Abstract:
The present invention provides a method, an optical inspection apparatus as well as a computer program product for optical inspection of a surface. The optical inspection apparatus can be effectively applied for optical inspection of periodic structures on e.g. a semi-conductor wafer for the purpose of quality control. By effectively splitting a light beam into a plurality of spatially separated light beams and by selective usage of these light beams, various surface segments of the surface can be inspected simultaneously by superposition of respective images. A resulting superposition image can then be compared with a reference image for detection of defects of the surface.
Abstract:
In an inspection system for planar objects having periodic structures, programmable optical Fourier filtering in the focal plane of a telecentric lens system is used to directly identify physical phenomena indicative of non-periodic defects. Lens assemblies and a coherent optical source are used to generate and observe a spatial Fourier transform of a periodic structure in the Fourier plane. Optical Fourier filtering (OFF) is performed in the focal plane using an electrically programmable and electrically alignable spatial light modulator. The spatial light modulator with high signal to noise ratio is electrically reconfigurable according to a feedback-driven, filter construction and alignment algorithm. The OFF enhances any non-periodic components present in the Fourier plane and final image plane of the object. A system having a plurality of inspection channels provides high-throughput inspection of objects with small non-periodic defects while maintaining high detection sensitivity.
Abstract:
A gas sensor, whose chamber uses filters and choppers in either a semicircular geometry or annular geometry, and incorporates separate infrared radiation filters and optical choppers. This configuration facilitates the use of a single infrared radiation source and a single detector for infrared measurements at two wavelengths, such that measurement errors may be compensated.
Abstract:
An apparatus and method for detecting pattern defects and/or particles on the front surface of a semiconductor wafer having repetitive patterns includes a laser for illuminating an area on the front surface with a beam of polarized light. A lens collects light scattered from the area and forms a Fourier diffraction pattern of the area illuminated. A Fourier mask blocks out scattered light collected by the lens at locations in the Fourier diffraction pattern where the intensity is above a predetermined level indicative of background information and leaves in light at locations where the intensity is below the threshold level indicative of possible particle information. The Fourier mask includes a spatial light modulator and a polarization discriminator. The lens also images the area illuminated onto a camera using scattered light collected from the area by the lens and not blocked out by the Fourier mask. In one embodiment of the invention the spatial light modulator is optically addressable and in other embodiments of the invention the spatial light modulator is electrically addressable.
Abstract:
A dynamic reflective spatial attenuator for use in an optical inspection apparatus. The attenuator takes the form of a two-dimensional micro-mechanical reflective array that, in the first operative position of a mirror element, reflects the desired scattered light toward a detector and, in the second operative position of a mirror element, reflects undesired scattered light into a light dump. The mirror array's fast response and flexibility allows for changes during mid-scan to increase the defect's or contaminant's signal relative to the substrate surface's signal.
Abstract:
An apparatus and method for detecting particles on a surface of a semiconductor wafer having repetitive patterns includes a laser for illuminating an area on the front surface at grazing angle of incidence with a beam of polarized light. A lens collects light scattered from the area and forms a Fourier diffraction pattern of the area illuminated. A Fourier mask blocks out light collected by the lens at locations in the Fourier diffraction pattern where the intensity is above a predetermined level indicative of background information and leaves in light at locations where the intensity is below the threshold level indicative of possible particle information. The Fourier mask includes an optically addressable spatial light modulator and a polarization discriminator. A camera detects scattered light collected from the area by the lens and not blocked out by the Fourier mask.
Abstract:
An apparatus for detecting particles on the front surface of a patterned semiconductor wafer having repetitive patterns includes a laser for illuminating an area on the front surface at grazing angle of incidence with a beam of polarized light. A lens collects light scattered from the area and forms a Fourier diffraction pattern of the area illuminated. A Fourier mask blocks out light collected by the lens at locations in the Fourier diffraction pattern where the intensity is above a predetermined level indicative of background information and leaves in light at locations where the intensity is below the threshold level indicative of possible particle information. The Fourier mask includes an optically addressable spatial light modulator and a crossed polarizer with the Fourier diffraction pattern being used as both a read beam and a write beam for the spatial light modulator. A camera detects scattered light collected from the area by the lens and not blocked out by the Fourier mask.
Abstract:
Method for determining the characteristics of a system for generating at least one pattern of light, the method comprising: a) providing a desired pattern of light, b) expressing the amplitude and the phase of the output pulse of the system as a function of the input laser pulse and in function of the characteristics of the system to obtain a calculated output pulse, the input laser pulse having a duration below or equal to 1 nanosecond, c) determining at least one characteristic of the system by minimizing a distance between the calculated output pulse and the desired output laser pulse.
Abstract:
The invention relates to a fluorescent microscope and a respective method for obtaining super-resolution images of a sample labelled with at least one type fluorescent label by combining localization microscopy and structured illumination microscopy. In an aspect, the fluorescent microscope comprises one or more light sources and an illumination system having a structured illumination path, in which a pattern generation system is positioned, for illuminating the sample with structured illumination light and a localization illumination path for illuminating the sample with localization illumination light. A switching mechanism is configured to switch between a first, a second and/or a third mode, wherein in the first mode at least a portion of the light emitted from the one or more light sources propagates through one of the illumination paths; in the second mode at least a portion of the light emitted from the one or more light sources propagates through the other one of the illumination paths; and in the third mode at least a portion of the light emitted from one or more of the light sources propagates through one illumination path while simultaneously at least another portion of the light emitted from one or more of the light sources propagates through the other illumination path. At least one image detector positioned in an optical detection path, configured to detect at least a portion of fluorescent light emitted from fluorescent molecules of the illuminated sample. Another aspect concerns a method for obtaining super-resolution image data of a sample labeled with at least one type of fluorescent label comprising illuminating the sample with localization illumination light and with structured illumination light; detecting at least a portion of the fluorescent light emitted from the excited fluorescent molecules of the at least one fluorescent label, thereby obtaining at least one image of the illuminated sample; and processing the obtained at least one image of the sample image to obtain super-resolution image data.
Abstract:
A scanning plasmonic microscope apparatus is described comprising a sample holder comprising a dielectric substrate, preferably a transparent dielectric substrate, covered with at least one metallic thin-film comprising plasmon-generating nanostructures adjacently arranged to at least one scanning area, said scanning area comprising a continuous, flat metallic surface for supporting one or more samples, preferably a biological sample; a spatial light modulator in optical alignment with said sample holder, said spatial light modulator comprising pixels for illuminating at least part of said nanostructures with light of a predetermined phase; a storage medium comprising target coordinates associated with target points in said at least one scanning area; and, phase information for controlling said pixels so that surface plasmon waves emitted by pixel-illuminated nanostructures are substantially in phase (focussed) in at least one of said target points in said at least one scanning area; and, an image sensor configured to image photons, which are scattered away from said scanning area when surface plasmons in said target point interact with at least part of said one or more samples; and, a scanner controller for controlling pixels in said spatial light modulator, said pixels illuminating at least part of said nanostructures on the basis of said phase information.