Polymeric compounds
    101.
    发明申请
    Polymeric compounds 失效
    聚合物

    公开(公告)号:US20010019809A1

    公开(公告)日:2001-09-06

    申请号:US09726347

    申请日:2000-12-01

    Abstract: Polymeric compounds for lithographic printing plates, especially plates for use in printing utilizing UV curable inks, may include a structural unit (I) 1 wherein R1 represents an optionally-substituted cyclic or alkyl group, x represents 0 or 1 and A represents an optionally-substituted alkylene group. A range of compounds having different solubilities in selected solvents may be prepared by varying the identity or group R1. Such components may be prepared by reacting an amine of formula R1NH2 with the maleic anhydride derivative corresponding to moiety 1.

    Abstract translation: 用于平版印刷版的聚合化合物,特别是用于使用UV固化油墨印刷的印版,可包括结构单元(I),其中R 1表示任选取代的环状或烷基,x表示0或1,A表示任选取代的 亚烷基。 在选择的溶剂中具有不同溶解度的一系列化合物可以通过改变同一性或基团R1来制备。 这样的组分可以通过使式R 1 NH 2的胺与对应于部分1的马来酸酐衍生物反应来制备。

    PHOTOPOLYMER COMPOSITION SUITABLE FOR LITHOGRAPHIC PRINTING PLATES

    公开(公告)号:WO2007077207A3

    公开(公告)日:2007-07-12

    申请号:PCT/EP2007/000009

    申请日:2007-01-02

    Abstract: Radiation-sensitive element comprising a substrate and a radiation-sensitive coating comprising (a) at least one component selected from photoinitiators and sensitizer/coinitiator systems which absorbs radiation of a wavelength in the range of 250 to 1,200 nm; (b) at least one free-radical polymerizable oligomer A having an average molecular weight in the range of 3,500 to 9,000 determined by GPC, obtainable by reacting a triisocyanate with (i) at least one acrylic or methacrylic monomer with two free OH groups and at least one (meth)acrylic group and (ii) at least one compound comprising one OH group, at least one (meth)acrylic group and at least one poly(alkyleneoxide) chain in the molecule, wherein the (meth)acrylic monomer (i) is present in an amount of 2 to 20 mole-%, based on the total amount of (meth)acrylic compounds with OH functionality.

    LITHOGRAPHIC PRINTING PLATES WITH HIGH PRINT RUN STABILITY
    103.
    发明申请
    LITHOGRAPHIC PRINTING PLATES WITH HIGH PRINT RUN STABILITY 审中-公开
    具有高打印运行稳定性的平版印刷板

    公开(公告)号:WO2006008073A3

    公开(公告)日:2007-03-15

    申请号:PCT/EP2005007686

    申请日:2005-07-14

    CPC classification number: G03F7/0757 G03F7/028

    Abstract: Radiation-sensitive element comprising (a) an optionally pretreated substrate and (b) a radiation-sensitive coating consisting of a composition comprising (i) one or more types of monomers and/or oligomers and/or polymers, each comprising at least one ethylenically unsaturated group accessible to a free­radical polymerization, (ii) at least one radiation-sensitive initiator or initiator system for free-radical polymerization absorbing radiation selected from the wavelength range of 300 to 1,200 nm; and (iii) at least one silsesquioxane comprising at least one substituent with at least one ethylenically unsaturated group each; applied onto the substrate.

    Abstract translation: 辐射敏感元件包括(a)任选地预处理的底物和(b)由组合物组成的辐射敏感性涂层,所述组合物包含(i)一种或多种类型的单体和/或低聚物和/或聚合物,每种包含至少一种烯属 不饱和基团可以进行自由基聚合,(ii)至少一种辐射敏感的引发剂或引发剂体系,用于自由基聚合吸收选自波长范围为300至1200nm的辐射; 和(iii)至少一种包含至少一个具有至少一个烯键式不饱和基团的取代基的倍半硅氧烷; 施加到基底上。

    DUAL-LAYER HEAT- SENSITIVE IMAGEABLE ELEMENTS WITH A POLYVINYL ACETAL TOP LAYER
    104.
    发明申请
    DUAL-LAYER HEAT- SENSITIVE IMAGEABLE ELEMENTS WITH A POLYVINYL ACETAL TOP LAYER 审中-公开
    双层热敏成像元件与聚乙烯顶层

    公开(公告)号:WO2007017162A2

    公开(公告)日:2007-02-15

    申请号:PCT/EP2006/007618

    申请日:2006-08-01

    Abstract: Thermally imageable elements are described comprising on a substrate with hydrophilic surface (a) a first layer comprising a first polymer soluble or swellable in aqueous alkaline developer and insoluble in organic solvents with low polarity and (b) a second layer comprising a second polymer soluble or swellable in aqueous alkaline developer, wherein the first polymer is different from the second polymer and the second polymer comprises vinyl acetal repeating units and pendant acidic groups selected from COOH, -SO 3 H, -PO 3 H 2 , -PO 4 H 2 , aromatic OH and groups having acidic amide or imide groups.

    Abstract translation: 描述了可热成像元件,其包括在具有亲水表面的基底上(a)第一层,其包含在含水碱性显影剂中可溶或可溶胀的第一聚合物,并且不溶于低极性的有机溶剂,和(b)包含第二聚合物可溶或 在水性碱性显影剂中可膨胀,其中第一聚合物不同于第二聚合物,第二聚合物包含乙烯基缩醛重复单元和选自COOH,-SO 3 H,-PO 3, 3个H 2,-PO 4 H 2,芳香族OH和具有酸性酰胺或酰亚胺基团的基团。

    SELECTIVE FLATTENING OF PAGE DESCRIPTION FILES TO SUPPORT COLOR CORRECTION

    公开(公告)号:WO2005067279A3

    公开(公告)日:2005-07-21

    申请号:PCT/US2004/043951

    申请日:2004-12-29

    Abstract: An imaging technique permits selective flattening of objects within page description files. The selective aspect of the flattening may pertain to the selection of particular objects to be flattened, selection of the degree of flattening to be applied to objects, or both. In some embodiments, selective flattening of objects in a page description file may be permitted based on an assessment of color correction efficacy. For example, the degree of flattening may be iteratively adjusted to achieve acceptable color correction results. Alternatively, a user may be notified in the event acceptable color correction results have not been achieved. A color error between bitmap files generated from a color corrected, unflattened page description file and from a color corrected, flattened page description file may be measured. When the measured error between the two bitmaps exceeds a predetermined value, an amount of file flattening may be adjusted to reduce the measured error.

    RADIATION-SENSITIVE ELEMENTS AND THEIR STORAGE STABILITY
    109.
    发明申请
    RADIATION-SENSITIVE ELEMENTS AND THEIR STORAGE STABILITY 审中-公开
    辐射敏感元件及其储存稳定性

    公开(公告)号:WO2004049071A8

    公开(公告)日:2005-06-02

    申请号:PCT/EP0313431

    申请日:2003-11-28

    Abstract: Radiation-sensitive element comprising (a) a substrate with at least one hydrophilic surface and (b) a radiation-sensitive coating on .at least one hydrophilic surface of the substrate, wherein the coating comprises: (i) at least one free-radical polymerizable monomer and/or oligomer and/or polymer with at least one ethylenically unsaturated group each, (ii) at least one absorber selected from photoinitiators and sensitizers, which is capable of absorbing radiation of a ,wavelength in the range of 250 to 1,200 nm and (iii) at least one stabilizer comprising in its molecule at least one group capable of inhibiting free-radical polymerization, and at least one other group capable of sorption at the hydrophilic surface of the substrate.

    Abstract translation: 辐射敏感元件包括(a)具有至少一个亲水表面的基底和(b)基底的至少一个亲水表面上的辐射敏感涂层,其中所述涂层包括:(i)至少一种自由基 具有至少一个烯属不饱和基团的可聚合单体和/或聚合物和/或聚合物各自包含(ii)至少一种选自光引发剂和敏化剂的吸收剂,其能够吸收波长在250至1,200nm范围内的辐射 和(iii)至少一种在其分子中包含至少一个能够抑制自由基聚合的基团的稳定剂和至少一种能够在底物亲水表面吸附的其它基团。

    MEDIA CONSTRUCTION FOR USE IN AUTO-FOCUS LASER
    110.
    发明申请
    MEDIA CONSTRUCTION FOR USE IN AUTO-FOCUS LASER 审中-公开
    用于自动聚焦激光的媒体结构

    公开(公告)号:WO2005021278A1

    公开(公告)日:2005-03-10

    申请号:PCT/US2004/026817

    申请日:2004-08-18

    Abstract: A media transfer sheet includes a light absorbing layer. The light absorbing layer is selected to absorb light at a wavelength that is close to light produced by a focusing light source. The light absorbing layer is placed in the media transfer sheet at a desired focus level for an imaging light source, within the media transfer sheet. The light absorbing layer does not allow any significant portion of the light from the focusing layer to pass therethrough, but does allow for reflectance of some portion of that light by the media transfer sheet. By limiting the level of reflection of focusing light, an improved reflected focusing light signal is produced that is more representative of the depth to be measured.

    Abstract translation: 介质转印片材包括光吸收层。 选择光吸收层以吸收由聚焦光源产生的光接近的波长的光。 在介质转印片内,光吸收层以成像光源的所需焦点水平放置在介质转印片中。 光吸收层不允许来自聚焦层的光的任何重要部分通过其中,但是允许通过介质转印片的一部分光的反射率。 通过限制聚焦光的反射水平,产生改进的反射聚焦光信号,其更具体地表示要测量的深度。

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