公开(公告)号：KR1020040051220A

公开(公告)日：2004-06-18

申请号：KR1020020079112

申请日：2002-12-12

Applicant: 삼성전자주식회사

Inventor： 조재걸

IPC: H01L21/22

CPC classification number: H01L21/67309

Abstract: PURPOSE: A wafer boat for sintering a porous silica thin film is provided to be capable of preventing the particles of the first thin film of a wafer from falling to the second thin film of the wafer without the use of a dummy wafer. CONSTITUTION: A wafer boat for sintering a porous silica thin film is provided with the first plate for supporting a substrate having the porous silica thin film, and the second plate prolonged from the peripheral portion of the first plate to the diameter direction. The wafer boat further includes a support plate(420) between the first and second plate. At this time, the support plate has a protrusion(423) for preventing the deviation of the substrate. Preferably, a plurality of support plates are regularly stacked with each other.

Abstract translation: 目的：提供用于烧结多孔二氧化硅薄膜的晶片舟皿，以能够防止晶片的第一薄膜的颗粒落在晶片的第二薄膜上而不使用虚设晶片。 构成：用于烧结多孔二氧化硅薄膜的晶片舟皿设置有用于支撑具有多孔二氧化硅薄膜的基板的第一板，并且第二板从第一板的周边部分延伸到直径方向。 晶片舟皿还包括在第一和第二板之间的支撑板（420）。 此时，支撑板具有用于防止基板偏移的突起（423）。 优选地，多个支撑板彼此规则地堆叠。