Abstract:
A method for inspecting defects inside a rod-shaped transparent object by using a scanning beam of parallel light rays directed onto a rod-shaped transparent object orthogonally to the longitudinal axis of the object so that an inspection plane comprises an object's cross-section. The scanning beam is detected at an opposite side of the rod-shaped object that is interposed to intercept the parallel rays of the scanning beam. The electric output signal from the detector is processed to produce a first light intensity profile in a first scan direction, the light intensity profile comprising a shadow region delimited by first and second shadow edges, which is indicative of the outside diameter of the object across the inspection plane. The method comprises analysing the first light intensity profile to determine the presence or absence of a peak of positive intensity within the shadow region and, if an intensity peak is determined to be present, to determine the presence or absence of a region of depressed intensity within the intensity peak. If, as a result of analysing, an intensity peak within the shadow region is determined to be absent or a region of depressed intensity is determined to be present within the intensity peak, the presence of at least one structural defect within the object's cross-section is identified. In the preferred embodiments, the rod-shaped transparent object is a glass core rod for the production of a transmission optical fibre.
Abstract:
A surface inspection system, as well as related components and methods, are provided. The surface inspection system includes a beam source subsystem, a beam scanning subsystem, a workpiece movement subsystem, an optical collection and detection subsystem, and a processing subsystem. The optical collection and detection system features, in the front quartersphere, a light channel assembly for collecting light reflected from the surface of the workpiece, and a front collector and wing collectors for collecting light scattered from the surface, to greatly improve the measurement capabilities of the system. The light channel assembly has a switchable edge exclusion mask and a reflected light detection system for improved detection of the reflected light.
Abstract:
An optical detection apparatus for measuring detection chambers of a specimen cartridge includes: a light source unit including light sources which are arranged along a scan line on which the detection chambers are aligned to be scanned, and configured to emit light rays to the detection chambers; and an optical detector configured to detect the light rays having passed through corresponding detection chambers disposed on the scan line. The light sources include main wavelength light sources which are used for measuring samples disposed in the detection chambers, and a sub-wavelength light source which is used for correcting a measuring error.
Abstract:
A first lens configured to convert light from the objective lens into parallel light includes a concave lens part having a concave curved face in a center portion of a flat face, and a convex lens part having a convex curved face around a flat face. Further, the first lens includes first and second regions configured to diverge light through the flat face and the concave curved face and a third region configured to collect light through the convex curved face and the concave curved face. When the sample is on a sample table and sealed in a two-dimensional electrophoresis substrate, light totally reflected by a side surface of the objective lens enters the second region. In contrast, when the sample is directly on the sample table, the light enters the third region.
Abstract:
Various metrology systems and methods are provided. One metrology system includes a light source configured to produce a diffraction-limited light beam, an apodizer configured to shape the light beam in the entrance pupil of illumination optics, and optical elements configured to direct the diffraction-limited light beam from the apodizer to an illumination spot on a grating target on a wafer and to collect scattered light from the grating target. The metrology system further includes a field stop and a detector configured to detect the scattered light that passes through the field stop. In addition, the metrology system includes a computer system configured to determine a characteristic of the grating target using output of the detector.
Abstract:
A method for analyzing displays is described. A processing device receives a first scanned image of a first display and determines a first characteristic of the first display by analyzing the first scanned image. The processing device also receives a second scanned image of a second display and determines a second characteristic of the second display by analyzing the second scanned image. The processing device compares the first characteristic and the second characteristic to determine a third characteristic of the second display.
Abstract:
Example methods and apparatus for obtaining suspended particle information are disclosed. A disclosed example method includes emitting light from a light source, dividing the light source into a first path and a second path, and directing the first path to a first container comprising a plurality of particles in a suspension material. The example method also includes directing the second path to a second container containing a suspension material devoid of particles, retrieving a first transmission value of the first path through the first container, and retrieving a second transmission value of the second path through the second container. The example method further includes directing the first and second paths to the second and first containers, respectively, retrieving a third transmission value of the first path a through the second container, retrieving a fourth transmission value of the second path through the first container, and calculating a ratio of the first and second transmission values to the third and fourth transmission values to determine an indication of transmissivity for a given wavelength.
Abstract:
Multi-spectral defect inspection for 3D wafers is provided. One system configured to detect defects in one or more structures formed on a wafer includes an illumination subsystem configured to direct light in discrete spectral bands to the one or more structures formed on the wafer. At least some of the discrete spectral bands are in the near infrared (NIR) wavelength range. Each of the discrete spectral bands has a bandpass that is less than 100 nm. The system also includes a detection subsystem configured to generate output responsive to light in the discrete spectral bands reflected from the one or more structures. In addition, the system includes a computer subsystem configured to detect defects in the one or more structures on the wafer using the output.
Abstract:
The present disclosure is directed to an illumination system. The illumination system may include a base member rotatable about a rotation axis and a plurality of mirrors disposed on an outer surface of the base member along a perimeter of the base member. The mirrors may be oriented at a predetermined angle. The illumination system also includes at least two illumination sources. Each of the mirrors of the first plurality of mirrors is configured to receive radiation from the first illumination source at a first portion of each mirror at a first time. The mirror is configured to reflect the radiation to an optical path. Each of the mirrors is further configured to receive radiation from the second illumination source at a second portion of the mirror at a second time. The mirrors reflect the radiation from the second illumination source to the common optical path.
Abstract:
Example methods and apparatus for obtaining suspended particle information are disclosed. A disclosed example method includes emitting light from a light source, dividing the light source into a first path and a second path, and directing the first path to a first container comprising a plurality of particles in a suspension material. The example method also includes directing the second path to a second container containing a suspension material devoid of particles, retrieving a first transmission value of the first path through the first container, and retrieving a second transmission value of the second path through the second container. The example method further includes directing the first and second paths to the second and first containers, respectively, retrieving a third transmission value of the first path a through the second container, retrieving a fourth transmission value of the second path through the first container, and calculating a ratio of the first and second transmission values to the third and fourth transmission values to determine an indication of transmissivity for a given wavelength.