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    Method for alignment and lithographic apparatus
    111.
    发明专利
    Method for alignment and lithographic apparatus 有权
    对准和平铺设备的方法

    公开(公告)号：JP2012028815A

    公开(公告)日：2012-02-09

    申请号：JP2011235644

    申请日：2011-10-27

    Applicant: Asml Netherlands Bv ,  エーエスエムエル ネザーランズ ビー.ブイ.

    Inventor： VAN DER WIJST MARC WILHELMUS MARIA

    IPC: H01L21/027 ,  G01B11/00 ,  G03F9/00

    CPC classification number: G03B27/58 ,  G03F9/7092

    Abstract: PROBLEM TO BE SOLVED: To provide a method and an apparatus for reducing noise in an original signal which contains a linear time-varying signal and the noise.SOLUTION: In the method and apparatus, the original signal is differentiated to obtain a differentiated original signal. The differentiated original signal is Fourier transformed to obtain power spectral densities of the differentiated original signal. A noise frequency is detected in a power spectral density spectrum of the obtained power spectral densities of the differentiated original signal. For the noise frequency, a corresponding noise component is determined. The noise component is subtracted from the original signal to obtain a noise-reduced original signal.

    Abstract translation: 解决的问题：提供一种降低包含线性时变信号和噪声的原始信号中的噪声的方法和装置。 解决方案：在该方法和装置中，对原始信号进行微分以获得分化的原始信号。 差分原始信号被傅立叶变换以获得差分原始信号的功率谱密度。 在获得的差分原始信号的功率谱密度的功率谱密度谱中检测噪声频率。 对于噪声频率，确定相应的噪声分量。 从原始信号中减去噪声分量，以获得噪声降低的原始信号。 版权所有（C）2012，JPO＆INPIT

    Method of adjusting speed and/or routing of table movement plan and lithographic apparatus
    112.
    发明专利
    Method of adjusting speed and/or routing of table movement plan and lithographic apparatus 有权
    调整表运动计划和平面设备速度和/或路线的方法

    公开(公告)号：JP2012015512A

    公开(公告)日：2012-01-19

    申请号：JP2011141655

    申请日：2011-06-27

    Applicant: Asml Netherlands Bv ,  エーエスエムエル ネザーランズ ビー.ブイ.

    Inventor： CEDRIC DESIREE FLAUSTRA ,  KEMPER NICOLAAS R ,  NORBERTUS JOSEPHUS MARTINUS VAN DE NIEUWELAAR ,  DIRK DE BRICE ,  HUA LEE ,  MARINUS JOCHEMSEN

    IPC: H01L21/027

    CPC classification number: G03F7/70775 ,  G03F7/70341 ,  G03F7/70725

    Abstract: PROBLEM TO BE SOLVED: To reduce or eliminate the risk of imaging defect.SOLUTION: There is provided a method of adjusting speed and/or routing of a part of a movement plan of a table under an immersion fluid supply system of a lithographic apparatus. The method includes splitting the movement plan of the table into a plurality of discrete movements; determining a risk of a bubble of a size greater than a certain size being present in immersion fluid through which a patterned beam of the lithographic apparatus will pass during a certain discrete movement by determining whether the immersion fluid supply system passes over a position at which immersion fluid leaked from the immersion fluid supply system is present; and adjusting the speed and/or routing of a part of the movement plan corresponding to (i) a discrete movement earlier than a discrete movement for which the risk of a bubble is determined, and/or (ii) a discrete movement for which the risk of a bubble is determined.

    Abstract translation: 要解决的问题：减少或消除成像缺陷的风险。 解决方案：提供了一种调节在光刻设备的浸没液体供应系统下的工作台的运动计划的一部分的速度和/或路线的方法。 该方法包括将表的运动计划分成多个离散运动; 确定存在于浸没流体中的尺寸大于一定尺寸的气泡的风险，通过该浸入流体中的光刻设备的图案化束将在特定离散运动期间通过该气泡通过确定浸没流体供应系统是否经过浸没的位置 存在从浸没液体供应系统泄漏的液体; 以及调整所述运动计划的一部分的速度和/或路线，其对应于（i）比确定气泡风险的离散运动更早的离散运动，和/或（ii）离散运动， 确定泡沫的风险。 版权所有（C）2012，JPO＆INPIT

    Lithography device
    113.
    发明专利
    Lithography device 有权
    LITHOGRAPHY设备

    公开(公告)号：JP2012009859A

    公开(公告)日：2012-01-12

    申请号：JP2011136364

    申请日：2011-06-20

    Applicant: Asml Netherlands Bv ,  エーエスエムエル ネザーランズ ビー.ブイ.

    Inventor： DOEDE FRANCE KUIPER ,  HANS BUTLER

    IPC: H01L21/027 ,  G03F7/20 ,  H01L21/68

    CPC classification number: G03F7/70775 ,  G03F7/70716 ,  G03F7/7085

    Abstract: PROBLEM TO BE SOLVED: To provide an improved lithography device, especially, a lithography device whose overlay and imaging performance are improved.SOLUTION: The lithography device includes an illumination system for adjusting a radiant beam, a support configured to support a patterning device capable of forming a pattern-imparted radiant beam by imparting a pattern to a section of the radiant beam, a substrate table configured to hold a substrate, a stage system for positioning the substrate table relative to a reference structure, a projection system for projecting the pattern-imparted radiant beam on a target part of the substrate, and an optical measurement system having a sensor part and an optical part. The optical part optically interacts with the pattern-imparted radiant beam, and transmits a result of the interaction as an output to the sensor part. The optical part is provided to the substrate table, and the sensor part is provided to the stage system or reference structure.

    Abstract translation: 要解决的问题：提供一种改进的光刻装置，特别是提高其覆盖和成像性能的光刻装置。 解决方案：光刻设备包括用于调节辐射束的照明系统，被配置为支撑能够通过向辐射束的部分赋予图案而形成图案赋予的辐射束的图案形成装置的支撑件，衬底台 被配置为保持基板，用于相对于参考结构定位所述基板台的台系统，用于将所述图案赋予的辐射束投影在所述基板的目标部分上的投影系统，以及具有传感器部分和 光学部件。 光学部件与图案赋予的辐射束光学相互作用，并将相互作用的结果作为输出传递到传感器部分。 将光学部件设置在基板台上，将传感器部件设置在平台系统或基准结构上。 版权所有（C）2012，JPO＆INPIT

    Stage device and lithography device with such stage device
    114.
    发明专利
    Stage device and lithography device with such stage device 有权
    具有这种装置的阶段装置和平移装置

    公开(公告)号：JP2012009853A

    公开(公告)日：2012-01-12

    申请号：JP2011123061

    申请日：2011-06-01

    Applicant: Asml Netherlands Bv ,  エーエスエムエル ネザーランズ ビー.ブイ.

    Inventor： JOHANNES ANTONIUS GERARDUS AKERMAN ,  THEODORUS PETRUS MARIA CADEE ,  GEORGE WILHELM JOHANNES CRYCEN

    IPC: H01L21/027 ,  H01L21/68

    CPC classification number: G03F7/70725 ,  G03F7/70991

    Abstract: PROBLEM TO BE SOLVED: To transmit clock data to a movable stage by radio, and to at least partially compensate for dependency of propagation delay on a length of a propagation path at this time.SOLUTION: A stage device for positioning an object includes a table for holding the object and a support structure for supporting the table, wherein the table can be displaced relative to the support structure, the support structure includes at least one of a first data clock and a second data clock, and the table includes at least the other of the first data clock and second data clock and further includes a circuit for synchronizing the first data clock and second data clock with each other. The circuit includes a transmitter and a receiver, and the transmitter is configured to transmit clock signal data from the first data clock to the second data clock by radio, and further includes a synchronizing circuit for synchronizing the second data clock with the first data clock based upon the clock signal data transmitted by radio and received by the receiver.

    Abstract translation: 要解决的问题：通过无线电将时钟数据发送到可移动台，并且至少部分地补偿此时传播延迟对传播路径的长度的依赖性。 解决方案：用于定位物体的台装置包括用于保持物体的台和用于支撑台的支撑结构，其中台可相对于支撑结构移位，支撑结构包括第一 数据时钟和第二数据时钟，并且该表至少包括第一数据时钟和第二数据时钟中的另一个，并且还包括用于使第一数据时钟和第二数据时钟彼此同步的电路。 该电路包括发射机和接收机，并且发射机被配置为通过无线电将时钟信号数据从第一数据时钟传送到第二数据时钟，并且还包括同步电路，用于使第二数据时钟与第一数据时钟基于 通过无线电发送并由接收机接收的时钟信号数据。 版权所有（C）2012，JPO＆INPIT

    Reducing fast ions in plasma radiation source
    115.
    发明专利
    Reducing fast ions in plasma radiation source 有权
    降低等离子体辐射源中的快速离子

    公开(公告)号：JP2011258990A

    公开(公告)日：2011-12-22

    申请号：JP2011204659

    申请日：2011-09-20

    Applicant: Asml Netherlands Bv ,  エーエスエムエル ネザーランズ ビー.ブイ.

    Inventor： VLADIMIR VITALEVICH IVANOV ,  BANINE VADIM YEVGENYEVICH ,  KOSHELEV KONSTANTIN

    IPC: H01L21/027 ,  H05G2/00

    CPC classification number: H05G2/001 ,  B82Y10/00 ,  G03F7/70033 ,  G03F7/70916

    Abstract: PROBLEM TO BE SOLVED: To reduce fast ions in a plasma radiation source.SOLUTION: The radiation source includes a first activation source to direct a first energy pulse onto a first spot in the radiation source near discharge space to create a main plasma channel which triggers discharge. The radiation source also has a second activation source to direct a second energy pulse onto a second spot in the radiation source near the discharge space to create an additional plasma channel. By directing the second energy pulse during the same discharge, a shortcut of a main plasma current is realized, which can reduce an amount of fast ions to be produced.

    Abstract translation: 要解决的问题：减少等离子体辐射源中的快速离子。 解决方案：辐射源包括第一激活源，以将第一能量脉冲引导到放电空间附近的辐射源中的第一点上，以产生触发放电的主等离子体通道。 辐射源还具有第二激活源，以将第二能量脉冲引导到放电空间附近的辐射源中的第二点上，以产生附加的等离子体通道。 通过在相同放电期间引导第二能量脉冲，实现了主等离子体电流的捷径，这可以减少要产生的快离子的量。 版权所有（C）2012，JPO＆INPIT

    Lithographic apparatus, device manufacturing method, and substrate exchanging method
    120.
    发明专利
    Lithographic apparatus, device manufacturing method, and substrate exchanging method 有权
    光刻设备，器件制造方法和基板交换方法

    公开(公告)号：JP2011216883A

    公开(公告)日：2011-10-27

    申请号：JP2011062035

    申请日：2011-03-22

    Applicant: Asml Netherlands Bv ,  エーエスエムエル ネザーランズ ビー.ブイ.

    Inventor： CADEE THEODORUS PETRUS MARIA ,  JAN JAAP KUIT ,  HUBERTUS MULKENS JOHANNES C ,  ZAAL KOEN JACOBUS J M

    IPC: H01L21/027 ,  H01L21/68

    CPC classification number: G03B21/58 ,  G03F7/70733

    Abstract: PROBLEM TO BE SOLVED: To provide a lithographic apparatus with an increased throughput.SOLUTION: A lithographic apparatus includes an illumination system configured to condition a radiation beam; a support constructed to support a patterning device, the patterning device being capable of imparting the radiation beam with a pattern in its cross-section to form a patterned radiation beam; at least three substrate tables that are each constructed to hold a substrate; and a projection system configured to project the patterned radiation beam onto a target portion of the substrate, wherein the substrate tables are moveable in a common moving area extending substantially in a plane perpendicular to the patterned radiation beam, the moving area comprising at least three working locations of which at least one working location is arranged for exposure of the substrate to the patterned radiation beam and at least one working location is arranged for non-exposure purposes.

    Abstract translation: 要解决的问题：为光刻设备提供增加的生产量。解决方案：光刻设备包括配置成调节辐射束的照明系统; 构造成支撑图案形成装置的支撑件，所述图案形成装置能够在其横截面中赋予辐射束图案以形成图案化的辐射束; 至少三个衬底台，其被构造成保持衬底; 以及投影系统，被配置为将所述图案化的辐射束投影到所述基板的目标部分上，其中所述基板台可在基本上在垂直于所述图案化的辐射束的平面中延伸的公共移动区域中移动，所述移动区域包括至少三个工作 布置其至少一个工作位置的位置用于将衬底暴露于图案化的辐射束，并且至少一个工作位置被布置用于非曝光目的。

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