公开(公告)号：JPH01208729A

公开(公告)日：1989-08-22

申请号：JP3331188

申请日：1988-02-16

Applicant: SEIKO EPSON CORP

Inventor： KARASAWA YASUSHI

IPC: G11B5/84

Abstract: PURPOSE:To easily enhance the adhesion between a glass substrate subjected to mirror finishing and a magnetic film and to increase the memory density of a magnetic memory medium by forming a silane coupling film as an intermediate film between the glass substrate and the magnetic film by a dip coating method into a hydrous silane coupling treating liquid. CONSTITUTION:The silane coupling film is formed as the intermediate film between the glass substrate subjected to the mirror finishing and the magnetic film by the dip coating method into the hydrous silane coupling treatment liquid. The dip coating method using a solvent which has a quick drying property at room temp. is optimum in order to uniformly and easily form the thin silane coupling film. The hydrolytic polymn. of the thin coupling film is effected and the securely bonded film is obtd. by incorporating water into the silane coupling treating liquid. This film has the effect of improving the adhesiveness between the glass substrate and a plating film. The adhesiveness between the glass film and the magnetic film is thereby improved and the stable low floating height of a magnetic head is assured. The higher-density recording is thus attained.

公开(公告)号：JPS63134668A

公开(公告)日：1988-06-07

申请号：JP28159686

申请日：1986-11-26

Applicant: SEIKO EPSON CORP

Inventor： KARASAWA YASUSHI ,  ONO YOSHIHIRO

IPC: C23C18/34 ,  C23C18/50 ,  G11B5/858

Abstract: PURPOSE:To improve the corrosion resistance of a deposited magnetic medium and to make it possible to form a magnetic layer enabling high density recording and reproducing by simultaneously adding a rhenium salt and a zinc salt to a magnetic plating soln. contg. a cobalt salt, a complex forming compd., a reducing agent and a pH adjusting agent. CONSTITUTION:A rhenium salt and a zinc salt are simultaneously added to an aq. soln. contg. a cobalt salt or a cobalt slat and a nickel salt, a compd. forming a complex with the metallic salts, e.g., tartaric acid, a reducing agent for the metallic salts and a pH adjusting agent to prepare a magnetic electroless plating soln. When the plating soln. is used, a formed magnetic layer has improved resistance to corrosion by pure water, hydrochloric acid and sulfuric acid, an increased S-N ratio and other effect.

公开(公告)号：JPS6398826A

公开(公告)日：1988-04-30

申请号：JP24380586

申请日：1986-10-14

Applicant: SEIKO EPSON CORP

Inventor： KARASAWA YASUSHI

IPC: G11B5/66 ,  G11B5/64 ,  G11B5/706 ,  G11B5/708 ,  G11B5/738 ,  G11B5/82

Abstract: PURPOSE:To orient the axis of easy magnetization of a magnetic metal by electroless plating in a line recording direction by providing an Ni-Zn-P layer contg. a specific ratio of Zn on a substrate and forming ruggedness having specific max. roughness on the surface thereof. CONSTITUTION:The Ni-Zn-P layer contg. >=3wt% Zn is provided on the circular nonmagnetic substrate subjected to mirror finishing and the fine ruggedness having 0.08-0.20mum max. roughness (Rmax) is formed on the surface thereof. A magnetic layer is formed by an electroless plating method on the rugged surface. The orientation of the axis of easy magnetization of the magnetic metal is no longer admitted if the above-mentioned Rmax is below 0.08mum and the head no longer floats if the Rmax exceeds 0.20mum. The axis of easy magnetization of the magnetic metal by the electroless plating is oriented in the line recording direction according to the above-mentioned constitution and, therefore, the medium having high reproduction output is obtd.

公开(公告)号：JPS62222422A

公开(公告)日：1987-09-30

申请号：JP6524486

申请日：1986-03-24

Applicant: SEIKO EPSON CORP

Inventor： KARASAWA YASUSHI

IPC: G11B5/66 ,  G11B5/64 ,  G11B5/73 ,  G11B5/738

Abstract: PURPOSE:To improve the surface roughness of a substrate and to improve the SN ratio in the stage of recording and reproducing by interposing an Ni-W-P film contg. 5-20wt% W and >=5wt% P between the substrate and magnetic layer to =5wt% P is interposed to

公开(公告)号：JPS6278722A

公开(公告)日：1987-04-11

申请号：JP21822885

申请日：1985-10-01

Applicant: SEIKO EPSON CORP

Inventor： KARASAWA YASUSHI

IPC: C23C18/30 ,  C23C18/16 ,  C23C18/31 ,  C23C18/34 ,  G11B5/858

Abstract: PURPOSE:To eliminate deposition to a jig and to permit the use of the common jig in an activation treatment stage and magnetic plating stage by immersing a nonmagnetic substrate and the jig for supporting said substrate into a strong alkaline palladium soln. heated to 40-70 deg.C then subjecting the jig to electroless magnetic plating. CONSTITUTION:The nonmagnetic substrate is immersed into the strong alkaline palladium soln. which has weak powder to adsorb metallic palladium and is heated to 40-70 deg.C; thereafter the substrate is subjected to magnetic plating. The adsorption reaction of palladium to the nonmagnetic substrate delays considerably and the characteristics of the magnetic film changes if the activation treatment in made of =70 deg.C.