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    Barrier member and lithographic apparatus
    101.
    发明专利
    Barrier member and lithographic apparatus 有权
    障碍物成员和平面设备

    公开(公告)号：JP2012142625A

    公开(公告)日：2012-07-26

    申请号：JP2012099767

    申请日：2012-04-25

    Applicant: Asml Netherlands Bv ,  エーエスエムエル ネザーランズ ビー.ブイ.

    Inventor： BECKERS MARCEL ,  VAN DE KERKHOF MARCUS A ,  SIEBE LANDHEER ,  MAAS WOUTERUS JOHANNES PETRUS MARIA ,  BRUIJSTENS JEROEN PETER JOHANNES ,  THOMAS IVO ADAM JOHANNES ,  JANSSEN FRANCISCUS JOHANNES JOSEPH ,  VAN OERLE BARTHOLOMEUS MATHIAS

    IPC: H01L21/027

    CPC classification number: G03F7/70341 ,  G03F7/70808 ,  G03F7/70958

    Abstract: PROBLEM TO BE SOLVED: To limit the movement of immersion liquid in a gap between immersion system structure and a projection system, and to reduce the quantity of immersion liquid that escapes the immersion system through the gap.SOLUTION: A lithographic apparatus includes a projection system configured to project a patterned radiation beam onto a target portion of a substrate. The lithographic apparatus also includes a barrier member, surrounding a space between the projection system, and the substrate in use, to define in part with the projection system a reservoir for liquid. A radially outer surface of the barrier member facing a portion of the projection system and a radially outer surface of the portion of the projection system facing the barrier member each have a lyophobic outer surface. The lyophobic outer surface of the barrier member and/or the lyophobic outer surface of the portion of the projection system has an inner edge that defines in part the reservoir.

    Abstract translation: 要解决的问题：为了限制浸没液体在浸没系统结构和投影系统之间的间隙中的移动，并且减少通过间隙逸出浸没系统的浸液的量。 解决方案：光刻设备包括被配置为将图案化的辐射束投影到基板的目标部分上的投影系统。 光刻设备还包括围绕投影系统和使用中的基板之间的空间的阻挡构件，以部分地将投影系统限定为用于液体的储存器。 面向突出系统的一部分的阻挡构件的径向外表面和面向阻挡构件的突出系统的部分的径向外表面各自具有疏液外表面。 屏障构件的疏液外表面和/或突出系统部分的疏液外表面具有部分限定储存器的内边缘。 版权所有（C）2012，JPO＆INPIT

    Lithographic apparatus and method of modifying radiation beam in lithographic apparatus
    102.
    发明专利
    Lithographic apparatus and method of modifying radiation beam in lithographic apparatus 有权
    光栅设备的光栅装置及其修改方法

    公开(公告)号：JP2012134494A

    公开(公告)日：2012-07-12

    申请号：JP2011275446

    申请日：2011-12-16

    Applicant: Asml Netherlands Bv ,  エーエスエムエル ネザーランズ ビー.ブイ.

    Inventor： BASTIANN STEPHANUS HENDRICUS JANSEN ,  RUBINGH MARIA JOHANNA AGNES

    IPC: H01L21/027

    CPC classification number: G03F7/70308

    Abstract: PROBLEM TO BE SOLVED: To at least reduce or mitigate for an effect of non-uniform heating of elements in a lithographic apparatus when using a localized illumination mode.SOLUTION: A lithographic apparatus comprises a beam modifying apparatus mounted in the path of a radiation beam. The beam modifying apparatus comprises a conduit configured to allow the flow of a fluid through it, the conduit being arranged such that, in use, the radiation beam passes through the conduit and the fluid flowing through it. The beam modifying apparatus further comprises a heat exchanger in thermal communication with a portion of the conduit located upstream, having regard to the direction of the fluid flow, of the location at which the radiation beam passes through the conduit.

    Abstract translation: 要解决的问题：为了在使用局部照明模式时至少减少或减轻光刻设备中元件的不均匀加热的影响。 解决方案：光刻设备包括安装在辐射束路径中的光束修改设备。 光束修改装置包括被配置为允许流体通过其的流动的导管，导管布置成使得在使用中辐射束穿过导管并流过其中的流体。 光束修改装置还包括与辐射束穿过导管的位置相关的位于上游的管道的一部分与流体流动的方向热连通的热交换器。 版权所有（C）2012，JPO＆INPIT

    Lithographic apparatus and device manufacturing method
    103.
    发明专利
    Lithographic apparatus and device manufacturing method 有权
    LITHOGRAPHIC装置和装置制造方法

    公开(公告)号：JP2012134485A

    公开(公告)日：2012-07-12

    申请号：JP2011272974

    申请日：2011-12-14

    Applicant: Asml Netherlands Bv ,  エーエスエムエル ネザーランズ ビー.ブイ.

    Inventor： VERMEULEN JOHANNES PETRUS MARTINUS ,  ANTONIUS FRANCISCUS JOHANNES DE GROOT ,  CADEE THEODORUS PETRUS MARIA ,  DE VOLEI JEROEN

    IPC: H01L21/027 ,  H01L21/68

    CPC classification number: G03F7/70758 ,  G03F7/70691

    Abstract: PROBLEM TO BE SOLVED: To provide a more efficient method for driving movement of a substrate table.SOLUTION: A lithographic apparatus comprises a carrier, and a drive system for moving the carrier relative to a projection system in a plane defined by reference to orthogonal axes X and Y. The drive system comprises a shuttle configured and arranged so as to move parallel to the Y-axis, a shuttle connector connecting the shuttle to the carrier and allowing movement of the carrier in a direction parallel to the X-axis relative to the shuttle, and a shuttle driver for driving movement of the shuttle parallel to the Y-axis. The shuttle is located to one side of the carrier in a direction parallel to the X-axis, and only one shuttle is connected to the carrier. The shuttle driver and the shuttle connector are configured to supply at least 10% of the Y-component of forces applied to the carrier by the drive system.

    Abstract translation: 要解决的问题：提供用于驱动衬底台的移动的更有效的方法。 解决方案：光刻设备包括载体和驱动系统，用于在参考正交轴线X和Y限定的平面中相对于投影系统移动载体。驱动系统包括梭子，其构造和布置为 平行于Y轴移动的穿梭连接器，将梭子连接到载体并允许载体相对于梭子平行于X轴的方向运动的穿梭连接器，以及用于驱动梭子平行于 Y轴。 梭子在平行于X轴的方向上位于载体的一侧，只有一个梭子连接到载体上。 梭式驾驶员和穿梭连接器被配置为提供由驱动系统施加到承载件的力的Y分量的至少10％。 版权所有（C）2012，JPO＆INPIT

    Lithographic apparatus and method
    104.
    发明专利
    Lithographic apparatus and method 有权
    LITHOGRAPHIC设备和方法

    公开(公告)号：JP2012129507A

    公开(公告)日：2012-07-05

    申请号：JP2011251806

    申请日：2011-11-17

    Applicant: Asml Netherlands Bv ,  エーエスエムエル ネザーランズ ビー.ブイ.

    Inventor： VAN SCHOOT JAN BERNARD PLECHELMUS ,  IGOR PETRUS MARIA BOUCHOMS ,  ANTONIUS JOHANNES JOSEPHUS VAN DIJSSELDONK ,  MARKUS FRANCISCUS ANTONIUS EURLINGS

    IPC: H01L21/027 ,  H01L21/68

    CPC classification number: G03F7/70558 ,  G03B27/54 ,  G03B27/58 ,  G03F7/709

    Abstract: PROBLEM TO BE SOLVED: To reduce an influence which vibration has on a pattern projected on a substrate.SOLUTION: The lithographic apparatus comprises: a radiation source for generating a radiation beam; a support structure for supporting a patterning device; a substrate table for supporting a substrate; and a projection system for projecting a patterned radiation beam onto a target portion of the substrate. The lithographic apparatus further includes a vibration measuring device configured to measure a relative vibration between the patterning device and the substrate during exposure onto the target portion. A control device adjusts an intensity of the radiation beam so as to compensate an influence which the measured relative vibration has on the pattern projected onto the substrate.

    Abstract translation: 要解决的问题：减少振动对投射在基板上的图案的影响。 光刻设备包括：用于产生辐射束的辐射源; 用于支撑图案形成装置的支撑结构; 用于支撑衬底的衬底台; 以及用于将图案化的辐射束投影到基板的目标部分上的投影系统。 该光刻设备还包括一个振动测量装置，其配置成在曝光到目标部分时测量图案形成装置和基板之间的相对振动。 控制装置调节辐射束的强度，以便补偿所测量的相对振动对投射到衬底上的图案的影响。 版权所有（C）2012，JPO＆INPIT

    Optical assembly
    106.
    发明专利
    Optical assembly 有权
    光学装置

    公开(公告)号：JP2012099859A

    公开(公告)日：2012-05-24

    申请号：JP2012023257

    申请日：2012-02-06

    Applicant: Asml Netherlands Bv ,  Carl Zeiss Smt Gmbh ,  エーエスエムエル ネザーランズ ビー.ブイ. ,  カール・ツァイス・エスエムティー・ゲーエムベーハー

    Inventor： KWAN YIM-BUN PATRICK ,  ERIK LOOPSTRA

    IPC: H01L21/027 ,  G02B5/00 ,  G02B7/02 ,  G02B7/182 ,  G02B7/198 ,  G02B13/14 ,  G03F7/20

    CPC classification number: G03F7/70258 ,  G02B5/005 ,  G02B13/143 ,  G03F7/70808 ,  G03F7/70825 ,  G03F7/70833 ,  G03F7/709

    Abstract: PROBLEM TO BE SOLVED: To arrange replaceable optical components in the beam path of an optical assembly with sufficient precision and reproducibility, to prevent transmission of interfering vibration from an exchange mechanism and replaceable optical components to the optical assembly, and to prevent contamination of the optical assembly and respective optical components thereof due to particles generated from the exchange mechanism.SOLUTION: In the optical assembly (1) having a plurality of optical components (2), at least one optical component (2', 2") is connected with a structure (5) separated movably from the optical assembly (1). Consequently, the optical component (2', 2") is sufficiently separated movably also from other optical components (2) and optical assembly (1).

    Abstract translation: 要解决的问题：为了以足够的精度和再现性在光学组件的光束路径中布置可更换的光学部件，以防止来自交换机构的干扰振动和可更换光学部件到光学组件的传播，并且防止污染 的光学组件及其各自的光学部件由于由交换机构产生的颗粒。 解决方案：在具有多个光学部件（2）的光学组件（1）中，至少一个光学部件（2'，2“）与从光学组件（1）可移动地分离的结构（5）连接 ），因此，光学部件（2'，2“）也可以与其他光学部件（2）和光学组件（1）一起被充分地分离。 版权所有（C）2012，JPO＆INPIT

    Lithographic apparatus and device manufacturing method
    107.
    发明专利
    Lithographic apparatus and device manufacturing method 审中-公开
    LITHOGRAPHIC装置和装置制造方法

    公开(公告)号：JP2012094892A

    公开(公告)日：2012-05-17

    申请号：JP2011285622

    申请日：2011-12-27

    Applicant: Asml Netherlands Bv ,  エーエスエムエル ネザーランズ ビー.ブイ.

    Inventor： VERHAGEN MARTINUS CORNELIS MARIA ,  JANSEN HANS ,  MARCO COELHO STAUFEN ,  JACOBUS JOHANNUS LEONARDUS HENDRICUS VERSPAY

    IPC: H01L21/027

    CPC classification number: G03F7/70341 ,  G03F7/70808

    Abstract: PROBLEM TO BE SOLVED: To protect an immersion fluid from an atmospheric environment in an immersion lithographic apparatus.SOLUTION: A lithographic apparatus is disclosed in which a liquid supply system is configured to supply a liquid to a region between a substrate W and a projection system PL of the lithographic apparatus and which has a liquid confinement structure fixed in a plane substantially perpendicular to an optical axis of the projection system PL and configured to hold the substrate W in order to restrict the liquid to a region above an upper surface of a substrate table WT so that a side of the substrate W to be exposed is substantially covered in the liquid during exposure.

    Abstract translation: 要解决的问题：为了在浸没式光刻设备中保护浸没液体免受大气环境的影响。 解决方案：公开了一种光刻设备，其中液体供应系统被配置为将液体供应到基板W和光刻设备的投影系统PL之间的区域，并且具有固定在平面中的液体限制结构 垂直于投影系统PL的光轴并被配置为保持衬底W，以便将液体限制在衬底台WT的上表面上方的区域，使得待暴露的衬底W的一侧基本上覆盖在 液体在曝光期间。 版权所有（C）2012，JPO＆INPIT

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