公开(公告)号：JP2005136413A

公开(公告)日：2005-05-26

申请号：JP2004312062

申请日：2004-10-27

Applicant: Asml Netherlands Bv ,  Carl Zeiss Smt Ag ,  エイエスエムエル ネザランドズ ベスローテン フエンノートシャップ ,  カール・ツァイス・エスエムティー・アーゲー

Inventor： CHRISTIAAN ALEXANDER HOOGENDAM ,  LOOPSTRA ERIK ROELOF ,  STREEFKERK BOB ,  GELLRICH BERNARD ,  WURMBRAND ANDREAS

IPC: G03F7/20 ,  H01L21/027

CPC classification number: G03F7/70341

Abstract: PROBLEM TO BE SOLVED: To enclose humid air in a lithography apparatus. SOLUTION: Liquid is supplied to a space between a final element of a projection system and a substrate. The leakage of the humid air into the other components of the projecting apparatus is prevented by a flow of gas toward a vacuum chamber, thereby preventing complicated components of the lithography apparatus from being damaged by the presence of the humid air. COPYRIGHT: (C)2005,JPO&NCIPI

Abstract translation: 要解决的问题：将湿空气包围在光刻设备中。 解决方案：将液体供应到投影系统的最终元件和基板之间的空间。 通过气体朝向真空室的流动来防止湿空气泄漏到投影装置的其他部件中，从而防止光刻设备的复杂部件被潮湿空气的损坏所损坏。 版权所有（C）2005，JPO＆NCIPI

公开(公告)号：JP2004343114A

公开(公告)日：2004-12-02

申请号：JP2004142059

申请日：2004-05-12

Applicant: Asml Netherlands Bv ,  エイエスエムエル ネザランドズ ベスローテン フエンノートシャップ

Inventor： STREEFKERK BOB ,  BAKKER LEVINUS PIETER ,  JOHANNES JACOBUS MATHEUS BASEL ,  COX HENRIKUS HERMAN MARIE ,  ANTONIUS THEODORUS ANNA MARIA ,  SJOERD NICOLAAS LAMBERTUS DOND ,  CHRISTIAAN ALEXANDER HOOGENDAM ,  JOERI LOF ,  LOOPSTRA ERIK ROELOF ,  JEROEN JOHANNES SOPHIA MARIA M ,  VAN DER MEULEN FRITS ,  MULKENS JOHANNES CATHARINUS HU ,  GERARDUS PETRUS MATTHIJS VAN N ,  SIMON KLAUS ,  SLAGHEKKE BERNARDUS ANTONIUS ,  STRAAIJER ALEXANDER ,  VAN DER TOORN JAN-GERARD CORNE ,  HOUKES MARTIJN

IPC: G03F7/20 ,  H01L21/027

CPC classification number: G03F7/70341 ,  G03F7/70425 ,  G03F7/70525 ,  G03F7/709

Abstract: PROBLEM TO BE SOLVED: To provide a lithographic apparatus intended to reduce liquid which remains on the surface of a substrate after exposure by a projection system.
SOLUTION: In the lithographic apparatus, a local region on the surface of the substrate under a projection system PL is immersed in a liquid. The height of a liquid feed system 310 above the surface of a substrate W can be varied using an actuator 314. In a control system, the liquid feed system 310 is maintained at a predetermined height above the surface of the substrate W, using feedforward control or feedback control by inputting the height of the surface of the substrate W.
COPYRIGHT: (C)2005,JPO&NCIPI

公开(公告)号：JP2004289126A

公开(公告)日：2004-10-14

申请号：JP2003417259

申请日：2003-11-11

Applicant: Asml Netherlands Bv ,  エイエスエムエル ネザランドズ ベスローテン フエンノートシャップ

Inventor： LOF JOERI ,  ANTONIUS THEODORUS ANNA MARIA ,  HOOGENDAM CHRISTIAAN ALEXANDER ,  KOLESNYCHENKO ALEKSEY ,  LOOPSTRA ERIK ROELOF ,  MODDERMAN THEODORUS MARINUS ,  MULKENS JOHANNES CATHARINUS HU ,  RITSEMA ROELOF AEILKO SIEBRAND ,  SIMON KLAUS ,  DE SMIT JOHANNES THEODOOR ,  STRAAIJER ALEXANDER ,  STREEFKERK BOB ,  VAN SANTEN HELMAR

IPC: G03F7/20 ,  G03F9/00 ,  H01L21/027

CPC classification number: G03F7/70341 ,  G03F7/707 ,  G03F7/7085 ,  G03F9/7088

Abstract: PROBLEM TO BE SOLVED: To provide a lithography projector in which a space between a substrate and a projection system is filled with liquid while minimizing the quantity of the liquid required to be accelerated during a stage operation. SOLUTION: In the lithography projector, the space between the final element of the projection system and the substrate table of the lithography projector is surrounded by a sealing member. A gas seal is formed between the sealing member and the plane of the substrate and the liquid is confined in that space. COPYRIGHT: (C)2005,JPO&NCIPI

公开(公告)号：JP2012151489A

公开(公告)日：2012-08-09

申请号：JP2012061788

申请日：2012-03-19

Applicant: Asml Netherlands Bv ,  エーエスエムエル ネザーランズ ビー.ブイ.

Inventor： STREEFKERK BOB ,  ANTONIUS THEODORUS ANNA MARIA DERKSEN ,  JOERI LOF ,  SIMON KLAUS ,  STRAAIJER ALEXANDER

IPC: H01L21/027 ,  G03F7/20

CPC classification number: G03F7/70875 ,  G03F7/70258 ,  G03F7/70341 ,  G03F7/70716 ,  G03F7/70891

Abstract: PROBLEM TO BE SOLVED: To reduce image distortion due to temperature gradients in a substrate and immersion liquid in an immersion projection exposure apparatus.SOLUTION: An immersion lithography apparatus comprises a temperature controller configured to adjust temperature of a member in the final stage of a projection exposure apparatus PL, a substrate, and immersion liquid to common target temperature T4. Imaging consistency and whole performance can be improved, by adjusting all of the temperatures of these structural members and by reducing temperature gradients. Means used to adjust the temperature may include controlling a flow rate and the temperature of the immersion liquid via a feedback circuit.

公开(公告)号：JP2012134561A

公开(公告)日：2012-07-12

申请号：JP2012084835

申请日：2012-04-03

Applicant: Asml Netherlands Bv ,  エーエスエムエル ネザーランズ ビー.ブイ.

Inventor： STREEFKERK BOB ,  JOHANNES JACOBUS MATHEUS BASELMANS ,  COX HENRIKUS HERMAN MARIE ,  ANTONIUS THEODORUS ANNA MARIA DERKSEN ,  SJOERD NICOLAAS LAMBERTUS DONDERS ,  CHRISTIAAN ALEXANDER HOOGENDAM ,  JOERI LOF ,  ERIK ROELOF LOOPSTRA ,  JEROEN JOHANNES SOPHIA MARIA MERTENS ,  VAN DER MEULEN FRITS ,  MULKENS JOHANNES CATHARINUS HUBERTUS ,  GERARDUS PETRUS MATTHIJS VAN NUNEN ,  KLAUS SIMON ,  SLAGHEKKE BERNARDUS ANTONIUS ,  ALEXANDER STOLE YALE ,  VAN DER TOORN JAN-GERARD CORNELIS ,  HOUKES MARTIJN

IPC: H01L21/027 ,  G03F7/20

CPC classification number: G03F7/70341 ,  G03F7/70425 ,  G03F7/70525 ,  G03F7/709

Abstract: PROBLEM TO BE SOLVED: To provide a lithographic apparatus for reducing residual liquid left on a surface of a substrate, after exposure by a projection system.SOLUTION: In a lithographic apparatus, a localized area of a surface of a substrate under a projection system PL is immersed in liquid. Height of a liquid supply system 310 above a surface of a substrate W can be varied by using actuators 314. A control system maintains the liquid supply system 310 at predetermined height above the surface of the substrate W, by using feedforward control or feedback control with input of the surface height of the substrate W.

Abstract translation: 要解决的问题：提供一种用于减少残留在基板表面上的残留液体的光刻设备，在通过投影系统曝光之后。 解决方案：在光刻设备中，将投影系统PL下的基板的表面的局部区域浸入液体中。 可以通过使用致动器314来改变基板W的表面上方的液体供应系统310的高度。控制系统通过使用前馈控制或反馈控制将液体供应系统310保持在基板W的表面上方的预定高度 输入基板W的表面高度。版权所有（C）2012，JPO＆INPIT

公开(公告)号：JP2010245569A

公开(公告)日：2010-10-28

申请号：JP2010164859

申请日：2010-07-22

Applicant: Asml Netherlands Bv ,  エーエスエムエル ネザーランズ ビー.ブイ.

Inventor： JANSEN HANS ,  CORNELISSEN SEBASTIAAN MARIA J ,  LAMBERTUS DONDERS SJOERD NICOLAAS ,  GRAAF ROELOF FREDERICK DE ,  CHRISTIAAN ALEXANDER HOOGENDAM ,  JACOBS HERNES ,  ANTONIUS LEENDERS MARTINUS H ,  MERTENS JEROEN JOHANNES SOPHIA MARIA ,  STREEFKERK BOB ,  VAN DER TOORN JAN-GERARD CORNELIS ,  SMITS PETER ,  JANSSEN FRANCISCUS JOHANNES J ,  RIEPEN MICHEL

IPC: H01L21/027 ,  G03F7/20

CPC classification number: G03F7/70341 ,  G03F7/707

Abstract: PROBLEM TO BE SOLVED: To provide a liquid immersion lithographic apparatus which reduces bubbles in an immersion liquid to prevent an adverse effect on pattern image quality. SOLUTION: The liquid immersion lithographic apparatus is provided to minimize bubbles generated or to prevent bubbles from being generated in the immersion liquid by reducing sizes or volumes of gaps between a target object and a substrate support table, and their upper structures, in the liquid immersion lithographic apparatus, and/or preparing a cover plate covering the gaps. The liquid immersion lithographic apparatus may further include an actuator which laterally moves the target object in a hole of the substrate support table to reduce a gap between a peripheral end of the target object and an inner side of the hole when the target object is in contact with the immersion liquid. COPYRIGHT: (C)2011,JPO&INPIT

Abstract translation: 要解决的问题：提供一种减少浸没液体中的气泡以防止对图案图像质量的不利影响的液浸光刻设备。 解决方案：提供液浸式光刻设备，以最小化产生的气泡或通过减少目标物体和基底支撑台及其上部结构之间的间隙的尺寸或体积来防止在浸没液体中产生气泡， 液浸光刻设备，和/或制备覆盖间隙的盖板。 液浸式光刻设备还可以包括致动器，该致动器在目标物体接触时使目标物体在基板支撑台的孔中横向移动，以减小目标物体的外周端与孔的内侧之间的间隙 与浸没液体。 版权所有（C）2011，JPO＆INPIT

公开(公告)号：JP2010239146A

公开(公告)日：2010-10-21

申请号：JP2010132174

申请日：2010-06-09

Applicant: Asml Netherlands Bv ,  エーエスエムエル ネザーランズ ビー.ブイ.

Inventor： STREEFKERK BOB ,  DONDERS SJOERD NICOLAAS LAMBERTUS ,  LOOPSTRA ERIK ROELOF ,  MULKENS JOHANNES CATHARINUS HUBERTUS

IPC: H01L21/027 ,  G03F7/20 ,  H01L21/68

CPC classification number: G03F7/70875 ,  B05C9/12 ,  G03F7/70341

Abstract: PROBLEM TO BE SOLVED: To provide a suitable method of manufacturing a device that eases a problem related to residual immersion liquid in an immersion lithography device. SOLUTION: An active drying station ADS for actively removing liquid from an object W of an immersion lithography device, a substrate table WT, or both is provided between a projection system and a substrate post-exposure processing module. The substrate table WT carries the object W to the active drying station ADS. The active drying station ADS includes a gas flow means. COPYRIGHT: (C)2011,JPO&INPIT

Abstract translation: 要解决的问题：提供一种适合于制造在浸没式光刻装置中减轻与残留浸液的问题有关的装置的方法。 解决方案：在投影系统和基板后曝光处理模块之间设置主动干燥台ADS，用于从浸没式光刻装置，衬底台WT或二者的物体W主动去除液体。 衬底台WT将物体W运送到主动干燥站ADS。 主动干燥站ADS包括气流装置。 版权所有（C）2011，JPO＆INPIT

公开(公告)号：JP2010183112A

公开(公告)日：2010-08-19

申请号：JP2010116463

申请日：2010-05-20

Applicant: Asml Netherlands Bv ,  エーエスエムエル ネザーランズ ビー.ブイ.

Inventor： STREEFKERK BOB ,  BASELMANS JOHANNES JACOBUS MATHEUS ,  BRULS RICHARD JOSEPH ,  DIERICHS MARCLE MATHIJS T M ,  DONDERS SJOERD NICOLAAS LAMBERTUS ,  CHRISTIAAN ALEXANDER HOOGENDAM ,  JANSEN HANS ,  LOOPSTRA ERIK ROELOF ,  JEROEN JOHANNES SOPHIA MARIA MERTENS ,  MULKENS JOHANNES CATHARINUS HUBERTUS ,  SENGERS TIMOTHEUS FRANCISCUS ,  RONALD WALTER JIIN SEVERYNS ,  SERGEI SHULEPOV ,  BOOM HERMAN

IPC: H01L21/027 ,  B05D3/12 ,  G03F7/20

CPC classification number: G03F7/70341 ,  G03F7/2041 ,  G03F7/70908 ,  G03F7/70958

Abstract: PROBLEM TO BE SOLVED: To provide an immersion lithographic projection apparatus.
SOLUTION: The immersion lithographic projection apparatus is disclosed in which an immersion liquid is sealed between a final element of a projection system and a substrate. Use of both hydrophobic and hydrophilic layers on various elements of the apparatus is disclosed. The use of the layers helps to prevent formation of bubbles in the immersion liquid and reduce residue on the elements after being immersed in the liquid.
COPYRIGHT: (C)2010,JPO&INPIT

公开(公告)号：JP2010161421A

公开(公告)日：2010-07-22

申请号：JP2010097301

申请日：2010-04-20

Applicant: Asml Netherlands Bv ,  エーエスエムエル ネザーランズ ビー.ブイ.

Inventor： JOERI LOF ,  BUTLER HANS ,  DONDERS SJOERD NICOLAAS LAMBERTUS ,  KOLESNYCHENKO ALEKSEY ,  LOOPSTRA ERIK ROELOF ,  MEIJER HENDRICUS JOHANNES MARIA ,  MULKENS JOHANNES CATHARINUS HUBERTUS ,  RITSEMA ROELOF AEILKO SIEBRAND ,  VAN SCHAIK FRANK ,  SENGERS TIMOTHEUS FRANCISCUS ,  SIMON KLAUS ,  DE SMIT JOANNES THEODOOR ,  STRAAIJER ALEXANDER ,  STREEFKERK BOB ,  BIJLAART ERIK THEODORUS MARIA ,  CHRISTIAAN ALEXANDER HOOGENDAM ,  VAN SANTEN HELMAR ,  VAN DE KERKHOF MARCUS ADRIANUS ,  KROON MARK ,  DEN BOEF ARIE JEFFREY ,  OTTENS JOOST JEROEN ,  MERTENS JEROEN JOHANNES SOPHIA MARIA

IPC: H01L21/027 ,  G03F7/20

CPC classification number: G03F7/70141 ,  G03F7/70341 ,  G03F7/7085 ,  G03F7/70883

Abstract: PROBLEM TO BE SOLVED: To provide an immersion type lithography projection apparatus with improved functionality. SOLUTION: The lithography projection apparatus includes: a radiation system Ex, IL also equipped with a radiation source LA, for providing the projection beams PB of radiation; a first object table (mask table) MT connected to a first positioning means, for correctly positioning a mask with respect to a member PL; a second object table (substrate table) WT connected to a second positioning means, for correctly positioning a substrate with respect to the member PL; and a projection system PL for forming an image of the radiated part of the mask MA on the target part C of the substrate W. COPYRIGHT: (C)2010,JPO&INPIT

Abstract translation: 要解决的问题：提供具有改进的功能的浸没式光刻投影装置。 光刻投影设备包括：辐射系统Ex，IL，其还配备有辐射源LA，用于提供辐射的投影光束PB; 连接到第一定位装置的第一目标表（掩模台）MT，用于相对于构件PL正确定位掩模; 连接到第二定位装置的第二对象台（衬底台）WT，用于相对于构件PL正确定位衬底; 以及用于在基板W的目标部分C上形成掩模MA的辐射部分的图像的投影系统PL。版权所有（C）2010，JPO＆INPIT

公开(公告)号：JP2010114455A

公开(公告)日：2010-05-20

申请号：JP2009293786

申请日：2009-12-25

Applicant: Asml Netherlands Bv ,  エーエスエムエル ネザーランズ ビー.ブイ.

Inventor： GRAAF ROELOF FREDERICK DE ,  LAMBERTUS DONDERS SJOERD NICOLAAS ,  HOOGENDAM CHRISTIAAN A ,  JANSEN HANS ,  LEENDERS MARTINUS HENDRIKUS ANTONIUS ,  LIEBREGTS PAULUS MARTINUS MARIA ,  MERTENS JEROEN JOHANNES SOPHIA MARIA ,  STREEFKERK BOB ,  VAN DER TOORN JAN-GERARD C ,  RIEPEN MICHEL

IPC: H01L21/027

CPC classification number: G03F7/70341

Abstract: PROBLEM TO BE SOLVED: To provide a lithographic projection apparatus in which measures are taken to prevent or reduce the presence of bubbles in liquid through which the radiated projection beam passes.
SOLUTION: This may be done, for example, by ensuring that a gap between a substrate and a substrate table is filled with immersion liquid or by causing a localized flow radially outwardly from the optical axis in the vicinity of the edge of the substrate.
COPYRIGHT: (C)2010,JPO&INPIT

Abstract translation: 要解决的问题：提供一种光刻投影装置，其中采取措施来防止或减少辐射投影光束通过的液体中气泡的存在。 解决方案：这可以通过例如通过确保衬底和衬底台之间的间隙用浸没液体填充或者通过使位于流动的边缘附近的光轴径向向外的局部流动来实现 基质。 版权所有（C）2010，JPO＆INPIT