公开(公告)号：JP2004002252A

公开(公告)日：2004-01-08

申请号：JP2002189133

申请日：2002-06-28

Applicant: Jsr Corp ,  Jsr株式会社

Inventor： EHATA SATOSHI ,  YONEDA EIJI ,  NAGAI TOMOKI ,  TONERI TATSUYA ,  O ISAMU

IPC: G03F7/004 ,  C07C309/06 ,  C07C309/17 ,  C07C309/80 ,  C07C309/84 ,  C09K3/00 ,  G03F7/038 ,  G03F7/039 ,  H01L21/027

Abstract: PROBLEM TO BE SOLVED: To provide a new acid-producing agent which is suitable as a radiation-sensitive acid-producing agent or thermally acid-producing agent, has relatively high combustibility, does not have a problem on accumulativeness in human bodies, produces an acid having sufficiently high acidity and boiling point, has a suitably short diffusion length in a resist coating film, and hardly has mask pattern dependency, to provide positive and negative type radiation-sensitive resin compositions containing the acid-producing agent, and the like. SOLUTION: This acid-producing agent comprises a compound having a structure represented by formula (I) (R is a monovalent organic group having a fluorine content of ≤50 wt. %, nitro group, cyano group, or H; Z 1 and Z 2 are each F or a perfluoroalkyl group). The positive type radiation-sensitive resin composition comprises the above-described acid-producing agent, and an acid-dissociating group-containing resin or an alkali-soluble resin and an alkali solubility controller. The negative type radiation-sensitive resin composition comprises the above-described acid-producing agent, an alkali-soluble resin and a cross-linking agent. COPYRIGHT: (C)2004,JPO