METHOD FOR OBTAINING TRANSVERSE UNIFORMITY DURING THIN FILM DEPOSITION ON EXTENDED SUBSTRATE

    公开(公告)号:AU3058789A

    公开(公告)日:1989-09-06

    申请号:AU3058789

    申请日:1989-02-09

    Inventor: MEYER STEPHEN F

    Abstract: Apparatus for sputter depositing a layer of metal onto a laterally extended substrate includes a substrate support, a deposition station, a downstream sensing assembly and a computerized controller. The deposition station includes a cathode and anodes extending the width of the substrate. Gas supply is provided to each of a plurality of zones through a common distribution chamber with a plurality of inlets which in combination cover the width of the substrate on which a thin film layer is to be deposited. The gas flow is directed through each anode into the plasma region and is individually controlled for each zone. The downstream sensing assembly includes, for each zone, a four-point contact assembly usign four electrically conductive wheels. Two of the wheels are used to apply current to the thin film and two are used to sense the resistance of it. This information is fed into the computer for use in controlling the gas flow into the deposition station, by zone.

    INFRARED-REJECTING OPTICAL PRODUCTS HAVING PIGMENTED COATINGS

    公开(公告)号:WO2019045983A1

    公开(公告)日:2019-03-07

    申请号:PCT/US2018/045933

    申请日:2018-08-09

    Abstract: Optical products are disclosed that include a polymeric substrate, provided with an infrared-reflective metal layer on an outer surface thereof that is subject to oxidation. The optical products are further provided with a protective coating, comprising one or more of a metal oxide or a metal nitride, deposited directly on the infrared-reflective metal layer using chemical vapor deposition. The optical products are further provided with a composite pigment coating, deposited on the protective coating, that include at least a first layer and a second layer, at least one of which layers comprises a first pigment, wherein each of the first layer and the second layer includes a binding group component, each of which binding group components together form a complementary binding group pair.

    DURABLE NEAR-INFRARED BLOCKING AND EMI SHIELDING FILM FOR DISPLAY FILTER
    158.
    发明申请
    DURABLE NEAR-INFRARED BLOCKING AND EMI SHIELDING FILM FOR DISPLAY FILTER 审中-公开
    用于显示过滤器的近红外阻挡和EMI屏蔽膜

    公开(公告)号:WO2007028060A3

    公开(公告)日:2008-08-07

    申请号:PCT/US2006034297

    申请日:2006-09-01

    Abstract: A plasma display filter is formed to include an alternating pattern (12) of infrared blocking layers (22, 24 and 26) and ZTO (zinc oxide/tin oxide) dielectric layers (14, 16, 18 and 20). In one embodiment, the alternating pattern comprises four ZTO dielectric layers and three infrared blocking layers. Benefits of the plasma display filter are enhanced if the ZTO dielectric layers are sputter deposited in an environment which is intentionally hydrogenated. As another possible enhancement, a sacrificial layer or glue layer may be deposited over the infrared blocking layers prior to formation of the subsequent ZTO dielectric layer, so as to protect the underlying layer during formation of the ZTO dielectric layer. Suitable materials include titanium and nichrome. The chemical durability of the ZTO dielectric layers enables the omission of the conventional protective overcoat layer (28), if desired.

    Abstract translation: 形成等离子体显示滤光器以包括红外阻挡层(22,24和26)和ZTO(氧化锌/氧化锡)电介质层(14,16,18和20)的交替图案(12)。 在一个实施例中,交替图案包括四个ZTO电介质层和三个红外阻挡层。 如果在有意氢化的环境中溅射沉积ZTO电介质层,则增强了等离子体显示滤光片的优点。 作为另一可能的增强,在形成后续ZTO电介质层之前,可以在红外阻挡层上沉积牺牲层或胶层,以便在形成ZTO电介质层期间保护下层。 合适的材料包括钛和镍铬合金。 如果需要,ZTO电介质层的化学耐久性使得能够省略常规保护性外涂层(28)。

    FABRICATION OF CONDUCTIVE MICRO TRACES USING A DEFORM AND SELECTIVE REMOVAL PROCESS
    159.
    发明申请
    FABRICATION OF CONDUCTIVE MICRO TRACES USING A DEFORM AND SELECTIVE REMOVAL PROCESS 审中-公开
    使用变形和选择性去除工艺制造导电微量纤维

    公开(公告)号:WO2007136734B1

    公开(公告)日:2008-02-21

    申请号:PCT/US2007011881

    申请日:2007-05-18

    Abstract: In a method of forming micro traces (64; 110, 112 and 114; and 409), stamping techniques are employed to define a target pattern of the micro traces. The stamping is applied to electrically conductive material (405; 700) and may be limited to pressure, but a thermal stamping approach may be utilized. Following the stamping, a portion of the conductive material is removed (305), leaving the target pattern of conductive micro traces. In the pressure-application step, the pressure or the combination of pressure and temperature is sufficient to at least weaken the integrity of the bulk conductive material along the area of contact. Typically, this step causes shearing of the conductive material. Following the pressure-application step, excess conductive material is removed. In some embodiments of the invention, the thickness of the micro traces is not determined in a single step. The original thickness may be formed using a "seed" material (104). The subsequent material buildup (108) may occur after the target pattern is established.

    Abstract translation: 在形成微迹线(64; 110,112和114;和409)的方法中,使用冲压技术来定义微迹线的目标图案。 冲压被应用于导电材料(405,700),并且可以被限制到压力,但是可以利用热冲压方法。 在冲压之后,去除导电材料的一部分(305),留下导电微迹线的目标图案。 在压力施加步骤中,压力或压力和温度的组合足以至少削弱沿着接触区域的体导电材料的完整性。 通常,该步骤导致导电材料的剪切。 在压力施加步骤之后,除去过量的导电材料。 在本发明的一些实施例中,微迹线的厚度在单个步骤中未确定。 原始厚度可以使用“种子”材料(104)形成。 随后的材料积累(108)可以在目标图案建立之后发生。

    ZINC-BASED FILM MANIPULATION FOR AN OPTICAL FILTER
    160.
    发明申请
    ZINC-BASED FILM MANIPULATION FOR AN OPTICAL FILTER 审中-公开
    用于光学滤波器的基于ZINC的电影操作

    公开(公告)号:WO2007120177A1

    公开(公告)日:2007-10-25

    申请号:PCT/US2006/035667

    申请日:2006-09-14

    CPC classification number: G02B5/284 C03C17/28 G02B5/282

    Abstract: An optical filter is formed of a layer stack that includes metallic layers (106, 107, 108 and 109) and dielectric layers (101 , 102, 103, 104 and 105), with at least one dielectric layer being defined by more than one zinc-based film (112, 114, 118 and 120). These zinc-based films have different percentages of zinc. The selections of the percentages are based upon the positions of the films within the dielectric layer. An unexpectedly low sheet resistance is available if the zinc-based film that immediately precedes forming a metallic layer has a percentage of zinc in the range of 80 percent to 100 percent. Process stabilization and manufacturing cost are provided by placing the percentage of the lower zinc-based film closer to 50 percent (25-75 percent). Process stabilization is further enhanced by providing an indium-based film (110 and 116) within the dielectric layer adjacent to the metallic layer.

    Abstract translation: 滤光器由包括金属层(106,107,108和109)和电介质层(101,102,103,104和105)的层叠层形成,其中至少一个电介质层由多于一个的锌 (112,114,118和120)。 这些锌基膜具有不同的锌含量。 百分比的选择基于介电层内的膜的位置。 如果在形成金属层之前的锌基膜的百分比在80%至100%的范围内,则可获得意想不到的薄层电阻。 过程稳定性和制造成本通过将下层锌基膜的百分比置于50%(25-75%)之间来提供。 通过在与金属层相邻的电介质层内提供铟基膜(110和116)来进一步增强工艺稳定性。

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