公开(公告)号：JP2014157358A

公开(公告)日：2014-08-28

申请号：JP2014053073

申请日：2014-03-17

Applicant: Fujifilm Corp ,  富士フイルム株式会社

Inventor： IWATO KAORU ,  KATAOKA SHOHEI ,  TARUYA SHINJI ,  KAMIMURA SATOSHI ,  ENOMOTO YUICHIRO ,  FUJII KANA ,  KATO KEITA ,  DOBASHI TORU ,  MIZUTANI KAZUYOSHI

IPC: G03F7/039 ,  G03F7/004 ,  G03F7/038

Abstract: PROBLEM TO BE SOLVED: To provide an active light-sensitive or a radiation-sensitive resin composition excellent in development defect performance, immersion defect performance and marginal resolving power, and capable of forming a pattern having a good shape, and to provide a pattern formation method using the same.SOLUTION: There is provided an active light-sensitive or a radiation-sensitive resin composition containing: a resin which has a reduced solubility to a developer containing an organic solvent by an action of an acid, has a repeating unit (P) having a group generating an alcoholic hydroxyl group by degradation by action of the acid, and has no fluorine atom and/or an aromatic group; a compound generating the acid by irradiation of an active light or radiation rays; and a hydrophobic resin. The active light-sensitive or the radiation-sensitive resin composition contains at least a compound generating the acid containing no fluorine atom by irradiation of the active light or the radiation rays as the compound generating the acid by irradiation of the active light or the radiation rays.

Abstract translation: 要解决的问题：提供显影缺陷性能，浸渍缺陷性能和边缘分辨能力优异的活性光敏性或辐射敏感性树脂组合物，并且能够形成具有良好形状的图案，并提供图案形成 提供了一种有效的光敏性或辐射敏感性树脂组合物，其含有：通过酸作用使含有有机溶剂的显影剂的溶解性降低的树脂具有重复单元（ P）具有通过酸作用而降解而产生醇羟基的基团，并且不具有氟原子和/或芳族基团; 通过活性光或辐射线的照射产生酸的化合物; 和疏水性树脂。 活性感光性树脂组合物或辐射敏感性树脂组合物至少含有通过照射活性光或辐射线而产生不含氟原子的酸的化合物，作为通过照射活性光或辐射线产生酸的化合物 。

公开(公告)号：JP2014081657A

公开(公告)日：2014-05-08

申请号：JP2014014421

申请日：2014-01-29

Applicant: Fujifilm Corp ,  富士フイルム株式会社

Inventor： IWATO KAORU ,  IIZUKA YUSUKE ,  SAEGUSA HIROSHI ,  HIRANO SHUJI ,  FUKUHARA TOSHIAKI

IPC: G03F7/004 ,  C08F220/28 ,  C08F220/38 ,  G03F7/039

Abstract: PROBLEM TO BE SOLVED: To provide an active light sensitive or radiation sensitive resin composition useful for fine pattern formation in semiconductor manufacturing and capable of remarkably reducing pattern collapse, development defects, liquid immersion defects (a water remaining defect, a valve defect) and scum, and a method for forming a pattern using the same.SOLUTION: The active light sensitive or radiation sensitive resin composition is characterized in that the retreat contact angle of water in the surface of a film formed by the active light sensitive or radiation sensitive resin composition is 65° or higher, and the retreat contact angle of water in the surface of the film after treatment with an alkali developer is 35° or lower. The method for forming a pattern uses the same.

Abstract translation: 要解决的问题：提供用于半导体制造中精细图案形成的活性光敏或辐射敏感性树脂组合物，并且能够显着降低图案塌陷，显影缺陷，液浸缺陷（水残留缺陷，阀缺陷）和浮渣 以及使用其形成图案的方法。解决方案：活性光敏或辐射敏感性树脂组合物的特征在于由活性光敏或辐射敏感树脂组合物形成的膜的表面中的水的后退接触角 为65°以上，用碱性显影剂处理后的膜表面的后退接触角为35°以下。 形成图案的方法使用相同的方式。

公开(公告)号：JP2014006491A

公开(公告)日：2014-01-16

申请号：JP2012232271

申请日：2012-10-19

Applicant: Fujifilm Corp ,  富士フイルム株式会社

Inventor： SHIBUYA AKINORI ,  TOKUGAWA YOKO ,  MATSUDA TOMOKI ,  ITO JUNICHI ,  KATAOKA SHOHEI ,  FUKUHARA TOSHIAKI ,  TANGO NAOHIRO ,  IWATO KAORU ,  YOSHITOME MASAHIRO ,  SUGIYAMA SHINICHI

IPC: G03F7/004 ,  C08F20/00 ,  G03F7/038 ,  G03F7/039 ,  H01L21/027

CPC classification number: G03F7/038 ,  C07C303/32 ,  C07C309/04 ,  C07C309/12 ,  C07D295/16 ,  C07D327/06 ,  C07D339/08 ,  G03F7/0045 ,  G03F7/0046 ,  G03F7/0397 ,  G03F7/11 ,  G03F7/2041 ,  G03F7/325

Abstract: PROBLEM TO BE SOLVED: To provide: an actinic ray- or radiation-sensitive resin composition which is excellent in exposure latitude and pattern roughness such as LWR, reduces occurrence of particles over time, and reduces, in the case of liquid-immersion exposure, elution of generated acids into an immersion liquid; an actinic ray- or radiation-sensitive film based on the same; and a method of forming a pattern.SOLUTION: The actinic ray- or radiation-sensitive resin composition includes (A) a compound represented by the specified general formula (1) that generates an acid when exposed to actinic rays or radiation, and (B) a resin.

Abstract translation: 要解决的问题：提供：曝光宽容度和图案粗糙度如LWR优异的光化射线或辐射敏感性树脂组合物可以减少颗粒随时间的发生，并且在液浸曝光的情况下， 将产生的酸溶解到浸液中; 基于其的光化射线或辐射敏感膜; 以及形成图案的方法。解决方案：光化射线或辐射敏感性树脂组合物包含（A）当暴露于光化射线或辐射时产生酸的特定通式（1）表示的化合物和（B ）树脂。

公开(公告)号：JP2013167731A

公开(公告)日：2013-08-29

申请号：JP2012030486

申请日：2012-02-15

Applicant: Fujifilm Corp ,  富士フイルム株式会社

Inventor： SHIBUYA AKINORI ,  TOKUGAWA YOKO ,  MATSUDA TOMOKI ,  ITO JUNICHI ,  KATAOKA SHOHEI ,  FUKUHARA TOSHIAKI ,  TANGO NAOHIRO ,  IWATO KAORU ,  YOSHITOME MASAHIRO ,  SUGIYAMA SHINICHI

IPC: G03F7/004 ,  C08F220/26 ,  G03F7/038

Abstract: PROBLEM TO BE SOLVED: To provide an actinic ray-sensitive or radiation-sensitive resin composition capable of suppressing pattern collapse and improving LWR (line width roughness) and storage stability, and a pattern forming method using the composition.SOLUTION: An actinic ray-sensitive or radiation-sensitive resin composition comprises: (A) resin having a repeating unit expressed by the following general formula (1) and a repeating unit that is decomposed by an action of an acid to increase the solubility in an alkali developing solution; (B) a compound Rincluding at least one nitrogen atom or a compound which is an ionic compound including a basic moiety Rincluding at least one nitrogen atom, both having such a property that R-Hor R-Has conjugated acids thereof has a pKa of 8 or lower; and (C) a compound that generates an acid by irradiation with actinic rays or radiation. In the general formula (1), L represents a single bond or a divalent connecting group; Rrepresents a hydrogen atom or an alkyl group; and Z represents a cyclic acid anhydride structure.

Abstract translation: 要解决的问题：提供能够抑制图案塌陷并提高LWR（线宽粗糙度）和保存稳定性的光化射线敏感性或辐射敏感性树脂组合物以及使用该组合物的图案形成方法。解决方案： 敏感或辐射敏感性树脂组合物包含：（A）具有由以下通式（1）表示的重复单元的树脂和通过酸作用分解以提高在碱性显影液中的溶解度的重复单元; （B）包含至少一个氮原子的化合物或作为包含碱性部分的离子化合物的化合物包含至少一个氮原子的化合物，其具有R-Hor R-has共轭酸的pKa为8的性质 或更低; 和（C）通过用光化射线或辐射照射产生酸的化合物。 在通式（1）中，L表示单键或二价连接基团; R表示氢原子或烷基; Z表示环状酸酐结构。

公开(公告)号：JP2013114085A

公开(公告)日：2013-06-10

申请号：JP2011260909

申请日：2011-11-29

Applicant: Fujifilm Corp ,  富士フイルム株式会社

Inventor： SHIBUYA AKINORI ,  IWATO KAORU

IPC: G03F7/004 ,  C08F20/10 ,  C08F20/18 ,  C08F20/54 ,  G03F7/039 ,  H01L21/027

CPC classification number: G03F7/004 ,  G03F7/0045 ,  G03F7/0046 ,  G03F7/0397 ,  G03F7/11 ,  G03F7/2041 ,  Y10T428/24628

Abstract: PROBLEM TO BE SOLVED: To provide an actinic ray-sensitive or radiation-sensitive resin composition having liquid physical properties such as a large depth of focus latitude and generation of fewer particles with lapse of time, and to provide a resist film, a pattern forming method, a method for manufacturing an electronic device and an electronic device using the composition.SOLUTION: The actinic ray-sensitive or radiation-sensitive resin composition includes (A) a compound that generates an acid by irradiation with actinic rays or radiation and (B) a resin that is decomposed by an action of an acid to increase the solubility with an alkali developing solution. And the actinic ray-sensitive or radiation-sensitive resin composition includes, as the above compound (A), a combination (A-1) comprising specified two compounds or a combination (A-2) comprising specified two compounds. The composition is used for the resist film, the pattern forming method, the method for manufacturing an electronic device, and the electronic device.

Abstract translation: 要解决的问题：提供具有液晶物理性质如光焦度宽的纬向和随时间产生较少颗粒的光化射线敏感或辐射敏感性树脂组合物，并提供抗蚀剂膜， 图案形成方法，电子装置的制造方法和使用该组合物的电子装置。 光敏性或辐射敏感性树脂组合物包含（A）通过光化射线或辐射照射产生酸的化合物和（B）通过酸的作用而分解的树脂以增加 与碱性显影液的溶解度。 另外，作为上述化合物（A），包含特定的两种化合物的组合（A-1）或包含特定的两种化合物的组合（A-2），所述光化学敏感性或辐射敏感性树脂组合物包含。 该组合物用于抗蚀剂膜，图案形成方法，电子器件的制造方法和电子器件。 版权所有（C）2013，JPO＆INPIT

公开(公告)号：JP2013097003A

公开(公告)日：2013-05-20

申请号：JP2011236456

申请日：2011-10-27

Applicant: Fujifilm Corp ,  富士フイルム株式会社

Inventor： KATO KEITA ,  SHIRAKAWA MICHIHIRO ,  OTANI TADAHIRO ,  NAKAMURA ATSUSHI ,  TAKAHASHI HIDETOMO ,  IWATO KAORU

IPC: G03F7/095 ,  G03F7/004 ,  G03F7/038 ,  G03F7/11 ,  G03F7/32 ,  H01L21/027

CPC classification number: G03F7/094 ,  G03F7/0392 ,  G03F7/0397 ,  G03F7/091 ,  G03F7/095 ,  G03F7/20 ,  G03F7/2041 ,  G03F7/325

Abstract: PROBLEM TO BE SOLVED: To provide a method for forming a pattern for reducing a residue on a substrate and obtaining a favorable cross-sectional shape.SOLUTION: The method for forming a pattern includes steps of: (a) forming an antireflection film on a substrate by using a first resin composition (I); (b) forming a resist film on the antireflection film by using a second resin composition (II); (c) exposing a laminate film to light; and (d) forming a negative pattern by developing the exposed laminate film by using a developing solution containing an organic solvent. The first resin composition (I) contains a first resin having polarity that is increased by the action of acid to decrease solubility with the developing solution containing an organic solvent. The second resin composition (II) contains a second resin having polarity that is increased by the action of acid to decrease solubility with the developing solution containing an organic solvent. At least one of (I) and (II) contains a compound that generates acid by irradiation with actinic rays or radiation.

Abstract translation: 要解决的问题：提供一种用于形成用于减少基板上残留物的图案的方法，并获得良好的横截面形状。 解决方案：形成图案的方法包括以下步骤：（a）通过使用第一树脂组合物（I）在基材上形成抗反射膜; （b）通过使用第二树脂组合物（II）在抗反射膜上形成抗蚀剂膜; （c）将层压薄膜曝光; 和（d）通过使用含有有机溶剂的显影液显影曝光的层压膜形成负图案。 第一树脂组合物（I）含有具有通过酸作用而增加的极性的第一树脂，以降低与含有机溶剂的显影液的溶解度。 第二树脂组合物（II）含有具有通过酸作用而增加的极性的第二树脂，以降低与含有机溶剂的显影液的溶解度。 （I）和（II）中的至少一种含有通过用光化射线或辐射照射产生酸的化合物。 版权所有（C）2013，JPO＆INPIT

公开(公告)号：JP2013097002A

公开(公告)日：2013-05-20

申请号：JP2011236455

申请日：2011-10-27

Applicant: Fujifilm Corp ,  富士フイルム株式会社

Inventor： SHIRAKAWA MICHIHIRO ,  KATO KEITA ,  OTANI TADAHIRO ,  NAKAMURA ATSUSHI ,  TAKAHASHI HIDETOMO ,  IWATO KAORU

IPC: G03F7/095 ,  G03F7/038 ,  G03F7/11 ,  G03F7/32 ,  H01L21/027

CPC classification number: G03F7/095 ,  G03F7/038 ,  G03F7/0392 ,  G03F7/0397 ,  G03F7/0757 ,  G03F7/091 ,  G03F7/094 ,  G03F7/11 ,  G03F7/2041 ,  G03F7/30 ,  G03F7/325 ,  H01L21/0271

Abstract: PROBLEM TO BE SOLVED: To provide a method for forming a pattern for preventing pattern collapse in a process of forming a negative pattern by organic solvent development, and to provide a laminate resist pattern formed by the method, a laminate film for organic solvent development suitably used for the pattern forming method, a resist composition suitably used for the pattern forming method, a method for manufacturing an electronic device, and an electronic device.SOLUTION: The method for forming a pattern includes steps of: (a) forming a first film on a substrate by using a first resin composition (I) containing a resin, in which the content of a repeating unit having a group that is decomposed by the action of acid to produce a polar group is 20 mol% or less with respect to the whole repeating units of the resin; (b) forming a second film on the first film by using a second resin composition (II), which is different from the first resin composition (I) and which contains a resin having a group that is decomposed by the action of acid to produce a polar group, and a compound that generates acid by irradiation with actinic rays or radiation; (c) exposing the laminate film having the first film and the second film to light; and (d) forming a negative pattern by developing the first film and the second film in the exposed laminate film by using a developing solution containing an organic solvent.

Abstract translation: 要解决的问题：提供一种通过有机溶剂显影在形成负型图案的过程中形成用于防止图案塌陷的图案的方法，并且提供通过该方法形成的层压抗蚀剂图案，用于有机的层压膜 适合用于图案形成方法的溶剂显影，适用于图案形成方法的抗蚀剂组合物，电子器件的制造方法和电子器件。 解决方案：形成图案的方法包括以下步骤：（a）通过使用含有树脂的第一树脂组合物（I）在基材上形成第一膜，其中具有以下基团的重复单元的含量： 相对于树脂的整个重复单元，通过酸的作用分解以产生极性基团为20摩尔％以下; （b）通过使用与第一树脂组合物（I）不同的第二树脂组合物（II）在第一膜上形成第二膜，并且含有具有通过酸作用分解的基团的树脂以产生 极性基团和通过用光化射线或辐射照射产生酸的化合物; （c）使具有第一膜和第二膜的层压膜曝光; 和（d）通过使用含有有机溶剂的显影液在显影的层叠膜中显影第一膜和第二膜来形成负图案。 版权所有（C）2013，JPO＆INPIT

公开(公告)号：JP2012173367A

公开(公告)日：2012-09-10

申请号：JP2011032679

申请日：2011-02-17

Applicant: Fujifilm Corp ,  富士フイルム株式会社

Inventor： IIZUKA YUSUKE ,  SHIBUYA AKINORI ,  IWATO KAORU ,  TANGO NAOHIRO

IPC: G03F7/039 ,  C07C381/12 ,  C08F20/10 ,  G03F7/004 ,  H01L21/027

Abstract: PROBLEM TO BE SOLVED: To provide a radiation-sensitive resin composition excellent in all of line edge roughness, pattern features, followability for an immersion liquid and dry etching durability, and to provide a resist film and a pattern forming method using the composition.SOLUTION: The radiation-sensitive resin composition contains: (A) a resin having a repeating unit expressed by general formula (I-1) or (I-2); and (C) a compound, which has a molar absorption coefficient ε, at a wavelength of 193 nm measured in an acetonitrile solvent, of a relative ratio of 0.8 or less with respect to triphenylsulfonium nonafluorobutane sulfonate and which generates an acid by irradiation with radiation. In general formulae (I-1) and (I-2), ARand ARrepresent an aromatic group; Rrepresents an alkyl group, a cycloalkyl group or an aryl group; Aand Aeach independently represent a hydrogen atom, an alkyl group, a halogen atom, a cyano group or an alkyloxycarbonyl group; and Z represents a linking group to form a ring together with C-AR.

Abstract translation: 要解决的问题：提供一种在线边缘粗糙度，图案特征，浸渍液的追随性和干蚀刻耐久性方面优异的辐射敏感性树脂组合物，并提供抗蚀剂膜和使用该方法的图案形成方法 组成。 解决方案：辐射敏感性树脂组合物含有：（A）具有由通式（I-1）或（I-2）表示的重复单元的树脂; 和（C）在乙腈溶剂中测量的在193nm波长处具有摩尔吸收系数ε的化合物相对于九氟丁磺酸三苯基锍相对比例为0.8以下，通过辐射照射产生酸 。 在通式（I-1）和（I-2）中，AR 1 和AR 2 表示芳族基团; R 1 表示烷基，环烷基或芳基; A 1 和A 2 各自独立地表示氢原子，烷基，卤素原子，氰基或烷氧基羰基 组; Z表示与C-AR 2 一起形成环的连接基团。 版权所有（C）2012，JPO＆INPIT

公开(公告)号：JP2012113003A

公开(公告)日：2012-06-14

申请号：JP2010259577

申请日：2010-11-19

Applicant: Fujifilm Corp ,  富士フイルム株式会社

Inventor： IWATO KAORU ,  KATAOKA SHOHEI

IPC: G03F7/32 ,  C08F220/28 ,  G03F7/038 ,  G03F7/039 ,  H01L21/027

Abstract: PROBLEM TO BE SOLVED: To provide a pattern forming method excellent in both of line width uniformity of a pattern and developing time-dependency of sensitivity, a chemically amplified resist composition and a resist film, for negative pattern formation with a developer containing an organic solvent.SOLUTION: A pattern forming method, in which a negative pattern is formed, comprises steps of: (1) forming a film with a chemically amplified resist composition containing (A) a resin that has 35 mol% or more of a repeating unit having an alcoholic hydroxyl group based on all repeating units in the resin, and is increased in its polarity and reduced in its solubility in a developer containing an organic solvent by an action of an acid, and (B) a compound that generates an acid by irradiation with an actinic ray or radiation; (2) exposing the film; and (3) developing a pattern with the developer containing the organic solvent.

Abstract translation: 要解决的问题：为了提供一种图案的线宽均匀性和显影时间依赖性都优异的图案形成方法，化学放大型抗蚀剂组合物和抗蚀剂膜，用于通过含有 有机溶剂。 解决方案：形成负型图案的图案形成方法包括以下步骤：（1）用化学放大型抗蚀剂组合物形成膜，该组合物含有（A）具有35摩尔％以上的重复的树脂 具有基于树脂中所有重复单元的醇羟基的单元，并且其极性增加并且通过酸的作用降低其在含有机溶剂的显影剂中的溶解度，和（B）产生酸的化合物 通过用光化射线或辐射照射; （2）曝光胶片; 和（3）用含有有机溶剂的显影剂显影图案。 版权所有（C）2012，JPO＆INPIT

公开(公告)号：JP2012068543A

公开(公告)日：2012-04-05

申请号：JP2010214563

申请日：2010-09-24

Applicant: Fujifilm Corp ,  富士フイルム株式会社

Inventor： SAITO SHOICHI ,  KATAOKA SHOHEI ,  IWATO KAORU ,  FUJII KANA

IPC: G03F7/038 ,  C08F8/00 ,  G03F7/38 ,  G03F7/40 ,  H01L21/027

Abstract: PROBLEM TO BE SOLVED: To provide an actinic ray-sensitive or radiation-sensitive resin composition that is excellent in resolution such as a critical dimension with no bridge defects, and DOF, as well as a resist film and a pattern forming method using the composition.SOLUTION: An actinic ray-sensitive or radiation-sensitive resin composition contains a resin that is decomposed by an action of an acid to produce an amide group or a thioamide group.

Abstract translation: 要解决的问题：提供分辨率优异的光电敏感性或辐射敏感性树脂组合物，例如没有桥接缺陷的临界尺寸，以及DOF，以及抗蚀剂膜和图案形成方法 使用组合。 光敏射线敏感或辐射敏感性树脂组合物含有通过酸的作用而分解以产生酰胺基或硫代酰胺基的树脂。 版权所有（C）2012，JPO＆INPIT