BROADBAND TUNABLE IN-LINE FILTER FOR FIBER OPTICS
    101.
    发明申请
    BROADBAND TUNABLE IN-LINE FILTER FOR FIBER OPTICS 审中-公开
    宽带无线光纤在线滤波器

    公开(公告)号:WO1988005550A1

    公开(公告)日:1988-07-28

    申请号:PCT/US1988000166

    申请日:1988-01-20

    CPC classification number: G02B6/29322

    Abstract: A broadband tunable in-fiber filter (10) includes a grating (15) with divergent ridges (19) which can be translated transversely of a side-polished optical fiber (11) to vary the periodicity at an exposed evanescent field. The divergence is gradual so that at any given transverse position of the grating (15), the ridges (19) interacting with the evanescent field are effectively parallel. The divergence is great enough so that a tuning-to-reflected bandwidth ratio of about 33:1 is demonstrated. The grating (15) is fabricated in an amorphous silicon film on a fused quartz substrate. The film is coated with photoresist which is exposed to a holographic interference front. The substrate is tilted with respect to an interference front created by two spherically diverging beams to achieve the desired divergence. Subsequent processing, including etching are standard.

    Abstract translation: 宽带可调谐的纤维内滤波器(10)包括具有发散脊(19)的光栅(15),所述光栅可横向于侧抛光纤(11)平移,以改变曝光的消逝场处的周期。 发散是渐进的,使得在光栅(15)的任何给定的横向位置处,与渐逝场相互作用的脊(19)实际上是平行的。 发散度足够大,从而可以显示约33:1的调谐至反射带宽比。 光栅(15)以熔融石英衬底上的非晶硅膜制造。 该膜被曝光到全息干涉前面的光致抗蚀剂涂覆。 基板相对于由两个球形发散光束产生的干涉前端倾斜以实现所需的发散。 后续处理,包括蚀刻是标准的。

    OTDR TESTING OF OPTICAL FIBER
    102.
    发明申请
    OTDR TESTING OF OPTICAL FIBER 审中-公开
    OTDR光纤测试

    公开(公告)号:WO1988005531A1

    公开(公告)日:1988-07-28

    申请号:PCT/US1988000169

    申请日:1988-01-21

    CPC classification number: G01M11/3118

    Abstract: A method (41-49, 410, 411) of dynamically changing the measurement window and operating parameters of the instrument, based on intermediate results, in order to minimize the total time required to make a complete measurement. Also, a method (412-415) of combining partial results from subwindows into a final result to be displayed that has not been corrupted by variation in system response due to time-varying operating parameters.

    Abstract translation: 基于中间结果动态地改变仪器的测量窗口和操作参数的方法(41-49,410,411),以便最小化完成测量所需的总时间。 另外,将从子窗口的部分结果组合到待显示的最终结果的方法(412-415),所述最终结果由于时变操作参数而不被系统响应的变化所破坏。

    INK JET BARRIER LAYER AND ORIFICE PLATE PRINTHEAD AND FABRICATION METHOD
    103.
    发明申请
    INK JET BARRIER LAYER AND ORIFICE PLATE PRINTHEAD AND FABRICATION METHOD 审中-公开
    喷墨打印机和打印机打印机和制造方法

    公开(公告)号:WO1987003364A1

    公开(公告)日:1987-06-04

    申请号:PCT/US1986002525

    申请日:1986-11-21

    Abstract: Thermal ink jet printhead and method of manufacture featuring an improved all-metal orifice plate and barrier layer assembly (28). This assembly includes constricted ink flow ports (58) to reduce cavitation damage and smooth, contoured convergent ink ejection orifices (32) to prevent ''gulping'' of air during an ink ejection process. Both of these features extend the maximum operating frequency, fmax, of the printhead. The nickel barrier layer (26) and the underlying thin film resistor substrate (38) are gold plated and then soldered together to form a good, strong solder bond at the substrate - barrier layer interface.

    Abstract translation: 热喷墨打印头和制造方法具有改进的全金属孔板和阻挡层组件(28)。 该组件包括收缩的墨水流动端口(58),以减少气蚀损伤和平滑的成型的会聚墨水喷射孔(32),以防止在喷墨过程中“空气化”。 这两个功能都可以延长打印头的最大工作频率fmax。 镍阻挡层(26)和下面的薄膜电阻器基板(38)被镀金,然后焊接在一起,以在基板 - 阻挡层界面处形成良好的强焊料接合。

    METHOD AND TARGET FOR SPUTTER DEPOSITING THIN FILMS
    104.
    发明申请
    METHOD AND TARGET FOR SPUTTER DEPOSITING THIN FILMS 审中-公开
    溅射沉积薄膜的方法和目标

    公开(公告)号:WO1986006416A1

    公开(公告)日:1986-11-06

    申请号:PCT/US1986000959

    申请日:1986-05-01

    Abstract: A sputtering target (176) has a sputtering surface with first and second regions (208, 206) of respective first and second materials. The first region (208) comprises a surface of a first member (208) of the first material, such as a circular cobalt plate. The second region (206) comprises a surface of second member (206) of the second material, such as a platinum ring. A cobalt cover ring (210) clamps the platinum ring (206) to the cobalt plate. By varying the relative sizes of the first and second regions (208, 206) as by changing the size of the cover ring (210) to expose more or less of the platinum ring (206), the concentration of the two materials in a layer deposited from the target (176) onto substrates (260) is varied. In addition, by imparting planetary motion to substrates (260) during deposition and sizing and positioning the exposed portion of the platinum ring (206) a radial coercivity gradient is established in the layer deposited on the substrates (260).

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