2008,JPO&INPIT

Abstract translation: 要解决的问题：提供一种用于在浸没式光刻设备中精确对准和/或调平基板的方法和装置。 解决方案：在测量站处形成衬底表面的图。 然后将基板移动到投影透镜和基板之间的空间被液体填充的位置。 随后，基板与例如透射图像传感器对准，以根据先前形成的图准确地曝光。 以这种方式，映射从不在液体环境下进行。 版权所有（C）2008，JPO＆INPIT

公开(公告)号：JP2007305992A

公开(公告)日：2007-11-22

申请号：JP2007120962

申请日：2007-05-01

Applicant: Asml Netherlands Bv ,  エーエスエムエル ネザーランズ ビー.ブイ.

Inventor： KOSHELEV KONSTANTIN NIKOLAEVIT ,  BANINE VADIM YEVGENYEVICH ,  IVANOV VLADIMIR VITAL EVITCH ,  KIEFT ERIK RENE ,  LOOPSTRA ERIK ROELOF ,  STEVENS LUCAS HENRICUS JOHANNE ,  SIDELKOV YURII VICTOROVITCH ,  KOLOSHNIKOV VSEVOLOD GRIGOREVI ,  KRIVTSUN VLADIMIR MIHAILOVITCH ,  GAYAZOV ROBERT RAFILEVITCH ,  FRIJNS OLAV WALDEMAR VLADIMIR

IPC: G21K5/00 ,  H01L21/027 ,  F28D15/02 ,  G03F7/20 ,  G21K5/02 ,  G21K5/08 ,  H05G2/00 ,  H05H1/24

CPC classification number: H05G2/003 ,  B82Y10/00 ,  F28D15/0266 ,  G03F7/70033 ,  G03F7/70166 ,  G03F7/70916 ,  H05G2/005

Abstract: PROBLEM TO BE SOLVED: To provide a radiation source that actualizes an output level and a repetition rate suitable for manufacturing. SOLUTION: A radiation source comprises an anode and a cathode that are configured and arranged to create a discharge in a gas or a vapor in a space between the anode and cathode for forming a plasma so as to generate electromagnetic radiation. The gas or vapor may contain xenon, indium, lithium and/or tin. To improve heat dissipation, the radiation source comprises multiple plasma discharge elements, each of which is used only for short intervals. After one discharge element is used, another discharge element is selected. To improve an exact timing of pinch formation and thus that of pulse of EUV radiation, the radiation source comprises a triggering device. To improve conversion efficiency, the radiation source is configured to have a low inductance, and operates in a self-triggering mode. COPYRIGHT: (C)2008,JPO&INPIT

Abstract translation: 要解决的问题：提供实现适合于制造的输出电平和重复率的辐射源。 解决方案：辐射源包括阳极和阴极，其构造和布置成在阳极和阴极之间的空间中的气体或蒸汽中产生放电，以形成等离子体，以便产生电磁辐射。 气体或蒸汽可以含有氙，铟，锂和/或锡。 为了改善散热，辐射源包括多个等离子体放电元件，每个等离子体放电元件仅用于短时间间隔。 在使用一个放电元件之后，选择另一个放电元件。 为了提高夹紧形成的准确时间，并且因此提高EUV辐射脉冲的准确时间，辐射源包括触发装置。 为了提高转换效率，辐射源被配置为具有低电感，并以自触发模式工作。 版权所有（C）2008，JPO＆INPIT

公开(公告)号：JP2007208279A

公开(公告)日：2007-08-16

申请号：JP2007065471

申请日：2007-03-14

Applicant: Asml Netherlands Bv ,  エーエスエムエル ネザーランズ ビー.ブイ.

Inventor： LOF JOERI ,  BIJLAART ERIK THEODORUS MARIA ,  BUTLER HANS ,  DONDERS SJOERD NICOLAAS LAMBER ,  HOOGENDAM CHRISTIAAN ALEXANDER ,  KOLESNYCHENKO ALEKSEY ,  LOOPSTRA ERIK ROELOF ,  MEIJER HENDRICUS JOHANNES MARI ,  MERTENS JEROEN JOHANNES SOPHIA ,  MULKENS JOHANNES CATHARINUS HU ,  RITSEMA ROELOF AEILKO SIEBRAND ,  SCHAIK FRANK VAN ,  SENGERS TIMOTHEUS FRANCISCUS ,  SIMON KLAUS ,  DE SMIT JOHANNES THEODOOR ,  STRAAIJER ALEXANDER ,  STREEFKERK BOB ,  VAN SANTEN HELMAR

IPC: H01L21/027 ,  G03F7/20

CPC classification number: G03F7/70341 ,  G03F7/707 ,  G03F7/7085 ,  G03F7/70866

Abstract: PROBLEM TO BE SOLVED: To provide a lithographic projection apparatus which minimizes a liquid loss from a supply system during the exposure of ends of a substrate, in liquid immersion exposure. SOLUTION: Liquid is limited by a middle plate 210 located between the liquid supply system and the substrate W. Spaces 222, 215 among the middle plate 210, a transmitted image sensor (TIS) 220, and the substrate W are also filled with the liquid 111. This procedure can be performed by two separated space liquid-supply systems via holes 230, 240, or can be performed by the same space liquid-supply system via the holes 230, 240. Therefore, both the space 215 between the substrate W and the middle plate 210, and the space 225 between the transmitted image sensor 220 and the middle plate 210 are filled with the liquid, so that both the substrate W and the transmitted image sensor can be illuminated under the same condition. A part 200 provides one or a plurality of support surfaces with the middle plate 210 which can be held at a predetermined position by a vacuum source. COPYRIGHT: (C)2007,JPO&INPIT

Abstract translation: 要解决的问题：提供一种光刻投影装置，其在液浸曝光期间在基片的端部曝光期间使供应系统的液体损失最小化。 解决方案：液体受位于液体供应系统和基板W之间的中间板210的限制。中间板210中的空间222,215，透射图像传感器（TIS）220和基板W也被填充 该过程可以通过两个分离的空间供液系统通孔230,240进行，或者可以经由孔230,240由相同的空间液体供应系统执行。因此，两者之间的空间215 基板W和中间板210以及透射图像传感器220和中间板210之间的空间225被填充液体，从而能够在相同条件下照射基板W和透射图像传感器。 部件200提供一个或多个支撑表面，中间板210可由真空源保持在预定位置。 版权所有（C）2007，JPO＆INPIT

公开(公告)号：JP2007174886A

公开(公告)日：2007-07-05

申请号：JP2006291469

申请日：2006-10-26

Applicant: Asml Netherlands Bv ,  エーエスエムエル ネザーランズ ビー.ブイ.

Inventor： HOL SVEN ANTOIN SVEN ,  LOOPSTRA ERIK ROELOF

IPC: H02K41/03 ,  G03F7/20 ,  H01L21/027

CPC classification number: H02K41/03 ,  G03F7/70758 ,  G03F7/70858 ,  H01J2329/00 ,  H02K9/00

Abstract: PROBLEM TO BE SOLVED: To provide an electromagnetic actuator of high performance having a cooling structure for reducing a temperature change in a permanent magnet structure of the actuator. SOLUTION: The lithography apparatus has a patterning supporter constituted so as to support a patterning device and a substrate supporter constituted so as to support a substrate. At least one of the patterning supporter and the substrate supporter is moved by the electromagnetic actuator. The actuator has a first part and a second part relatively movable to each other. The first part has a coil structure, and the second part includes a plurality of permanent magnets acting each other with the coil structure. The second part is provided with a cooling structure arranged adjoining to the permanent magnet. A cooling duct is arranged between the adjacent permanent magnets or on one surface of the permanent magnet facing the coil structure. COPYRIGHT: (C)2007,JPO&INPIT

Abstract translation: 要解决的问题：提供一种高性能的电磁致动器，其具有用于减小致动器的永磁体结构的温度变化的冷却结构。 解决方案：光刻设备具有图案形成支撑件，其构造成支撑图案形成装置和支撑基板构成的基板支撑件。 图案形成支撑件和基板支撑件中的至少一个由电磁致动器移动。 致动器具有彼此相对移动的第一部分和第二部分。 第一部分具有线圈结构，第二部分包括多个与线圈结构相互作用的永磁体。 第二部分设置有与永磁体相邻布置的冷却结构。 在相邻的永磁体之间或在面向线圈结构的永磁体的一个表面上布置有冷却管道。 版权所有（C）2007，JPO＆INPIT

公开(公告)号：JP2006253677A

公开(公告)日：2006-09-21

申请号：JP2006059050

申请日：2006-03-06

Applicant: Asml Netherlands Bv ,  エイエスエムエル ネザランドズ ベスローテン フエンノートシャップ

Inventor： LOOPSTRA ERIK ROELOF ,  KOLESNYCHENKO ALEKSEY YURIEVIC ,  VAN SANTEN HELMAR

IPC: B81C99/00 ,  H01L21/027

CPC classification number: G03F7/0002 ,  B41M3/003 ,  B82Y10/00 ,  B82Y40/00

Abstract: PROBLEM TO BE SOLVED: To provide a lithographic apparatus that has high resolution, can be configured at low costs, and performs processing at high speed for increased productivity in imprint lithography.
SOLUTION: A method comprises a step of redistributing an imprintable medium, that is in a flowable state over a target portion of a surface of a substrate, to regions of differing volume corresponding to regions of differing pattern density in an imprint pattern of a template; a step of bringing the medium into contact with the template while the medium is in a flowable state, so as to form the imprint pattern in the medium; a step of conditioning the medium so that the medium changes into a substantially non-flowable state; and a step of separating the template from the medium that is in the substantially non-flowable state. Immediately prior to bringing the medium into contact with the template, an appropriately designed redistribution stamp is impressed onto the medium to redistribute the medium.
COPYRIGHT: (C)2006,JPO&NCIPI

Abstract translation: 要解决的问题：为了提供具有高分辨率的光刻设备，可以以低成本构造，并且以高速执行处理以提高压印光刻的生产率。 解决方案：一种方法包括将可压印介质重新分布在基板表面的目标部分上的可压印介质的步骤，该区域对应于不同图案密度区域的不同体积的区域， 一个模板 在介质处于可流动状态时使介质与模板接触的步骤，以便在介质中形成压印图案; 调节介质以使介质变成基本上不可流动状态的步骤; 以及从基本上不可流动状态的介质中分离模板的步骤。 在使介质与模板接触之前，将适当设计的再分布印记印在介质上以重新分布介质。 版权所有（C）2006，JPO＆NCIPI

公开(公告)号：JP2006191066A

公开(公告)日：2006-07-20

申请号：JP2005375770

申请日：2005-12-27

Applicant: Asml Netherlands Bv ,  エイエスエムエル ネザランドズ ベスローテン フエンノートシャップ

Inventor： UITTERDIJK TAMMO ,  LOOPSTRA ERIK ROELOF ,  SANDERSE LAURENS A

IPC: H01L21/027 ,  G03F7/20

CPC classification number: G03F7/70341 ,  G03F7/70958

Abstract: PROBLEM TO BE SOLVED: To provide a lithographic apparatus and a device manufacturing method. SOLUTION: A final element in an immersion lithographic apparatus is disclosed. The final element has, on a surface closest to a substrate, a layer bonded to the surface, and comprises an edge barrier which is made of the same material as that of the layer and extends from the layer so as to be away from the substrate for shielding the final element from a liquid. In an embodiment, the final element is attached to the apparatus via the layer and/or the edge barrier, which can be made of a material having a thermal expansion coefficient smaller than that of the final element. COPYRIGHT: (C)2006,JPO&NCIPI

Abstract translation: 要解决的问题：提供光刻设备和设备制造方法。 解决方案：公开了浸没式光刻设备中的最终元件。 最终元件在最接近基底的表面上具有结合到表面的层，并且包括由与该层相同的材料制成并且从该层延伸以远离基底的边缘阻挡层 用于屏蔽液体中的最终元素。 在一个实施例中，最终元件经由层和/或边缘阻挡件附接到装置，该阻挡层可以由热膨胀系数小于最终元件的热膨胀系数的材料制成。 版权所有（C）2006，JPO＆NCIPI

公开(公告)号：JP2006041522A

公开(公告)日：2006-02-09

申请号：JP2005211635

申请日：2005-07-21

Applicant: Asml Netherlands Bv ,  Carl Zeiss Smt Ag ,  エイエスエムエル ネザランドズ ベスローテン フエンノートシャップ ,  カール・ツァイス・エスエムティー・アーゲー

Inventor： VAN EMPEL TJARKO ADRIAAN R ,  LOOPSTRA ERIK ROELOF ,  VAN DER NET ANTONIUS J ,  VAN DE VIJVER YURI JOHANNES G ,  GELLRICH BERNARD ,  JANSEN BAUKE ,  SANDERSE RENS

IPC: H01L21/027 ,  G03F7/20

CPC classification number: G03F7/70933 ,  G03F7/70908

Abstract: PROBLEM TO BE SOLVED: To provide a lithographic device provided with a projection column having a gas-regulated environment that is hardly affected by the fluctuation of an ambient atmosphere.
SOLUTION: The lithographic device is disclosed. The lithographic device includes a projection system configured to project a patternized radiation beam on the target portion of a substrate. The projection system includes a housing and a plurality of optical elements disposed in the housing. In addition, the lithographic device includes an inlet for supplying a regulated gas to the housing and a gas discharge section for discharging the regulated gas from the housing to create the gas-regulated environment. At least one gate for making the gas-regulated environment communicate with the ambient atmosphere is disposed. The gate is disposed to perform the predetermined leakage of the regulated gas to the ambient atmosphere.
COPYRIGHT: (C)2006,JPO&NCIPI

Abstract translation: 要解决的问题：提供一种设置有几乎不受环境大气波动影响的气体调节环境的投影柱的光刻设备。 解决方案：公开了光刻设备。 光刻设备包括投影系统，该投影系统被配置为将图案化的辐射束投影到基板的目标部分上。 投影系统包括壳体和设置在壳体中的多个光学元件。 此外，平版印刷装置包括用于将调节气体供应到壳体的入口和用于从壳体排出调节气体以产生气体调节环境的气体排出部分。 设置用于使气体调节环境与环境大气连通的至少一个门。 门被设置为执行经调节的气体到周围大气的预定泄漏。 版权所有（C）2006，JPO＆NCIPI

公开(公告)号：JP2005333134A

公开(公告)日：2005-12-02

申请号：JP2005143396

申请日：2005-05-17

Applicant: Asml Netherlands Bv ,  エイエスエムエル ネザランドズ ベスローテン フエンノートシャップ

Inventor： STREEFKERK BOB ,  DONDERS SJOERD NICOLAAS LAMBER ,  LOOPSTRA ERIK ROELOF ,  MULKENS JOHANNES CATHARINUS HU

IPC: G03F7/20 ,  H01L21/027

CPC classification number: G03F7/70875 ,  B05C9/12 ,  G03F7/70341

Abstract: PROBLEM TO BE SOLVED: To provide a lithography apparatus and a device manufacturing method.
SOLUTION: The lithography projection apparatus, whose liquid supplying system supplies a dipping liquid between the last element of the projection apparatus and a substrate, is disclosed. An active dry station is located to remove the dipping liquid from the substrate W or the other object actively after dipping the substrate.
COPYRIGHT: (C)2006,JPO&NCIPI

Abstract translation: 要解决的问题：提供一种光刻设备和设备制造方法。 公开了一种光刻投影装置，其液体供给系统在投影装置的最后一个元件和基板之间提供浸渍液体。 位于主动干燥站以在浸渍基底之后主动地从基底W或其他物体上移除浸渍液。 版权所有（C）2006，JPO＆NCIPI

公开(公告)号：JP2005184004A

公开(公告)日：2005-07-07

申请号：JP2004371208

申请日：2004-12-22

Applicant: Asml Netherlands Bv ,  エイエスエムエル ネザランドズ ベスローテン フエンノートシャップ

Inventor： MULKENS JOHANNES CATHARINUS HU ,  VAN DEN BRINK MARINUS A ,  LOOPSTRA ERIK ROELOF

IPC: G03F7/20 ,  B41C1/10 ,  B41N3/00 ,  G03F9/00 ,  H01L21/027

CPC classification number: G03F7/70341 ,  B41C1/1075 ,  B41C1/1083 ,  G03F7/70258 ,  G03F9/7026

Abstract: PROBLEM TO BE SOLVED: To provide a lithographic apparatus, an alignment apparatus, a device manufacture method, an alignment method, and an apparatus change method.
SOLUTION: By a detector, the amount of liquid in the optical path of projection beams or alignment beams is detected and then by a controller, an optical element required for focusing the projection beams or the alignment beams onto the surface of a substrate from among a plurality of compensating optical elements is determined. An appropriate optical element is arranged directly in the optical path of the projection beams or the alignment beams as a final element for the projection system or the projection alignment system.
COPYRIGHT: (C)2005,JPO&NCIPI

Abstract translation: 要解决的问题：提供光刻设备，对准设备，设备制造方法，对准方法和设备改变方法。 解决方案：通过检测器，检测投影光束或对准光束的光路中的液体量，然后由控制器检测将投影光束或对准光束聚焦到衬底的表面上所需的光学元件 从多个补偿光学元件中确定。 适当的光学元件直接布置在投影光束或对准光束的光路中，作为投影系统或投影对准系统的最终元件。 版权所有（C）2005，JPO＆NCIPI