公开(公告)号：JP2012047896A

公开(公告)日：2012-03-08

申请号：JP2010188639

申请日：2010-08-25

Applicant: Fujifilm Corp ,  富士フイルム株式会社

Inventor： KATO KEITA ,  KAMIMURA SATOSHI ,  ENOMOTO YUICHIRO ,  IWATO KAORU ,  KATAOKA SHOHEI ,  SAITO SHOICHI

IPC: G03F7/32 ,  G03F7/038 ,  G03F7/039 ,  H01L21/027

CPC classification number: G03F7/325 ,  G03F7/0045 ,  G03F7/0046 ,  G03F7/0382 ,  G03F7/0397 ,  G03F7/091 ,  G03F7/16 ,  G03F7/168 ,  G03F7/20 ,  G03F7/2006 ,  G03F7/2041 ,  G03F7/38 ,  G03F7/40

Abstract: PROBLEM TO BE SOLVED: To provide a pattern forming method capable of forming a pattern with a small defect density.SOLUTION: The pattern forming method includes: (a) forming a film using a chemical amplification type resist composition; (b) exposing the film; and (c) developing the exposed film using a developer containing a first organic solvent. The developer has a density of particles having a particle diameter of 0.3 μm or more of 30 pieces/mL.

Abstract translation: 要解决的问题：提供能够形成具有小缺陷密度的图案的图案形成方法。 解决方案：图案形成方法包括：（a）使用化学放大型抗蚀剂组合物形成膜; （b）曝光胶片; 和（c）使用含有第一有机溶剂的显影剂显影曝光的膜。 显影剂的粒径为0.3μm以上的粒子的密度为30个/ mL。 版权所有（C）2012，JPO＆INPIT

公开(公告)号：JP2012027436A

公开(公告)日：2012-02-09

申请号：JP2010286766

申请日：2010-12-22

Applicant: Fujifilm Corp ,  富士フイルム株式会社

Inventor： KATAOKA SHOHEI ,  IWATO KAORU ,  FUJII KANA ,  KAMIMURA SATOSHI ,  ENOMOTO YUICHIRO ,  KATO KEITA ,  YAMAGUCHI SHUHEI

IPC: G03F7/32 ,  C08F20/00 ,  G03F7/004 ,  G03F7/038 ,  G03F7/039 ,  H01L21/027

CPC classification number: G03F7/004 ,  C07C303/32 ,  C07C309/04 ,  C07C309/06 ,  C07C309/07 ,  C07C309/10 ,  C07C309/12 ,  C07C309/13 ,  C07C309/14 ,  C07D211/96 ,  G03F7/0045 ,  G03F7/0046 ,  G03F7/0392 ,  G03F7/0397 ,  G03F7/0755 ,  G03F7/11 ,  G03F7/2041 ,  G03F7/325

Abstract: PROBLEM TO BE SOLVED: To provide a pattern forming method excellent in resolution such as a minimum dimension that does not allow a bridge defect to generate, roughness performance such as line edge roughness and dependence on developing time, to provide an actinic ray sensitive or radiation sensitive resin composition used for the method, and to provide a resist film.SOLUTION: A pattern forming method comprises the steps of: (a) forming a film from an actinic ray sensitive or radiation sensitive resin composition containing a compound(A) that generates an acid upon irradiation with an actinic ray or radiation and is decomposed by an action of an acid to reduce solubility in an organic solvent; (b) exposing the film; and (c) developing using a developer containing an organic solvent.

Abstract translation: 要解决的问题：为了提供优异的分辨率的图案形成方法，例如不允许桥接缺陷产生的最小尺寸，粗糙度性能如线边缘粗糙度和对显影时间的依赖性，以提供光化射线 敏感或辐射敏感的树脂组合物，并提供抗蚀剂膜。 解决方案：图案形成方法包括以下步骤：（a）由光化射线敏感或辐射敏感性树脂组合物形成膜，所述组合物含有在用光化射线或辐射照射时产生酸的化合物（A），并且是 通过酸的作用分解以降低在有机溶剂中的溶解度; （b）曝光胶片; 和（c）使用含有有机溶剂的显影剂显影。 版权所有（C）2012，JPO＆INPIT

公开(公告)号：JP2011257613A

公开(公告)日：2011-12-22

申请号：JP2010132410

申请日：2010-06-09

Applicant: Fujifilm Corp ,  富士フイルム株式会社

Inventor： YAMAMOTO KEI ,  IWATO KAORU ,  HIRANO SHUJI ,  IIZUKA YUSUKE

IPC: G03F7/039 ,  C08F20/04 ,  C08F20/10 ,  C08F20/28 ,  C08F20/54 ,  G03F7/004 ,  G03F7/38 ,  H01L21/027

Abstract: PROBLEM TO BE SOLVED: To provide an actinic ray sensitive or radiation sensitive resin composition which can provide a pattern having improved uniformity of coating film thickness and excellent size uniformity in the wafer surface on which the pattern has been formed by liquid immersion exposure, and a pattern forming method using the composition.SOLUTION: An actinic ray-sensitive or radiation-sensitive resin composition contains: (A) a resin which has a repeating unit represented by the following general formula (A1) and increases its dissolution rate in an alkali developer by an action of an acid; (B) a compound which generates an acid by irradiation with actinic rays or radiation; and (C) a resin which comprises a repeating unit having a lactone structure substituted by a group having a fluorine atom. (In the formula, Rrepresents a hydrogen atom, an alkyl group, a fluoroalkyl group, a halogen atom or CHOH; Rrepresents an alkylene group, a cycloalkylene group or a bivalent connecting group that is formed by combining them; n represents an integer of 0-5; if n is 2 or more, a plurality of Rmay be the same or different.)

Abstract translation: 要解决的问题：提供一种光化射线敏感或辐射敏感性树脂组合物，其可以提供在通过液浸曝光形成图案的晶片表面中具有改善的涂膜厚度均匀性和优异的尺寸均匀性的图案 ，以及使用该组合物的图案形成方法。 光敏射线敏感性或辐射敏感性树脂组合物含有：（A）具有下列通式（A1）所示的重复单元的树脂，并通过作用于 酸; （B）通过用光化射线或辐射照射产生酸的化合物; 和（C）含有被具有氟原子的基团取代的内酯结构的重复单元的树脂。 （式中，R 1 表示氢原子，烷基，氟代烷基，卤素原子或CH 2。 OH; R 2 表示通过组合形成的亚烷基，亚环烷基或二价连接基团; n表示0-5的整数;如果n为2或 更多，多个R 2 可以相同或不同。）版权所有（C）2012，JPO＆INPIT

公开(公告)号：JP2011209520A

公开(公告)日：2011-10-20

申请号：JP2010077432

申请日：2010-03-30

Applicant: Fujifilm Corp ,  富士フイルム株式会社

Inventor： IWATO KAORU ,  KATAOKA SHOHEI ,  TARUYA SHINJI ,  KAMIMURA SATOSHI ,  ENOMOTO YUICHIRO ,  FUJII KANA ,  KATO KEITA ,  DOBASHI TORU ,  MIZUTANI KAZUYOSHI

IPC: G03F7/038 ,  C08F20/36 ,  C08F32/04 ,  G03F7/32 ,  H01L21/027

Abstract: PROBLEM TO BE SOLVED: To provide an actinic ray-sensitive or radiation-sensitive resin composition which is excellent in development defect performance, liquid immersion defect performance and limit resolution and enables to form a pattern having a good shape, and a pattern forming method using the same.SOLUTION: The actinic ray-sensitive or radiation-sensitive resin composition comprises a resin which contains a first repeating unit having a group that is decomposed by the action of an acid to thereby generate an alcoholic hydroxyl group, and which exhibits decreased solubility in a developer containing an organic solvent under the action of an acid, a compound which generates an acid upon irradiation with actinic rays or radiation, and a hydrophobic resin.

Abstract translation: 要解决的问题：提供显影缺陷性能，液浸缺陷性能和极限分辨率优异的能光泽或光敏树脂组合物，并且能够形成具有良好形状的图案，以及使用 光敏性或辐射敏感性树脂组合物包含含有具有通过酸作用分解的基团的第一重复单元从而产生醇羟基并且表现出降低的溶解度的树脂 在酸的作用下在含有有机溶剂的显影剂中，在用光化射线或辐射照射时产生酸的化合物和疏水性树脂。

公开(公告)号：JP2011145424A

公开(公告)日：2011-07-28

申请号：JP2010005341

申请日：2010-01-13

Applicant: Fujifilm Corp ,  富士フイルム株式会社

Inventor： IWATO KAORU ,  TARUYA SHINJI ,  ENOMOTO YUICHIRO ,  KAMIMURA SATOSHI ,  KATO KEITA

IPC: G03F7/038 ,  C08F20/26 ,  G03F7/004 ,  G03F7/039 ,  G03F7/32 ,  G03F7/38 ,  H01L21/027

CPC classification number: G03F7/0382 ,  G03F7/0045 ,  G03F7/0046 ,  G03F7/2041 ,  G03F7/325 ,  Y10S430/114 ,  Y10S430/128 ,  Y10T428/24802

Abstract: PROBLEM TO BE SOLVED: To provide a pattern forming method by which a pattern having high sensitivity and resolution, small line width roughness (LWR), and a superior exposure latitude (EL) and pattern form is formed, to provide a pattern formed by the pattern forming method, and to provide a chemically amplified resist composition used in the pattern forming method, and a resist film formed of the chemically amplified resist composition. SOLUTION: The pattern forming method includes: (1) a step of forming a film from a chemically amplified resist composition containing (A) a resin including a repeating unit having at least two hydroxyl groups, (B) a compound generating an acid by the irradiation with an active ray or radiation, (C) a cross-linking agent, and (D) a solvent; (2) a step of exposing the film, and (3) a step of developing by using a developing solution containing an organic solvent. A pattern is formed by the pattern forming method. The chemically amplified resist composition is used in the pattern forming method, and the resist is formed from the chemically amplified resist composition. COPYRIGHT: (C)2011,JPO&INPIT

Abstract translation: 要解决的问题：提供一种图案形成方法，通过该图案形成方法形成具有高灵敏度和分辨率，小线宽粗糙度（LWR）和优良曝光宽容度（EL）和图案形式的图案，以提供图案 通过图案形成方法形成，并提供在图案形成方法中使用的化学放大抗蚀剂组合物和由化学放大抗蚀剂组合物形成的抗蚀剂膜。 解决方案：图案形成方法包括：（1）从化学放大抗蚀剂组合物形成膜的步骤，所述化学放大抗蚀剂组合物含有（A）包含具有至少两个羟基的重复单元的树脂，（B） 通过用活性射线或辐射照射，（C）交联剂，和（D）溶剂; （2）使膜曝光的工序，（3）使用含有有机溶剂的显影液进行显影的工序。 通过图案形成方法形成图案。 在图案形成方法中使用化学放大抗蚀剂组合物，并且由化学放大抗蚀剂组合物形成抗蚀剂。 版权所有（C）2011，JPO＆INPIT

公开(公告)号：JP2011102975A

公开(公告)日：2011-05-26

申请号：JP2010230645

申请日：2010-10-13

Applicant: Fujifilm Corp ,  富士フイルム株式会社

Inventor： SAEGUSA HIROSHI ,  IWATO KAORU ,  IIZUKA YUSUKE ,  KOSHIJIMA KOSUKE

IPC: G03F7/004 ,  C08F20/10 ,  C08F20/54 ,  C08F30/08 ,  G03F7/039 ,  H01L21/027

CPC classification number: G03F7/0397 ,  G03F7/0045 ,  G03F7/0046 ,  G03F7/0758 ,  G03F7/2041 ,  G03F7/38

Abstract: PROBLEM TO BE SOLVED: To provide an active light sensitive or radiation sensitive resin composition and a method of forming a pattern using the resin composition improved in line edge roughness, BLOB defects and generation of scum, and having good conformability to an immersion liquid in immersion exposure. SOLUTION: The active light sensitive or radiation sensitive resin composition includes (A) a resin that when acted on by an acid, increases its solubility in an alkali developer, (B) a compound that when exposed to active lights or radiation, generates an acid, and (C) a resin containing at least one group selected among the following groups (x) to (z) and further containing at least either a fluorine atom or a silicon atom, in which three or more polymer chains are contained through at least one branch point, (x) an alkali-soluble group, (y) a group that when acted on by an alkali developer, is decomposed to thereby increase its solubility in the alkali developer, and (z) a group that when acted on by an acid, is decomposed to thereby increase its solubility in an alkali developer. COPYRIGHT: (C)2011,JPO&INPIT

Abstract translation: 要解决的问题：提供一种主动光敏或辐射敏感性树脂组合物和使用改善了线边缘粗糙度，BLOB缺陷和浮渣产生并且具有良好的浸渍适形性的树脂组合物形成图案的方法 液体浸入曝光。 主要的光敏性或辐射敏感性树脂组合物包括（A）当被酸作用时增加其在碱性显影剂中的溶解度的树脂，（B）当暴露于活性光或辐射时， 产生酸，和（C）含有选自下列基团（x）至（z）中的至少一个基团的树脂，并且还含有其中含有三个或更多个聚合物链的氟原子或硅原子中的至少一个 通过至少一个分支点，（x）碱溶性基团，（y）当被碱显影剂作用时分解的基团分解，从而增加其在碱性显影剂中的溶解度，和（z） 被酸分解，从而增加其在碱性显影剂中的溶解度。 版权所有（C）2011，JPO＆INPIT

公开(公告)号：JP2011100089A

公开(公告)日：2011-05-19

申请号：JP2009285584

申请日：2009-12-16

Applicant: Fujifilm Corp ,  富士フイルム株式会社

Inventor： ENOMOTO YUICHIRO ,  KAMIMURA SATOSHI ,  TARUYA SHINJI ,  KATO KEITA ,  IWATO KAORU

IPC: G03F7/038 ,  C08F20/10 ,  C08F32/08 ,  G03F7/004 ,  G03F7/32 ,  H01L21/027

CPC classification number: G03F7/0382 ,  G03F7/0395 ,  G03F7/0397 ,  G03F7/2041 ,  G03F7/30 ,  G03F7/325 ,  G03F7/327 ,  Y10S430/106 ,  Y10S430/111

Abstract: PROBLEM TO BE SOLVED: To provide a pattern forming method for forming a pattern having a large depth of focus (DOF), small line width roughness (LWR) and reduced bridge defects, in order to more stably form a high-accuracy fine pattern for manufacturing a highly integrated and accurate electronic device, and to provide a chemical amplification resist composition used in the method and a resist film formed from the chemical amplification resist composition. SOLUTION: The pattern forming method includes: (1) a step of forming a film from a chemical amplification resist composition; (2) a step of exposing the film; and (3) a step of developing the film by using an organic solvent-containing developer, wherein the resist composition contains: (A) a resin substantially insoluble in alkali; (B) a compound capable of generating an acid upon irradiation with an actinic ray or radiation; (C) a cross-linking agent; and (D) a solvent. The chemical amplification resist composition used in the method and the resist film formed from the chemical amplification resist composition are also provided. COPYRIGHT: (C)2011,JPO&INPIT

Abstract translation: 要解决的问题：为了提供用于形成具有大的焦深（DOF），小线宽粗糙度（LWR）和减小的桥缺陷的图案的图案形成方法，以便更稳定地形成高精度 用于制造高度集成和精确的电子器件的精细图案，并提供用于该方法的化学放大抗蚀剂组合物和由化学增强抗蚀剂组合物形成的抗蚀剂膜。 解决方案：图案形成方法包括：（1）从化学放大抗蚀剂组合物形成膜的步骤; （2）曝光胶片的步骤; 和（3）通过使用含有机溶剂的显影剂显影该膜的步骤，其中抗蚀剂组合物包含：（A）基本上不溶于碱的树脂; （B）能够在用光化射线或辐射照射时能产生酸的化合物; （C）交联剂; 和（D）溶剂。 还提供了用于该方法的化学放大抗蚀剂组合物和由化学放大抗蚀剂组合物形成的抗蚀剂膜。 版权所有（C）2011，JPO＆INPIT

公开(公告)号：JP2011095607A

公开(公告)日：2011-05-12

申请号：JP2009250885

申请日：2009-10-30

Applicant: Fujifilm Corp ,  富士フイルム株式会社

Inventor： ENOMOTO YUICHIRO ,  TARUYA SHINJI ,  KAMIMURA SATOSHI ,  IWATO KAORU ,  KATO KEITA

IPC: G03F7/038 ,  C08F220/28 ,  G03F7/30 ,  G03F7/32 ,  H01L21/027

Abstract: PROBLEM TO BE SOLVED: To provide a pattern forming method, and an actinic ray-sensitive or radiation-sensitive resin composition which enable formation of a pattern which is superior in the depth of focus (DOF) and in roughness characteristics and having few bridge defects and few chips. SOLUTION: The pattern forming method includes the steps of (A) forming a film by using an actinic ray-sensitive or radiation-sensitive resin composition; (B) exposing the film; and (C) developing the exposed film with a developer comprising an organic solvent, wherein the composition comprises (a) a resin whose solubility in the developer decreases by the action of an acid and which has a repeating unit, in which an oxygen atom-containing group bonds to a main chain via a single bond or a divalent linking group, including neither an ester bond nor an aromatic ring group, with the content of the repeating unit in the resin being 20-100 mol%, based on all the repeating units in the resin, (b) a compound which generates acid upon irradiation with actinic rays or radiation and (d) a solvent. COPYRIGHT: (C)2011,JPO&INPIT

Abstract translation: 要解决的问题：为了提供图案形成方法，以及能够形成焦深（DOF）和粗糙度特性优异的图案的光化射线敏感性或辐射敏感性树脂组合物，并具有 桥梁缺陷少，芯片少。 解决方案：图案形成方法包括以下步骤：（A）通过使用光化射线敏感或辐射敏感树脂组合物形成膜; （B）曝光胶片; 和（C）用包含有机溶剂的显影剂显影所述曝光的膜，其中所述组合物包含（a）其中在显色剂中的溶解度随着酸的作用而降低并且具有重复单元的树脂， 基于所有重复的方式，通过单键或二价连接基团（不包括酯键和芳环基团）将主链含有基团键，其中树脂中重复单元的含量为20-100摩尔％ 树脂中的单元，（b）在用光化射线或辐射照射时产生酸的化合物和（d）溶剂。 版权所有（C）2011，JPO＆INPIT

公开(公告)号：JP2010266857A

公开(公告)日：2010-11-25

申请号：JP2010089799

申请日：2010-04-08

Applicant: Fujifilm Corp ,  富士フイルム株式会社

Inventor： OTANI TADAHIRO ,  HIRANO SHUJI ,  SAEGUSA HIROSHI ,  IWATO KAORU ,  IIZUKA YUSUKE

IPC: G03F7/039 ,  C08F20/28 ,  G03F7/004 ,  G03F7/38 ,  H01L21/027

Abstract: PROBLEM TO BE SOLVED: To provide an actinic ray-sensitive or radiation-sensitive resin composition allowing formation of a pattern in which pattern collapse is suppressed, which hardly induces development failure and exhibits excellent stability with lapse of time, and also to provide a method for forming a pattern, using the composition. SOLUTION: The actinic ray-sensitive or radiation-sensitive resin composition contains: (A) a resin showing an increase in a dissolution rate with an alkali developing solution by the action of an acid; (B) a compound generating an acid by irradiation with actinic rays or radiation; (C) a resin containing a repeating unit having a polarity converting group that is decomposed by the action of an alkali developing solution to increase the solubility with the alkali developing solution, and containing at least either a fluorine atom or a silicon atom; and (D) a basic compound having a pKa of not more than 9. COPYRIGHT: (C)2011,JPO&INPIT

Abstract translation: 要解决的问题：提供光化学射线敏感性或辐射敏感性树脂组合物，其能够形成抑制图案塌陷的图案，其几乎不引起显影破坏，并且随着时间的推移表现出优异的稳定性，并且还 提供使用该组合物形成图案的方法。 光敏射线敏感性或辐射敏感性树脂组合物含有：（A）通过酸的作用显示与碱性显影液的溶解速度增加的树脂; （B）通过用光化射线或辐射照射产生酸的化合物; （C）含有具有极性转换基团的重复单元的树脂，其通过碱显影液的作用而分解，以增加与碱性显影液的溶解度，并且至少含有氟原子或硅原子; （D）pKa不大于9的碱性化合物。版权所有（C）2011，JPO＆INPIT

公开(公告)号：JP2010250072A

公开(公告)日：2010-11-04

申请号：JP2009099400

申请日：2009-04-15

Applicant: Fujifilm Corp ,  富士フイルム株式会社

Inventor： SHIRAKAWA MICHIHIRO ,  YAMAMOTO KEI ,  IWATO KAORU ,  SAEGUSA HIROSHI ,  HIRANO SHUJI ,  IIZUKA YUSUKE

IPC: G03F7/039 ,  C08F20/00 ,  G03F7/004 ,  H01L21/027

Abstract: PROBLEM TO BE SOLVED: To provide an active ray-sensitive or radiation-sensitive resin composition having an effect of improving a spread bottom profile of a resist pattern, with which a pattern having few pattern collapse defects is formed, and to provide a method for forming a pattern by using the composition. SOLUTION: The composition includes (A) a resin the solubility of which with an alkali developing solution is increased by an action of an acid, (B) a compound generating an acid by irradiation with active rays or radiation, and (C) a resin containing at least either a fluorine atom or a silicon atom and containing a polarity conversion group that is decomposed by an action of an alkali developing solution to increases the solubility with the alkali developing solution, wherein the resin component (A) contains a repeating unit obtained from an ester compound expressed by general formula (1). In general formula (1), A 1 represents a polymerizable functional group having a carbon-carbon double bond; A 2 represents a divalent group selected from furan-diyl, tetrahydrofuran-diyl and oxanorbornan-diyl; R 1 and R 2 each independently represent a 1C-10C straight-chain, branched or cyclic monovalent hydrocarbon group; or R 1 and R 2 may be bonded to form an aliphatic hydrocarbon ring together with carbon atoms bonding thereto; and R 3 represents a 1C-10C straight-chain, branched or cyclic monovalent hydrocarbon group which may include a hydrogen atom or a hetero atom. COPYRIGHT: (C)2011,JPO&INPIT

Abstract translation: 要解决的问题：提供一种具有改善抗蚀剂图案的扩散底部轮廓的效果的活性射线敏感或辐射敏感性树脂组合物，由此形成具有很少图案塌陷缺陷的图案，并提供 通过使用该组合物形成图案的方法。 该组合物包含（A）通过酸的作用使其与碱性显影液的溶解度增加的树脂，（B）通过用活性射线或辐射照射产生酸的化合物和（C ）含有至少一个氟原子或硅原子的树脂，并含有通过碱性显影液的作用分解的极性转换基团以增加与碱性显影液的溶解度，其中树脂组分（A）含有 由通式（1）表示的酯化合物得到的重复单元。 在通式（1）中，A 1 表示具有碳 - 碳双键的聚合性官能团; A 2 表示选自呋喃二基，四氢呋喃 - 二基和氧杂二甘醇二基的二价基团; R 1 和R 2 各自独立地表示1C-10C直链，支链或环状的一价烃基; 或R 1 和R 2 可与键合的碳原子一起形成脂族烃环; R 3表示可以包含氢原子或杂原子的1C-10C直链，支链或环状的一价烃基。 版权所有（C）2011，JPO＆INPIT