System and method for high speed FOD detection

    公开(公告)号:US09839946B2

    公开(公告)日:2017-12-12

    申请号:US14614198

    申请日:2015-02-04

    Abstract: A system for the detection of foreign object debris material on a surface of a composite part being manufactured. A platform is configured to move over the surface. A thermal excitation source is fixed to the platform and configured to direct infrared radiation across the surface. An infrared camera is also fixed to the platform and configured to scan the surface as the platform moves over the surface to detect and output a signal proportional to infrared radiation emitted by the surface and/or by any foreign object debris material on the surface in response to the infrared radiation from the excitation source. A controller is coupled to the excitation source and to the infrared camera and is configured to compare the signal from the infrared camera with a first predetermined threshold signal to detect if any foreign object debris material is located on the surface.

    Panel inspection apparatus and method

    公开(公告)号:US09810640B2

    公开(公告)日:2017-11-07

    申请号:US15006976

    申请日:2016-01-26

    Abstract: A panel inspection apparatus is provided. The panel inspection apparatus has a support platform, a delivery platform and a panel inspection assembly. The delivery platform is disposed on the support platform, and the delivery platform has a push module for delivering the panel. The panel inspection assembly includes a plurality of light source modules and a plurality of image-taking modules corresponding to the light source modules. The light source modules include a front light source, a first horizontal light source, and a back light source. The image-taking modules include a front light image-taking module, a first horizontal light image-taking module, and a back light image-taking module. The push module delivers the panel across the support platform so that a plurality of light beams emitted from the light source modules can scan the panel to finish the panel inspection process.

    SYSTEM AND METHOD FOR DETERMINING WEAR OF A WORN SURFACE
    126.
    发明申请
    SYSTEM AND METHOD FOR DETERMINING WEAR OF A WORN SURFACE 有权
    用于确定WORN表面的磨损的系统和方法

    公开(公告)号:US20160103050A1

    公开(公告)日:2016-04-14

    申请号:US14510330

    申请日:2014-10-09

    Abstract: A method of determining wear of a worn surface of a machine component includes providing a scanning device at a distance from the worn surface. The method also includes moving at least one of the scanning device and the worn surface relative to the other and generating a set of data points via the scanning device. Each data point of the set of data points is indicative of a depth of a corresponding point on the worn surface relative to a reference plane. The method further includes determining a maximum depth of the worn surface based on the set of data points and comparing the maximum depth to a reference value to determine a next step in a remanufacturing process of the machine component.

    Abstract translation: 确定机器部件的磨损表面的磨损的方法包括提供距磨损表面一定距离的扫描装置。 该方法还包括相对于另一扫描装置和磨损表面中的至少一个移动并经由扫描装置产生一组数据点。 数据点集合中的每个数据点表示磨损表面上相对于参考平面的对应点的深度。 该方法还包括基于该组数据点确定磨损表面的最大深度,并将最大深度与参考值进行比较,以确定机器部件的再制造过程中的下一步骤。

    Surface scanning inspection system with independently adjustable scan pitch
    128.
    发明授权
    Surface scanning inspection system with independently adjustable scan pitch 有权
    表面扫描检测系统具有独立可调的扫描间距

    公开(公告)号:US09116132B2

    公开(公告)日:2015-08-25

    申请号:US14532989

    申请日:2014-11-04

    Abstract: A surface scanning wafer inspection system with independently adjustable scan pitch and associated methods of operation are presented. The scan pitch may be adjusted independently from an illumination area on the surface of a wafer. In some embodiments, scan pitch is adjusted while the illumination area remains constant. For example, defect sensitivity is adjusted by adjusting the rate of translation of a wafer relative to the rate of rotation of the wafer without additional optical adjustments. In some examples, the scan pitch is adjusted to achieve a desired defect sensitivity over an entire wafer. In other examples, the scan pitch is adjusted during wafer inspection to optimize defect sensitivity and throughput. In other examples, the scan pitch is adjusted to maximize defect sensitivity within the damage limit of a wafer under inspection.

    Abstract translation: 提出了具有独立可调的扫描间距和相关操作方法的表面扫描晶片检查系统。 可以独立于晶片表面上的照明区域来调整扫描间距。 在一些实施例中,在照明区域保持恒定的同时调整扫描间距。 例如,通过调整晶片相对于晶片的旋转速率的平移速率来调整缺陷灵敏度,而无需额外的光学调整。 在一些示例中,调整扫描间距以在整个晶片上实现期望的缺陷灵敏度。 在其他示例中,在晶片检查期间调整扫描间距以优化缺陷灵敏度和产量。 在其他示例中,调整扫描间距以使在检查的晶片的损伤极限内的缺陷灵敏度最大化。

    Optical unit, fluorescence detection device, and fluorescence detection method
    129.
    发明授权
    Optical unit, fluorescence detection device, and fluorescence detection method 有权
    光学单元,荧光检测装置和荧光检测方法

    公开(公告)号:US09006687B2

    公开(公告)日:2015-04-14

    申请号:US14378674

    申请日:2013-02-20

    Inventor: Yukio Watanabe

    Abstract: A first lens configured to convert light from the objective lens into parallel light includes a concave lens part having a concave curved face in a center portion of a flat face, and a convex lens part having a convex curved face around a flat face. Further, the first lens includes first and second regions configured to diverge light through the flat face and the concave curved face and a third region configured to collect light through the convex curved face and the concave curved face. When the sample is on a sample table and sealed in a two-dimensional electrophoresis substrate, light totally reflected by a side surface of the objective lens enters the second region. In contrast, when the sample is directly on the sample table, the light enters the third region.

    Abstract translation: 第一透镜被配置为将来自物镜的光转换为平行光,包括在平面的中心部分具有凹曲面的凹透镜部分和在平坦表面周围具有凸曲面的凸透镜部分。 此外,第一透镜包括被配置为使光通过平面和凹曲面发散的第一和第二区域和被配置为通过凸曲面和凹曲面收集光的第三区域。 当样品在样品台上并密封在二维电泳基质中时,由物镜的侧表面全反射的光进入第二区域。 相反,当样品直接在样品台上时,光进入第三区域。

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