Abstract:
A method and apparatus for controlling signal transmission is provided. The method includes determining whether a signal to noise ratio (SNR) between a first base station and a signal receiving node is less than a threshold, and controlling the first base station and a second base station to cooperatively transmit a signal to the signal receiving node in response to the SNR being less than the threshold. Further, the second base station is located in an adjacent cell to a cell containing the first base station.
Abstract:
The present invention discloses an apparatus and method for disinfecting an object in a batch, continuous, or mixed mode. The apparatus according to the present invention comprises a bath to/from which water is flowed in/drained out; and at least one ultraviolet ray (UV) lamp unit assembly mounted in the bath, each UV lamp unit assembly including a plurality of UV lamp units. Each UV lamp unit comprises a quartz tube, a UV lamp mounted in the quartz tube and a photo-catalyst layer of titanium dioxide formed on an outer surface of the quartz tube to disinfect an object in the bath by the photo-catalytic reaction of titanium dioxide and UV. The apparatus of the present invention may comprise a conveyer device comprising a driving roller, driven rollers and a conveyer belt wound around the rollers, the conveyer device is divided into an inlet portion formed at a first outside of the bath, a conveying portion formed in water in the bath and a discharging portion formed at a second outside of the bath.
Abstract:
There are provided a light sensor, a display apparatus including the same, and a control method thereof. The display apparatus includes: a display panel which includes a display area through which an image is displayed and a non-display area. A light receiving transistor which is formed in the non-display area and receives outside light. A charging part which includes a first terminal is connected to a drain electrode of the light receiving part and a second terminal is connected to a direct current voltage terminal. A signal amplifying part which includes a first terminal and a second terminal which is connected to a source of reference voltage and receives a reference voltage. A charging switching part is connected between the first input terminal and the first terminal of the charging part. A controller is provided which controls the charging switching part according to a predetermined first cycle to charge or discharge the charging part.
Abstract:
The present invention related to a manufacturing method of uncooked food and uncooked food manufactured thereby with improved taste and conservation period not by heating but using lactic ferments that can eradicate microorganism existing in grain, fruit and vegetables, and the method for preparing uncooked food that comprises the steps of pre-treating foods made of grain, fruit or vegetables by uncooked method; and incubating said pre-treated food by mixing with solution containing method activated lactic ferments at 15˜35° C. for 0.25˜8 hours and additionally further includes the step of activating lactic ferments in the solution containing sugar such as lactose; and adding sugar such as glucose or fructose into the mixture of the processed food and the solution containing the lactic ferments during the incubating step.
Abstract:
Disclosed is a hydraulic control system for an automatic transmission that controls a powertrain, which includes a first friction element for use as an engine brake for discontinuing operation of a one-way clutch in the transmission and a second friction element operating only when the first friction element is disengaged. The hydraulic control system comprises a manual valve including a forward range port for exhausting hydraulic pressure when driving in a forward range, and an L range port for exhausting hydraulic pressure for low speed control; and a switch valve controlled by engine brake signal pressure, solenoid pressure, and forward range pressure supplied from the forward range port, the switch valve selectively supplying control pressure to the first friction element and the second friction element.
Abstract:
A hydraulic control system for an automatic transmission includes a first clutch acting as an input element at first, second, and third forward speed ranges, a second clutch acting as the input element at third and fourth forward speed ranges, a third clutch acting as the input element at an R range, a fourth clutch operating at P, R, N, and L range for performing an engine brake function by stopping a one-way clutch at the first, second, and third forward speed ranges, a first brake acting as a response element at the P, R, N, and L ranges, a second brake acting as a response element at second and fourth forward speed ranges, a first switch valve for distributing hydraulic pressure controlled by a first solenoid valve to a damper clutch in a torque converter and to clutch control valves for the first clutch, and a second switch valve for distributing hydraulic pressure controlled by a second solenoid valve to the second clutch and the first brake.
Abstract:
A manual valve body is provided with a first port communicated with a regulator valve via a pressure line, a second port connected to a first pressure control valve and a second fail safe valve so as to supply hydraulic pressure thereto at range “P”, a third port connected to the regulator valve, an N-R control valve, and first and second switch valves so as to supply the hydraulic pressure from the first port thereto at range “R”, a fourth port connected to second and third pressure control valves and the first and second switch valves so as to supply the hydraulic pressure from the first valve thereto at ranges “2”, “3”, and “D”, and a fifth port connected to the first switch valve so as to supply the hydraulic pressure from the first port thereto at range “L”.
Abstract:
A method of forming a gate electrode of a compound semiconductor device includes forming a first insulating film pattern having a first aperture, forming a second insulating film pattern having a second aperture consisting of inverse V-type on the first insulating film pattern, forming a T-type gate electrode by depositing a conductivity film on the entire structure, removing a second insulating film pattern, forming a insulating spacer on a pole sidewall by etching a first insulating film pattern, and forming an ohmic electrode of the source and drain by self-aligning method using T-type gate electrode as a mask. Thereby T-type gate electrode of materials such as refractory metals can be prevented to be deteriorate because of high annealing, as well as it is stably formed, by using an insulating film. Ohmic metal and gate electrodes formed by self-aligning method can be prevented an interconnection by forming an insulating film spacer between these electrodes.
Abstract:
A method for fabricating a T-shaped gate electrode of a high speed semiconductor device such as HEMTs which is applied to high speed logic circuit including low-noise receivers and power amplifiers having a frequency of X-band or more respectively, and MMICs having a frequency of millimeter wave band. Such devices require a short gate length and a large sectional area of the gate pattern. The conventional photolithography techniques are in need of the resolution for fabricating a fine line width. Therefore, electron-beam lithography is most widely used. But, it is difficult to enhance throughput in manufacturing semiconductor devices because a lot of exposure time is required in the methods using electron beams. In the present invention, a silicon oxide film or a silicon nitride film is deposited on a mono-layered resist pattern. A dummy pattern corresponding to a leg of the gate is formed using the silicon oxide film or the silicon nitride film. A leg of the gate electrode is formed at the portion of the dummy pattern. According to the present invention, a step for improving the resolution is not required, and a gate electrode having a very fine line width of a few hundreds .ANG. can be obtained by regulating the thickness of the silicon nitride film.
Abstract:
The invention relates to a method of fabricating a compound semiconductor device by forming a first and a second compound semiconductor devices having a plurality of different epitaxial layers on a common semiconductor substrate. The method comprises the steps of sequentially forming a plurality of first epitaxial layers for manufacturing the first compound semiconductor device on the semiconductor substrate; forming a first insulating film pattern for defining an active region of the first compound semiconductor device; etching the plurality of first epitaxial layers using the first insulating film pattern as a mask; forming a second insulating film on the resultant structure; forming a sidewall insulating spacer on the sidewall of the active region of the first compound semiconductor device by dry etching the second insulating film; sequentially forming a plurality of second epitaxial layers for manufacturing the second compound semiconductor device on the portion from which the plurality of first epitaxial layers is etched back; forming each electrode of the first and second compound semiconductor devices; and forming an interconnection electrode interconnecting each electrode of the first and second compound semiconductor devices.