LITHOGRAPHIC PRINTING PLATE PRECURSORS WITH MERCAPTO-FUNCTIONALIZED FREE-RADICAL POLYMERIZABLE MONOMERS
    141.
    发明申请
    LITHOGRAPHIC PRINTING PLATE PRECURSORS WITH MERCAPTO-FUNCTIONALIZED FREE-RADICAL POLYMERIZABLE MONOMERS 审中-公开
    具有自由功能的自由可聚合单体的平版印刷机前驱体(LITHOGRAPHIC PRINTING PLATE PRECURSORS WITH MERCAPTO-FUNCTIONALIZED FREE-RADICAL POLYMERIZABLE MONOMERS

    公开(公告)号:WO2005071488A1

    公开(公告)日:2005-08-04

    申请号:PCT/EP2005/000489

    申请日:2005-01-19

    Abstract: Lithographic printing plate precursor comprising: a) an untreated or pretreated substrate and b) a radiation-sensitive coating comprising: (i) at least one polymeric binder soluble or swellable in aqueous alkaline developers; (ii) at least one free-radical polymerizable monomer and/or oligomer comprising at least one non-aromatic C-C double bond and at least one SH group in the molecule; and (iii) a radiation-sensitive initiator or initiator system for free-radical polymerization, wherein component (ii) has the formula (I) wherein each R 1a , R 1b and R 1c is independently selected from H, C 1 -C 6 alkyl, C 2 -C 8 alkenyl, aryl, halogen, CN and COOR 1d , wherein R id is H, C 1 -C 18 alkyl, C 2 -C 8 alkenyl, C 2 -C 8 alkynyl or aryl; and Z is an aliphatic, heterocyclic or heteroaromatic spacer or a combination of two or more thereof, wherein Z can optionally comprise one or more additional SH groups and/or one or more additional non-aromatic C-C double bonds; and each Z 1 is independently selected from a single bond, formulae (Ia), (Ib), (Ic), (Id), (Ie), (If), (Ig), (Ih), (Ij), (Ik), (Im), (In), (Io), (Ip), (Iq), (Ir), (Is), (It), (Iu), (Iv), wherein R 2a , R 2b and R 2c are independently selected from H, C 1 -C 6 alkyl and aryl, Z 2 is selected from a single bond, O, S and NR 2c , Z 3 is a single bond which is connected to Z, b is an integer from 1 to 10 and c is an integer from 1 to 3.

    Abstract translation: 包括:a)未处理或预处理的底物和b)辐射敏感性涂层,其包含:(i)至少一种可溶于或溶胀在含水碱性显影剂中的聚合物粘合剂; (ii)至少一种包含分子中至少一个非芳族C-C双键和至少一个SH基团的自由基可聚合单体和/或低聚物; 和(iii)用于自由基聚合的辐射敏感引发剂或引发剂体系,其中组分(ii)具有式(I),其中每个R 1a,R 1b和R 1c各自独立地选自 其中R 1是H,C 1 -C 18烷基,C 2 -C 8烯基,C 2 -C 8炔基或芳基;其中R 1是H,C 1 -C 6烷基,C 2 -C 8烯基,芳基,卤素,CN和COOR 并且Z是脂族,杂环或杂芳族间隔基或其两个或更多个的组合,其中Z可任选地包含一个或多个另外的SH基团和/或一个或多个另外的非芳族C-C双键; 并且每个Z 1独立地选自单键,式(Ia),(Ib),(Ic),(Id),(Ie),(If),(Ig),(Ih) ,(Ik),(Im),(In),(Io),(Ip),(Iq),(Ir),(Is),(It),(Iu),(Iv) R 2b和R 2c独立地选自H,C 1 -C 6烷基和芳基,Z 2选自单键,O,S和NR 2c,Z 3是单 键连接Z,b为1〜10的整数,c为1〜3的整数。

    RADIATION-SENSITIVE COMPOSITIONS AND IMAGEABLE ELEMENTS BASED THEREON
    142.
    发明申请
    RADIATION-SENSITIVE COMPOSITIONS AND IMAGEABLE ELEMENTS BASED THEREON 审中-公开
    基于此的辐射敏感组合物和可成像元素

    公开(公告)号:WO2005054952A1

    公开(公告)日:2005-06-16

    申请号:PCT/EP2004/013138

    申请日:2004-11-18

    CPC classification number: G03F7/031 Y10T428/31591

    Abstract: Radiation-sensitive composition comprising (a) at least one photopolymerizable compound with at least one ethylenically unsaturated group accessible to a free-radical polymerization, wherein the at least one photopolymerizable compound has a molecular weight of 3,000 or less and can be obtained by reacting a diisocyanate with (I) an ethylenically unsaturated compound with a hydroxy group, and at the same time (ii) a saturated organic compound with an NH group and an OH group, wherein the reactants are used in amounts according to the following condition: Number of moles of isocyanate groups ≤ number of moles of OH plus NH groups; (b) at least one sensitizer which absorbs radiation from the wavelength range of 250 to 450 nm of the electromagnetic spectrum and is selected from: dihydropyridines of formula (I) and oxazole derivatives of formula (II): (II) (c) at least one coinitiator capable of forming free radicals together with the sensitizer (b) and selected from 2,2’, 4,4’, 5’5-hexaarylbiimidazoles, compounds with at least one photolytically cleavable trihalogenmethyl group, diaryliodonium salts, triarylsulfonium salts and N-heterocyclic compounds with at least one nitrogen atom in the ring, having an oxy substituent at least one ring nitrogen atom, and mixtures of the above compounds; and (d) optionally one or more components selected from alkali-soluble binders, colorants, exposure indicators, plasticizers, chain transfer agents, leuco dyes, surfactants, inorganic fillers and thermopolymerization inhibitors; with the proviso that the radiation-sensitive composition does not comprise a metallocene.

    Abstract translation: 辐射敏感性组合物,其包含(a)至少一种可光聚合化合物与至少一种可自由基聚合的烯键式不饱和基团,其中所述至少一种可光聚合化合物的分子量为3,000以下,可以通过使 二异氰酸酯与(I)具有羟基的烯属不饱和化合物,同时(ii)具有NH基和OH基的饱和有机化合物,其中反应物的用量按照以下条件使用: 异氰酸酯基团的摩尔数= OH加NH基团的摩尔数; (b)至少一种吸收来自电磁波谱的波长范围为250至450nm的辐射的敏化剂,并选自:式(I)的二氢吡啶和式(II)的恶唑衍生物:(II)(c) 能够与敏化剂(b)一起形成自由基的至少一种共引发剂,并选自2,2',4,4',5,5'-六芳基联咪唑,具有至少一个可光解裂解的三卤代甲基的化合物,二芳基碘鎓盐,三芳基锍盐 和环中具有至少一个氮原子的N-杂环化合物,至少一个环氮原子具有氧取代基,以及上述化合物的混合物; 和(d)任选的一种或多种选自碱溶性粘合剂,着色剂,曝光指示剂,增塑剂,链转移剂,无色染料,表面活性剂,无机填料和热聚合抑制剂的组分; 条件是辐射敏感组合物不包含金属茂。

    PROCESS FOR PRODUCTION OF HEAT-SENSITIVE IMAGEABLE ELEMENTS
    143.
    发明申请
    PROCESS FOR PRODUCTION OF HEAT-SENSITIVE IMAGEABLE ELEMENTS 审中-公开
    生产感应性成像元件的方法

    公开(公告)号:WO2005039878A1

    公开(公告)日:2005-05-06

    申请号:PCT/EP2004/011379

    申请日:2004-10-11

    Abstract: The invention relates to a process for the production of a heat-sensitive imageable element comprising: (a) providing a substrate, (b) applying a first coating solution, comprising at least one photothermal conversion material, at least one polymer A soluble or swellable in an aqueous alkaline developer and at least one solvent, (c) drying, (d) applying a second coating solution, comprising at least one cross-linkable polyfunctional enolether, at least one polymer B comprising hydroxy groups and/or carboxy groups, and at least one solvent, wherein the polymer used in the first coating solution does not dissolve in this solvent, wherein the second coating solution does not contain a photothermal conversion material, and (e) drying at a temperature of at least 60°C.

    Abstract translation: 本发明涉及一种用于生产热敏可成像元件的方法,包括:(a)提供基底,(b)施​​加包含至少一种光热转换材料的第一涂层溶液,至少一种可溶或可膨胀的聚合物A 在水性碱性显影剂和至少一种溶剂中,(c)干燥,(d)施加包含至少一个可交联的多官能烯烃的至少一种包含羟基和/或羧基的聚合物B的第二涂料溶液,以及 至少一种溶剂,其中在第一涂布溶液中使用的聚合物不溶于该溶剂,其中第二涂料溶液不含光热转化材料,和(e)在至少60℃的温度下干燥。

    PROCESS AND COMPOSITION FOR GUMMING LITHOGRAPHIC PRINTING PLATES
    144.
    发明申请
    PROCESS AND COMPOSITION FOR GUMMING LITHOGRAPHIC PRINTING PLATES 审中-公开
    用于雕刻平版印刷板的方法和组合

    公开(公告)号:WO2005037569A1

    公开(公告)日:2005-04-28

    申请号:PCT/EP2004/010898

    申请日:2004-09-29

    CPC classification number: B41N3/08

    Abstract: The process for gumming lithographic printing plates comprises (a) providing a lithographic printing plate; (b) providing a gumming solution comprising (I) water and (II) at least one component selected from water-soluble starch and water-soluble starch derivatives; (c) applying the gumming solution onto the printing plate provided in step (a), and is characterized in that the gumming solution has a pH value >7.

    Abstract translation: 用于上胶平版印刷版的方法包括(a)提供平版印刷版; (b)提供包含(I)水和(II)选自水溶性淀粉和水溶性淀粉衍生物中的至少一种成分的上胶溶液; (c)将上胶溶液涂布到步骤(a)中提供的印版上,其特征在于上胶溶液的pH值> 7。

    HEAT-SENSITIVE POSITIVE WORKING LITHOGAPHIC PRINTING PLATE PRECURSOR
    146.
    发明申请
    HEAT-SENSITIVE POSITIVE WORKING LITHOGAPHIC PRINTING PLATE PRECURSOR 审中-公开
    热敏正极工作立体印刷机前驱板

    公开(公告)号:WO2005016645A1

    公开(公告)日:2005-02-24

    申请号:PCT/EP2004/008911

    申请日:2004-08-09

    Abstract: Heat-sensitive element comprising a) an optionally pretreated substrate; b) a positive working coating comprising (i) at least 40 wt.-%, based on the dry weight of the coating, of at least one polymer soluble in aqueous alkaline developer selected from novolak resins, functionalized novolak resins, polyvinylphenol resins, polyvinyl cresols and poly(meth)acrylates with phenolic and/or sulfonamide side groups, (ii) 01-20 wt.-%, based on the dry weight of the coating, of at least one (C 4 -C 20 alkyl)phenol novolak resin insoluble in aqueous alkaline developer, and (iii) optionally at least one further component selected from polymer particles, surfactants, contrast dyes and pigments, inorganic fillers, antioxidants, print-out dyes, carboxylic acid derivatives of cellulose polymers, plasticizers and substances capable of absorbing radiation of a wavelength from the range of 650 to 1,300 nm and converting it into heat.

    Abstract translation: 热敏元件包括:a)任选预处理的基材; b)正性工作涂层,其包含(i)基于所述涂层的干重至少40重量%的至少一种可溶于含水碱性显影剂的聚合物,其选自酚醛清漆树脂,官能化酚醛清漆树脂,聚乙烯基苯酚树脂,聚乙烯基 甲酚和具有酚和/或磺酰胺侧基的聚(甲基)丙烯酸酯,(ii)基于涂层干重的01-20重量%的至少一种(C 4 -C 20烷基)苯酚酚醛清漆树脂不溶于 在含水碱性显影剂中,和(iii)任选的至少一种选自聚合物颗粒,表面活性剂,造影剂和颜料的其它组分,无机填料,抗氧化剂,印刷染料,纤维素聚合物的羧酸衍生物,增塑剂和能够吸收的物质 波长范围为650至1300nm的辐射并将其转换成热。

    RADIATION-SENSITIVE COMPOSITIONS COMPRISING OXAZOLE DERIVATIVES AND IMAGEABLE ELEMENTS BASED THEREON
    147.
    发明申请
    RADIATION-SENSITIVE COMPOSITIONS COMPRISING OXAZOLE DERIVATIVES AND IMAGEABLE ELEMENTS BASED THEREON 审中-公开
    包含氧唑衍生物和可成像元素的辐射敏感组合物

    公开(公告)号:WO2004074930A3

    公开(公告)日:2005-02-03

    申请号:PCT/EP2004001706

    申请日:2004-02-20

    CPC classification number: G03F7/029 G03F7/031

    Abstract: Radiation-sensitive element comprising: (a) one or more types of monomers each comprising at least one ethylenically unsaturated group accessible to a free-radical polymerization, (b) at least one sensitizer, (c) at least one coinitiator capable of forming free radicals together with the sensitizer (b) and selected from the following classes of compounds: metallocenes; 1,3,5-triazine derivatives with one to three CX3 groups, wherein X represents chlorine or bromine; peroxides; hexaarylbiimidazoles; oxime ethers; oxime esters; N-aryl glycines and derivatives thereof; thiol compounds; N-aryl, S-aryl and O-aryl polycarboxylic acids with at least 2 carboxyl groups of which at least one is bonded to the N, S or O atom of the aryl unit; alkyltriarylborates; benzoin ethers; benzoin esters; trihalogenomethylarylsulfones; amines; N,N-dialkylaminobenzoic acid esters; aromatic sulfonyl halides; trihalogenomethylsulfones; imides; diazosulfonates; 9,10-dihydroanthracene derivatives; a-hydroxy and a-amino acetophenones; and (d) optionally one or more components selected from alkali-soluble binders, colorants, exposure indicators, plasticizers, chain transfer agents, leuco dyes, surfactants, inorganic fillers and thermopolymerization inhibitors characterized in that the at least one sensitizer is an oxazole derivative of the formula (I), wherein each R , R and R is independently selected from a halogen atom, an optionally substituted alkyl group, an optionally substituted aryl group, which may also be fused, an optionally substituted aralkyl group, a group -NR R and a group - , wherein R and R are independently selected from a hydrogen atom, an alkyl, aryl or ralkyl group, R is an alkyl, aryl or aralkyl group or a hydrogen atom and k, m and n are independently 0 or an integer from 1 to 5.

    Abstract translation: 辐射敏感元件包括:(a)一种或多种类型的单体,每种单体各自包含可自由基聚合的至少一个烯键式不饱和基团,(b)至少一种敏化剂,(c)至少一种能形成游离基的共引发剂 自由基与敏化剂(b)一起并选自以下类别的化合物:金属茂; 具有一至三个CX 3基团的1,3,5-三嗪衍生物,其中X表示氯或溴; 过氧化物; hexaarylbiimidazoles; 肟醚 肟酯 N-芳基甘氨酸及其衍生物; 硫醇化合物; 具有至少2个羧基的N-芳基,S-芳基和O-芳基多元羧酸,其中至少一个与芳基单元的N,S或O原子键合; alkyltriarylborates; 苯偶姻醚; 苯偶姻酯; trihalogenomethylarylsulfones; 胺; N,N-二烷基氨基苯甲酸酯; 芳香族磺酰卤; trihalogenomethylsulfones; 酰亚胺; diazosulfonates; 9,10-二氢蒽衍生物; α-羟基和α-氨基苯乙酮; 和(d)任选的一种或多种选自碱溶性粘合剂,着色剂,曝光指示剂,增塑剂,链转移剂,无色染料,表面活性剂,无机填料和热聚合抑制剂的组分,其特征在于所述至少一种敏化剂是 式(I),其中每个R 1,R 2和R 3独立地选自卤素原子,任选取代的烷基,任选取代的芳基,其也可以稠合,任选地 取代的芳烷基,基团-NR 4 R 5和基团-OR 6,其中R 4和R 5独立地选自氢原子,烷基,芳基或R 1烷基,R 6是烷基,芳基或芳烷基或氢原子,k,m和n分别为0或1〜5的整数。

    MODIFIED NEUGEBAUER MODEL FOR HALFTONE IMAGING SYSTEMS
    148.
    发明申请
    MODIFIED NEUGEBAUER MODEL FOR HALFTONE IMAGING SYSTEMS 审中-公开
    改进的黑客成像系统的NEUGEBAUER模型

    公开(公告)号:WO2005006737A1

    公开(公告)日:2005-01-20

    申请号:PCT/US2004/021198

    申请日:2004-07-01

    CPC classification number: H04N1/6011 H04N1/603

    Abstract: A technique for profiling a color printing device employs a modified Neugebauer color mixing model. The modeling technique makes use of a variable dot gain value and "n factor." The variable dot gain adjustment value may vary according to the particular tristimulus channel under evaluation. In addition, the variable dot gain value may vary according to the particular Neugebauer primary over which a halftone dot is printed. Accordingly, the technique may rely on an array of different dot gain values and n factors that correspond to different combinations of color channels and overprint conditions. As a further feature, the techniques may rely on a dot gain formula that relates halftone dot variation, i.e., fringe thickness, to the size of the halftone dot. This relationship tends to produce a dot gain model that more closely resembles the actual dot gain behavior on a printing press.

    Abstract translation: 彩色印刷装置的成型技术采用改良的Neugebauer混色模型。 建模技术利用可变点增益值和“n因子”。 可变点增益调整值可以根据评估中的特定三刺激通道而变化。 此外,可变点增益值可以根据打印半色调点的特定的Neugebauer初级而变化。 因此,该技术可以依赖于对应于颜色通道和套印条件的不同组合的不同点增益值和n因子的阵列。 作为另一个特征,这些技术可以依赖于将半色调点变化即条纹厚度与半色调点的大小相关联的点增益公式。 这种关系往往会产生一个更接近于印刷机上实际的网点增益行为的点增益模型。

    RADIATION-SENSITIVE COMPOSITIONS CONTAINING POLYMERIC SULFONATE ACID GENERATORS AND THEIR USE IN IMAGING
    149.
    发明申请
    RADIATION-SENSITIVE COMPOSITIONS CONTAINING POLYMERIC SULFONATE ACID GENERATORS AND THEIR USE IN IMAGING 审中-公开
    含有聚合硫酸发生器的辐射敏感组合物及其在成像中的应用

    公开(公告)号:WO03102692A8

    公开(公告)日:2005-01-20

    申请号:PCT/US0317063

    申请日:2003-05-29

    Inventor: TAO TING

    Abstract: A radiation-sensitive patterning composition comprising: (1) at least one acid generating compound selected from compounds of formula (I) and formula (II) wherein: R1, R2, R3, R4, R5, and R6, are independently selected from the group consisting of hydrogen, nitro, hydroxyl, carbonyl, halogen, cyano, unsubstituted and substituted alkyl groups, unsubstituted and substituted cycloalkyl groups; unsubstituted and substituted alkoxy groups, and unsubstituted and substituted aryl groups; wherein: X is an onium ion selected from the group consisting of diazonium, iodonium, sulfonium, phosphonium, bromonium, chloronium, oxysulfoxonium, oxysulfonium, sulfoxonium, selenium, tellurium and arsenium; and n is an integer from 4 to 100; (2) at least one cross-linking agent cross-linkable by an acid; (3) at least one polymer compound capable of reacting with the cross-linking agent; and (4) at least one infrared absorbing compound.

    Abstract translation: 一种辐射敏感性图案化组合物,其包含:(1)至少一种选自式(I)和式(II)的化合物的产酸化合物,其中:R 1,R 2,R 3,R 4,R 5和R 6独立地选自 由氢,硝基,羟基,羰基,卤素,氰基,未取代和取代的烷基,未取代和取代的环烷基组成的基团; 未取代和取代的烷氧基,以及未取代和取代的芳基; 其中:X +是选自重氮,碘鎓,锍,鏻,溴鎓,氯鎓,氧硫氧基鎓,氧锍,氧化锍,硒,碲和砷的鎓离子; n为4〜100的整数。 (2)至少一种可被酸交联的交联剂; (3)能够与交联剂反应的至少一种高分子化合物; 和(4)至少一种红外吸收化合物。

    ENSURING ACCURATE MEASUREMENTS FOR SOFT PROOFING SYSTEM

    公开(公告)号:WO2004091190A3

    公开(公告)日:2004-10-21

    申请号:PCT/US2004/009926

    申请日:2004-03-31

    Abstract: Techniques for providing accurate output measurement and calibration in soft proofing systems incorporate one or more features to promote controlled viewing conditions. For example, a soft proofing system is described in which an administator can control the proofing process by limiting or restricting the ability to view an image until acceptable viewing conditions have been met. For example, the ability to view the image can be restricted until the viewing station has been calibrated using a calibration device known to support calibration of the viewing station to less than or equal to a maximum of error. With controlled viewing conditions and, more particularly, controlled calibration conditions, the soft proof reviewers obtain more uniform output. In this manner, the system can provide safeguards to ensure that the images viewed at the viewing station have acceptable color accuracy.

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