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公开(公告)号:JPS62190637A
公开(公告)日:1987-08-20
申请号:JP3362086
申请日:1986-02-17
Applicant: NISSHIN HIGH VOLTAGE KK
Inventor: HAYASHI KEIZO
Abstract: PURPOSE:To aim at expansion of an electron beam radiation area without any change a direction of X-ray generation by making a target in a rotating columnar form, rotating its rotary axis in titled mode against the direction of the electron radiation and moving it in the direction of axis center of the rotary axis. CONSTITUTION:A target 3 is formed columnar, in its circumference to be made freely rotatable by a rotation axis 4, the rotary axis 4 is set up as tilting against the direction of electron beam radiation from an electron gun 2 and also, the target 3 is made freely movable in a direction shown by arrow S along the axis center of the rotary axis 4. When the rotary axis is rotated under its state irradiated by electron beams, the electron beam radiation area is allowed to distribute at the peripheral side of the target 3. Further, an X-ray generation point P on the peripheral side of the target 3 is changed and electron beam radiation area is expanded by movement of the target 3 along the axis center of the rotary axis 4, but any direction change of X-ray radiation can not follow.
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公开(公告)号:JPS52110578A
公开(公告)日:1977-09-16
申请号:JP2742476
申请日:1976-03-13
Applicant: TOKYO SHIBAURA ELECTRIC CO
Inventor: ENDOU MASAYOSHI , TANAKA MASAMI , ISHIDA SHIYUUSUKE
Abstract: PURPOSE:By maming X-ray tube which rotates the anode having spherical target accompanying swinging movement by means of plane cam and the link mechanism, the locus of electron gun can be made longer and the possibility of burn can be reduced.
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公开(公告)号:GB2523439A
公开(公告)日:2015-08-26
申请号:GB201421075
申请日:2014-11-27
Applicant: METAL IND RES & DEV CT
Inventor: CHEN YEN-CHUN , SHIH WEI-HUNG , CHANG YI-SAN , YU TSUNG-CHIH , CHENG MING-HUI
Abstract: A radiation generating apparatus includes a target base 110, a target 120, a holding assembly 130 and an electronic beam generating device 140. The target is disposed on the target base. The holding assembly holds the target base. The electronic beam generating device is adapted to generate an electronic beam, wherein the electronic beam is emitted to the target to generate a radiation. The target, the holding assembly and the electronic beam generating device are located at the same side of the target base. The device may also be provided with a first driving unit 160 which is to adapted to drive the target base to move along the radial direction. The device may then have a second driving unit 132 and a rotation member 134, which are adapted to drive the rotational member and the target base to rotate along the axial direction.
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公开(公告)号:DE102004003370B4
公开(公告)日:2015-04-02
申请号:DE102004003370
申请日:2004-01-22
Applicant: SIEMENS AG
Inventor: FREUDENBERGER JÖRG DR , RÖHRER PETER , SCHARDT PETER DR
Abstract: Hochleistungsanodenteller für eine direkt mit einem Kühlmedium gekühlte Drehkolbenröhre, der aus einem hochtemperaturbeständigen Material, wie z. B. Wolfram, Molybdän oder einer Kombination beider Materialien, besteht, dadurch gekennzeichnet, dass im Bereich der Brennfleckbahn in den Anodenteller (2) ein anderes hochwärmeleitfähiges Material so ein- oder angebracht ist, dass sich eine verbesserte Wärmeableitung aus dem Anodenteller in das Kühlmedium und damit ein geringerer Temperaturgradient ergibt.
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公开(公告)号:GB2468099B
公开(公告)日:2013-05-01
申请号:GB201011338
申请日:2007-12-31
Applicant: GEN ELECTRIC
Inventor: AHLAWAT ANUPAM SINGH , PATURI PRASAD BALAJI NARASIMHA
Abstract: A high flux X-ray tube anode target assembly (101). The assembly includes a support shaft (107) connected to a pivot assembly (109). The assembly further includes a movable anode target (105) having a target surface (106) disposed at one end of the support shaft. The target surface includes a single radius of curvature. The radius of curvature extends from a pivot point (110). The assembly also includes a drive member (119) operably arranged with respect to the support shaft to provide motion to the anode target. The assembly is configured to maintain a substantially fixed distance between the pivot point and the target surface.
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公开(公告)号:DE602006019678D1
公开(公告)日:2011-03-03
申请号:DE602006019678
申请日:2006-08-30
Applicant: SAKABE NORIYOSHI , SAKABE KIWAKO
Inventor: SAKABE NORIYOSHI
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公开(公告)号:DE112007003748T5
公开(公告)日:2010-12-09
申请号:DE112007003748
申请日:2007-12-31
Applicant: GEN ELECTRIC
Inventor: AHLAWAT ANUPAM SINGH , PATURI PRASAD BALAJI NARASIMHA
IPC: H01J35/28
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