公开(公告)号：JP2012246286A

公开(公告)日：2012-12-13

申请号：JP2011286998

申请日：2011-12-27

Applicant: Kao Corp ,  花王株式会社

Inventor： YAMAZAKI NAOYUKI ,  DOI YASUHIRO ,  TERASAKI HIROYUKI

IPC: A61K8/73 ,  A61K8/34 ,  A61K8/44 ,  A61Q5/00 ,  A61Q5/02 ,  A61Q5/12

Abstract: PROBLEM TO BE SOLVED: To provide a hair cosmetic capable of imparting excellent finger combing properties and no sticky feeling, and manageability to a hair after being treated and dried, and to provide a method for manufacturing the same.SOLUTION: The hair cosmetic includes a cationized hydroxypropyl cellulose (A), an oil solution (B) that has a dissolution rate of 0-1 g per 100 g of water at 20°C, and a surfactant (C), wherein the cationized hydroxypropyl cellulose (A) has a main chain derived from an anhydroglucose, the degree of substitution of cationized ethyleneoxy groups is 0.01-2.9, and the degree of substitution of propyleneoxy groups is 0.1-4.0, and a method for manufacturing the same.

Abstract translation: 要解决的问题：提供能够赋予优良的指纹性能和无粘性感的头发化妆品，以及经处理和干燥后的毛发的可管理性，并提供其制造方法。 解决方案：毛发化妆品包括阳离子化羟丙基纤维素（A），在20℃下每100g水溶解速率为0-1g的油溶液（B）和表面活性剂（C）， 其中阳离子化羟丙基纤维素（A）具有源自脱水葡萄糖的主链，阳离子化亚乙氧基的取代度为0.01〜2.9，丙烯氧基的取代度为0.1-4.0，制造其的方法 。 版权所有（C）2013，JPO＆INPIT

公开(公告)号：JP2012149027A

公开(公告)日：2012-08-09

申请号：JP2011103312

申请日：2011-05-02

Applicant: Kao Corp ,  花王株式会社

Inventor： FUJII RYOSUKE ,  DOI YASUHIRO ,  TAKAI MASAKI ,  MIZUSHIMA HOROMI

IPC: A61K8/73 ,  A61K8/46 ,  A61Q19/10 ,  C08B11/14 ,  C11D3/37

CPC classification number: A61K8/731 ,  A61Q19/10 ,  C08B11/193

Abstract: PROBLEM TO BE SOLVED: To provide a skin cleanser composition capable of giving a superior stop feeling at the time of rinsing and a smooth feeling after drying, and a method of manufacturing the composition.SOLUTION: The skin cleanser composition contains cationization hydroxypropyl cellulose (A) and surfactant (B). The cationization hydroxypropyl cellulose (A) has a main chain derived from anhydroglucose, the degree of substitution of a cationization ethyleneoxy group is 0.01-3.0, and the degree of substitution of a propyleneoxy radical is 0.01-2.9.

Abstract translation: 待解决的问题：提供能够在冲洗时具有优异的止动感和干燥后的平滑感的皮肤清洁剂组合物，以及制造该组合物的方法。 皮肤清洁剂组合物含有阳离子化羟丙基纤维素（A）和表面活性剂（B）。 阳离子化羟丙基纤维素（A）具有源自脱水葡萄糖的主链，阳离子化乙烯氧基的取代度为0.01-3.0，丙烯氧基的取代度为0.01〜2.9。 版权所有（C）2012，JPO＆INPIT

公开(公告)号：JP2010143961A

公开(公告)日：2010-07-01

申请号：JP2008319585

申请日：2008-12-16

Applicant: Kao Corp ,  花王株式会社

Inventor： HIRAISHI TOKUJI ,  WAKABAYASHI HIROKI ,  SHIROTA KYOICHI ,  DOI YASUHIRO

IPC: B41J2/01 ,  B41M5/00 ,  C09D11/00 ,  C09D11/322 ,  C09D11/324 ,  C09D11/326 ,  C09D11/328 ,  C09D11/38

Abstract: PROBLEM TO BE SOLVED: To provide a water dispersion for inkjet recording, providing excellent print density, to provide a water-based ink containing the water dispersion, and to provide a method for producing the water dispersion. SOLUTION: (1) The water dispersion for the inkjet recording contains composite particles obtained by attaching anionic colorant particles to cationic polymer particles. (2) The water-based ink for the inkjet recording contains the water dispersion. (3) The method for producing the water dispersion for the inkjet recording includes a step of obtaining a water dispersion of the composite particles by attaching the anionic colorant particles to the cationic polymer particles by mixing a water dispersion of the anionic colorant particles with a water dispersion of the cationic polymer particles. COPYRIGHT: (C)2010,JPO&INPIT

Abstract translation: 要解决的问题：为了提供喷墨记录用水分散体，提供优异的印刷密度，提供含有水分散体的水性油墨，并提供水分散体的制造方法。 （1）喷墨记录用水分散体含有通过将阴离子着色剂粒子附着在阳离子性聚合物粒子上而得到的复合粒子。 （2）喷墨记录用水性油墨含有水分散体。 （3）喷墨记录用水分散体的制造方法包括以下步骤：通过将阴离子着色剂颗粒的水分散体与水混合，将阴离子着色剂颗粒附着到阳离子聚合物颗粒上来获得复合颗粒的水分散体 阳离子聚合物颗粒的分散。 版权所有（C）2010，JPO＆INPIT

公开(公告)号：JP2009221120A

公开(公告)日：2009-10-01

申请号：JP2008065165

申请日：2008-03-14

Applicant: Kao Corp ,  花王株式会社

Inventor： INOUE MASAKI ,  DOI YASUHIRO

IPC: A61K8/898 ,  A61K8/37 ,  A61K8/46 ,  A61K8/892 ,  A61K8/893 ,  A61K8/894 ,  A61Q5/02 ,  A61Q19/10 ,  C11D1/14 ,  C11D1/29 ,  C11D1/72 ,  C11D1/74 ,  C11D3/37

Abstract: PROBLEM TO BE SOLVED: To provide a detergent composition for skin or hair, having an excellent stability, excellent foaming performance and a good use feeling from a rinsing time to after drying.
SOLUTION: This detergent composition for the skin and hair includes the following components: (A) 8 to 50 wt.% of at least one kind of a surfactant selected from among an anionic surfactant, a nonionic surfactant and an ampholytic surfactant; (B) 0.1 to 3 wt.% of at least one kind of a modified silicone selected from among a polyether-modified silicone, an amino-modified silicones, a fatty acid-modified silicone and a branched polyglycerol-modified silicone; and (C) 0.05 to 3 wt.% of at least one kind of a compound selected from the group consisting of an ester of a polyhydric alcohol ethylene oxide adduct with an 8C-22C branched fatty acid, an ethylene oxide adduct of an ester of a polyhydric alcohol with the 8C-22C branched fatty acid and an ester of polyethylene glycol with the 8-22C branched fatty acid; wherein the weight ratio of the components (B) to (C), [(B)/(C)], is the 0.3 to 3.
COPYRIGHT: (C)2010,JPO&INPIT

Abstract translation: 待解决的问题：提供一种皮肤或头发的洗涤剂组合物，具有优异的稳定性，优异的发泡性能和从漂洗时间到干燥后的良好使用感。 本发明的皮肤和毛发用洗涤剂组合物包含以下成分：（A）8〜50重量％的选自阴离子表面活性剂，非离子表面活性剂和两性表面活性剂中的至少一种表面活性剂; （B）0.1〜3重量％的选自聚醚改性硅酮，氨基改性硅酮，脂肪酸改性硅酮和支链聚甘油改性硅酮中的至少一种改性硅氧烷; 和（C）0.05〜3重量％的至少一种选自下列化合物的化合物：由具有8C-22C支链脂肪酸的多元醇环氧乙烷加合物的酯， 具有8C-22C支链脂肪酸的多元醇和聚乙二醇与8-22C支链脂肪酸的酯; 其中组分（B）至（C），[（B）/（C）]的重量比为0.3至3.版权所有（C）2010，JPO＆INPIT

公开(公告)号：JP2009149575A

公开(公告)日：2009-07-09

申请号：JP2007330035

申请日：2007-12-21

Applicant: Kao Corp ,  花王株式会社

Inventor： INOUE KATSUHISA ,  FUKUSHIMA TETSURO ,  DOI YASUHIRO

IPC: A61K31/14 ,  A01N35/08 ,  A01P3/00 ,  A61K31/04 ,  A61P31/02 ,  C11D3/48

CPC classification number: Y02A50/473

Abstract: PROBLEM TO BE SOLVED: To provide an antimicrobial agent having high antimicrobial activity and imparting little irritation to the skin or the like.
SOLUTION: The antimicrobial agent includes a quaternary ammonium salt represented by general formula (1) (wherein, R
1 is a 6-24C hydrocarbon group; R
2 and R
3 are each a 1-24C hydrocarbon group which may be substituted with a hydroxy group; R
4 is a 1-5C hydrocarbon group which may be substituted with a hydroxy group, or a benzyl group; R
5 is a 2-6C alkylene group substituted with a hydroxy group; n is a number of 0.3-10; p is an integer of 1-3; q and r are each an integer of 0-2; s is an integer of 1-3; with the proviso that p+q+r+s=4; and A
- is an anion). The antimicrobial composition contains the antimicrobial agent.
COPYRIGHT: (C)2009,JPO&INPIT

Abstract translation: 要解决的问题：提供具有高抗微生物活性并赋予皮肤等少刺激性的抗微生物剂。 解决方案：抗微生物剂包括由通式（1）表示的季铵盐（其中，R 1 SP 6是6-24C烃基; R 2 SP 2和/ R 3 SP 3各自是可以被羟基取代的1-24C烃基; R 4是可以被羟基取代的1-5C烃基 或苄基; R 5是被羟基取代的2-6C亚烷基; n是0.3-10的数; p是1-3的整数; q和r是 每个为0-2的整数; s为1-3的整数;条件是p + q + r + s = 4;并且A - 为阴离子）。 抗微生物组合物含有抗微生物剂。 版权所有（C）2009，JPO＆INPIT

公开(公告)号：JP2005336387A

公开(公告)日：2005-12-08

申请号：JP2004159385

申请日：2004-05-28

Applicant: Kao Corp ,  花王株式会社

Inventor： INOUE MASAKI ,  DOI YASUHIRO

IPC: A61K8/00 ,  A61Q5/02 ,  A61Q19/10 ,  C11D1/06 ,  C11D1/68 ,  C11D3/37 ,  A61K7/075 ,  A61K7/50

Abstract: PROBLEM TO BE SOLVED: To provide a detergent composition having little irritation to the skin, excellent in foamability and foam quality and having good feeling in washing, rinsing and after drying.
SOLUTION: The detergent composition comprises ingredients (A), (B) and (C): (A) an ether carboxylic acid-based surfactant expressed by general formula (1); (B) a glyceryl ether having a 4-12 alkyl or alkenyl; (C) a cationic group-containing copolymer prepared by radically polymerizing at least one species of nonionic group-containing vinyl monomers expressed by general formula (2) or general formula (3) and at least one species of cationic group-containing organic vinyl monomers expressed by general formula (4) or general formula (5) with at least one species of crosslinking vinyl monomers having at least 2 groups selected from a vinyl group, acryloyl group, methacryloyl group and allyl group as essential constituents.
COPYRIGHT: (C)2006,JPO&NCIPI

Abstract translation: 要解决的问题：提供对皮肤刺激性低的洗涤剂组合物，发泡性和泡沫质量优异，并且在洗涤，漂洗和干燥后具有良好的感觉。 洗涤剂组合物包含成分（A），（B）和（C）：（A）由通式（1）表示的醚羧酸类表面活性剂; （B）具有4-12个烷基或链烯基的甘油醚; （C）通过自由基聚合由通式（2）或通式（3）表示的至少一种含非离子基团的乙烯基单体和至少一种含阳离子基团的有机乙烯基单体制备的含阳离子基团的共聚物 由具有至少一种选自乙烯基，丙烯酰基，甲基丙烯酰基和烯丙基中的至少2个基团的至少一种交联乙烯基单体作为必要成分由通式（4）或通式（5）表示。 版权所有（C）2006，JPO＆NCIPI

公开(公告)号：JP2005210082A

公开(公告)日：2005-08-04

申请号：JP2004348980

申请日：2004-12-01

Applicant: Kao Corp ,  花王株式会社

Inventor： TAMURA ATSUSHI ,  DOI YASUHIRO

IPC: C11D7/08 ,  C11D7/10 ,  C11D7/26 ,  C11D7/36 ,  H01L21/304 ,  H01L21/3205 ,  H01L23/52

Abstract: PROBLEM TO BE SOLVED: To provide a cleaning agent composition containing sulfur for cleaning a semiconductor device having aluminum interconnect lines and manufacturing methods for a semiconductor device having protective film containing sulfur element on the surface of aluminum interconnect lines and a semiconductor device having a production process to form the protective film. SOLUTION: The cleaning agent composition containing sulfur for cleaning the semiconductor device having aluminum interconnect lines is capable of forming a protective film containing sulfur atoms on the surface of the aluminum film in the test of protective film formation. The semiconductor device has the protective film containing sulfur atoms on the surface of aluminum interconnect lines and also contains sulfur atoms in the region at least within 5 nm in the direction of thickness from the surface of the protective film. The manufacturing method for the semiconductor device is also provided. COPYRIGHT: (C)2005,JPO&NCIPI

Abstract translation: 解决的问题：提供一种含有硫的清洗剂组合物，用于清洗具有铝互连线的半导体器件和具有在铝互连线表面上含有硫元素的保护膜的半导体器件的制造方法以及具有 形成保护膜的生产工艺。 解决方案：在保护膜形成试验中，含有用于清洗具有铝互连线的半导体器件的硫的清洗剂组合物能够在铝膜的表面上形成含有硫原子的保护膜。 半导体器件具有在铝互连线表面上含有硫原子的保护膜，并且在该保护膜的表面上的厚度方向上至少在5nm以内的区域中含有硫原子。 还提供了半导体器件的制造方法。 版权所有（C）2005，JPO＆NCIPI

公开(公告)号：JP2005187438A

公开(公告)日：2005-07-14

申请号：JP2003434728

申请日：2003-12-26

Applicant: Kao Corp ,  花王株式会社

Inventor： DOI YASUHIRO ,  TAKAHASHI MASAKATSU

IPC: A61K8/30 ,  A01N25/30 ,  A01N37/36 ,  A61K8/00 ,  A61K8/37 ,  A61K8/42 ,  A61Q5/02 ,  A61Q5/12 ,  A61Q19/00 ,  C11D3/20 ,  C11D3/32 ,  C11D3/48 ,  A61K7/00 ,  A61K7/075 ,  A61K7/08 ,  A61K7/48

Abstract: PROBLEM TO BE SOLVED: To provide an antiseptic agent that can show excellent antibacterial action with a reduced amount, a detergent that includes the antiseptic agent and shows excellent antiseptic, foaming and sense of use, and a cosmetic that includes the antiseptic agent and has excellent antiseptic properties and sense of use.
SOLUTION: The antiseptic agent includes a glyceric acid derivative represented by general formula (1) (wherein R
1 is H or methyl, R
2 is COO-R
3 or CONH-R
4 , R
3 is a 4-22C straight chain or branched chain alkyl, R
4 is a 4-22C straight chain or branched chain). The detergent composition comprises 0.01 % wt. to less than 0.5 % wt. of the glyceric acid derivative and a surfactant. The cosmetic comprises 0.01 to 5 % wt. of the glyceric acid derivative.
COPYRIGHT: (C)2005,JPO&NCIPI

Abstract translation: 待解决的问题：为了提供能够以减少的量显示出优异的抗菌作用的防腐剂，包含防腐剂并且显示出优异的消毒，起泡和使用感的洗涤剂以及包含防腐剂的化妆品 具有优异的防腐性和使用感。 解决方案：防腐剂包括通式（1）表示的甘油酸衍生物（其中R 1 为H或甲基，R SP 2为COO- SP> 3 或CONH-R 4 ，R 3 是4-22C直链或支链烷基， 是4-22C直链或支链）。 洗涤剂组合物包含0.01重量％ 至小于0.5重量％。 的甘油酸衍生物和表面活性剂。 化妆品包含0.01至5重量％ 的甘油酸衍生物。 版权所有（C）2005，JPO＆NCIPI

公开(公告)号：JP2005167193A

公开(公告)日：2005-06-23

申请号：JP2004229826

申请日：2004-08-05

Applicant: Kao Corp ,  花王株式会社

Inventor： TAMURA ATSUSHI ,  DOI YASUHIRO ,  MIYAMOTO SADAJI

IPC: H01L21/304

Abstract: PROBLEM TO BE SOLVED: To provide a release agent composition capable of effectively removing the deposition of aluminum wiring generated after ashing and a deposition resulting from titanium generated when a via hole is formed and capable of largely inhibiting corrosion to an aluminum wiring material, and titanium, titanium nitride or the like on the bottom of the via hole, a method for peeling and washing a semiconductor substrate or a semiconductor element with the metallic wiring by using the composition, and a method for manufacturing the semiconductor substrate or the semiconductor element using the method for a peeling and a washing. SOLUTION: The release agent composition is used for peeling and washing the semiconductor substrate or the semiconductor element containing the metallic wiring. In the release agent composition, the composition contains a dissolving agent having the quantity of aluminum dissolved of 10 ppm or more by a standard test (A-1) and an inhibitor having the quantity of aluminum etched of 7 nm or less by the standard test (B-1), and does not substantially contains a fluoride compound. COPYRIGHT: (C)2005,JPO&NCIPI

Abstract translation: 要解决的问题：提供一种脱模剂组合物，其能够有效地除去灰化后产生的铝布线的沉积和由形成通孔的钛产生的沉积物，并能够大大抑制铝布线材料的腐蚀 和通孔的底部的钛，氮化钛等，使用该组合物用金属配线剥离和清洗半导体衬底或半导体元件的方法，以及制造半导体衬底或半导体的方法 元素使用剥离和洗涤的方法。 解决方案：脱模剂组合物用于剥离和洗涤包含金属布线的半导体衬底或半导体元件。 在脱模剂组合物中，组合物含有通过标准试验（A-1）溶解的铝量为10ppm以上的溶解剂，通过标准试验将铝的蚀刻量为7nm以下的抑制剂 （B-1），基本上不含氟化合物。 版权所有（C）2005，JPO＆NCIPI

公开(公告)号：JP2004165447A

公开(公告)日：2004-06-10

申请号：JP2002329800

申请日：2002-11-13

Applicant: Kao Corp ,  花王株式会社

Inventor： YOSHIDA HIROYUKI ,  DOI YASUHIRO

IPC: H01L21/3205

Abstract: PROBLEM TO BE SOLVED: To provide a composition used in a manufacturing process of a semiconductor substrate, which effectively prevents corrosion of a metal wiring, a method for preventing corrosion of the metal wiring of the semiconductor substrate using the same, or a manufacturing method of the semiconductor substrate using the composition, for a metal wiring formation process in which an alkaline solution is used, for example, a resist releasing process, a metal CMP process, and a wafer cleaning process after metal CMP.
SOLUTION: There are provided the composition used in a manufacturing process of a semiconductor substrate, which contains a compound containing 4, 5, 6, 7-tetrahydrobenzotriazole framework, a method for preventing corrosion of a metal wiring of the semiconductor substrate that uses the composition for a manufacturing process of the semiconductor substrate, and a method for manufacturing the semiconductor substrate using the composition for the manufacturing process of the semiconductor substrate.
COPYRIGHT: (C)2004,JPO