Optical Surface Inspection
    131.
    发明申请
    Optical Surface Inspection 失效
    光学表面检测

    公开(公告)号:US20070009148A1

    公开(公告)日:2007-01-11

    申请号:US11160707

    申请日:2005-07-06

    CPC classification number: G01N21/95607 G01N2201/0675 H01L21/67288

    Abstract: The present invention provides a method, an optical inspection apparatus as well as a computer program product for optical inspection of a surface. The optical inspection apparatus can be effectively applied for optical inspection of periodic structures on e.g. a semi-conductor wafer for the purpose of quality control. By effectively splitting a light beam into a plurality of spatially separated light beams and by selective usage of these light beams, various surface segments of the surface can be inspected simultaneously by superposition of respective images. A resulting superposition image can then be compared with a reference image for detection of defects of the surface.

    Abstract translation: 本发明提供一种光学检查装置以及用于光学检查表面的计算机程序产品的方法。 光学检查装置可以有效地应用于例如周期性结构的光学检查。 半导体晶片,用于质量控制。 通过将光束有效地分割成多个空间分离的光束并且通过选择性地使用这些光束,可以通过叠加各个图像同时检查表面的各种表面段。 然后可以将所得到的叠加图像与用于检测表面缺陷的参考图像进行比较。

    Method and apparatus for high-throughput inspection of large flat patterned media using dynamically programmable optical spatial filtering
    132.
    发明授权
    Method and apparatus for high-throughput inspection of large flat patterned media using dynamically programmable optical spatial filtering 失效
    使用动态可编程光学空间滤波对大平面图案化介质进行高通量检测的方法和装置

    公开(公告)号:US07041998B2

    公开(公告)日:2006-05-09

    申请号:US10396760

    申请日:2003-03-24

    Abstract: In an inspection system for planar objects having periodic structures, programmable optical Fourier filtering in the focal plane of a telecentric lens system is used to directly identify physical phenomena indicative of non-periodic defects. Lens assemblies and a coherent optical source are used to generate and observe a spatial Fourier transform of a periodic structure in the Fourier plane. Optical Fourier filtering (OFF) is performed in the focal plane using an electrically programmable and electrically alignable spatial light modulator. The spatial light modulator with high signal to noise ratio is electrically reconfigurable according to a feedback-driven, filter construction and alignment algorithm. The OFF enhances any non-periodic components present in the Fourier plane and final image plane of the object. A system having a plurality of inspection channels provides high-throughput inspection of objects with small non-periodic defects while maintaining high detection sensitivity.

    Abstract translation: 在具有周期结构的平面物体的检查系统中,使用远心透镜系统的焦平面中的可编程光学傅立叶滤波来直接识别指示非周期性缺陷的物理现象。 透镜组件和相干光源用于产生和观察傅立叶平面中周期性结构的空间傅立叶变换。 光学傅立叶滤波(OFF)在焦平面上使用电可编程且电可对准的空间光调制器执行。 具有高信噪比的空间光调制器根据反馈驱动的滤波器构造和对准算法进行电可重构。 OFF增强存在于对象的傅立叶平面和最终图像平面中的任何非周期性分量。 具有多个检查通道的系统提供具有小的非周期缺陷的物体的高通量检查,同时保持高检测灵敏度。

    Particle detection method and apparatus
    134.
    发明授权
    Particle detection method and apparatus 失效
    粒子检测方法及装置

    公开(公告)号:US06879391B1

    公开(公告)日:2005-04-12

    申请号:US09579620

    申请日:2000-05-26

    Inventor: Joseph J. Danko

    Abstract: An apparatus and method for detecting pattern defects and/or particles on the front surface of a semiconductor wafer having repetitive patterns includes a laser for illuminating an area on the front surface with a beam of polarized light. A lens collects light scattered from the area and forms a Fourier diffraction pattern of the area illuminated. A Fourier mask blocks out scattered light collected by the lens at locations in the Fourier diffraction pattern where the intensity is above a predetermined level indicative of background information and leaves in light at locations where the intensity is below the threshold level indicative of possible particle information. The Fourier mask includes a spatial light modulator and a polarization discriminator. The lens also images the area illuminated onto a camera using scattered light collected from the area by the lens and not blocked out by the Fourier mask. In one embodiment of the invention the spatial light modulator is optically addressable and in other embodiments of the invention the spatial light modulator is electrically addressable.

    Abstract translation: 用于检测具有重复图案的半导体晶片的表面上的图案缺陷和/或颗粒的装置和方法包括:用偏振光束照射前表面上的区域的激光器。 透镜收集从该区域散射的光,并形成照明区域的傅里叶衍射图案。 傅立叶方差掩模在傅立叶衍射图案中的强度高于指示背景信息的预定水平的位置遮挡由透镜收集的散射光,并且在强度低于表示可能的粒子信息的阈值水平的位置处留下光。 傅里叶掩模包括空间光调制器和偏振鉴别器。 透镜还可以使用透镜从该区域收集的散射光照射到相机上的区域,并且不会被傅里叶面罩遮挡。 在本发明的一个实施例中,空间光调制器是可光学寻址的,并且在本发明的其它实施例中,空间光调制器可电寻址。

    Apparatus for optical inspection of a working surface having a dynamic reflective spatial attenuator

    公开(公告)号:US06643007B2

    公开(公告)日:2003-11-04

    申请号:US09905839

    申请日:2001-07-13

    Applicant: Tuan Le

    Inventor: Tuan Le

    CPC classification number: G01N21/95623 G01N21/94 G01N21/9501 G01N2201/0675

    Abstract: A dynamic reflective spatial attenuator for use in an optical inspection apparatus. The attenuator takes the form of a two-dimensional micro-mechanical reflective array that, in the first operative position of a mirror element, reflects the desired scattered light toward a detector and, in the second operative position of a mirror element, reflects undesired scattered light into a light dump. The mirror array's fast response and flexibility allows for changes during mid-scan to increase the defect's or contaminant's signal relative to the substrate surface's signal.

    Particle detection method and apparatus
    136.
    发明授权
    Particle detection method and apparatus 失效
    粒子检测方法及装置

    公开(公告)号:US5805278A

    公开(公告)日:1998-09-08

    申请号:US668494

    申请日:1996-06-18

    Inventor: Joseph J. Danko

    Abstract: An apparatus and method for detecting particles on a surface of a semiconductor wafer having repetitive patterns includes a laser for illuminating an area on the front surface at grazing angle of incidence with a beam of polarized light. A lens collects light scattered from the area and forms a Fourier diffraction pattern of the area illuminated. A Fourier mask blocks out light collected by the lens at locations in the Fourier diffraction pattern where the intensity is above a predetermined level indicative of background information and leaves in light at locations where the intensity is below the threshold level indicative of possible particle information. The Fourier mask includes an optically addressable spatial light modulator and a polarization discriminator. A camera detects scattered light collected from the area by the lens and not blocked out by the Fourier mask.

    Abstract translation: 用于检测具有重复图案的半导体晶片的表面上的颗粒的装置和方法包括:激光器,用于以偏振光束以掠射入射角照射前表面上的区域。 透镜收集从该区域散射的光,并形成照明区域的傅里叶衍射图案。 傅立叶掩模在傅立叶衍射图案中的强度高于指示背景信息的预定水平的位置处遮挡由透镜收集的光,并且在强度低于阈值水平的位置处留下指示可能的粒子信息的位置。 傅里叶掩模包括光可寻址空间光调制器和偏振鉴别器。 相机通过镜头检测从该区域收集的散射光,并且不被傅里叶面罩遮挡。

    Method and apparatus for detecting particles on a surface of a
semiconductor wafer having repetitive patterns
    137.
    发明授权
    Method and apparatus for detecting particles on a surface of a semiconductor wafer having repetitive patterns 失效
    用于检测具有重复图案的半导体晶片的表面上的颗粒的方法和装置

    公开(公告)号:US5659390A

    公开(公告)日:1997-08-19

    申请号:US386289

    申请日:1995-02-09

    Inventor: Joseph J. Danko

    Abstract: An apparatus for detecting particles on the front surface of a patterned semiconductor wafer having repetitive patterns includes a laser for illuminating an area on the front surface at grazing angle of incidence with a beam of polarized light. A lens collects light scattered from the area and forms a Fourier diffraction pattern of the area illuminated. A Fourier mask blocks out light collected by the lens at locations in the Fourier diffraction pattern where the intensity is above a predetermined level indicative of background information and leaves in light at locations where the intensity is below the threshold level indicative of possible particle information. The Fourier mask includes an optically addressable spatial light modulator and a crossed polarizer with the Fourier diffraction pattern being used as both a read beam and a write beam for the spatial light modulator. A camera detects scattered light collected from the area by the lens and not blocked out by the Fourier mask.

    Abstract translation: 用于检测具有重复图案的图案化半导体晶片的前表面上的颗粒的装置包括:用偏振光束以掠射入射角照射前表面上的区域的激光。 透镜收集从该区域散射的光,并形成照明区域的傅里叶衍射图案。 傅立叶掩模在傅立叶衍射图案中的强度高于指示背景信息的预定水平的位置处遮挡由透镜收集的光,并且在强度低于阈值水平的位置处留下指示可能的粒子信息的位置。 傅里叶掩模包括光可寻址空间光调制器和具有傅里叶衍射图案的交叉偏振器,作为用于空间光调制器的读光束和写光束。 相机通过镜头检测从该区域收集的散射光,并且不被傅里叶面罩遮挡。

    Method and apparatus for combination of localization microscopy and structured illumination microscopy
    139.
    发明授权
    Method and apparatus for combination of localization microscopy and structured illumination microscopy 有权
    定位显微镜和结构化照明显微镜组合的方法和设备

    公开(公告)号:EP2801854B1

    公开(公告)日:2017-07-19

    申请号:EP13002490.4

    申请日:2013-05-10

    Abstract: The invention relates to a fluorescent microscope and a respective method for obtaining super-resolution images of a sample labelled with at least one type fluorescent label by combining localization microscopy and structured illumination microscopy. In an aspect, the fluorescent microscope comprises one or more light sources and an illumination system having a structured illumination path, in which a pattern generation system is positioned, for illuminating the sample with structured illumination light and a localization illumination path for illuminating the sample with localization illumination light. A switching mechanism is configured to switch between a first, a second and/or a third mode, wherein in the first mode at least a portion of the light emitted from the one or more light sources propagates through one of the illumination paths; in the second mode at least a portion of the light emitted from the one or more light sources propagates through the other one of the illumination paths; and in the third mode at least a portion of the light emitted from one or more of the light sources propagates through one illumination path while simultaneously at least another portion of the light emitted from one or more of the light sources propagates through the other illumination path. At least one image detector positioned in an optical detection path, configured to detect at least a portion of fluorescent light emitted from fluorescent molecules of the illuminated sample. Another aspect concerns a method for obtaining super-resolution image data of a sample labeled with at least one type of fluorescent label comprising illuminating the sample with localization illumination light and with structured illumination light; detecting at least a portion of the fluorescent light emitted from the excited fluorescent molecules of the at least one fluorescent label, thereby obtaining at least one image of the illuminated sample; and processing the obtained at least one image of the sample image to obtain super-resolution image data.

    Abstract translation: 本发明涉及荧光显微镜和相应的方法,用于通过组合定位显微镜和结构化照明显微镜来获得用至少一种类型的荧光标签标记的样品的超分辨率图像。 在一个方面,荧光显微镜包括一个或多个光源以及具有结构化照明路径的照明系统,图案生成系统位于该结构化照明路径中,用于利用结构化照明光照亮样本以及用于照亮样本的定位照明路径 定位照明灯。 切换机构被配置为在第一模式,第二模式和/或第三模式之间切换,其中在第一模式中,从一个或多个光源发射的光的至少一部分传播通过照明路径之一; 在第二模式中,从一个或多个光源发射的光的至少一部分传播通过照明路径中的另一个; 并且在第三模式中,从一个或多个光源发射的光的至少一部分传播通过一个照明路径,同时从一个或多个光源发射的光的至少另一部分传播通过另一个照明路径 。 位于光学检测路径中的至少一个图像检测器,被配置为检测从照射样本的荧光分子发射的荧光的至少一部分。 另一方面涉及用于获得用至少一种类型的荧光标签标记的样本的超分辨率图像数据的方法,包括用定位照明光和结构化照明光照亮样本; 检测从至少一个荧光标记的激发的荧光分子发射的荧光的至少一部分,由此获得照射的样本的至少一个图像; 并处理所获得的样本图像的至少一个图像以获得超分辨率图像数据。

    Plasmonic microscopy
    140.
    发明公开
    Plasmonic microscopy 审中-公开
    Plasmonmikroskopie

    公开(公告)号:EP2653903A1

    公开(公告)日:2013-10-23

    申请号:EP12165040.2

    申请日:2012-04-20

    Abstract: A scanning plasmonic microscope apparatus is described comprising a sample holder comprising a dielectric substrate, preferably a transparent dielectric substrate, covered with at least one metallic thin-film comprising plasmon-generating nanostructures adjacently arranged to at least one scanning area, said scanning area comprising a continuous, flat metallic surface for supporting one or more samples, preferably a biological sample; a spatial light modulator in optical alignment with said sample holder, said spatial light modulator comprising pixels for illuminating at least part of said nanostructures with light of a predetermined phase; a storage medium comprising target coordinates associated with target points in said at least one scanning area; and, phase information for controlling said pixels so that surface plasmon waves emitted by pixel-illuminated nanostructures are substantially in phase (focussed) in at least one of said target points in said at least one scanning area; and, an image sensor configured to image photons, which are scattered away from said scanning area when surface plasmons in said target point interact with at least part of said one or more samples; and, a scanner controller for controlling pixels in said spatial light modulator, said pixels illuminating at least part of said nanostructures on the basis of said phase information.

    Abstract translation: 描述了一种扫描等离子体显微镜装置,其包括样品保持器,该样品保持器包括电介质基底,优选为透明电介质基底,被至少一个金属薄膜覆盖,所述金属薄膜包括相邻地布置在至少一个扫描区域上的等离子体发生纳米结构,所述扫描区域包括 连续的,平坦的金属表面,用于支撑一个或多个样品,优选生物样品; 与所述样品保持器光学对准的空间光调制器,所述空间光调制器包括用于用预定相的光照亮所述纳米结构的至少一部分的像素; 存储介质,包括与所述至少一个扫描区域中的目标点相关联的目标坐标; 以及用于控制所述像素的相位信息,使得由像素照明的纳米结构发射的表面等离子体波在所述至少一个扫描区域中的至少一个所述目标点中基本上同相(聚焦) 以及图像传感器,被配置为对在所述目标点中的表面等离子体激元与所述一个或多个样本的至少一部分相互作用时,从所述扫描区域散射的光子成像; 以及用于控制所述空间光调制器中的像素的扫描器控制器,所述像素基于所述相位信息照亮所述纳米结构的至少一部分。

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