STRAHLUNGSEMITTIERENDES HALBLEITERBAUTEIL
    111.
    发明公开
    STRAHLUNGSEMITTIERENDES HALBLEITERBAUTEIL 审中-公开
    辐射半导体部件

    公开(公告)号:EP2465139A1

    公开(公告)日:2012-06-20

    申请号:EP10740230.7

    申请日:2010-08-05

    Abstract: A radiation-emitting semiconductor component is provided, comprising: a light-emitting diode chip (1) having at least two emission regions (2a, 2b) that can be operated independently of each other, at least two differently designed conversion elements (31, 32), wherein during operation of the light-emitting diode chips (1) each of the emission regions (2a, 2b) is provided for generating electromagnetic primary radiation, each emission region (2a, 2b) has an emission surface (21, 22) by which at least part of the primary radiation is decoupled from the light-emitting diode chip (1), the conversion elements (31, 32) are provided for absorbing at least part of the primary radiation and for re-emitting secondary radiation, the differently designed conversion elements (31, 32) are disposed downstream of different emission surfaces, and an electric resistance element (4), which is connected in series or parallel to at least one of the emission regions (2a, 2b).

    VERFAHREN ZUR HERSTELLUNG EINES OPTOELEKTRONISCHEN HALBLEITERCHIPS UND OPTOELEKTRONISCHER HALBLEITERCHIP
    118.
    发明公开
    VERFAHREN ZUR HERSTELLUNG EINES OPTOELEKTRONISCHEN HALBLEITERCHIPS UND OPTOELEKTRONISCHER HALBLEITERCHIP 有权
    方法用于制造光电子半导体芯片和光电子半导体芯片

    公开(公告)号:EP2583305A1

    公开(公告)日:2013-04-24

    申请号:EP11726078.6

    申请日:2011-05-26

    Abstract: The invention relates to a method for producing an organic opto-electronic semiconductor chip, comprising the following steps: - providing an n-conducting layer (2), - arranging a p-conducting layer (4) on the n-conducting layer (2), - arranging a metal layer sequence (5) on the p-conducting layer (4), - arranging a mask (6) on the side of the metal layer sequence (5) which faces away from the p-conducting layer (4), - spot-ablating the metal layer sequence (5) and exposing the p-conducting layer (4) using the mask (6), and - spot-neutralizing or removing the exposed regions (4a) of the p-conducting layer (4) up to the n-conducting layer (2) using the mask (6), wherein - the metal layer sequence (5) comprises at least one mirror layer (51) and a barrier layer (52), and - the mirror layer (52) of the metal layer sequence (5) faces the p-conducting layer (4).

    Abstract translation: 一种用于在光电子半导体芯片制造方法的说明,其包括以下步骤:提供一n导通层(2),排列p型导电层(4)的n导通层(2),排列的金属层序列上 (5)p导通层(4),布置掩模上(6)在所述金属层序列的做侧(5)所有的远离p导通层(4),在去除金属层序列的地方 (5)和露出使用掩模(6)(4)p型导电层,和在地方中和或去除p导电层(4)只要n导通层的未覆盖区域(4A)( 2)使用掩模(6),worin金属层序列(5)包括至少一个反射镜层(51)和阻挡层(52)和金属层序列的镜层(51)(5)面 p导通层(4)。

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