公开(公告)号：JP2010282228A

公开(公告)日：2010-12-16

申请号：JP2010186049

申请日：2010-08-23

Applicant: Jsr Corp ,  Jsr株式会社

Inventor： NAGAI TOMOKI ,  KOBAYASHI HIDEKAZU ,  SHIMOKAWA TSUTOMU

IPC: G03F7/039 ,  G03F7/004 ,  G03F7/075 ,  H01L21/027

Abstract: PROBLEM TO BE SOLVED: To provide a radiation-sensitive composition which is excellent in resolution, environmental durability and storage stability as a chemically amplified resist sensitive to active radiation, for example, ultraviolet radiation such as g-line or i-line, far-ultraviolet radiation typified by KrF excimer laser, ArF excimer laser or F2 excimer laser, and EUV (Extreme Ultra Violet), or electron beam or the like. SOLUTION: This radiation-sensitive resin composition contains a compound in which at least one hydrogen atom bonded to a nitrogen atom of a compound having such a structure that at least one hydrogen atom is bonded to the nitrogen atom is protected with a specified group. COPYRIGHT: (C)2011,JPO&INPIT

Abstract translation: 要解决的问题：提供一种对作为对活性辐射敏感的化学放大抗蚀剂的分辨率，环境耐久性和储存稳定性优异的辐射敏感性组合物，例如紫外线如g线或i线 由KrF准分子激光，ArF准分子激光或F2准分子激光，EUV（Extreme Ultra Violet）或电子束等代表的远紫外线辐射。 解决方案：该辐射敏感性树脂组合物包含其中至少一个与具有至少一个氢原子键合到氮原子上的结构的化合物的氮原子键合的至少一个氢原子被保护， 组。 版权所有（C）2011，JPO＆INPIT

公开(公告)号：JP2009198963A

公开(公告)日：2009-09-03

申请号：JP2008042797

申请日：2008-02-25

Applicant: Jsr Corp ,  Jsr株式会社

Inventor： MARUYAMA KEN ,  SHIMIZU DAISUKE ,  KAI TOSHIYUKI ,  SHIMOKAWA TSUTOMU

IPC: G03F7/039 ,  C08G8/28 ,  G03F7/004 ,  H01L21/027

Abstract: PROBLEM TO BE SOLVED: To provide a radiation-sensitive composition suitable for use in the formation of a chemically amplified positive resist film. SOLUTION: The radiation-sensitive composition includes a compound represented by formula (1) and a radiation-sensitive acid generator. In the formula (1), R denotes a monovalent acid-dissociable group or the like, X denotes a methylene group or the like, and Y denotes a 1-10C substituted or unsubstituted alkyl group. COPYRIGHT: (C)2009,JPO&INPIT

Abstract translation: 要解决的问题：提供适合用于形成化学放大正性抗蚀剂膜的辐射敏感组合物。 解决方案：辐射敏感性组合物包括由式（1）表示的化合物和辐射敏感性酸产生剂。 在式（1）中，R表示一价酸解离基等，X表示亚甲基等，Y表示1-10C取代或未取代的烷基。 版权所有（C）2009，JPO＆INPIT

公开(公告)号：JP2009197094A

公开(公告)日：2009-09-03

申请号：JP2008038863

申请日：2008-02-20

Applicant: Jsr Corp ,  Jsr株式会社

Inventor： MARUYAMA KEN ,  SHIMIZU DAISUKE ,  KAI TOSHIYUKI ,  SHIMOKAWA TSUTOMU

IPC: C08G8/32 ,  C07C67/343 ,  C07C69/734 ,  C08G8/00

Abstract: PROBLEM TO BE SOLVED: To provide a method for producing a resorcinol derivative having a low metal ion content.
SOLUTION: The method for producing the resorcinol derivative includes a step of obtaining a solution by dissolving a resorcinol derivative in an organic solvent or a mixed solution containing the organic solvent, and a step of reducing the metal ion content of the solution by bringing the solution into contact with an aqueous solution of an organic acid at least once.
COPYRIGHT: (C)2009,JPO&INPIT

Abstract translation: 待解决的问题：提供一种具有低金属离子含量的间苯二酚衍生物的制备方法。 解决方案：间苯二酚衍生物的制造方法包括通过将间苯二酚衍生物溶解在有机溶剂或含有有机溶剂的混合溶液中而获得溶液的步骤，以及通过以下方法降低溶液的金属离子含量的步骤： 使溶液与有机酸的水溶液接触至少一次。 版权所有（C）2009，JPO＆INPIT

公开(公告)号：JP2009175746A

公开(公告)日：2009-08-06

申请号：JP2009069558

申请日：2009-03-23

Applicant: Jsr Corp ,  Jsr株式会社

Inventor： NISHIMURA ISAO ,  FUJIWARA KOICHI ,  KOBAYASHI HIDEKAZU ,  SHIMOKAWA TSUTOMU ,  NAKAMURA ATSUSHI ,  YONEDA EIJI ,  O ISAMU

IPC: G03F7/039 ,  C08F4/00 ,  C08F4/26 ,  C08F4/80 ,  G03F7/004 ,  H01L21/027

CPC classification number: G03F7/039 ,  G03F7/0046 ,  G03F7/0397 ,  G03F7/2006

Abstract: PROBLEM TO BE SOLVED: To provide a radiation-sensitive resin composition for an ArF excimer laser which excels in basic physical properties as a resist, such as transparency, sensitivity, resolution, dry etching resistance and pattern profile, in particular, excels in solubility in a resist solvent, and reduces the roughness on a pattern side wall after development. SOLUTION: The radiation-sensitive resin composition comprises an acid-dissociable group-containing resin containing a repeating unit represented by formula (1) and having a ratio of weight average molecular weight to number average molecular weight (Mw/Mn) of smaller than 1.5, and a radiation-sensitive acid generator, wherein R 1 s each independently represent hydrogen, a methyl group, a trifluoromethyl group or a hydroxymethyl group; R 2 s each independently represent a 4-20C monovalent alicyclic hydrocarbon group or its derivative or a 1-4C linear or branched alkyl group, and at least one of R 2 s is the alicyclic hydrocarbon group or its derivative, or any two of R 2 s bond to each other to form a 4-20C divalent alicyclic hydrocarbon group or its derivative together with the carbon atom to which they bond, and the remaining R 2 represents a 1-4C linear or branched alkyl group or a 4-20C monovalent alicyclic hydrocarbon group or its derivative. COPYRIGHT: (C)2009,JPO&INPIT

Abstract translation: 要解决的问题：提供一种用于ArF准分子激光器的辐射敏感性树脂组合物，其具有优异的基础物理性能，如抗敏剂，如透明度，灵敏度，分辨率，耐干蚀刻性和图案轮廓，特别优异 在抗蚀剂溶剂中的溶解度，并且在显影后降低图案侧壁上的粗糙度。 解决方案：辐射敏感性树脂组合物包含含酸分解基团的树脂，其含有由式（1）表示的重复单元，其重均分子量与数均分子量（Mw / Mn）的比例 小于1.5的辐射敏感性酸产生剂，其中R SP 1各自独立地表示氢，甲基，三氟甲基或羟甲基; R“SP”2各自独立地表示4-20C一价脂环族烃基或其衍生物或1-4C直链或支链烷基，并且R“SP 2”中的至少一个 是脂环族烃基或其衍生物，或R 2 SP 2中的任意两个彼此键合形成4-20C二价脂环族烃基或其衍生物与它们所键合的碳原子一起形成， 而剩余的R“SP”2代表1-4C直链或支链烷基或4-20C一价脂环族烃基或其衍生物。 版权所有（C）2009，JPO＆INPIT

公开(公告)号：JP2009155228A

公开(公告)日：2009-07-16

申请号：JP2007332324

申请日：2007-12-25

Applicant: Jsr Corp ,  Jsr株式会社

Inventor： MARUYAMA KEN ,  SHIMIZU DAISUKE ,  KAI TOSHIYUKI ,  SHIMOKAWA TSUTOMU

IPC: C07C39/17 ,  C07C37/20

Abstract: PROBLEM TO BE SOLVED: To provide a phenolic compound that is useful as a raw material for a base material component contained in a radiosensitive composition, highly soluble to organic solvents, and readily producible in large quantities.
SOLUTION: The phenolic compound is obtained by subjecting a resorcinol compound and a bisaldehyde compound to a condensation reaction, and includes, for example, a phenolic compound represented by formula (3A) (wherein X represents a 2-8C alkylene group that may contain a substituent, and Y represents a 1-10C alkyl group that may contain a substituent).
COPYRIGHT: (C)2009,JPO&INPIT

Abstract translation: 要解决的问题：提供一种酚类化合物，其可用作包含在无机组合物中的基材成分的原料，其高度可溶于有机溶剂，并且易于大量生产。 酚类化合物通过使间苯二酚化合物和双醛化合物进行缩合反应而得到，并且包括例如由式（3A）表示的酚类化合物（其中X表示2-8C亚烷基，其中X表示2-8C亚烷基， 可以含有取代基，Y表示可以含有取代基的1-10C烷基。 版权所有（C）2009，JPO＆INPIT

公开(公告)号：JP2007045787A

公开(公告)日：2007-02-22

申请号：JP2005234131

申请日：2005-08-12

Applicant: Central Glass Co Ltd ,  Jsr Corp ,  Jsr株式会社 ,  セントラル硝子株式会社

Inventor： KOMATA TAKEO ,  MATSUURA MAKOTO ,  MATSUNAGA YOSHI ,  KOBAYASHI SATORU ,  SHIMOKAWA TSUTOMU ,  KUSUMOTO SHIRO ,  HARA HIROMICHI ,  SUGIURA MAKOTO ,  KAWAKAMI MINEKI

IPC: C07C311/09 ,  C07C303/40 ,  C08F20/38

Abstract: PROBLEM TO BE SOLVED: To produce/provide objective specific α-substituted acrylic acid norbornanyls from a substituted norbornene by passing through a substituted norbornanyl alcohol in a high selectivity and yield, and a polymer containing the same as a monomer. SOLUTION: This substituted norbornanyl alcohol is expressed by general formula [4] [wherein, any one of R 2 , R 3 is RfSO 2 NHCH 2 - group (wherein, Rf is a 1-4C perfluoroalkyl) and rest is H]. COPYRIGHT: (C)2007,JPO&INPIT

Abstract translation: 待解决的问题：通过以高选择性和收率的方式通过取代的降冰片烷醇，以及含有与单体相同的聚合物，从取代的降冰片烯生产/提供目标特异的α-取代的丙烯酸降冰片烷基。

解决方案：该取代的降冰片烷基醇由通式[4]表示[其中，R 2 SP 3，R 3 SP 3中的任一个为R f SO 2， （其中，Rf为1-4C全氟烷基），其余为H]。 版权所有（C）2007，JPO＆INPIT

公开(公告)号：JP2006117621A

公开(公告)日：2006-05-11

申请号：JP2004310099

申请日：2004-10-25

Applicant: Jsr Corp ,  Jsr株式会社

Inventor： NISHIMURA ISAO ,  SHIMOKAWA TSUTOMU ,  YAMAHARA NOBORU ,  SUGITA HIKARI ,  TANAKA MASATO ,  EGAWA HIROMI ,  SUGIE NORIHIKO

IPC: C07F7/18 ,  C08G77/04 ,  G03F7/039 ,  G03F7/075 ,  H01L21/027

Abstract: PROBLEM TO BE SOLVED: To provide a radiation sensitive resin composition useful as a chemical amplifying type resist having especially high sensitivity, excellent in pattern formation and depth of focus (DOF), a polysiloxane useful as a resin component as the radiation sensitive resin composition and a silane compound useful as the synthetic raw material, etc., of the polysiloxane. SOLUTION: This silane compound is expressed by formula (I) [wherein, R is an alkoxy or the like; R 1 is H, F, a lower alkyl or the like; A is a divalent (substituted) hydrocarbon group; R 2 is a monovalent dissociative acid group]. The polysiloxane has a structural unit expressed by formula (1), or has the above structural unit and a structural unit expressed by formula (2). The radiation sensitive resin composition contains (A) the polysiloxane having the structural unit expressed by formula (1) and the structural unit expressed by formula (2), and (B) a radiation sensitive acid-forming agent. COPYRIGHT: (C)2006,JPO&NCIPI

Abstract translation: 要解决的问题：为了提供用作具有特别高的灵敏度，图案形成和焦深（DOF）优异的化学放大型抗蚀剂的辐射敏感性树脂组合物，可用作树脂组分的聚硅氧烷作为辐射敏感性 树脂组合物和可用作聚硅氧烷的合成原料等的硅烷化合物。 解决方案：该硅烷化合物由式（I）表示[其中，R是烷氧基等; R 1是H，F，低级烷基等; A是二价（取代）烃基; R 2 是一价离解酸基]。 聚硅氧烷具有由式（1）表示的结构单元，或具有上述结构单元和由式（2）表示的结构单元。 辐射敏感性树脂组合物含有（A）具有由式（1）表示的结构单元的聚硅氧烷和由式（2）表示的结构单元，和（B）辐射敏感性的酸形成剂。 版权所有（C）2006，JPO＆NCIPI

公开(公告)号：JP2005309141A

公开(公告)日：2005-11-04

申请号：JP2004126805

申请日：2004-04-22

Applicant: Jsr Corp ,  Jsr株式会社

Inventor： NISHIMURA ISAO ,  SHIMOKAWA TSUTOMU ,  EGAWA HIROMI

IPC: G03F7/075 ,  C08G77/14 ,  G03F7/039 ,  G03F7/11 ,  G03F7/38 ,  G03F7/40 ,  H01L21/027

Abstract: PROBLEM TO BE SOLVED: To provide a resist pattern forming method by which control of the dimensions of a resist pattern can be accurately performed and LER can be diminished. SOLUTION: The resist pattern forming method includes the steps of applying a radiation to predetermined positions of a radiation sensitive resin composition on a substrate with the radiation sensitive resin composition containing a siloxane resin having a structural unit represented by formula (I) and a weight average molecular weight, in terms of polystyrene, by GPC of 500-1,000,000 and a radiation sensitive acid generator; developing the composition with an alkaline developer; applying a radiation; and carrying out heating. In the formula (I), R denotes a 1-20C linear or branched hydrocarbon group whose valence is n+1 or a 3-20C alicyclic hydrocarbon group whose valence is n+1, the linear or branched hydrocarbon group and the alicyclic hydrocarbon group each may be substituted; X denotes a group containing an acid-dissociable group; and n is 1 or 2. COPYRIGHT: (C)2006,JPO&NCIPI

Abstract translation: 要解决的问题：提供抗蚀剂图案形成方法，通过该方法可以精确地执行抗蚀剂图案的尺寸的控制，并且可以减少LER。 解决方案：抗蚀剂图案形成方法包括以下步骤：将具有由式（I）表示的结构单元的硅氧烷树脂的辐射敏感性树脂组合物和辐射敏感性树脂组合物的预定位置施加到基板上的预定位置， 重均分子量（以聚苯乙烯换算），GPC为500-1,000,000，辐射敏感酸产生剂; 用碱性显影剂显影组合物; 施加辐射; 并进行加热。 在式（I）中，R表示1-20价的n + 1的直链或支链烃基或价数为n + 1的3-20C脂环族烃基，直链或支链烃基和脂环族烃基 每个可以被替代; X表示含有酸解离基团的基团。 并且n为1或2.版权所有（C）2006，JPO＆NCIPI

公开(公告)号：JP2005134456A

公开(公告)日：2005-05-26

申请号：JP2003367470

申请日：2003-10-28

Applicant: Jsr Corp ,  Jsr株式会社

Inventor： NISHIMURA ISAO ,  SHIMOKAWA TSUTOMU ,  SUGIURA MAKOTO

IPC: G03F7/039 ,  C08F22/20 ,  C08G2/00 ,  C08G77/14 ,  C08K5/00 ,  C08K5/42 ,  C08L83/06 ,  G03F7/075 ,  H01L21/027

CPC classification number: C08L83/06 ,  C08K5/0025 ,  C08K5/42 ,  C08L2666/04

Abstract: PROBLEM TO BE SOLVED: To provide a radiation-sensitive resin composition having high transparency at a wavelength of ≤193 nm, in particular, showing excellent LER (line edge roughness).
SOLUTION: The radiation-sensitive resin composition contains: (A) a resin having a structural unit expressed by formula (I); (B) a resin having a repeating unit expressed by general formula (II); and (C) a radiation-sensitive acid generating agent. In formula (I), R
1 represents a bivalent (alicyclic) hydrocarbon group which may be substituted; R
2 represents a lower alkyl group or a monovalent (substituted) alicyclic hydrocarbon group; or any two of R
2 are coupled to form a bivalent (substituted) alicyclic hydrocarbon group and the rest R
2 represents a lower alkyl group or a monovalent (substituted) alicyclic hydrocarbon group. In formula (II), R
3 represents H, F or a trifluoromethyl group; R
4 represents a (substituted) hydrocarbon group having the valence of (c+1), a (substituted) alicyclic hydrocarbon group or a (substituted) aromatic group; R
5 represents H or a monovalent acid dissociable group; a and b represent 0 to 3 satisfying (a+b)≥1; and c represents 1 to 3.
COPYRIGHT: (C)2005,JPO&NCIPI

Abstract translation: 要解决的问题：提供在波长≤193nm具有高透明度的辐射敏感性树脂组合物，特别是显示优异的LER（线边缘粗糙度）。 解决方案：辐射敏感性树脂组合物含有：（A）具有由式（I）表示的结构单元的树脂; （B）具有由通式（II）表示的重复单元的树脂; 和（C）辐射敏感性酸产生剂。 在式（I）中，R“SP”表示可被取代的二价（脂环族）烃基; R 2表示低级烷基或一价（取代）脂环族烃基; 或R 2 SP 2中的任何两个连接形成二价（取代的）脂环族烃基，其余的R 2代表低级烷基或一价（取代的）脂环烃 组。 在式（II）中，R“3”表示H，F或三氟甲基; R（S）=（C + 1），（取代的）脂环烃基或（取代的）芳族基团的（取代的）烃基; R 5表示H或一价酸解离基团; a和b表示满足（a + b）≥1的0〜3; （C）2005，JPO＆NCIPI

公开(公告)号：JP2005031564A

公开(公告)日：2005-02-03

申请号：JP2003273290

申请日：2003-07-11

Applicant: JSR CORP ,  SEMICONDUCTOR LEADING EDGE TEC

Inventor： CHIBA TAKASHI ,  SHIMOKAWA TSUTOMU ,  HAYASHI AKIHIRO ,  ITANI TOSHIRO ,  MITSUYOSHI YASURO ,  FURUKAWA TAKAMITSU

IPC: G03F7/039 ,  C08G77/24 ,  G03F7/004 ,  H01L21/027

Abstract: PROBLEM TO BE SOLVED: To provide a radiation-sensitive resin composition which effectively responds to a radiation of ≤200 nm wavelength, has high transparency to the radiation, is free of pattern falling, and has excellent resolution. SOLUTION: The radiation-sensitive resin composition contains (A) a polysiloxane which is alkali-insoluble or slightly alkali-soluble resin having a structural unit represented by formula (I) and becomes readily alkali-soluble when a t-butoxycarbonyl group in the structural unit dissociates, (B) a radiation-sensitive acid generator and (C) a fluorine-containing solvent. COPYRIGHT: (C)2005,JPO&NCIPI