公开(公告)号：JP2011077540A

公开(公告)日：2011-04-14

申请号：JP2010273585

申请日：2010-12-08

Applicant: Asml Netherlands Bv ,  エーエスエムエル ネザーランズ ビー.ブイ.

Inventor： GEORGE RICHARD ALEXANDER ,  GUI CHENG-QUN ,  PIETER WILLEM HERMAN DE JAGER ,  ROBBERT EDGAR VAN LEEUWEN ,  JACOBUS BURGHOOM

IPC: H01L21/027 ,  G01B11/00 ,  G03F7/20 ,  G03F9/00

CPC classification number: G03B27/53 ,  G03F7/70291 ,  G03F7/70791 ,  G03F9/7003 ,  G03F9/7026

Abstract: PROBLEM TO BE SOLVED: To provide a method and device which improve overlay accuracy without significantly damaging processing ability of a lithographic apparatus.
SOLUTION: An alignment indicator on a substrate is inspected in exposure of a substrate for optimizing exposure conditions. When a substrate 10 is subjected to exposure and scanning immediately below an alignment unit 15, each portion of the substrate passes through below a detector unit 16 and then passes through below an exposure unit 17. Consequently, when the information about position of straight line, orientation, and expansion measured by the detector unit 16 for each part of the substrate 10 can be transferred to the exposure unit 17, and the substrate is exposed while passing directly under the exposure unit 17, the exposure condition of the part of the substrate to be exposed can be optimized.
COPYRIGHT: (C)2011,JPO&INPIT

Abstract translation: 要解决的问题：提供一种提高叠加精度而不显着损害光刻设备的处理能力的方法和装置。 解决方案：在衬底曝光中检查衬底上的对准指示器，以优化暴露条件。 当基板10在对准单元15的正下方进行曝光和扫描时，基板的每个部分通过检测器单元16下方，然后通过曝光单元17下方。因此，当关于直线位置的信息时， 由检测器单元16对基板10的每个部分测量的取向和膨胀可以被传送到曝光单元17，并且在通过曝光单元17的正下方时曝光基板，将基板的一部分的曝光条件 被曝光可以优化。 版权所有（C）2011，JPO＆INPIT

公开(公告)号：JP2011071545A

公开(公告)日：2011-04-07

申请号：JP2010275375

申请日：2010-12-10

Applicant: Asml Netherlands Bv ,  エーエスエムエル ネザーランズ ビー.ブイ.

Inventor： JANSEN HANS ,  CORNELISSEN SEBASTIAAN MARIA J ,  LAMBERTUS DONDERS SJOERD NICOLAAS ,  GRAAF ROELOF FREDERICK DE ,  CHRISTIAAN ALEXANDER HOOGENDAM ,  JACOBS HERNES ,  ANTONIUS LEENDERS MARTINUS H ,  MERTENS JEROEN JOHANNES SOPHIA MARIA ,  STREEFKERK BOB ,  VAN DER TOORN JAN-GERARD CORNELIS ,  SMITS PETER ,  JANSSEN FRANCISCUS JOHANNES J ,  RIEPEN MICHEL

IPC: H01L21/027

CPC classification number: G03F7/70341 ,  G03F7/707

Abstract: PROBLEM TO BE SOLVED: To provide a liquid immersion lithographic apparatus that prevents an adverse effect on pattern image quality due to existence of bubbles in immersion liquid.
SOLUTION: The liquid immersion lithographic exposure apparatus minimizes or prevents generation of bubbles in the immersion liquid by reducing a size or a volume of a gap between an object and the top of a substrate table and/or preparing a cover plate covering the gap. Additionally, an actuator for laterally moving the object in a hole in order to reduce the gap between an edge of the object and a side of the hole of the support table when the object and the table are in contact with the liquid, may be prepared.
COPYRIGHT: (C)2011,JPO&INPIT

Abstract translation: 要解决的问题：提供一种液浸光刻设备，其防止由于浸没液体中的气泡的存在而对图案图像质量的不利影响。 解决方案：液浸式光刻曝光装置通过减小物体与基板台顶部之间的间隙的尺寸或体积，和/或制备覆盖该基板台的盖板来最小化或防止在浸液中产生气泡 间隙。 此外，可以准备用于在物体和台面与液体接触的同时横向移动物体在孔中的致动器，以便减小物体的边缘与支撑台的孔的一侧之间的间隙 。 版权所有（C）2011，JPO＆INPIT

公开(公告)号：JP2011071513A

公开(公告)日：2011-04-07

申请号：JP2010210311

申请日：2010-09-21

Applicant: Asml Netherlands Bv ,  エーエスエムエル ネザーランズ ビー.ブイ.

Inventor： JACOBS JOHANNES HENRICUS WILHELMUS ,  KATE NICOLAAS TEN ,  OTTENS JOOST JEROEN ,  VAN DONK GERRIT ,  VEN ES JOHANNES

IPC: H01L21/027

CPC classification number: G03B27/52 ,  G03F7/70341 ,  G03F7/70875

Abstract: PROBLEM TO BE SOLVED: To provide a system that reduces uneven cooling of an object so that the object may be maintained at a substantially uniform temperature. SOLUTION: A lithographic apparatus is provided that includes a substrate holder configured to hold a substrate, and a heat pipe configured to maintain the substrate holder at a substantially uniform temperature. The heat pipe has a chamber containing a liquid reservoir and a vapor space, and a heating element at least partly in contact with liquid in the chamber. COPYRIGHT: (C)2011,JPO&INPIT

Abstract translation: 要解决的问题：提供减少物体的不均匀冷却的系统，使得物体可以保持在基本均匀的温度。 解决方案：提供一种光刻设备，其包括被配置为保持基板的基板保持器和被配置为将基板保持器保持在基本上均匀的温度的热管。 热管具有容纳液体储存器和蒸汽空间的室，以及在室中至少部分地与液体接触的加热元件。 版权所有（C）2011，JPO＆INPIT

公开(公告)号：JP2011069608A

公开(公告)日：2011-04-07

申请号：JP2010210310

申请日：2010-09-21

Applicant: Asml Netherlands Bv ,  エーエスエムエル ネザーランズ ビー.ブイ.

Inventor： JACOBS JOHANNES HENRICUS WILHELMUS ,  KATE NICOLAAS TEN ,  OTTENS JOOST JEROEN ,  PATEL HRISHIKESH ,  VAN DONK GERRIT ,  VEN ES JOHANNES

IPC: F28D15/02 ,  H01L21/027

CPC classification number: F28D15/04 ,  G03F7/70341 ,  G03F7/70875

Abstract: PROBLEM TO BE SOLVED: To provide a system for reducing the non-uniform cooling of an object such that the object is maintained at a substantially uniform temperature.
SOLUTION: The heat pipe maintains the object at a substantially uniform temperature. The heat pipe includes a liquid reservoir and a vapor space, a chamber with one part defined by a condensation face, and a liquid transport device applying force adding to gravity to a liquid and transporting the liquid from the condensation face to the reservoir. The condensation face is formed such that a condensation liquid is moved toward the liquid transport device along the condensation face.
COPYRIGHT: (C)2011,JPO&INPIT

Abstract translation: 要解决的问题：提供一种用于减少物体的不均匀冷却的系统，使得物体保持在基本均匀的温度。

解决方案：热管将物体保持在基本均匀的温度。 热管包括液体储存器和蒸汽空间，具有由冷凝面限定的一部分的腔室以及将重力加到液体并将液体从冷凝面传送到储液器的液体输送装置。 冷凝面形成为使得冷凝液沿着冷凝面向液体输送装置移动。 版权所有（C）2011，JPO＆INPIT

公开(公告)号：JP2011066440A

公开(公告)日：2011-03-31

申请号：JP2010257492

申请日：2010-11-18

Applicant: Asml Netherlands Bv ,  エーエスエムエル ネザーランズ ビー.ブイ.

Inventor： ZAAL KOEN JACOBUS JOHANNES MARIA ,  JEROEN JOHANNES SOPHIA MARIA MERTENS ,  OTTENS JOOST JEROEN

IPC: H01L21/027 ,  G03F7/20

CPC classification number: G03F7/70341 ,  G03F7/70691

Abstract: PROBLEM TO BE SOLVED: To provide a lithographic apparatus capable of supplying a high refractive index liquid to a space between a final lens component and a substrate, and of reducing the distortion of the substrate.
SOLUTION: A burl plate 20 is intended for use in immersion lithography, wherein the substrate W is arranged on the burl (or pimple) plate 20 and the plate 20 is arranged on a flat surface of a wafer table WT. The burl plate 20 has a plurality of projections 21, 24 that are referred to as "burls" or "pimples" on the top surface thereof. The burl plate 20 has a higher burl density in a peripheral portion than in a middle so that when a higher pressure differential is applied in the peripheral portion, compression of the burls in the peripheral portion is substantially identical to that in the medial portion.
COPYRIGHT: (C)2011,JPO&INPIT

Abstract translation: 要解决的问题：提供能够向最终透镜部件和基板之间的空间供给高折射率液体并且减小基板的变形的光刻设备。 解决方案：喷砂板20用于浸没式光刻，其中基板W布置在凸起（或疙瘩）板20上，板20布置在晶片台WT的平坦表面上。 突出板20在其顶面上具有多个突起21,24，这些突起21,24被称为“毛刺”或“粉刺”。 凸缘板20在周边部分具有比中间更高的凸起密度，使得当在周边部分施加较高的压差时，周边部分中的毛刺的压缩与中间部分中的压缩基本相同。 版权所有（C）2011，JPO＆INPIT

公开(公告)号：JP2011040738A

公开(公告)日：2011-02-24

申请号：JP2010168948

申请日：2010-07-28

Applicant: Asml Netherlands Bv ,  エーエスエムエル ネザーランズ ビー.ブイ.

Inventor： CLAESSENS BERT JAN ,  PAUL VAN DER FEEN ,  GODFRIED HERMAN PHILIP

IPC: H01L21/027 ,  G03F7/20

CPC classification number: G03F7/7085

Abstract: PROBLEM TO BE SOLVED: To provide a lithographic apparatus including a radiation beam monitoring apparatus BM. SOLUTION: The radiation beam monitoring apparatus BM includes an optical element 20 configured to generate a diffraction pattern, and an imaging detector 22 located behind the optical element 20 and not in a focal plane F of the optical element. An analysis system or an analyzer 24 is connected to the imaging detector 22 to receive the output from the imaging detector 22. The imaging detector 22 is capable of detecting a mixture of spatial coherence and divergence of the radiation beam. COPYRIGHT: (C)2011,JPO&INPIT

Abstract translation: 要解决的问题：提供一种包括辐射束监测装置BM的光刻设备。 解决方案：辐射束监测装置BM包括被配置为产生衍射图案的光学元件20和位于光学元件20后面且不在光学元件的焦平面F中的成像检测器22。 分析系统或分析器24连接到成像检测器22以接收来自成像检测器22的输出。成像检测器22能够检测辐射束的空间相干性和发散性的混合。 版权所有（C）2011，JPO＆INPIT

公开(公告)号：JP2011040736A

公开(公告)日：2011-02-24

申请号：JP2010162398

申请日：2010-07-20

Applicant: Asml Netherlands Bv ,  エーエスエムエル ネザーランズ ビー.ブイ.

Inventor： KOOLE ROELOF ,  WUISTER SANDER FREDERIK

IPC: H01L21/027 ,  B29C59/02

CPC classification number: G03F7/0002 ,  B82Y10/00 ,  B82Y40/00

Abstract: PROBLEM TO BE SOLVED: To provide an imprint lithography apparatus that can suppress excessive use of gas. SOLUTION: The apparatus includes: an imprint template arrangement used for imprinting a pattern on a substrate 22 provided with a predetermined amount of imprintable medium 24; a substrate holder 20 configured to hold the substrate 22; and a chamber 40 having an inlet 42 to allow gas to flow into the chamber 40 and an outlet 44 to allow gas to flow out of the chamber 40, wherein the chamber 40 in use contains a gaseous atmosphere. The inlet 42 and the outlet 44 of the chamber 40 are connected to other constituent elements of a gas circulation system. The constituent elements include a gas circulation driver 48 configured to circulate gas in the gas circulation system and/or a gas purification unit 50 configured to purify the gas as it circulates in the gas circulation system. COPYRIGHT: (C)2011,JPO&INPIT

Abstract translation: 要解决的问题：提供可以抑制气体的过度使用的压印光刻设备。 该装置包括：用于在设置有预定量的可压印介质24的基板22上压印图案的印模模板布置; 构造成保持基板22的基板保持件20; 以及具有入口42的腔室40，以允许气体流入腔室40和出口44，以允许气体流出腔室40，其中使用中的腔室40含有气体气氛。 室40的入口42和出口44连接到气体循环系统的其它构成元件。 构成要素包括：气体循环驱动器48，被配置为在气体循环系统中循环气体;和/或气体净化单元50，被配置为在气体循环系统中循环时净化气体。 版权所有（C）2011，JPO＆INPIT

公开(公告)号：JP2011029658A

公开(公告)日：2011-02-10

申请号：JP2010220938

申请日：2010-09-30

Applicant: Asml Netherlands Bv ,  エーエスエムエル ネザーランズ ビー.ブイ.

Inventor： JACOBS HERNES ,  GILISSEN NOUD JAN ,  JANSEN HANS ,  KATE NICOLAAS TEN ,  KEMPER NICOLAAS R ,  ANTONIUS LEENDERS MARTINUS HENDRIKUS ,  LOOPSTRA ERIK R ,  HUBERTUS MULKENS JOHANNES C ,  HARMEN KLAAS VAN DER SCHOOT ,  STAVENGA MARCO KOERT ,  STREEFKERK BOB ,  VERHAGEN MARTINUS CORNELIS MARIA ,  STEIJAART PETER PAUL ,  VERMAELEN MARKUS MARTINUS PETRUS ADRIANUS ,  VAN DER HOEVEN JAN CORNELIS

IPC: H01L21/027

CPC classification number: G03F7/70341

Abstract: PROBLEM TO BE SOLVED: To moderate a defect induced by an immersion liquid in an immersion lithography projection apparatus where a liquid removal system surrounds a liquid supply system for providing liquid to a space between a projection system and a substrate. SOLUTION: The liquid removal system 100 is moveable relative to the liquid supply system (partially shown as a barrier member 12) and is controlled to have substantially zero velocity relative to the moving substrate table. The gap between the liquid supply system (partially shown as the barrier member 12) and the liquid removal system 100 may be covered and the atmosphere between the liquid supply system and the liquid removal system above the substrate table may be maintained so that the vapor pressure of liquid is relatively high. COPYRIGHT: (C)2011,JPO&INPIT

Abstract translation: 要解决的问题：为了缓和浸没光刻投影装置中的浸没液体引起的缺陷，其中液体移除系统围绕用于向投影系统和基板之间的空间提供液体的液体供应系统。 解决方案：液体移除系统100可相对于液体供应系统（部分地示出为阻挡构件12）移动，并且被控制为相对于移动的衬底台具有基本上零的速度。 可以覆盖液体供应系统（部分示为阻挡构件12）和液体移除系统100之间的间隙，并且可以保持液体供应系统和衬底台之上的液体移除系统之间的气氛，使得蒸气压 的液体比较高。 版权所有（C）2011，JPO＆INPIT

公开(公告)号：JP2011029644A

公开(公告)日：2011-02-10

申请号：JP2010166761

申请日：2010-07-26

Applicant: Asml Netherlands Bv ,  エーエスエムエル ネザーランズ ビー.ブイ.

Inventor： MARTENS ARJAN HUBRECHT JOSEF ANNA ,  KRAMER PIETER JACOB

IPC: H01L21/027

CPC classification number: G03F7/70858 ,  G03F7/70341

Abstract: PROBLEM TO BE SOLVED: To provide an immersion lithographic apparatus which accurately controls the temperature of an immersion fluid supplied to a space between the final element of a projection system and a substrate. SOLUTION: A fluid temperature control unit includes: a heater 100 configured to heat a first fluid in a first fluid path 110; a first temperature sensor 120 configured to measure a temperature of the first fluid in the first fluid path; a second temperature sensor 130 configured to measure a temperature of a second fluid in a second fluid path 140; and a controller 90 configured to control the heater 100 on the basis of the temperature detected by the first sensor and the temperature detected by the second sensor. COPYRIGHT: (C)2011,JPO&INPIT

Abstract translation: 要解决的问题：提供一种准确地控制供给到投影系统的最终元件与基板之间的空间的浸没流体的温度的浸没式光刻设备。 流体温度控制单元包括：加热器100，其构造成加热第一流体路径110中的第一流体; 第一温度传感器120，被配置为测量第一流体路径中的第一流体的温度; 配置成测量第二流体通道140中的第二流体的温度的第二温度传感器130; 以及控制器90，被配置为基于由第一传感器检测到的温度和由第二传感器检测到的温度来控制加热器100。 版权所有（C）2011，JPO＆INPIT

公开(公告)号：JP2011018899A

公开(公告)日：2011-01-27

申请号：JP2010134919

申请日：2010-06-14

Applicant: Asml Netherlands Bv ,  エーエスエムエル ネザーランズ ビー.ブイ.

Inventor： DAMEN JOHANNES WILHELMUS ,  SIJBEN ANKO JOZEF CORNELUS ,  ROZENVELD JOHANNES ALBERT ,  JEROEN-FRANK DEKKERS ,  BRINKHOF EUGENE MARIA ,  LANGELER HERMANUS ANTONIUS ,  VAN GOMPEL PETRUS ALBERTUS JOHANNES FRANCISCA

IPC: H01L21/027 ,  G03F7/20

CPC classification number: G03F7/70841 ,  G03F7/70858 ,  G03F7/70991

Abstract: PROBLEM TO BE SOLVED: To provide a lithography apparatus that reduces or removes insulation collapse and has an electrical connector suitable for low-pressure, high-voltage electric connection.SOLUTION: The lithographic projection apparatus is configured to transfer a pattern onto a substrate. The lithography apparatus includes a power source and the electrical connector. The electrical connector electrically connects the power source to another component of the lithography device. The electrical connector includes a laminate sequentially including: a first conductive layer 37; a first flexible insulating layer 36; a conductor 33 configured to carry a current; a second flexible insulating layer 36; and a second conductive layer 37.

Abstract translation: 要解决的问题：提供减少或消除绝缘塌陷的光刻设备，并具有适于低压，高压电连接的电连接器。解决方案：光刻投影设备被配置为将图案转印到基板上。 光刻设备包括电源和电连接器。 电连接器将电源电连接到光刻设备的另一部件。 电连接器包括顺序地包括：第一导电层37; 第一柔性绝缘层36; 配置为承载电流的导体33; 第二柔性绝缘层36; 和第二导电层37。