Abstract:
An LED is provided, which has a radiation-emitting active layer (7), an n-contact (10), a p-contact (9), and a current spreading layer (4). The current spreading layer (4) is disposed between the active layer (7) and the n-contact (10). The current spreading layer (4) further comprises a multifold recurring layer sequence, which comprises at least one n-doped layer (44), an undoped layer (42), and a layer made of AlxGa1-xN (43), where 0
Abstract:
The invention relates to a thin-film LED, which comprises a barrier layer (3), a first mirror layer (2) following the barrier layer (3), a layer stack (5) following the first mirror layer (2), and at least one contact structure (6) following the layer stack (5). The layer stack (5) comprises at least one active layer (5a), which emits the electromagnetic radiation. The contact structure (6) is disposed on a radiation emergence surface (4) and comprises a contact surface (7). The first mirror layer (2) has a recess in a region opposite the contact surface of the contact structure (6), said recess being larger than the contact surface (7) of the contact structure (6). As a result, the efficiency of the thin-film LED increases.
Abstract:
A radiation-emitting semiconductor body having a contact layer (3) and an active zone (7) is specified, wherein the semiconductor body has a tunnel junction (4) which is arranged between the contact layer and the active zone, and the active zone has a multiple quantum well structure containing at least two active layers (71) which emit electromagnetic radiation into the semiconductor body when an operating current is impressed.
Abstract:
The invention relates to a light-emitting diode chip comprising a series of layers (10) provided with at least one n-type conductivity layer. Said light-emitting diode chip comprises a reflective layer (5) that is connected in a conductive manner to the n-type conductivity layer (31). At least one transparent dielectric layer (4) is arranged between the n-type conductivity layer and the reflective layer.
Abstract:
The application relates to an optoelectronic semiconductor chip (20) comprising the following sequence of regions in a growth direction (σ) of the semiconductor chip (20): - a p-doped barrier layer (1), for an active region (2), - the active region (2), which is suitable for generating electromagnetic radiation, the active region being based on a hexagonal compound semiconductor, and - an n-doped barrier layer (3) for the active region (2). The application furthermore relates to a component comprising such a semiconductor chip (20) and to a method for producing such a semiconductor chip (20).