公开(公告)号：JP2009294670A

公开(公告)日：2009-12-17

申请号：JP2009205427

申请日：2009-09-07

Applicant: Jsr Corp ,  Jsr株式会社

Inventor： CHIBA TAKASHI ,  HAYASHI AKIHIRO ,  SHIMOKAWA TSUTOMU

IPC: G03F7/004 ,  G03F7/039 ,  H01L21/027

Abstract: PROBLEM TO BE SOLVED: To provide a radiation sensitive resin composition having sensitivity to active light rays such as far-ultraviolet light represented by an ArF excimer laser, for example, superior in the flatness of a pattern surface without impairing fundamental material properties such as transparency to radiation, sensitivity, a resolution, and a pattern shape, and useful as a chemical amplification type resist which is improved against pattern collapse on a substrate.
SOLUTION: The radiation sensitive resin composition includes: (A) an alkali-insoluble or alkali-hardly-soluble resin in which solubility in alkaline aqueous solution is increased by the action of an acid; (B) radiation sensitive acid generator; and (C) a compound represented by a general formula (1) where R
1 and R
2 are a hydrogen atom, a hydroxyl group, an (thio)alkoxyl group or the like, R
3 is a hydrogen atom or a monovalent acid-dissociative group, and n is 0 or 1.
COPYRIGHT: (C)2010,JPO&INPIT

Abstract translation: 要解决的问题：提供对由ArF准分子激光器表示的远紫外线等活性光线具有敏感性的辐射敏感性树脂组合物，例如图案表面的平坦度优异而不损害基本材料性质 例如对辐射的透明度，灵敏度，分辨率和图案形状，并且可用作针对基板上的图案塌陷而改进的化学放大型抗蚀剂。 解决方案：辐射敏感性树脂组合物包括：（A）通过酸的作用使在碱性水溶液中的溶解度增加的碱不溶性或碱难溶性树脂; （B）辐射敏感酸发生器; 和（C）由通式（1）表示的化合物，其中R 1和R 2均为氢原子，羟基，（硫代）烷氧基或 其中R 3为氢原子或一价酸解离基团，n为0或1.版权所有（C）2010，JPO＆INPIT

公开(公告)号：JP2007047643A

公开(公告)日：2007-02-22

申请号：JP2005234137

申请日：2005-08-12

Applicant: Jsr Corp ,  Jsr株式会社

Inventor： KAWAKAMI MINEKI ,  KUSUMOTO SHIRO ,  SHIMOKAWA TSUTOMU ,  SUGIURA MAKOTO ,  HARA HIROMICHI

IPC: G03F7/039 ,  C08F20/38 ,  G03F7/004 ,  H01L21/027

Abstract: PROBLEM TO BE SOLVED: To provide a positive radiation-sensitive resin composition excellent in depth-of-focus latitude (DOF) as a positive radiation-sensitive resin composition using an ArF light source, and suitable for use as a chemically amplified positive resist excellent also in sensitivity, developability and dimensional faithfulness. SOLUTION: The positive radiation-sensitive resin composition contains a resin (A) containing a repeating unit represented by formula [1] and having a weight average molecular weight (expressed in terms of polystyrene) of 1,000-100,000 by gel permeation chromatography (GPC) and a radiation-sensitive acid generator (B), wherein R 1 is hydrogen atom, methyl group, ethyl group or a 1-4C perfluoroalkyl group; one of R 2 and R 3 is RfSO 2 NHCH 2 -group(where Rf represents a 1-4C perfluoroalkyl group) and the remainder is hydrogen atom. The positive radiation-sensitive resin composition preferably contains an acid diffusion control agent (C) in combination with the resin (A) and the radiation-sensitive acid generator (B). COPYRIGHT: (C)2007,JPO&INPIT

Abstract translation: 要解决的问题：提供使用ArF光源作为正性辐射敏感性树脂组合物的聚焦深度（DOF）优异的正性辐射敏感性树脂组合物，并且适合用作化学放大 积极的抵抗力也在敏感性，可发展性和尺寸忠实度方面也优异。 解决方案：正性辐射敏感性树脂组合物含有含有由式[1]表示的重复单元并且通过凝胶渗透色谱法具有1,000-100,000的重均分子量（以聚苯乙烯换算）的树脂（A） （GPC）和辐射敏感性酸产生剂（B），其中R 1是氢原子，甲基，乙基或1-4C全氟烷基; R 2 和R 3之一中的一个是RfSO 2，其中R f表示1-4C 全氟烷基），其余为氢原子。 正性辐射敏感性树脂组合物优选含有与树脂（A）和辐射敏感性酸产生剂（B）组合的酸扩散控制剂（C）。 版权所有（C）2007，JPO＆INPIT

公开(公告)号：JP2006193687A

公开(公告)日：2006-07-27

申请号：JP2005009024

申请日：2005-01-17

Applicant: Jsr Corp ,  Jsr株式会社

Inventor： CHIBA TAKASHI ,  NAKAGAWA DAIKI ,  SAKAKIBARA HIROKAZU ,  DOKOCHI HIROSHI ,  SUGIURA MAKOTO ,  UKO TOMOHIRO ,  SHIMOKAWA TSUTOMU

IPC: C08F220/22 ,  G03F7/11 ,  H01L21/027

Abstract: PROBLEM TO BE SOLVED: To provide a resin composition capable of forming a coating film on a photo resist without causing intermixing with the photo resist film, wherein the coating film can be kept stable without dissolving into a medium upon exposure to a light under liquid-impregnation, and it is possible to produce a top-coating film having a large contact angle such as 70°or more for the liquid-impregnation medium and showing high solubility in an alkaline developing liquid without degradation in a pattern form in a case where a dry exposure to a light is conducted in place of liquid-impregnation exposure to a light.
SOLUTION: A copolymer for forming a top-coating film to be applied on a photo resist film exposed to a light under liquid-impregnation contains a repeating unit containing a carboxylic group in an amount of 20-60 mol% relative to the total repeating unit, has a weight average molecular weight of 2,000-100,000 as measured by the gel permeation chromatography method, and can be produced by the copolymerization of a (meth)acrylic acid ester containing a side chain having a fluorine atom and further by the copolymerization of a (meth)acrylic acid alkyl ester containing a hydroxy group.
COPYRIGHT: (C)2006,JPO&NCIPI

Abstract translation: 要解决的问题：提供能够在光致抗蚀剂上形成涂膜的树脂组合物，而不会与光致抗蚀剂膜混合，其中涂膜可以保持稳定而不会在暴露于光时溶解在介质中 在液体浸渍下，可以制备对于液体浸渍介质具有大于70°或更大接触角的顶涂膜，并且在碱性显影液中显示高溶解度，而不会在图案形式中降解 进行干燥曝光的情况是代替暴露于光的液体浸渍的情况。 解决方案：用于形成施加在暴露于液体浸渍下的光的光致抗蚀剂膜上的顶涂层的共聚物包含含有相对于该树脂的20-60摩尔％的羧基的重复单元 总重复单元，通过凝胶渗透色谱法测定的重均分子量为2,000-100,000，并且可以通过使含有具有氟原子的侧链的（甲基）丙烯酸酯进一步由 含有羟基的（甲基）丙烯酸烷基酯的共聚合。 版权所有（C）2006，JPO＆NCIPI

公开(公告)号：JP2006133803A

公开(公告)日：2006-05-25

申请号：JP2006005710

申请日：2006-01-13

Applicant: Jsr Corp ,  Jsr株式会社

Inventor： IWAZAWA HARUO ,  HAYASHI AKIHIRO ,  SHIMOKAWA TSUTOMU

IPC: G03F7/039 ,  C08K5/42 ,  C08L83/04 ,  G03F7/004 ,  G03F7/075 ,  H01L21/027

Abstract: PROBLEM TO BE SOLVED: To provide a radiation-sensitive resin composition, containing a dissociable group-containing polysiloxane as a resin component and suitable for use as a chemically amplified resist, particularly superior in resolution. SOLUTION: The radiation-sensitive resin composition contains (A) the dissociable group-containing polysiloxane and (B) a radiation-sensitive acid generator, containing as essential components, a compound (B1) capable of generating an acid represented by Formula (I) and a compound (B2) capable of generating other sulfonic acid or a carboxylic acid. In the Formula (I), four symbols Rf each independently denote F or a trifluoromethyl group; Ra denotes a 3-20C cyclic monovalent hydrocarbon group or a 3-20C cyclic monovalent fluorinated hydrocarbon group, and the cyclic monovalent hydrocarbon group and the cyclic monovalent fluorinated hydrocarbon group may be substituted. COPYRIGHT: (C)2006,JPO&NCIPI

Abstract translation: 要解决的问题：提供一种含有可离解基团的聚硅氧烷作为树脂组分并且适合用作化学放大抗蚀剂的辐射敏感性树脂组合物，其分辨率特别优异。 解决方案：辐射敏感性树脂组合物含有（A）含离解基团的聚硅氧烷和（B）作为必需成分的辐射敏感性酸产生剂，能够产生由式 （I）和能够产生其它磺酸或羧酸的化合物（B2）。 在式（I）中，四个符号R f各自独立地表示F或三氟甲基; Ra表示3-20C环状一价烃基或3-20C环状一价氟化烃基，环状一价烃基和环状一价氟代烃基可以被取代。 版权所有（C）2006，JPO＆NCIPI

公开(公告)号：JP2006053404A

公开(公告)日：2006-02-23

申请号：JP2004235695

申请日：2004-08-13

Applicant: Jsr Corp ,  Jsr株式会社

Inventor： SUGITA HIKARI ,  TANAKA MASATO ,  KONNO KEIJI ,  NOMURA NAKAATSU ,  SHIMOKAWA TSUTOMU

IPC: G03F7/038 ,  C08F220/26 ,  C08F232/08 ,  C08J3/24 ,  C08L33/04 ,  H01L21/027

Abstract: PROBLEM TO BE SOLVED: To provide a radiation-sensitive composition which forms a crosslinked structure upon exposure to radiation, is degraded to low molecular weight by heating at a relatively low temperature after crosslinking, can easily be removed without damaging a substrate, has a high stationary wave preventing effect, does not cause intermixing with a resist film, and is useful to form a hard mask capable of forming a resist pattern excellent in resolution, pattern profile, etc. SOLUTION: The radiation-sensitive composition comprises (A) a copolymer typified by a copolymer having a repeating unit represented by formula (1-1) and a repeating unit represented by formula (2-1), (B) a radiation-sensitive acid generator and (C) a solvent. In the formula (1-1), R 5 denotes hydrogen atom or methyl group. COPYRIGHT: (C)2006,JPO&NCIPI

Abstract translation: 要解决的问题：为了提供在暴露于辐射时形成交联结构的辐射敏感组合物，通过在交联后在相对低的温度下加热而降解为低分子量，可以容易地除去而不损坏基底， 具有高的静止波防止效果，不会引起与抗蚀剂膜的混合，并且可用于形成能够形成分辨率，图案轮廓等优异的抗蚀剂图案的硬掩模。解决方案：辐射敏感组合物 包括（A）以共聚物为代表的共聚物，其具有由式（1-1）表示的重复单元和由式（2-1）表示的重复单元，（B）辐射敏感性酸产生剂和（C）溶剂 。 在式（1-1）中，R 5表示氢原子或甲基。 版权所有（C）2006，JPO＆NCIPI

公开(公告)号：JP2005308827A

公开(公告)日：2005-11-04

申请号：JP2004122243

申请日：2004-04-16

Applicant: Jsr Corp ,  Jsr株式会社

Inventor： NISHIMURA ISAO ,  SHIMOKAWA TSUTOMU ,  SUGIE NORIHIKO

IPC: G03F7/075 ,  G03F7/004 ,  G03F7/039 ,  H01L21/027

Abstract: PROBLEM TO BE SOLVED: To provide a radiation sensitive resin composition having high transparency at a wavelength of ≤193 nm and useful as a chemically amplified resist excellent particularly in sensitivity, DOF and LER. SOLUTION: The radiation-sensitive resin composition contains (A) a siloxane resin having a weight average molecular weight of 500-1,000, in terms of polystyrene, by gel permeation chromatography, (B) a compound having a repeating structure represented by formula (4), and (C) a photoacid generator. In the formula (4), each R 1 is H or a group represented by formula (4-1) and at least one of the symbols R 1 is a group represented by the formula (4-1). COPYRIGHT: (C)2006,JPO&NCIPI

Abstract translation: 要解决的问题：提供在波长≤193nm下具有高透明度的辐射敏感性树脂组合物，并且可用作特别是灵敏度，DOF和LER优异的化学放大抗蚀剂。 解决方案：辐射敏感性树脂组合物含有（A）以聚苯乙烯换算，通过凝胶渗透色谱法测定重均分子量为500-1,000的硅氧烷树脂，（B）具有由 式（4）和（C）光酸产生剂。 在式（4）中，每个R SP 1是H或由式（4-1）表示的基团，并且符号R 1 SP 1中的至少一个是表示的基团 通过式（4-1）。 版权所有（C）2006，JPO＆NCIPI

公开(公告)号：JP2005179461A

公开(公告)日：2005-07-07

申请号：JP2003420621

申请日：2003-12-18

Applicant: Jsr Corp ,  Jsr株式会社

Inventor： NISHIMURA ISAO ,  SUGITA HIKARI ,  TANAKA MASATO ,  KONNO KEIJI ,  NOMURA NAKAATSU ,  SHIMOKAWA TSUTOMU

IPC: G03F7/11 ,  C07C29/147 ,  C07C33/34 ,  C07C67/343 ,  C07C69/76 ,  C08F12/22 ,  C09D5/33 ,  C09D125/02

Abstract: PROBLEM TO BE SOLVED: To provide a process for applying a vinyl-based naphthalenecarboxylic acid (derivative) and a vinyl-based naphthalenemethanol, with which technical idea or technical concept reaching application to an antireflection film having extremely excellent properties is created. SOLUTION: The process for applying a naphthalene derivative comprises using a polymer obtained by polymerizing the naphthalene derivative represented by formula (1) or formula (5) (R 1 , R 2 and R 3 are each independently a hydrogen atom or a 1-10C monofunctional organic group) as a main component for an antireflection film. COPYRIGHT: (C)2005,JPO&NCIPI

Abstract translation: 要解决的问题：提供一种应用乙烯基萘羧酸（衍生物）和乙烯基萘甲醇的方法，其技术思想或技术概念被应用于具有极好性能的抗反射膜。 解决方案：应用萘衍生物的方法包括使用通过聚合由式（1）或式（5）表示的萘衍生物（R SP 1，R SP 2， / SP>和R 3 各自独立地为氢原子或1-10C单官能有机基团）作为抗反射膜的主要成分。 版权所有（C）2005，JPO＆NCIPI

公开(公告)号：JP2005139169A

公开(公告)日：2005-06-02

申请号：JP2004296459

申请日：2004-10-08

Applicant: Jsr Corp ,  Jsr株式会社

Inventor： NISHIMURA ISAO ,  YAMAHARA NOBORU ,  TANAKA MASATO ,  SHIMOKAWA TSUTOMU

IPC: G03F7/039 ,  C07F7/18 ,  C08G77/04 ,  G03F7/075 ,  H01L21/027

Abstract: PROBLEM TO BE SOLVED: To obtain a new polysiloxane that is suitable as a resin component in chemically amplified resist particularly having excellent I-D bias and depth of focus (DOF), a new silane compound useful as a raw material for producing the polysiloxane, and a polysiloxane-containing radiation ray-sensitive resin composition. SOLUTION: The silane compound is represented by formula (I). The polysiloxane has a structural unit represented by formula (1) or has the unit (1) and a structural unit represented by formula (2) (wherein R is an alkyl, R 1 and R 2 are each fluorine atom, or a lower alkyl or a lower fluorinated alkyl, (n) and (m) are each 0 or 1, (k) is 1 or 2, (i) is an integer of 0 to 10). The radiation ray-sensitive resin composition contains the polysiloxane and a radiation ray sensitive acid-generating agent. COPYRIGHT: (C)2005,JPO&NCIPI

Abstract translation: 要解决的问题为了获得适合作为特别是具有优异的ID偏压和深度聚焦（DOF）的化学放大型抗蚀剂中的树脂组分的新的聚硅氧烷，可用作生产聚硅氧烷的原料的新的硅烷化合物 和含聚硅氧烷的放射线敏感性树脂组合物。 硅烷化合物由式（I）表示。 聚硅氧烷具有由式（1）表示的结构单元或具有单元（1）和由式（2）表示的结构单元（其中R是烷基，R 1 SP＆lt; SP＆gt;和R SP＆ 2是各自的氟原子，或低级烷基或低级氟化烷基，（n）和（m）各自为0或1，（k）为1或2，（i）为0〜 10）。 放射线敏感性树脂组合物含有聚硅氧烷和放射线敏感性的酸产生剂。 版权所有（C）2005，JPO＆NCIPI

公开(公告)号：JP2005035941A

公开(公告)日：2005-02-10

申请号：JP2003275425

申请日：2003-07-16

Applicant: Jsr Corp ,  Jsr株式会社

Inventor： CHIBA TAKASHI ,  HAYASHI AKIHIRO ,  SHIMOKAWA TSUTOMU

IPC: G03F7/004 ,  C07C31/44 ,  C07C33/44 ,  C07C35/52 ,  G03F7/039 ,  H01L21/027

Abstract: PROBLEM TO BE SOLVED: To provide a norbornane-based fluorine-containing compound providing a chemical amplification-type resist having excellent smoothness of the pattern surface and preventing the falling down of a pattern on a substrate without damaging the basic properties such as transparency to radiation, sensitivity, resolution and a pattern shape as an additive component of the chemical amplification-type resist sensitive to far ultraviolet rays or the like exemplified by ArF excimer laser; and to provide a radiation-sensitive resin composition containing the compound.
SOLUTION: The compound is represented by general formula (1) (wherein, R
1 and R
2 are each a hydrogen atom, a hydroxy group, a (thio)alkoxy group or the like; R
3 is a hydrogen atom or a monovalent acid-dissociating group; and m is 0 or 1). The radiation-sensitive resin composition contains (A) an alkali-insoluble or alkali-slightly soluble resin increasing the solubility in an aqueous alkali solution by the action of an acid, and (B) a radiation sensitive acid-generating agent besides the compound.
COPYRIGHT: (C)2005,JPO&NCIPI

Abstract translation: 要解决的问题：提供一种降冰片烷基的含氟化合物，其提供具有优异的图案表面平滑度的化学放大型抗蚀剂，并且防止图案在基材上的下降而不损害诸如 作为对远紫外线等敏感的化学放大型抗蚀剂的添加成分的放射线，灵敏度，分辨率和图案形状的透明性等，以ArF准分子激光为例。 并提供含有该化合物的辐射敏感性树脂组合物。 解决方案：该化合物由通式（1）表示（其中，R SP 1和R SP 2各自为氢原子，羟基，（硫代 ）烷氧基等; R 3是氢原子或一价酸解离基; m为0或1）。 该辐射敏感性树脂组合物含有（A）通过酸作用增加在碱性水溶液中的溶解度的碱不溶性或碱性微溶性树脂，（B）化合物以外的辐射敏感性酸发生剂。 版权所有（C）2005，JPO＆NCIPI

公开(公告)号：JP2005015532A

公开(公告)日：2005-01-20

申请号：JP2003178719

申请日：2003-06-23

Applicant: Jsr Corp ,  Jsr株式会社

Inventor： TANAKA MASATO ,  SUGITA HIKARI ,  KONNO KEIJI ,  NISHIMURA ISAO ,  NOMURA NAKAATSU ,  SHIMOKAWA TSUTOMU

IPC: G03F7/11 ,  C08F220/28 ,  C08F220/58 ,  C08F232/08 ,  C08K5/00 ,  C08L33/14 ,  C08L33/24 ,  C08L45/00 ,  G02B1/11 ,  H01L21/027

Abstract: PROBLEM TO BE SOLVED: To provide an antireflection film forming composition which has a high antireflection effect, does not cause intermixing, and can form a resist pattern excellent in resolution, pattern shape, etc.; and a polymer useful as a constituting component for the composition. SOLUTION: The polymer comprises first structural units represented by formula (1) and second structural units having cross-linking properties. In formula (1), R 1 and R 2 are each a monovalent atom or a monovalent organic group; R 3 and R 4 are each a hydrogen atom or a monovalent organic group; and m and n are each an integer of 0 or 1-3. COPYRIGHT: (C)2005,JPO&NCIPI

Abstract translation: 解决问题：为了提供具有高抗反射效果的防反射膜形成用组合物，不会引起混合，并且可以形成分辨率，图案形状等优异的抗蚀剂图案。 以及可用作组合物的组成成分的聚合物。 聚合物包含由式（1）表示的第一结构单元和具有交联特性的第二结构单元。 式（1）中，R SB 1和R SB 2各自为一价原子或一价有机基团; R SB 3和R SB 4各自为氢原子或一价有机基团; m和n分别为0或1-3的整数。 版权所有（C）2005，JPO＆NCIPI