公开(公告)号：JP2009222816A

公开(公告)日：2009-10-01

申请号：JP2008064989

申请日：2008-03-13

Applicant: Jsr Corp ,  Jsr株式会社

Inventor： ICHINOHE DAIGO ,  KAJITA TORU

IPC: G03F7/075 ,  C08F8/30 ,  C08F290/12 ,  G02F1/1335 ,  G02F1/1339 ,  G03F7/033 ,  G03F7/40 ,  H01L21/027

Abstract: PROBLEM TO BE SOLVED: To provide a radiation-sensitive resin composition from which a protective film excellent in heat resistance and adhesion on a color filter is formed, and a radiation-sensitive resin composition from which a spacer excellent in adhesion and excellent also in various performances such as elastic recovery property is formed. SOLUTION: The radiation-sensitive resin composition contains [A] a polymer of an unsaturated compound containing (a1) at least one compound selected from the group consisting of unsaturated carboxylic acids and unsaturated carboxylic acid anhydrides, [B] a calix arene compound having a specific structure, and [C] a radiation-sensitive polymerization initiator. COPYRIGHT: (C)2010,JPO&INPIT

Abstract translation: 要解决的问题：提供一种辐射敏感性树脂组合物，其中形成了耐滤性和滤色片上的粘附性优异的保护膜，以及粘合性优异的间隔物优异的辐射敏感性树脂组合物 也在各种表现如弹性恢复性能的形成。 解决方案：辐射敏感性树脂组合物含有[A]含有（a1）至少一种选自不饱和羧酸和不饱和羧酸酐的化合物的不饱和化合物的聚合物，[B]杯状芳烃 具有特定结构的化合物，[C]辐射敏感性聚合引发剂。 版权所有（C）2010，JPO＆INPIT

公开(公告)号：JP2009204865A

公开(公告)日：2009-09-10

申请号：JP2008046792

申请日：2008-02-27

Applicant: Jsr Corp ,  Jsr株式会社

Inventor： ICHINOHE DAIGO ,  KAJITA TORU

IPC: G03F7/023 ,  G02B1/04 ,  G02B3/00 ,  G03F7/075 ,  H01L21/027

Abstract: PROBLEM TO BE SOLVED: To provide a radiation sensitive resin composition having high radiation sensitivity, having a developing margin of forming a satisfactory pattern shape even when exceeding the optimum developing time in a developing process, and can form easily a pattern-like thin film excellent in tightness. SOLUTION: The radiation sensitive resin composition contains (A) a copolymer of (a1) at least one selected from the group comprising an unsaturated carboxylic acid and an unsaturated carboxylic anhydride, and (a2) at least kind selected from the group comprising an unsaturated compound having an oxiranyl group, and an unsaturated compound having an oxetanyl group, (B) a 1,2-quinone diazide compound, and (C) a calixarene compound of specific structure. COPYRIGHT: (C)2009,JPO&INPIT

Abstract translation: 要解决的问题：为了提供具有高辐射敏感性的辐射敏感性树脂组合物，即使在显影过程中超过最佳显影时间时也具有形成令人满意的图案形状的显影余量，并且可以容易地形成图案样 薄膜性能优良。 解决方案：辐射敏感性树脂组合物含有（A）（a1）选自不饱和羧酸和不饱和羧酸酐的至少一种的共聚物，和（a2）选自包含 具有环氧乙烷基的不饱和化合物和具有氧杂环丁烷基的不饱和化合物，（B）1,2-醌二叠氮化合物和（C）特定结构的杯芳烃化合物。 版权所有（C）2009，JPO＆INPIT

公开(公告)号：JP2009203344A

公开(公告)日：2009-09-10

申请号：JP2008046787

申请日：2008-02-27

Applicant: Jsr Corp ,  Jsr株式会社

Inventor： ICHINOHE DAIGO ,  KAJITA TORU

IPC: C08G59/40 ,  C08F290/14 ,  C08G8/22 ,  C08G59/08 ,  C08L33/14 ,  G02B5/20 ,  G02F1/1335

Abstract: PROBLEM TO BE SOLVED: To provide a thermosetting composition, which is suitably used to produce a color filter protective film high in surface hardness and excellent in various resistances such as transparency, heat resistance, and adhesiveness. SOLUTION: The thermosetting resin composition comprises: [A] a polymer having a repeating unit derived from a polymerizable unsaturated compound having an oxiranyl group or oxetanyl group; and [B] a calyx compound having a specific structure. The thermosetting resin composition can be suitably used to produce the color filter protective film. COPYRIGHT: (C)2009,JPO&INPIT

Abstract translation: 要解决的问题：提供一种热固性组合物，其适合用于制备表面硬度高，透明性，耐热性和粘合性等各种电阻优异的滤色器保护膜。 解决方案：热固性树脂组合物包含：[A]具有衍生自具有环氧乙烷基或氧杂环丁烷基的可聚合不饱和化合物的重复单元的聚合物; 和[B]具有特定结构的花萼化合物。 热固性树脂组合物可以适用于制造滤色器保护膜。 版权所有（C）2009，JPO＆INPIT

公开(公告)号：JP2009179648A

公开(公告)日：2009-08-13

申请号：JP2008017317

申请日：2008-01-29

Applicant: Jsr Corp ,  Jsr株式会社 ,  Univ Kanagawa ,  学校法人神奈川大学

Inventor： NISHIKUBO TATATOMI ,  KUDO HIROTO ,  SOGA TETSUNORI ,  ISHIKAWA MASAYOSHI ,  KAJITA TORU

IPC: C08F24/00 ,  C08F8/00 ,  C08F20/28 ,  C08J7/00

Abstract: PROBLEM TO BE SOLVED: To provide a refractive index variable composition in which the refractive index of the material is varied by an easy method and a refractive index difference can be varied in a desired positive or negative direction, and to provide a method for forming a refractive index pattern from the composition. SOLUTION: The refractive index variable composition contains (A) a polymer having a bicyclo ortho-ester structure. The method for forming a refractive index pattern comprises irradiating a part of a molded product of the refractive index variable composition with radiation, or irradiating a part of a molded product of the refractive index variable composition with radiation and then heating the product. COPYRIGHT: (C)2009,JPO&INPIT

Abstract translation: 要解决的问题：为了提供折射率可变组合物，其中材料的折射率通过简单的方法改变，并且折射率差可以在期望的正或负方向上变化，并且提供一种方法 用于从组合物形成折射率图案。 折射率可变组合物含有（A）具有双环原位酯结构的聚合物。 形成折射率图案的方法包括用辐射照射折射率可变组合物的成型产品的一部分，或者用辐射照射折射率可变组合物的模制产品的一部分，然后加热产品。 版权所有（C）2009，JPO＆INPIT

公开(公告)号：JP2009075284A

公开(公告)日：2009-04-09

申请号：JP2007243287

申请日：2007-09-20

Applicant: Jsr Corp ,  Jsr株式会社

Inventor： ICHINOHE DAIGO ,  KAJITA TORU

IPC: G03F7/029 ,  G02F1/1339 ,  G03F7/032 ,  G03F7/40

Abstract: PROBLEM TO BE SOLVED: To provide a radiation-sensitive resin composition obtaining an adequate residual film ratio even under ≤1,000 J/m 2 of exposure energy, and capable of forming a spacer or a protective film for a display device excellent in adhesion and rubbing resistance and further having a high elastic recovery rate even at a post-bake temperature of SOLUTION: The radiation-sensitive resin composition comprises [A] a copolymer of (a1) at least one selected from the group consisting of unsaturated carboxylic acids and unsaturated carboxylic acid anhydrides and (a2) an unsaturated compound other than the component (a1), [B] a polymerizable compound having an ethylenically unsaturated bond, [C] a radiation-sensitive radical generator, and [D] a specific onium-fluorinated alkylfluorophosphate. COPYRIGHT: (C)2009,JPO&INPIT

Abstract translation: 要解决的问题：为了提供即使在≤1,000J/ m 2的曝光能量下获得足够的残余膜比，并且能够形成间隔物或保护性的辐射敏感性树脂组合物 用于具有优异的粘合性和耐摩擦性的显示装置的膜，并且即使在后烘烤温度<200℃下也具有高的弹性回复率。 解决方案：辐射敏感性树脂组合物包含[A]（a1）选自不饱和羧酸和不饱和羧酸酐中的至少一种的共聚物和（a2）不同于组分（ a1），[B]具有烯键式不饱和键的可聚合化合物，[C]辐射敏感性自由基发生剂和[D]特定的氟化氟化烷基氟磷酸酯。 版权所有（C）2009，JPO＆INPIT

公开(公告)号：JP2008075026A

公开(公告)日：2008-04-03

申请号：JP2006257893

申请日：2006-09-22

Applicant: Jsr Corp ,  Jsr株式会社

Inventor： YOSHII KIMIHIKO ,  KAJITA TORU ,  AKIIKE TOSHIYUKI

IPC: C08L63/00 ,  C08G59/20 ,  C08G59/70 ,  C08K5/07 ,  C08K5/15 ,  C09J11/06 ,  C09J171/02 ,  C09J183/06 ,  C09K3/10 ,  H01L23/29 ,  H01L23/31 ,  H01L33/62

CPC classification number: H01L2224/32245 ,  H01L2224/48091 ,  H01L2224/73265 ,  H01L2924/00014

Abstract: PROBLEM TO BE SOLVED: To provide a thermosetting resin composition which is excellent in UV ray durability, heat resistance, and adhesiveness, and is not peeled also after a reflow treatment. SOLUTION: This thermosetting resin composition comprises (A) a polyorganosiloxane having an epoxy equivalent of ≤1,600 g/mole, (B) a metal chelate compound, and (C) an oxetane ring-having compound. COPYRIGHT: (C)2008,JPO&INPIT

Abstract translation: 要解决的问题：提供一种热可塑性组合物，其耐紫外线耐久性，耐热性和粘合性优异，并且在回流处理后也不会剥离。 解决方案：该热固性树脂组合物包含（A）环氧当量≤1,600g/ mol的聚有机硅氧烷，（B）金属螯合化合物和（C）含氧杂环丁烷环化合物。 版权所有（C）2008，JPO＆INPIT

公开(公告)号：JP2007128061A

公开(公告)日：2007-05-24

申请号：JP2006273677

申请日：2006-10-05

Applicant: Jsr Corp ,  Jsr株式会社

Inventor： KAJITA TORU ,  KAWAMOTO TATSUYOSHI ,  MATSUMOTO TATSU

IPC: G03F7/023 ,  C08K5/28 ,  C08L101/08 ,  G02B1/04 ,  G02B3/00 ,  H01L21/027

Abstract: PROBLEM TO BE SOLVED: To provide a radiation-sensitive resin composition which has high radiation sensitivity and sufficiently high resolution, excels in adhesion to a substrate, a base or an upper layer, suppresses generation of a sublimate during baking in a film forming process, ensures a large development margin, and can be suitably used for forming an interlayer insulation film or microlenses. SOLUTION: The radiation-sensitive resin composition contains (A) a polymer obtained by living radical polymerization in the presence of a specific thiocarbonyl thio compound and having carboxyl groups, wherein the ratio (Mw/Mn) between weight average molecular weight (Mw) and number average molecular weight (Mn) in terms of polystyrene measured by gel permeation chromatography is ≤1.7, and (B) a 1,2-quinonediazido compound. COPYRIGHT: (C)2007,JPO&INPIT

Abstract translation: 要解决的问题：为了提供具有高辐射敏感性和足够高分辨率的辐射敏感性树脂组合物，在与基材，基底或上层的粘附性方面优异，抑制了在膜的烘烤过程中产生升华 确保大的开发余量，并且可以适当地用于形成层间绝缘膜或微透镜。 解决方案：辐射敏感性树脂组合物含有（A）在特定硫代羰基硫代化合物存在下具有羧基的活性自由基聚合获得的聚合物，其中重均分子量（Mw / Mw）和通过凝胶渗透色谱法测定的聚苯乙烯换算的数均分子量（Mn）≤1.7，（B）1,2-醌二叠氮化合物。 版权所有（C）2007，JPO＆INPIT

公开(公告)号：JP2007025645A

公开(公告)日：2007-02-01

申请号：JP2006155917

申请日：2006-06-05

Applicant: Jsr Corp ,  Jsr株式会社

Inventor： MANO HIROYUKI ,  ICHINOHE DAIGO ,  NISHIO HISAHIRO ,  KAJITA TORU

IPC: G03F7/004 ,  G02F1/1339

Abstract: PROBLEM TO BE SOLVED: To provide a photosensitive resin composition solution which has good storage stability of the resin, requires a short time of a reduced-pressure drying step, makes a slit nozzle less liable to dry, gives a good film surface, and is suitable for a slit die coater process. SOLUTION: The photosensitive resin composition uses a mixed solvent containing 2-20 wt.% of a compound represented by formula (1) as a solvent, wherein R 1 -R 5 are each independently H or a 1-6C alkyl and n is an integer of 1-6, and the composition is applied on a substrate by a slit die coater. COPYRIGHT: (C)2007,JPO&INPIT

Abstract translation: 要解决的问题：为了提供具有良好的树脂储存稳定性的感光性树脂组合物溶液，需要短时间的减压干燥步骤，使得狭缝喷嘴不容易干燥，得到良好的膜表面 ，适用于狭缝模涂布工艺。 光敏树脂组合物使用含有2-20重量％的由式（1）表示的化合物作为溶剂的混合溶剂，其中R 1 -R / SP>各自独立地为H或1-6C烷基，n为1-6的整数，并且通过狭缝式模涂机将组合物施加在基材上。 版权所有（C）2007，JPO＆INPIT

公开(公告)号：JP2006276847A

公开(公告)日：2006-10-12

申请号：JP2006054651

申请日：2006-03-01

Applicant: Jsr Corp ,  Jsr株式会社

Inventor： ICHINOHE DAIGO ,  KAJITA TORU

IPC: G03F7/027 ,  C08F8/30 ,  C08F290/04 ,  G03F7/031

Abstract: PROBLEM TO BE SOLVED: To provide a radiation sensitive resin composition having high sensitivity and high resolution, giving a satisfactory spacer shape even under exposure energy of about ≤1,200 J/m 2 , and capable of forming spacers for a liquid crystal display element excellent in elastic recovery, rubbing resistance, adhesion to a substrate, heat resistance, etc. SOLUTION: The radiation sensitive resin composition contains (A) a polymer obtained by reacting a copolymer (α) of an unsaturated carboxylic acid and/or an unsaturated carboxylic acid anhydride, a hydroxyl group-containing unsaturated compound and another unsaturated compound with a free isocyanato group-containing unsaturated compound (β) obtained by reacting a diisocyanate compound represented by the formula (1): OCN-W-NCO with a hydroxyl group-containing polymerizable unsaturated compound. In the formula (1), W denotes a divalent group represented by one of formulae (i)-(ix) (where n is an integer of 1-12). COPYRIGHT: (C)2007,JPO&INPIT

Abstract translation: 要解决的问题：为了提供具有高灵敏度和高分辨率的辐射敏感性树脂组合物，即使在约≤1,200J/ m 2 SP / 2的曝光能量下也能获得令人满意的间隔物形状，并且能够 形成用于液晶显示元件的间隔物，其弹性恢复性，耐摩擦性，与基材的粘合性，耐热性等。解决方案：该辐射敏感性树脂组合物含有（A）通过使共聚物（α） 的不饱和羧酸和/或不饱和羧酸酐，含羟基的不饱和化合物和另一种不饱和化合物与通过使式（1）表示的二异氰酸酯化合物反应得到的游离异氰酸酯基的不饱和化合物（β） ：具有含羟基的可聚合不饱和化合物的OCN-W-NCO。 在式（1）中，W表示由式（i） - （ix）（其中n是1-12的整数）表示的二价基团。 版权所有（C）2007，JPO＆INPIT

公开(公告)号：JP2006259454A

公开(公告)日：2006-09-28

申请号：JP2005078802

申请日：2005-03-18

Applicant: Jsr Corp ,  Jsr株式会社

Inventor： ICHINOHE DAIGO ,  HAMAGUCHI HITOSHI ,  KAJITA TORU

IPC: G02F1/1339 ,  G02F1/1337 ,  G03F7/033

Abstract: PROBLEM TO BE SOLVED: To provide a radiation-sensitive resin composition preferably used for simultaneously forming a projection and a spacer of a vertical alignment liquid crystal display element. SOLUTION: The radiation-sensitive resin composition for simultaneously forming the projection and the spacer of the vertical alignment liquid crystal display element contains: [A] (a1) unsaturated carboxylic acid and/or unsaturated carboxylic acid anhydride, (a2) an unsaturated compound denoted by formula (1), and (a3) a copolymer obtained to copolymerize the other unsaturated compound except for components of (a1) to (a2) (in the formula (1), R 1 is a hydrogen atom or a methyl group, R 2 , R 3 and R 4 can be independently shown in a hydrogen atom, a hydroxyl group or 1-6C alkyl group or alkoxy group, and n is an integer of 0 to 6 ); [B] a polymerization unsaturated compound; and [C] a radiation-sensitive polymerization initiator. COPYRIGHT: (C)2006,JPO&NCIPI

Abstract translation: 要解决的问题：提供优选用于同时形成垂直取向液晶显示元件的突起和间隔物的辐射敏感性树脂组合物。 解决方案：用于同时形成突起的放射线敏感性树脂组合物和垂直取向液晶显示元件的间隔物包含：[A]（a1）不饱和羧酸和/或不饱和羧酸酐，（a2） 式（1）表示的不饱和化合物和（a3）除（a1）〜（a2）的成分（式（1）中的R SB 1 是氢原子或甲基，R SB 2，R SB 3和R SB 4可以独立地表示在氢原子中，羟基 或1-6C烷基或烷氧基，n为0-6的整数）; [B]聚合不饱和化合物; 和[C]辐射敏感聚合引发剂。 版权所有（C）2006，JPO＆NCIPI