公开(公告)号：US11749649B2

公开(公告)日：2023-09-05

申请号：US17399185

申请日：2021-08-11

Applicant: Intel Corporation

Inventor： Adel Elsherbini ,  Johanna Swan ,  Shawna Liff ,  Patrick Morrow ,  Gerald Pasdast ,  Van Le

IPC: H01L25/065 ,  H01L23/538 ,  H01L23/522 ,  H01L23/00 ,  H01L25/00

CPC classification number: H01L25/0657 ,  H01L23/5226 ,  H01L23/5389 ,  H01L24/08 ,  H01L24/09 ,  H01L25/50 ,  H01L2224/08146 ,  H01L2224/0912

Abstract: Composite IC chip including a chiplet embedded within metallization levels of a host IC chip. The chiplet may include a device layer and one or more metallization layers interconnecting passive and/or active devices into chiplet circuitry. The host IC may include a device layer and one or more metallization layers interconnecting passive and/or active devices into host chip circuitry. Features of one of the chiplet metallization layers may be directly bonded to features of one of the host IC metallization layers, interconnecting the two circuitries into a composite circuitry. A dielectric material may be applied over the chiplet. The dielectric and chiplet may be thinned with a planarization process, and additional metallization layers fabricated over the chiplet and host chip, for example to form first level interconnect interfaces. The composite IC chip structure may be assembled into a package substantially as a monolithic IC chip.

公开(公告)号：US11621208B2

公开(公告)日：2023-04-04

申请号：US16040748

申请日：2018-07-20

Applicant: Intel Corporation

Inventor： Feras Eid ,  Adel Elsherbini ,  Johanna Swan

IPC: H01L23/367 ,  H01L25/065 ,  H01L23/498

Abstract: An integrated circuit assembly may be formed having a substrate, a first integrated circuit device electrically attached to the substrate, a second integrated circuit device electrically attached to the first integrated circuit device, and a heat dissipation device comprising at least one first thermally conductive structure proximate at least one of the first integrated circuit device, the second integrated circuit device, and the substrate; and a second thermally conductive structure disposed over the first thermally conductive structure(s), the first integrated circuit device, and the second integrated circuit device, wherein the first thermally conductive structure(s) have a lower electrical conductivity than an electrical conductivity of the second thermally conductive structure. The first thermally conductive structure(s) may be formed by an additive process or may be pre-formed and attached to at least one of the first integrated circuit device, the second integrated circuit device, and the substrate.

公开(公告)号：US11581238B2

公开(公告)日：2023-02-14

申请号：US17318887

申请日：2021-05-12

Applicant: Intel Corporation

Inventor： Shawna Liff ,  Adel Elsherbini ,  Johanna Swan ,  Jimin Yao ,  Veronica Strong

IPC: H01L23/373 ,  H01L21/768 ,  H01L25/065 ,  H01L23/48

Abstract: A heat spreading material is integrated into a composite die structure including a first IC die having a first dielectric material and a first electrical interconnect structure, and a second IC die having a second dielectric material and a second electrical interconnect structure. The composite die structure may include a composite electrical interconnect structure comprising the first interconnect structure in direct contact with the second interconnect structure at a bond interface. The heat spreading material may be within at least a portion of a dielectric area through which the bond interface extends. The heat spreading material may be located within one or more dielectric materials surrounding the composite interconnect structure, and direct a flow of heat generated by one or more of the first and second IC dies.

公开(公告)号：US20220399249A1

公开(公告)日：2022-12-15

申请号：US17346895

申请日：2021-06-14

Applicant: Intel Corporation

Inventor： Georgios Dogiamis ,  Qiang Yu ,  Feras Eid ,  Adel Elsherbini ,  Kimin Jun ,  Johanna Swan ,  Shawna Liff

IPC: H01L23/473 ,  H01L23/13 ,  H01L23/538 ,  H05K7/20 ,  H01L25/065

Abstract: An integrated circuit (IC) package may be fabricated having an interposer, one or more microfluidic channels through the interposer, a first IC chip attached to a first side of the interposer, and a second IC chip attached to a second side of the interposer, where the first side of the interposer includes first bond pads coupled to first bond pads of the first IC chip, and the second side of the interposer includes second bond pads coupled to first bond pads of the second IC chip. In an embodiment of the present description, a liquid cooled three-dimensional IC (3DIC) package may be formed with the IC package, where at least two IC devices may be stacked with a liquid cooled interposer. In a further embodiment, the liquid cooled 3DIC package may be electrically attached to an electronic board. Other embodiments are disclosed and claimed.

公开(公告)号：US11302599B2

公开(公告)日：2022-04-12

申请号：US15957437

申请日：2018-04-19

Applicant: Intel Corporation

Inventor： Feras Eid ,  Adel Elsherbini ,  Johanna Swan

IPC: H01L23/367 ,  H01L23/498 ,  H01L23/00 ,  H01L25/065 ,  H01L25/00 ,  H01L21/48 ,  H01L23/13

Abstract: A heat dissipation device may be formed as a thermally conductive structure having at least one thermal isolation structure extending at least partially through the thermally conductive structure. The heat dissipation device may be thermally connected to a plurality of integrated circuit devices, such that the at least one thermal isolation structure is positioned between at least two integrated circuit devices. The heat dissipation device allows for heat transfer away from each of the plurality of integrated circuit devices, such as in a z-direction within the thermally conductive structure, while substantially preventing heat transfer in either the x-direction and/or the y-direction within the thermally isolation structure, such that thermal cross-talk between integrated circuit devices is reduced.

公开(公告)号：US20220037281A1

公开(公告)日：2022-02-03

申请号：US17500824

申请日：2021-10-13

Applicant: Intel Corporation

Inventor： Adel Elsherbini ,  Patrick Morrow ,  Johanna Swan ,  Shawna Liff ,  Mauro Kobrinksy ,  Van Le ,  Gerald Pasdast

IPC: H01L23/00 ,  H01L23/528 ,  H01L23/522 ,  H01L25/18 ,  H01L25/00 ,  H01L21/768 ,  H01L21/82 ,  H01L23/48

Abstract: A composite integrated circuit (IC) device structure comprising a host chip and a chiplet. The host chip comprises a first device layer and a first metallization layer. The chiplet comprises a second device layer and a second metallization layer that is interconnected to transistors of the second device layer. A top metallization layer comprising a plurality of first level interconnect (FLI) interfaces is over the chiplet and host chip. The chiplet is embedded between a first region of the first device layer and the top metallization layer. The first region of the first device layer is interconnected to the top metallization layer by one or more conductive vias extending through the second device layer or adjacent to an edge sidewall of the chiplet.

公开(公告)号：US20210400856A1

公开(公告)日：2021-12-23

申请号：US16909269

申请日：2020-06-23

Applicant: Intel Corporation

Inventor： Georgios Dogiamis ,  Adel Elsherbini ,  Feras Eid

IPC: H05K9/00 ,  H01B7/00 ,  H01B7/18 ,  H01R12/53

Abstract: Cables, cable connectors, and support structures for cantilever package and/or cable attachment may be fabricated using additive processes, such as a coldspray technique, for integrated circuit assemblies. In one embodiment, cable connectors may be additively fabricated directly on an electronic substrate. In another embodiment, seam lines of cables and/or between cables and cable connectors may be additively fused. In a further embodiment, integrated circuit assembly attachment and/or cable attachment support structures may be additively formed on an integrated circuit assembly.

公开(公告)号：US20210398909A1

公开(公告)日：2021-12-23

申请号：US16905202

申请日：2020-06-18

Applicant: Intel Corporation

Inventor： Georgios Dogiamis ,  Feras Eid ,  Adel Elsherbini ,  David Johnston ,  Jyothi Bhaskarr Velamala ,  Rachael Parker

IPC: H01L23/544 ,  H01L23/00 ,  H01L23/498 ,  H04L9/32

Abstract: Techniques and mechanisms for providing physically unclonable function (PUF) circuitry at a substrate which supports coupling to an integrated circuit (IC) chip. In an embodiment, the substrate comprises an array of electrodes which extend in a level of metallization at a side of the insulator layer. A cap layer, disposed on the array, is in contact with the electrodes and with a portion of the insulator layer which is between the electrodes. A material of the cap layer has a different composition or microstructure than the metallization. Regions of the cap layer variously provide respective impedances each between a corresponding two electrodes. In other embodiments, the substrate includes (or couples to) integrated circuitry that is operable to determine security information based on the detection of one or more such impedances.

公开(公告)号：US20210398895A1

公开(公告)日：2021-12-23

申请号：US16907797

申请日：2020-06-22

Applicant: Intel Corporation

Inventor： Adel Elsherbini ,  Feras Eid ,  Georgios Dogiamis ,  Beomseok Choi ,  Henning Braunisch ,  William Lambert ,  Krishna Bharath ,  Johanna Swan

IPC: H01L23/50 ,  H05K1/18 ,  H01L23/367 ,  H01L23/31 ,  H01L23/48 ,  H01L23/00 ,  H01L25/065 ,  H01L21/48 ,  H01L21/56 ,  H01L25/00

Abstract: An integrated circuit assembly may be fabricated having an electronic substrate, an integrated circuit device having a first surface, an opposing second surface, at least one side extending between the first surface and the second surface, and at least one through-substrate via extending into the integrated circuit device from the second surface, wherein the first surface of the integrated circuit device is electrically attached to the electronic substrate; and at least one power delivery route electrically attached to the second surface of the integrated circuit device and to the electronic substrate, wherein the at least one power delivery route is conformal to the side of the integrated circuit device and the first surface of the electronic substrate.

公开(公告)号：US20210202377A1

公开(公告)日：2021-07-01

申请号：US16727747

申请日：2019-12-26

Applicant: Intel Corporation

Inventor： Adel Elsherbini ,  Mauro Kobrinsky ,  Shawna Liff ,  Johanna Swan ,  Gerald Pasdast ,  Sathya Narasimman Tiagaraj

IPC: H01L23/522 ,  H01L21/768 ,  H01L23/528

Abstract: An integrated circuit device may be formed including an electronic substrate and a metallization structure on the electronic substrate, wherein the metallization structure includes a first level comprising a first dielectric material layer, a second level on the first level, wherein the second level comprises a second dielectric material layer, a third level on the second level, wherein the third level comprises a third dielectric material layer, at least one power/ground structure in the second level, and at least one skip level via extending at least partially through the first dielectric material layer of the first level, through the second dielectric layer of the second level, and at least partially through the third dielectric material layer of the third level, wherein the at least one skip level via comprises a continuous conductive material.