公开(公告)号：JP2010084003A

公开(公告)日：2010-04-15

申请号：JP2008254292

申请日：2008-09-30

Applicant: Ecole Polytechnic Federal De Lausanne (Epfl) ,  Jsr Corp ,  Jsr株式会社 ,  エコール ポリテクニーク フェデラル ドゥ ローザンヌ(エーペーエフエル)

Inventor： YONEDA EIJI ,  GRAETZEL MICHAEL ,  NAZEERUDDIN MOHAMMAD KHAJA

IPC: C09B57/10 ,  C07D213/55 ,  C07D409/14 ,  C07F15/00 ,  H01L31/04 ,  H01M14/00

CPC classification number: Y02E10/542 ,  Y02P70/521

Abstract: PROBLEM TO BE SOLVED: To provide a dye to become a constituting material of a dye-sensitized solar cell having a high conversion efficiency and excelling in the durability. SOLUTION: The dye is represented by formula (1): ML 1 L 2 L 3 (M is a group 8 to 10 element in the long periodic table; and L 1 , L 2 and L 3 are bidentate ligands represented by respective specific formulae), and is, for example, a compound of formula (1a). COPYRIGHT: (C)2010,JPO&INPIT

Abstract translation: 要解决的问题：提供一种染料，以成为具有高转换效率和优异的耐久性的染料敏化太阳能电池的构成材料。 解决方案：染料由式（1）表示：ML 1 3 （M为8至10组 元素在长周期表中; L 1 ，L 2 和L 3 是由各自的特定式表示的双齿配体） 例如，式（1a）的化合物。 版权所有（C）2010，JPO＆INPIT

公开(公告)号：JP2007163834A

公开(公告)日：2007-06-28

申请号：JP2005359999

申请日：2005-12-14

Applicant: Jsr Corp ,  Jsr株式会社

Inventor： NAGAI TOMOKI ,  YONEDA EIJI ,  SHIMIZU MAKOTO

IPC: G03F7/039 ,  C08F2/38 ,  H01L21/027

Abstract: PROBLEM TO BE SOLVED: To provide a radiation-sensitive resin composition having high transparency to radiation and high resolution as a chemically amplified resist sensitive to active radiation, particularly far-ultraviolet radiation typified by ArF excimer laser (wavelength; 193 nm), and excellent in basic physical properties as a resist including a pattern profile and LER. SOLUTION: The radiation-sensitive resin composition comprises (A) an acid-dissociable group-containing polymer containing an acid-dissociable group and (B) a radiation-sensitive acid generator, wherein the acid-dissociable group-containing polymer (A) has a weight average molecular weight of 1,000-4,000 and a polydispersity of ≤1.3 and the acid-dissociable group-containing polymer (A) is obtained by living radical polymerization using a chain transfer agent represented by formula (X-1), wherein R a represents a substituted or unsubstituted hydrocarbon group; and Z represents a 2-15C monovalent organic group which may contain a substituent and a hetero atom. COPYRIGHT: (C)2007,JPO&INPIT

Abstract translation: 要解决的问题：提供对作为对活性辐射敏感的化学放大抗蚀剂的特别是辐射和高分辨率透明度的辐射敏感性树脂组合物，特别是由ArF受激准分子激光器（波长193nm）表示的远紫外辐射， ，作为含有图案轮廓和LER的抗蚀剂的基本物理性质优异。 解决方案：辐射敏感性树脂组合物包含（A）含有酸解离基团的含酸解离基团的聚合物和（B）辐射敏感性酸产生剂，其中所述含酸解离基团的聚合物（ A）的重均分子量为1,000-4,000，多分散性≤1.3，含酸解离基的聚合物（A）通过使用由式（X-1）表示的链转移剂的活性自由基聚合获得， 其中R a 表示取代或未取代的烃基; Z表示可以含有取代基和杂原子的2-15C一价有机基团。 版权所有（C）2007，JPO＆INPIT

公开(公告)号：JP2007106717A

公开(公告)日：2007-04-26

申请号：JP2005300865

申请日：2005-10-14

Applicant: Jsr Corp ,  Jsr株式会社

Inventor： YONEDA EIJI ,  SHIMOKAWA TSUTOMU

IPC: C07C309/14 ,  C07C19/07 ,  C07C381/12 ,  G03F7/004 ,  G03F7/039 ,  H01L21/027

Abstract: PROBLEM TO BE SOLVED: To provide a basic compound suitable as an acid diffusion controller in a positive-type radiation-sensitive resin composition useful for fine processing in which every kind of radiation, such as far ultraviolet rays, an electron beam, and X rays, is used. SOLUTION: This basic compound comprises an onium salt expressed by general formula (1) (at least one of Z 1 and Z 2 is F or a 1-10C straight-chain or branched-chain perfluoroalkyl; R 1 s may be identical to or different from each other and are each an alkyl or a cycloalkyl, or two of R 1 s and N bonded thereto together form a ring; A is a bivalent organic group or a single bond; and M + is a sulfonium cation, an iodonium cation or the like). COPYRIGHT: (C)2007,JPO&INPIT

Abstract translation: 要解决的问题：为了提供一种适用于酸性扩散控制剂的碱性化合物，用于精细加工的正型辐射敏感性树脂组合物中，其中每种辐射如远紫外线，电子束， 和X射线。 解决方案：该碱性化合物包括由通式（1）表示的鎓盐（Z 1 和Z 2 中的至少一个为F或1-10C 直链或支链全氟烷基; R 1彼此可以相同或不同，并且各自为烷基或环烷基，或两个R 1 SP 和N键合在一起形成环; A是二价有机基团或单键; M 是锍阳离子，碘鎓阳离子等）。 版权所有（C）2007，JPO＆INPIT

公开(公告)号：JP2007101760A

公开(公告)日：2007-04-19

申请号：JP2005289469

申请日：2005-10-03

Applicant: Jsr Corp ,  Jsr株式会社

Inventor： YONEDA EIJI ,  HAMADA KENICHI ,  SHIHO KOUJI

IPC: G03F7/023 ,  C08F220/02 ,  C08F220/26 ,  G03F7/40 ,  H01L21/027

Abstract: PROBLEM TO BE SOLVED: To provide a radiation-sensitive resin composition having no safety problem, superior in sensitivity, resolution and storage stability as a solution, and having such a proper development margin that a proper pattern profile can be formed, even after the lapse of the optimum developing time in a developing step, and to provide a method for forming an interlayer insulation film and microlenses from the composition. SOLUTION: The radiation-sensitive resin composition contains [A] a copolymer of (a1) at least one selected from among unsaturated carboxylic acid and unsaturated carboxylic acid anhydride, (a2) a specific oxetane group-containing unsaturated compound and (a3) an unsaturated compound having a specific ether structure, and [B] a 1,2-quinonediazido compound. COPYRIGHT: (C)2007,JPO&INPIT

Abstract translation: 要解决的问题：为了提供不具有安全性问题的辐射敏感性树脂组合物，作为溶液的灵敏度，分辨率和储存稳定性优异，并且具有能够形成适当图案轮廓的适当的显影余量，甚至 在显影步骤中经过最佳显影时间之后，并提供从组合物形成层间绝缘膜和微透镜的方法。 解决方案：辐射敏感性树脂组合物含有[a]（a1）至少一种选自不饱和羧酸和不饱和羧酸酐中的至少一种的共聚物，（a2）特定的含氧杂环丁烷基的不饱和化合物和（a3 ）具有特定醚结构的不饱和化合物，和[B] 1,2-醌二叠氮化合物。 版权所有（C）2007，JPO＆INPIT

公开(公告)号：JP2007079552A

公开(公告)日：2007-03-29

申请号：JP2006189133

申请日：2006-07-10

Applicant: Jsr Corp ,  Jsr株式会社

Inventor： YONEDA EIJI ,  SAKAKIBARA HIROKAZU ,  NAKAJIMA HIROMITSU ,  NAKAGAWA DAIKI ,  NISHIMURA YUKIO

IPC: G03F7/039 ,  G03F7/004 ,  H01L21/027

CPC classification number: G03F7/0397 ,  G03F7/0045 ,  G03F7/0392 ,  G03F7/2041

Abstract: PROBLEM TO BE SOLVED: To provide a radiation-sensitive resin composition being a resist, which has properties such as excellent sensitivity, a small degree of line edge roughness of patterns, capability of inhibiting pattern collapsing and the like. SOLUTION: The radiation-sensitive resin composition comprises an acid-dissociable group-containing polymer having recurring units of formulas (1-1) and (1-2), an additive of formula (1-3) and an acid generator. In the formula (1-1), R 1 represents methyl or the like and X represents a predetermined polycyclic alicyclic hydrocarbon group or the like. In the formula (1-2), R 1 denotes methyl or the like and Z denotes an acid-dissociable group which can be released by an acid. In the formula (1-3), n denotes an integer of 1-8 and a plurality of symbols A each independently denotes hydroxyl or the like. COPYRIGHT: (C)2007,JPO&INPIT

Abstract translation: 要解决的问题：提供具有敏感性优异，图案线边缘粗糙度小，抑制图案折叠能力等特性的抗蚀剂的感光性树脂组合物。 解决方案：辐射敏感性树脂组合物包含具有式（1-1）和（1-2）的重复单元的酸解离基团的聚合物，式（1-3）的添加剂和酸发生剂 。 式（1-1）中，R“SP”表示甲基等，X表示预定的多环脂肪族烃基等。 式（1-2）中，R 1表示甲基等，Z表示可被酸释放的酸解离基。 在式（1-3）中，n表示1-8的整数，多个符号A各自独立地表示羟基等。 版权所有（C）2007，JPO＆INPIT

公开(公告)号：JP2007041231A

公开(公告)日：2007-02-15

申请号：JP2005224577

申请日：2005-08-02

Applicant: Jsr Corp ,  Jsr株式会社

Inventor： YONEDA EIJI ,  SHIMIZU MAKOTO

IPC: G03F7/039 ,  G03F7/004 ,  H01L21/027

Abstract: PROBLEM TO BE SOLVED: To provide a positive type resin composition excellent in sensitivity, resolution, and line edge roughness. SOLUTION: This composition comprises a radiation-sensitive acid generator, a resin which becomes alkali soluble when its acid dissociative group dissociates, and a compound expressed in general formula (1). In the general formula (1), n is an integer of 0-3, and X - is a sulfonic acid anion not containing fluorine. COPYRIGHT: (C)2007,JPO&INPIT

Abstract translation: 要解决的问题：提供灵敏度，分辨率和线边缘粗糙度优异的正型树脂组合物。 解决方案：该组合物包含辐射敏感的酸产生剂，当其酸解离基解离时变为碱溶性的树脂和通式（1）表示的化合物。 在通式（1）中，n是0-3的整数，X - 是不含氟的磺酸阴离子。 版权所有（C）2007，JPO＆INPIT

公开(公告)号：JP2005156726A

公开(公告)日：2005-06-16

申请号：JP2003392514

申请日：2003-11-21

Applicant: Jsr Corp ,  Jsr株式会社

Inventor： YONEDA EIJI ,  NAKAJIMA HIROMITSU ,  NAKAMURA ATSUSHI ,  O ISAMU

IPC: G03F7/039 ,  C08F2/38 ,  C08F2/44 ,  G03F7/033 ,  H01L21/027

Abstract: PROBLEM TO BE SOLVED: To provide a radiation-sensitive resin composition adaptable to a short-wavelength radiation typified by far UV capable of meeting progress of scale down in an integrated circuit device, having high transparency to radiations and excellent in basic properties as a resist, such as sensitivity, resolution, pattern profile and line edge roughness of a pattern. SOLUTION: The radiation-sensitive resin composition contains an acid-dissociable group-containing polymer containing at least two repeating units having mutually different acid-dissociable groups (polymer A calling for short) and a radiation-sensitive acid generator(acid generator B calling for short), wherein the polymer (A) is obtained by chain transfer type radical polymerization using a chain transfer agent represented by formula (X-1) wherein R a represents a substituted or unsubstituted hydrocarbon group and Z represents a substituted or unsubstituted hetero atom-containing group. COPYRIGHT: (C)2005,JPO&NCIPI

Abstract translation: 要解决的问题：提供一种适用于以远紫外线为代表的能够在集成电路装置中达到缩小进度的短波长辐射的辐射敏感性树脂组合物，具有高的辐射透明性和优异的基本性能 作为抗蚀剂，例如图案的灵敏度，分辨率，图案轮廓和线边缘粗糙度。 解决方案：辐射敏感性树脂组合物含有含酸解离基团的聚合物，其含有至少两个具有相互不同的酸解离基团的重复单元（聚合物A要求较短）和辐射敏感性酸产生剂 B），其中聚合物（A）通过使用由式（X-1）表示的链转移剂的链转移型自由基聚合获得，其中R 表示取代或未取代的烃基 Z表示取代或未取代的含杂原子的基团。 版权所有（C）2005，JPO＆NCIPI

公开(公告)号：JP2005112724A

公开(公告)日：2005-04-28

申请号：JP2003344623

申请日：2003-10-02

Applicant: Jsr Corp ,  Jsr株式会社

Inventor： EHATA SATOSHI ,  YONEDA EIJI ,  O ISAMU

IPC: G03F7/004 ,  C07C22/00 ,  C07C22/02 ,  C07C25/02 ,  C07C25/22 ,  C07C43/225 ,  C07C69/732 ,  C07C69/76 ,  C07C309/19 ,  C07C309/80 ,  C07C381/12 ,  G03F7/038 ,  G03F7/039 ,  H01L21/027

Abstract: PROBLEM TO BE SOLVED: To provide a new acid generator which has good flammability and no problem of its accumulation in a human body, is high in the acidity and boiling point of the acid generated, has an appropriately short diffusion length of the acid in a resist film, and can form a resist pattern having reduced dependency on the sparseness and denseness of a mask pattern and excellent smoothness, a sulfonic acid generated from the acid generator, a sulfonyl halide compound useful as a raw material for synthesizing the acid generator or the like, and a radiation-sensitive resin composition containing the acid generator. SOLUTION: The acid generator has a structure represented by formula (I) (wherein R 1 is a monovalent substituent such as an alkoxycarbonyl group, an alkylsulfonyl group, and an alkoxysulfonyl group; m is 0 or an integer of 1-10; and n is an integer of 1-5). The radiation-sensitive resin composition comprises, in addition to the acid generator, an acid dissociative group-containing resin in the positive type or an alkali-soluble resin and a crosslinking agent in the positive type. COPYRIGHT: (C)2005,JPO&NCIPI

Abstract translation: 要解决的问题：为了提供具有良好的可燃性和在人体内不积聚的问题的新型酸产生剂，产生的酸的酸度和沸点高，具有适当短的扩散长度 并且可以形成对掩模图案的稀疏性和致密性降低的依赖性和优异的平滑性的抗蚀剂图案，由酸产生剂产生的磺酸，用作合成酸的原料的磺酰卤化合物 发电机等，以及含有酸发生剂的辐射敏感性树脂组合物。 解决方案：酸产生剂具有由式（I）表示的结构（其中R 1 是烷氧基羰基，烷基磺酰基和烷氧基磺酰基等一价取代基; m为0 或1-10的整数; n为1-5的整数）。 放射线敏感性树脂组合物除酸产生剂外还包含正极型的酸解离基团的树脂或碱溶性树脂和正型的交联剂。 版权所有（C）2005，JPO＆NCIPI

公开(公告)号：JP2005104956A

公开(公告)日：2005-04-21

申请号：JP2003423516

申请日：2003-12-19

Applicant: Jsr Corp ,  Jsr株式会社

Inventor： YONEDA EIJI ,  NISHIMURA YUKIO ,  O ISAMU

IPC: G03F7/004 ,  C07C381/12 ,  C07D317/72 ,  C07D319/14 ,  C07D333/46 ,  C07D493/04 ,  G03F7/039 ,  H01L21/027

Abstract: PROBLEM TO BE SOLVED: To obtain a radiation sensitive acid-forming agent (for a photoresist) used for a highly sensitive and high resolution radiation sensitive resin composition excellent in preservation stability and pattern forms, an onium salt compound suitable as the radiation sensitive acid-forming agent, and a positive type radiation sensitive resin composition containing the radiation sensitive acid-forming agent. SOLUTION: The radiation sensitive acid-forming agent contains the onium salt the cationic part of which is expressed by formula (1) [wherein, A is I or S; (m) is ≥1 integer; (n) is ≥0 integer; (x) is 1-15 integer; Ar 1 , Ar 2 are each a monovalent (substituted) aromatic hydrocarbon group, or the like; and R is a (substituted) alkyl, a monovalent (substituted) alicyclic hydrocarbon group, or the like]. The onium salt compound consists of a compound the cationic part of which is expressed by formula (1) and R in formula (1) is a (substituted) alicyclic hydrocarbon group. The positive type radiation sensitive resin composition contains (A) the radiation sensitive acid-forming agent and (B) a resin containing a leaving group by an acid. COPYRIGHT: (C)2005,JPO&NCIPI

Abstract translation: 要解决的问题：为了获得用于保存稳定性和图案形式优异的高灵敏度和高分辨率辐射敏感性树脂组合物的辐射敏感性酸形成剂（用于光致抗蚀剂），适合作为辐射的鎓盐化合物 敏感性成酸剂和含有辐射敏感性酸形成剂的正型辐射敏感性树脂组合物。 解决方案：辐射敏感的酸形成剂含有阳离子部分由式（1）表示的鎓盐[其中，A为I或S; （m）≥1整数; （n）≥0整数; （x）为1-15整数; Ar 1 ，Ar 2 分别为一价（取代）芳烃基等; 并且R是（取代的）烷基，一价（取代的）脂环族烃基等）。 鎓盐化合物由阳离子部分由式（1）表示的化合物和式（1）中的R是一个（取代的）脂环族烃基组成。 正型辐射敏感性树脂组合物含有（A）辐射敏感性酸形成剂和（B）含酸离去基团的树脂。 版权所有（C）2005，JPO＆NCIPI

公开(公告)号：JP2004240170A

公开(公告)日：2004-08-26

申请号：JP2003029273

申请日：2003-02-06

Applicant: Jsr Corp ,  Jsr株式会社

Inventor： YONEDA EIJI ,  O ISAMU

IPC: G03F7/004 ,  C09K3/00 ,  G03F7/039 ,  H01L21/027

Abstract: PROBLEM TO BE SOLVED: To provide a new radiation-sensitive acid generator having excellent storage stability, high transparency for radiation and high sensitivity, and to provide a positive radiation-sensitive resin composition containing the above radiation-sensitive acid generator and being excellent in the storage stability, sensitivity, resolution, pattern profile and so on. SOLUTION: The radiation-sensitive acid generator contains at least one kind of sulfonyloxyimide compound having such a structure that an aromatic hydrocarbon group having an electron donating group and/or a heterocyclic group having an electron donating group is bonded to the skeleton having a sulfonyloxyimide group and that the electron donating group is bonded in the moiety of the electron donating atom with the aromatic ring in the aromatic hydrocarbon group or with the heterocycle in the heterocyclic group. The positive radiation-sensitive resin composition contains the above radiation-sensitive acid generator and an acid dissociating group-containing resin. COPYRIGHT: (C)2004,JPO&NCIPI