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    Position measurement unit, measurement system, and lithographic apparatus comprising such position measurement unit
    132.
    发明专利
    Position measurement unit, measurement system, and lithographic apparatus comprising such position measurement unit 有权
    位置测量单元，测量系统和包含这种位置测量单元的平面设备

    公开(公告)号：JP2007127625A

    公开(公告)日：2007-05-24

    申请号：JP2006249172

    申请日：2006-09-14

    Applicant: Asml Netherlands Bv ,  エーエスエムエル ネザーランズ ビー.ブイ.

    Inventor： VAN DER PASCH ENGELBERTUS ANTO ,  LOOPSTRA ERIK ROELOF

    IPC: G01B11/00 ,  H01L21/027 ,  H01L21/68

    CPC classification number: G01B9/02051 ,  G01B9/02029 ,  G01B2290/70 ,  G03F7/70775

    Abstract: PROBLEM TO BE SOLVED: To provide a compact position measurement unit for a lithographic apparatus or the like. SOLUTION: A measurement unit to measure a position in first and second dimensions includes a diffraction type encoder and an interferometer. The diffraction type encoder measures by means of a diffraction on first and second diffraction gratings (G1, G2) the position in the first dimension of the second grating (G2) with respect to the first grating (G1). The interferometer measures the position in the second dimension of a mirror (MI). The measurement unit includes a combined optical unit (COU) to transfer an encoder measurement beam (EMB) as well as an interferometer measurement beam (IMB). Further, the measurement unit may include a combined light source for the encoder as well as the interferometer. One of the first and second diffraction gratings (G1, G2) may further show some degree of zero order reflection to provide the mirror (MI) of the interferometer. COPYRIGHT: (C)2007,JPO&INPIT

    Abstract translation: 要解决的问题：提供用于光刻设备等的紧凑的位置测量单元。 解决方案：用于测量第一和第二维度中的位置的测量单元包括衍射型编码器和干涉仪。 衍射型编码器通过第一和第二衍射光栅（G1，G2）上相对于第一光栅（G1）在第二光栅（G2）的第一维度中的位置的衍射来测量。 干涉仪测量反射镜（MI）的第二维度中的位置。 测量单元包括用于传送编码器测量光束（EMB）以及干涉仪测量光束（IMB）的组合光学单元（COU）。 此外，测量单元可以包括用于编码器的组合光源以及干涉仪。 第一和第二衍射光栅（G1，G2）中的一个可进一步示出一些零级反射以提供干涉仪的镜（MI）。 版权所有（C）2007，JPO＆INPIT

    Lithography apparatus and method of manufacturing device
    133.
    发明专利
    Lithography apparatus and method of manufacturing device 有权
    平面设备及其制造方法

    公开(公告)号：JP2006148138A

    公开(公告)日：2006-06-08

    申请号：JP2005339037

    申请日：2005-11-24

    Applicant: Asml Netherlands Bv ,  エイエスエムエル ネザランドズ ベスローテン フエンノートシャップ

    Inventor： LOOPSTRA ERIK ROELOF ,  BARTRAY PETRUS R ,  VAN DIJSSELDONK ANTONIUS JOHAN ,  LIEBREGTS PAULUS MARTINUS MARI

    IPC: H01L21/027 ,  G03F7/20

    CPC classification number: G03F7/70141 ,  G03F7/70091

    Abstract: PROBLEM TO BE SOLVED: To provide a lithography apparatus which enables a user to adjust an aperture ratio in a limited space and is not affected by contaminants, and to provide a method for manufacturing a device. SOLUTION: The lithography apparatus includes an illumination system composed to supply a radiation beam and a projection system composed to project the radiation beam on a target of a substrate. At least either of the illumination system and the projection system includes a focusing element for reflecting or bending the beam. The apparatus is provided with a plurality of diaphragm disks which have apertures penetrating the diaphragm disks, and a disk positioning apparatus composed so that one of the diaphragm disks is arranged near the focusing element in order to adjust the aperture ratio (NA) of the projection system or the illumination system. The apparatus also includes a disk-replacing apparatus, is provided outside the projection system or the illumination system and constituted so as to select one of the diaphragm disks and to supply the selected diaphragm disk to the disk-positioning apparatus. COPYRIGHT: (C)2006,JPO&NCIPI

    Abstract translation: 要解决的问题：提供一种使用户能够在有限空间中调节开口率并且不受污染物影响的光刻设备，并且提供一种用于制造器件的方法。 解决方案：光刻设备包括一个照射系统，它被配置成提供一个辐射束和一个投影系统，该投影系统将辐射束投影到一个基板的靶上。 照明系统和投影系统中的至少一个包括用于反射或弯曲光束的聚焦元件。 该装置设置有多个具有穿过隔膜盘的孔的隔膜盘，以及盘定位装置，其构成为使得一个隔膜盘布置在聚焦元件附近，以便调节突起的孔径比（NA） 系统或照明系统。 该设备还包括一个盘替换装置，设置在投影系统或照明系统的外部，并构成为选择其中一个光阑盘，并将所选择的光阑盘提供给盘定位装置。 版权所有（C）2006，JPO＆NCIPI

    Lithography equipment and method for manufacturing device
    134.
    发明专利
    Lithography equipment and method for manufacturing device 有权
    LITHOGRAPHY EQUIPMENT AND METHOD FOR MANUFACTURING DEVICE

    公开(公告)号：JP2006093709A

    公开(公告)日：2006-04-06

    申请号：JP2005275937

    申请日：2005-09-22

    Applicant: Asml Netherlands Bv ,  エイエスエムエル ネザランドズ ベスローテン フエンノートシャップ

    Inventor： LUIJTEN CARLO CORNELIS MARIA ,  LAMBERTUS DONDERS SJOERD NICOL ,  KEMPER NICOLAAS R ,  LEENDERS MARTINUS HENDRIKUS AN ,  LOOPSTRA ERIK ROELOF ,  STREEFKERK BOB ,  BECKERS MARCEL ,  BOOM HERMAN ,  MOERMAN RICHARD

    IPC: H01L21/027 ,  G03F7/20

    CPC classification number: G03F7/70341

    Abstract: PROBLEM TO BE SOLVED: To provide immersion lithography equipment in which the generation of air bubbles in an immersion liquid is reduced. SOLUTION: Immersion lithography projection equipment has a liquid-confining structure configured so as to confine liquid at least partially in a space between a projection system and a substrate. The confining structure has a buffering plane which is arranged when in use, very close to the a plane substantially including the substrate and the top surface of a substrate table that holds the substrate, and defines a path having flow resistance. In this buffering plane, recesses are formed and normally filled with liquid when in use so that a gap is rapidly filled therewith when the gap between the substrate and the substrate table moves under the buffering plane. The recess may be formed into an annular or a radial shape so that a plurality of recesses can be arranged. COPYRIGHT: (C)2006,JPO&NCIPI

    Abstract translation: 要解决的问题：提供浸没式光刻设备，其中浸没液体中的气泡的产生减少。 浸渍光刻投影设备具有液体限制结构，其被配置为至少部分地将液体限制在投影系统和基板之间的空间中。 约束结构具有缓冲平面，该平面在使用时非常接近于基本上包括基板的平面和保持基板的基板台的顶表面，并且限定具有流动阻力的路径。 在该缓冲面中，当使用时形成凹部，并且通常在液体中充满液体，使得当基板和基板台之间的间隙在缓冲平面下移动时，间隙迅速填充。 凹部可以形成为环形或径向形状，使得可以布置多个凹部。 版权所有（C）2006，JPO＆NCIPI

    Lithography instrument and method of calibrating the same
    135.
    发明专利
    Lithography instrument and method of calibrating the same 有权
    LITHOGRAPHY仪器及其校准方法

    公开(公告)号：JP2006054452A

    公开(公告)日：2006-02-23

    申请号：JP2005215936

    申请日：2005-07-26

    Applicant: Asml Netherlands Bv ,  エイエスエムエル ネザランドズ ベスローテン フエンノートシャップ

    Inventor： LOOPSTRA ERIK ROELOF ,  LEVASIER LEON M ,  OESTERHOLT RENE

    IPC: H01L21/027 ,  G01B11/00 ,  G01B11/26 ,  G03F7/20

    CPC classification number: G03F7/70775 ,  G03F7/70458 ,  G03F7/70516 ,  G03F9/7011 ,  G03F9/7019

    Abstract: PROBLEM TO BE SOLVED: To provide a lithography instrument including a substrate table and a movement control system for controlling the movement of the substrate table. SOLUTION: The movement control system includes three positional detectors P1 to P5 which are established to detect the position of a substrate table WT. To measure the position and the orientation of the substrate table WT, the three position detectors P1 to P5 have optical encoders of one-dimensional or multi-dimensional types. The optical encoders are disposed such that they provide at least six position values in total so that at least one position value is provided for each of three dimensions. COPYRIGHT: (C)2006,JPO&NCIPI

    Abstract translation: 要解决的问题：提供一种光刻仪器，其包括用于控制衬底台的运动的衬底台和运动控制系统。 解决方案：移动控制系统包括三个位置检测器P1至P5，其被建立以检测衬底台WT的位置。 为了测量衬底台WT的位置和取向，三位置检测器P1至P5具有一维或多维类型的光学编码器。 光学编码器被布置成使得它们总共提供至少六个位置值，使得为三维中的每一个提供至少一个位置值。 版权所有（C）2006，JPO＆NCIPI

    Lithographic system and its manufacturing equipment
    136.
    发明专利
    Lithographic system and its manufacturing equipment 审中-公开
    LITHOGRAPHIC系统及其制造设备

    公开(公告)号：JP2005222963A

    公开(公告)日：2005-08-18

    申请号：JP2003196786

    申请日：2003-06-10

    Applicant: Asml Netherlands Bv ,  エイエスエムエル ネザランドズ ベスローテン フエンノートシャップ

    Inventor： LIEBREGTS PAULUS MARTINUS MARI ,  BLEEKER ARNO JAN ,  LOOPSTRA ERIK ROELOF ,  BORGGREVE HARRY

    IPC: G03F7/20 ,  H01L21/027

    CPC classification number: G03F7/70991 ,  G03F7/70291

    Abstract: PROBLEM TO BE SOLVED: To provide a lithography system using a programmable patterning means, in order to turn into pattern a projection beam in which throughput is enhanced, without significantly increasing the update speed of the patterning means.
    SOLUTION: The lithography system drives two programmable patterning means 11 and 12, using a control signal from a computer 10, in order to pattern two different beams 13 and 14 being projected to two substrates 19 and 20. Since two substrates are exposed selectively using the same data the throughput of the lithography system substantially is doubled. In order to guarantee correct response to each patterning means 11, 12 to the control signal from the computer 10, signal to each patterning means may be adjusted using calibration units 21 and 22.
    COPYRIGHT: (C)2005,JPO&NCIPI

    Abstract translation: 要解决的问题：为了提供一种使用可编程图案形成装置的光刻系统，以便在不显着增加图案形成装置的更新速度的情况下变成其中生产量增加的投影光束的图案。 解决方案：光刻系统使用来自计算机10的控制信号驱动两个可编程图案形成装置11和12，以便将两个不同的光束13和14投影到两个基板19和20上。由于两个基板被暴露 选择性地使用相同的数据，光刻系统的生产量基本上是加倍的。 为了保证对来自计算机10的控制信号对每个图案形成装置11,122的正确响应，可以使用校准单元21和22来调整对每个图案形成装置的信号。（C）2005，JPO和NCIPI

    Lithographic apparatus and device manufacturing method
    139.
    发明专利
    Lithographic apparatus and device manufacturing method 有权
    LITHOGRAPHIC装置和装置制造方法

    公开(公告)号：JP2005109488A

    公开(公告)日：2005-04-21

    申请号：JP2004280795

    申请日：2004-09-28

    Applicant: Asml Netherlands Bv ,  エイエスエムエル ネザランドズ ベスローテン フエンノートシャップ

    Inventor： CHRISTIAAN ALEXANDER HOOGENDAM ,  BIJLAART ERIK THEODORUS MARIA ,  LOOPSTRA ERIK ROELOF ,  MULKENS JOHANNES CATHARINUS HU ,  STREEFKERK BOB

    IPC: G03F7/20 ,  H01L21/027

    CPC classification number: G03F7/70341

    Abstract: PROBLEM TO BE SOLVED: To provide a lithographic apparatus which can adapt to variations in the substrate thickness by adjusting the mobility of a liquid confinement system, and can increase a distance from the substrate prior to replacement, and is protected from damage caused by the liquid confinement system at the time of collision, and a device manufacturing method using it.
    SOLUTION: In this lithographic projection apparatus, the movement of a liquid confinement system, which confines liquid within a localized area between a final element of a projection system and a substrate, is restricted in the direction of the optical axis of the apparatus by stoppers attached to a base frame or the projection system.
    COPYRIGHT: (C)2005,JPO&NCIPI

    Abstract translation: 要解决的问题：提供一种光刻设备，其可以通过调节液体限制系统的迁移率来适应衬底厚度的变化，并且可以在更换之前增加与衬底的距离，并且被保护免受损坏 通过在碰撞时的液体限制系统和使用它的装置制造方法。 解决方案：在该光刻投影装置中，将液体限制系统的移动限制在装置的光轴方向上，液体限制系统将液体限定在投影系统的最终元件和基板之间的局部区域内 通过连接到基架或投影系统的塞子。 版权所有（C）2005，JPO＆NCIPI

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