LASER SCANNING MICROSCOPE SYSTEM AND METHOD OF SETTING LASER-LIGHT INTENSITY VALUE
    131.
    发明申请
    LASER SCANNING MICROSCOPE SYSTEM AND METHOD OF SETTING LASER-LIGHT INTENSITY VALUE 有权
    激光扫描显微镜系统和设置激光强度值的方法

    公开(公告)号:US20150115176A1

    公开(公告)日:2015-04-30

    申请号:US14516798

    申请日:2014-10-17

    Abstract: A method of setting a laser-light intensity value includes: emitting laser light, the laser light being excitation light, a fluorescent-dyed biological sample being irradiated with the excitation light and emitting light; detecting fluorescence emitted by the biological sample, and outputting a signal corresponding to a brightness value; prestoring relation information, the relation information including the plurality of laser-light intensity values, and information on at least one possible correlation between a phototoxicity degree and the brightness value in relation to each of the laser-light intensity values, the phototoxicity to the biological sample resulting from the laser light; generating a fluorescence image having the brightness value based on the output signal; calculating a brightness value representative of a ROI area based on the generated fluorescence image; and referring to the relation information, and determining a laser-light intensity value satisfying tolerance of the phototoxicity based on the calculated representative brightness value.

    Abstract translation: 设置激光强度值的方法包括:发射激光,激光作为激发光,荧光染色的生物样品被激发光照射并发射光; 检测由生物样品发出的荧光,并输出与亮度值对应的信号; 预定关系信息,包括多个激光光强度值的关系信息,以及关于每个激光强度值的光毒性度和亮度值之间的至少一个可能的相关性的信息,对生物学的光毒性 由激光产生的样品; 产生具有基于输出信号的亮度值的荧光图像; 基于所生成的荧光图像计算代表ROI区域的亮度值; 并且参考关系信息,并且基于计算的代表亮度值来确定满足光毒性的容许度的激光光强度值。

    Methods for gas leak detection and localization in populated areas using isotope ratio measurements
    132.
    发明申请
    Methods for gas leak detection and localization in populated areas using isotope ratio measurements 有权
    使用同位素比率测量在人口稠密地区进行气体泄漏检测和定位的方法

    公开(公告)号:US20150007638A1

    公开(公告)日:2015-01-08

    申请号:US14493853

    申请日:2014-09-23

    Applicant: Picarro, Inc.

    Abstract: Improved gas leak detection from moving platforms is provided. Automatic horizontal spatial scale analysis can be performed in order to distinguish a leak from background levels of the measured gas. Source identification can be provided by using isotopic ratios and/or chemical tracers to distinguish gas leaks from other sources of the measured gas. Multi-point measurements combined with spatial analysis of the multi-point measurement results can provide leak source distance estimates. Qualitative source identification is provided. These methods can be practiced individually or in any combination.

    Abstract translation: 提供了从移动平台改进的气体泄漏检测。 可以进行自动水平空间尺度分析,以区分泄漏与被测气体的背景水平。 可以通过使用同位素比率和/或化学示踪剂来提供源识别,以区分气体泄漏与测量气体的其他来源。 多点测量结合多点测量结果的空间分析可以提供泄漏源距离估计。 提供定性来源识别。 这些方法可以单独或以任何组合实施。

    A PORTABLE SMALL-OBJECT HOLDING DEVICE AND A METHOD FOR USING SAME
    135.
    发明申请
    A PORTABLE SMALL-OBJECT HOLDING DEVICE AND A METHOD FOR USING SAME 审中-公开
    便携式小物体保持装置和使用该装置的方法

    公开(公告)号:WO2017109781A1

    公开(公告)日:2017-06-29

    申请号:PCT/IL2016/051364

    申请日:2016-12-21

    CPC classification number: G01N21/87 G01N21/01 G01N2201/025

    Abstract: A portable small-object holding device, comprising: a housing, movable gripper jaws configured to grip and hold a small object; at least one hinge and at least one cog-wheel configured to enable rotating said at least one hinge around its longitudinal axis; and wherein the portable small-object holding device is adapted to enable illuminating the small object when being held within said portable small-object holding device, by a beam of light at least one wavelength. The inspection of the small-object is carried out after inserting the portable small- object holding device via an aperture comprised in a portable apparatus for inspecting small objects, and preferably engaging the portable small-object holding device with the portable apparatus for inspecting small objects.

    Abstract translation: 一种便携式小物体保持装置,包括:壳体,可移动夹爪,被构造为夹持和保持小物体; 至少一个铰链和至少一个齿轮,所述至少一个齿轮构造成能够使所述至少一个铰链绕其纵向轴线旋转; 并且其中所述便携式小物体保持装置适于通过至少一个波长的光束照亮所述小物体在被保持在所述便携式小物体保持装置内时的照亮。 在通过包括在用于检查小物体的便携式设备中的孔插入便携式小物体保持装置并且优选地将便携式小物体保持装置与便携式装置接合以检查小物体之后执行小物体的检查

    WAFER EDGE DETECTION AND INSPECTION
    136.
    发明申请
    WAFER EDGE DETECTION AND INSPECTION 审中-公开
    WAFER边缘检测和检查

    公开(公告)号:WO2015179233A1

    公开(公告)日:2015-11-26

    申请号:PCT/US2015/031051

    申请日:2015-05-15

    Abstract: Methods and systems for determining wafer inspection coordinates for fixed location(s) on a wafer are provided. One system includes an illumination subsystem configured to direct light to a spot on an edge of a wafer. The spot extends beyond the edge of the wafer. The system also includes a stage that rotates the wafer thereby causing the spot to be scanned over the edge of the wafer. The system also includes a detector configured to detect light from the spot while the spot is being scanned over the edge and to generate output responsive thereto. The system further includes a computer processor configured to determine wafer inspection coordinates of two or more locations on the edge of the wafer based on the output and to determine wafer inspection coordinates of fixed location(s) on the wafer based on the wafer inspection coordinates of the two or more locations on the edge.

    Abstract translation: 提供了用于确定晶片上固定位置的晶片检查坐标的方法和系统。 一个系统包括被配置为将光引导到晶片边缘上的点的照明子系统。 斑点延伸超过晶片的边缘。 该系统还包括使晶片旋转的台,从而使光斑在晶片的边缘上扫描。 该系统还包括检测器,其被配置为在斑点被扫描在边缘上时检测来自斑点的光并且响应于此产生输出。 该系统还包括计算机处理器,其被配置为基于输出来确定晶片边缘上的两个或更多个位置的晶片检查坐标,并且基于晶片的晶片检查坐标来确定晶片上固定位置的晶片检查坐标 边缘上的两个或多个位置。

    MULTIFUNCTION WAFER AND FILM FRAME HANDLING SYSTEM
    137.
    发明申请
    MULTIFUNCTION WAFER AND FILM FRAME HANDLING SYSTEM 审中-公开
    多功能波形和薄膜框架处理系统

    公开(公告)号:WO2014035348A1

    公开(公告)日:2014-03-06

    申请号:PCT/SG2013/000383

    申请日:2013-09-02

    Abstract: A multifunction wafer and film frame handling system includes a wafer table assembly having a wafer table providing an ultra-planar wafer table surface configured for carrying a wafer or a film frame, and at least one of: a flattening apparatus configured for automatically applying a downward force to portions of a warped or non-planar wafer in a direction normal to the wafer table surface; a displacement limitation apparatus configured for automatically constraining or preventing uncontrolled lateral motion of a wafer relative to the wafer table surface after cessation of an applied negative pressure and application of a positive pressure to the underside of the wafer via the wafer table; and a rotational misalignment compensation apparatus configured for automatically compensating for a rotational misalignment of a wafer mounted on a film frame.

    Abstract translation: 一种多功能晶片和薄膜框架处理系统,包括晶片台组件,该晶片台组件具有提供用于承载晶片或薄膜框架的超平面晶片台表面的晶片台,以及至少一个:平坦化装置,其被配置为自动施加向下 在垂直于晶片台表面的方向上对翘曲或非平面晶片的部分施力; 位移限制装置,被配置为在停止施加的负压之后自动约束或防止晶片相对于晶片台表面的不受控横向运动,并且通过晶片台向晶片的下侧施加正压力; 以及旋转对准补偿装置,被配置为自动补偿安装在胶片框架上的晶片的旋转未对准。

    SYSTEM AND METHOD FOR AUTOMATICALLY CORRECTING FOR ROTATIONAL MISALIGNMENT OF WAFERS ON FILM FRAMES
    138.
    发明申请
    SYSTEM AND METHOD FOR AUTOMATICALLY CORRECTING FOR ROTATIONAL MISALIGNMENT OF WAFERS ON FILM FRAMES 审中-公开
    用于自动校正电影框架上波形旋转偏差的系统和方法

    公开(公告)号:WO2014035347A1

    公开(公告)日:2014-03-06

    申请号:PCT/SG2013/000382

    申请日:2013-09-02

    Inventor: LIN, Jing

    Abstract: Automatically correcting for rotational misalignment of a wafer improperly mounted on a film frame includes capturing an image of portions of the wafer using an image capture device, prior to initiation of a wafer inspection procedure by an inspection system; digitally determining a rotational misalignment angle and a rotational misalignment direction of the wafer relative to the film frame and/or a set of reference axes of a field of view of the image capture device; and correcting for the rotational misalignment of the wafer by way of a film frame handling apparatus separate from the inspection system, which is configured for rotating the film frame across the rotational misalignment angle in a direction opposite to the rotational misalignment direction. Such film frame rotation can occur prior to placement of the film frame on the wafer table, without decreasing film frame handling throughput or inspection process throughput.

    Abstract translation: 自动校正不正确地安装在胶片框架上的晶片的旋转未对准包括在通过检查系统启动晶片检查过程之前使用图像捕获装置捕获晶片的部分图像; 数字地确定晶片相对于胶片框架的旋转未对准角度和旋转未对准方向和/或图像捕获装置的视场的一组参考轴; 以及通过与检查系统分离的胶片框架处理装置校正晶片的旋转未对准,所述检查系统被配置为沿与旋转未对准方向相反的方向旋转胶片框架跨过旋转未对准角度。 在胶片框架放置在晶片台上之前,胶片框架旋转可能发生,而不会降低胶片框架处理量或检查处理量。

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